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1. 发明申请

WO0154163A9 SHAPED AND LOW DENSITY FOCUSED ION BEAMS 审中-公开
标题翻译：形状和低密度聚焦离子束
公开(公告)号：WO0154163A9
公开(公告)日：2002-10-17
申请号：PCT/EP0100621
申请日：2001-01-19
申请人： KONINKL PHILIPS ELECTRONICS NV , FEI CO
发明人： GERLACH ROBERT L , UTLAUT MARK W , TESCH PAUL P , YOUNG RICHARD J , CHANDLER CLIVE D , VAN DER MAST KARL D
IPC分类号： C23C14/32 , G01Q70/14 , H01J37/30 , H01J37/305 , H01J37/317
CPC分类号： H01J37/3178 , H01J37/3007 , H01J37/3056 , H01J2237/31744
摘要： A method and apparatus for providing a shaped ion beam having low current density and sharp edges for inducing a reaction between a working material supplied to a target and the target to deposit or remove material. The low current density and sharp edges eliminate the problem of overmilling, while permitting rapid ion beam processing. One method of producing the shaped beam is by using a two lens system, the first lens imaging the source onto the plane of the second lens and the second lens forming an image of the aperture onto the target plane. Another method is to greatly underfocus a chromatic aberration limited beam. Large beams having uniform current density and sharp edges can be produced. A knife edge beam, having a sharp edge can also be produced.
摘要翻译：一种用于提供具有低电流密度和锋利边缘的成形离子束的方法和装置，用于引起供应到目标的工作材料与靶材沉积或去除材料之间的反应。低电流密度和尖锐的边缘消除了超磨的问题，同时允许快速的离子束处理。产生成形光束的一种方法是通过使用双透镜系统，第一透镜将光源成像到第二透镜的平面上，并且第二透镜将孔的图像形成到目标平面上。另一种方法是使色差受限束非常不足。可以产生具有均匀电流密度和锋利边缘的大光束。也可以生产具有锋利边缘的刀刃梁。

2. 发明专利

AU3814801A Through-the-lens collection of secondary particles for a focused ion beam system 未知
公开(公告)号：AU3814801A
公开(公告)日：2001-08-20
申请号：AU3814801
申请日：2001-02-08
申请人： FEI CO
发明人： GERLACH ROBERT L , UTLAUT MARK W
IPC分类号： H01J37/244 , G11B5/31 , H01J37/08 , H01J37/305 , H01J37/317 , H01J37/26 , B01D59/44
摘要： Secondary particles are collected along the optical axis of a focused ion beam system, thereby eliminating the need for side-mounted detectors that make close packing of multiple columns difficult and that require the final lens to be spaced further away from the target. Secondary particles can be collected through the lens and then diverted away from the optical axis of the ion column for detection without significantly degrading the resolution of the focused ion beam. Secondary particles can also be collected using a conductive plate connected to an amplifier to detect the electrical current caused by the secondary particles.

3. 发明专利

DE60136036D1 未知
公开(公告)号：DE60136036D1
公开(公告)日：2008-11-20
申请号：DE60136036
申请日：2001-02-07
申请人： FEI CO
发明人： GERLACH ROBERT L , TESCH PAUL P , SWANSON LYNWOD W , UTLAUT MARK W
IPC分类号： C23C14/32 , H01J37/08 , H01J27/26 , H01J37/244 , H01J37/305 , H01J37/317
摘要： A multi-gun FIB system for nanofabrication provides increased throughput at reduced cost while maintaining resolution. Multiple guns are maintained in modular gun chambers that can be vacuum isolated from the primary vacuum chamber containing the targets. A system can include multiple gun chambers, each of which van include multiple guns, with each gun chamber being capable of being vacuum isolated, so that each gun chamber can be removed and replaced without disturbing the vacuum in other gun chambers or in the main chamber. An optical column is associated with each gun. Optical elements for multiple columns can be formed in a bar that extends into several columns. Some of the optical elements are positioned in the gun chambers and others are positioned in the primary vacuum chamber. A through-the-lens secondary particle collection can be used in connection with each of the individual columns.

