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1. 发明申请

US20110271497A1 DRY ADHESIVE FASTENER SYSTEM AND METHOD OF USING THE SAME 审中-公开
标题翻译：干燥粘合紧固件系统及其使用方法
公开(公告)号：US20110271497A1
公开(公告)日：2011-11-10
申请号：US13144815
申请日：2010-02-12
申请人： Kahp Yang Suh , Tae Il Kim , Chang Hyun Pang , Weon Gyu Bae
发明人： Kahp Yang Suh , Tae Il Kim , Chang Hyun Pang , Weon Gyu Bae
IPC分类号： A44B18/00
CPC分类号： A44B18/0073 , A44B18/0007 , C09J5/00 , C09J2201/626 , C09J2467/00 , F16B5/07 , Y10T24/27 , Y10T24/2783
摘要： Provided are a dry adhesive fastening system which has a relatively superior adhesion, does not almost generate noises during the attaching or detaching operation, has a simplified structure adapted to mass production requirements, and a method of using the same. For this, the dry adhesive fastening system includes a first adhesion member having a first microvillus disposed on a first board and a second adhesion member having a second microvillus disposed on a second board to contact the first adhesion, thereby providing adhesion. Also, unlike the existing velcro fastening system, the hook and loop may not be classified to improve production yield and effectiveness. Also, during the attachment/detachment, the noises may do not occur. In addition, since the microvillus having the micro or nano size is used, the adhesion may be realized even though a very small area is provided. Therefore, the dry adhesive fastening system according to the embodiment of the present invention may be applied in fields greater than those of the existing velcro fastening system.
摘要翻译：提供了一种具有相对优异的附着力的干燥粘合剂紧固系统，在附接或拆卸操作期间几乎不产生噪声，具有适于批量生产要求的简化结构及其使用方法。为此，干式粘合剂紧固系统包括具有设置在第一板上的第一微生物的第一粘合构件和设置在第二板上的第二微孔的第二粘合构件以接触第一粘合，从而提供粘合。此外，与现有的维可牢尼龙搭扣系统不同，钩环可以不分类以提高产量和效果。此外，在附着/拆卸期间，可能不会发生噪声。此外，由于使用微米或纳米尺寸的微生物，即使提供非常小的面积，也可以实现粘附。因此，根据本发明的实施例的干式粘合剂紧固系统可以应用于比现有的尼龙搭扣系统的领域更大的领域。

2. 发明授权

US08721905B2 Method for forming minute pattern and method for forming minute pattern mask 有权
标题翻译：形成微小图案的方法和形成微图案掩模的方法
公开(公告)号：US08721905B2
公开(公告)日：2014-05-13
申请号：US13431516
申请日：2012-03-27
申请人： Se-Hwan Yu , Ji Seon Lee , Yoon Ho Khang , Kahp Yang Suh , Hyoung Sick Um , Jae Jun Chae , Sung Hun Lee
发明人： Se-Hwan Yu , Ji Seon Lee , Yoon Ho Khang , Kahp Yang Suh , Hyoung Sick Um , Jae Jun Chae , Sung Hun Lee
IPC分类号： H01L21/302
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： A method for forming a minute pattern mask includes forming an etching target layer on a substrate. A convex pattern including a plurality of convex parts is formed on the etching target layer. A resin composition is coated on the convex pattern to form a resin layer including a first region neighboring the convex part and a second region positioned between the neighboring convex parts. The resin layer is ashed or etched to form the plurality of first resin patterns. The plurality of first resin patterns is processed to form a minute pattern mask including a plurality of second resin patterns. The etching target layer is etched using the plurality of second resin patterns as an etch mask to form a minute pattern.
摘要翻译：形成微图案掩模的方法包括在基板上形成蚀刻目标层。在蚀刻目标层上形成包括多个凸部的凸形图案。将树脂组合物涂覆在凸形图案上以形成包括邻近凸部的第一区域和位于相邻凸部之间的第二区域的树脂层。树脂层被灰化或蚀刻以形成多个第一树脂图案。处理多个第一树脂图案以形成包括多个第二树脂图案的微小图案掩模。使用多个第二树脂图案作为蚀刻掩模蚀刻蚀刻目标层以形成微小图案。

3. 发明申请

US20120034390A1 METHOD OF FORMING HIERARCHICAL MICROSTRUCTURE USING PARTIAL CURING 审中-公开
标题翻译：使用部分固化形成分层微结构的方法
公开(公告)号：US20120034390A1
公开(公告)日：2012-02-09
申请号：US13265521
申请日：2009-04-20
申请人： Kahp Yang Suh , Hoon Eui Jeong , No Kyun Kwak
发明人： Kahp Yang Suh , Hoon Eui Jeong , No Kyun Kwak
IPC分类号： B82B3/00
CPC分类号： B81C1/0046 , B81B2203/04 , B81C1/00206 , B81C2201/034
摘要： Disclosed is a method of forming a hierarchical microstructure using partial curing, which is simple in the manufacturing process and capable of forming a hierarchical structure without heterogeneous interfaces. To this end, there is provided a method of forming a hierarchical microstructure using partial curing, including forming a first polymer pattern having partial curing layers and forming a second polymer pattern on the first polymer pattern by using the partial curing layers. According to the present invention, a microstructure having various hierarchical structures can be formed by using a simple process. Accordingly, efficiency in various processes in which a microstructure having various hierarchical structures needs to be formed and economic efficiency can be improved. Furthermore, new functional materials, having not only super hydrophobicity, but also a high adhesive property even in a rough surface, can be developed.
摘要翻译：公开了一种使用部分固化形成分级微结构的方法，其制造过程简单并且能够形成没有异质界面的层次结构。为此，提供了使用部分固化形成层状微结构的方法，包括通过使用部分固化层在第一聚合物图案上形成具有部分固化层并形成第二聚合物图案的第一聚合物图案。根据本发明，可以通过使用简单的工艺形成具有各种分层结构的微结构。因此，可以提高需要形成具有各种分层结构的微结构的各种工艺中的效率和经济效率。此外，即使在粗糙表面上，也可以开发不仅具有超疏水性，而且具有高粘合性的新功能材料。

4. 发明申请

US20130098869A1 Method for Forming Minute Pattern and Method for Forming Minute Pattern Mask 有权
标题翻译：形成分钟图案的方法和形成分钟图案掩模的方法
公开(公告)号：US20130098869A1
公开(公告)日：2013-04-25
申请号：US13431516
申请日：2012-03-27
申请人： Se-Hwan Yu , Ji Seon Lee , Yoon Ho Khang , Kahp Yang Suh , Hyoung Sick Um , Jae Jun Chae , Sung Hun Lee
发明人： Se-Hwan Yu , Ji Seon Lee , Yoon Ho Khang , Kahp Yang Suh , Hyoung Sick Um , Jae Jun Chae , Sung Hun Lee
IPC分类号： B44C1/22
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： A method for forming a minute pattern mask includes forming an etching target layer on a substrate. A convex pattern including a plurality of convex parts is formed on the etching target layer. A resin composition is coated on the convex pattern to form a resin layer including a first region neighboring the convex part and a second region positioned between the neighboring convex parts. The resin layer is ashed or etched to form the plurality of first resin patterns. The plurality of first resin patterns is processed to form a minute pattern mask including a plurality of second resin patterns. The etching target layer is etched using the plurality of second resin patterns as an etch mask to form a minute pattern.
摘要翻译：形成微图案掩模的方法包括在基板上形成蚀刻目标层。在蚀刻目标层上形成包括多个凸部的凸形图案。将树脂组合物涂覆在凸形图案上以形成包括邻近凸部的第一区域和位于相邻凸部之间的第二区域的树脂层。树脂层被灰化或蚀刻以形成多个第一树脂图案。处理多个第一树脂图案以形成包括多个第二树脂图案的微小图案掩模。使用多个第二树脂图案作为蚀刻掩模蚀刻蚀刻目标层以形成微小图案。

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