4. 发明申请

WO2012177890A2 HIGH VOLTAGE ISOLATION OF AN INDUCTIVELY COUPLED PLASMA ION SOURCE WITH A LIQUID THAT IS NOT ACTIVELY PUMPED 审中-公开
标题翻译：感应耦合等离子体源的高电压隔离与液体不是有效泵送
公开(公告)号：WO2012177890A2
公开(公告)日：2012-12-27
申请号：PCT/US2012043563
申请日：2012-06-21
申请人： FEI CO , KELLOGG SEAN , WELLS ANDREW B , MCGINN JAMES B , PARKER N WILLIAM , UTLAUT MARK W
发明人： KELLOGG SEAN , WELLS ANDREW B , MCGINN JAMES B , PARKER N WILLIAM , UTLAUT MARK W
IPC分类号： H01J37/22 , H01J37/08 , H01J37/10
CPC分类号： H05H1/24 , H01J27/16 , H01J37/08 , H01J37/321 , H01J2237/002 , H01J2237/061 , H01J2237/0817 , H01J2237/31749 , H05H1/46 , H05H2001/4652
摘要： An inductively-coupled plasma source for a focused charged particle beam system includes a plasma chamber and a fluid that is not actively pumped surrounding the plasma chamber for providing high voltage isolation between the plasma chamber and nearby parts which are at ground potential, such as a conductive shield. One or more cooling devices cool the plasma chamber by using evaporative cooling and heat pipes to dissipate the heat from the plasma chamber into a surrounding environment.
摘要翻译：用于聚焦带电粒子束系统的电感耦合等离子体源包括等离子体腔室和不被主动地泵送在等离子体室周围的流体，以在等离子体室和处于地电位的附近部件之间提供高电压隔离，例如导电屏蔽。一个或多个冷却装置通过使用蒸发冷却和热管将等离子体室的热量散发到周围环境中来冷却等离子体室。

5. 发明申请

WO2012177876A3 ENCAPSULATION OF ELECTRODES IN SOLID MEDIA FOR USE IN CONJUNCTION WITH FLUID HIGH VOLTAGE ISOLATION 审中-公开
标题翻译：固体介质中电极的附着与流体高压隔离相结合
公开(公告)号：WO2012177876A3
公开(公告)日：2013-02-28
申请号：PCT/US2012043548
申请日：2012-06-21
申请人： FEI CO , KELLOGG SEAN , GRAUPERA ANTHONY , PARKER N WILLIAM , UTLAUT MARK W , WELLS ANDREW B , MCGINN JAMES B
发明人： KELLOGG SEAN , GRAUPERA ANTHONY , PARKER N WILLIAM , UTLAUT MARK W , WELLS ANDREW B , MCGINN JAMES B
IPC分类号： H05H1/00
CPC分类号： H01J27/16 , H01J37/08 , H01J37/321 , H01J2237/002 , H01J2237/061 , H01J2237/0817 , H01J2237/31749 , H05H1/28 , H05H1/30 , H05H1/46 , H05H2001/4652 , H05H2001/4682
摘要： An inductively-coupled plasma source for a focused charged particle beam system includes a conductive shield that provides improved electrical isolation and reduced capacitive RF coupling and a dielectric fluid that insulates and cools the plasma chamber. The conductive shield may be enclosed in a solid dielectric media. The dielectric fluid may be circulated by a pump or not circulated by a pump. A heat tube can be used to cool the dielectric fluid.
摘要翻译：用于聚焦带电粒子束系统的电感耦合等离子体源包括提供改进的电隔离和减小的电容RF耦合的导电屏蔽以及绝缘和冷却等离子体室的介电流体。导电屏蔽件可以封闭在固体介电介质中。电介质流体可以由泵循环或不被泵循环。可以使用热管来冷却介电流体。

6. 发明专利

DE602004028819D1 TEILCHENDETEKTOR GEEIGNET FÜR DIE ERKENNUNG VON IONEN UND ELEKTRONEN 未知
公开(公告)号：DE602004028819D1
公开(公告)日：2010-10-07
申请号：DE602004028819
申请日：2004-06-25
申请人： FEI CO
发明人： GERLACH ROBERT L , UTLAUT MARK W , DINGLE TREVOR , UNCOVSKY MAREK
IPC分类号： H01J37/244 , H01J20060101 , H01J37/30 , H01J43/06 , H01J49/02

7. 发明专利

DE60139685D1 未知
公开(公告)号：DE60139685D1
公开(公告)日：2009-10-08
申请号：DE60139685
申请日：2001-05-16
申请人： FEI CO
发明人： GERLACH ROBERT L , UTLAUT MARK W
IPC分类号： H01J37/02 , H01J37/20 , H01J37/08 , H01J37/244 , H01J37/30 , H01J37/305 , H01J37/317

8. 发明专利

DE60138002D1 未知
公开(公告)号：DE60138002D1
公开(公告)日：2009-04-30
申请号：DE60138002
申请日：2001-01-19
申请人： FEI CO
发明人： GERLACH ROBERT L , UTLAUT MARK W , TESCH PAUL P , YOUNG RICHARD J , CHANDLER CLIVE D , VAN DER MAST KARL D
IPC分类号： C23C14/32 , H01J37/30 , G01Q70/14 , H01J37/305 , H01J37/317

9. 发明专利

JP2014128871A System for delivering very small amount of fluid 审中-公开
标题翻译：提供非常小量的液体的系统
公开(公告)号：JP2014128871A
公开(公告)日：2014-07-10
申请号：JP2013240123
申请日：2013-11-20
申请人： Fei Co , エフ・イ−・アイ・カンパニー
发明人： BOTMAN AURELIEN PHILIPPE JEAN MACLOU , RANDOLPH STEVEN , UTLAUT MARK W
IPC分类号： B82B3/00 , B23K15/00 , B82B1/00 , B82Y30/00 , B82Y40/00 , H01J37/20 , H01J37/28 , H01J37/305 , H01J37/317
CPC分类号： B05D1/26 , C25D5/024 , C25F3/14 , G01N23/225 , Y10T137/0324
摘要： PROBLEM TO BE SOLVED: To provide a method and apparatus which supplies a small amount of liquid to the surface of a workpiece for processing, such as particle beam-induced deposition and etching, in a vacuum system.SOLUTION: A microscopic channel for making liquid flow from a liquid supply position to a processing position is formed on the surface of a workpiece. A nano-capillary 802 is prepared whose tip diameter is less than 50 μm and which is formed with at least one slit 1002 extending to the tip. The tip of the nano-capillary 802 is brought into contact with the surface of the workpiece, and the liquid is distributed from the nano-capillary 802 to the surface of the workpiece and supplied to the processing position through the channel. The evaporation rate or flow rate of the liquid is controlled so as to generate bubbles having a desired size at the processing position.
摘要翻译：要解决的问题：提供一种在真空系统中向工件表面供给少量液体的方法和装置，例如粒子束诱导的沉积和蚀刻。解决方案：用于制造液体的微细通道在工件的表面上形成从液体供给位置到处理位置的流动。制备其尖端直径小于50μm的纳米毛细管802，并且形成有至少一个延伸到尖端的狭缝1002。纳米毛细管802的尖端与工件的表面接触，并且液体从纳米毛细管802分布到工件的表面并通过通道供应到加工位置。控制液体的蒸发速率或流速，以便在处理位置产生具有所需尺寸的气泡。

10. 发明专利

JP2013257317A Lamella creation method and device using fixed-angle beam and rotating sample stage 审中-公开
标题翻译： LAMELLA创建方法和使用固定角度和旋转样本阶段的设备
公开(公告)号：JP2013257317A
公开(公告)日：2013-12-26
申请号：JP2013109593
申请日：2013-05-24
申请人： Fei Co , エフ・イ−・アイ・カンパニー
发明人： WELLS ANDREW B , PARKER N WILLIAM , CHANDLER CLIVE D , UTLAUT MARK W
IPC分类号： G01N1/28
CPC分类号： G01N1/32 , H01J37/3023 , H01J37/3056 , H01J2237/31745
摘要： PROBLEM TO BE SOLVED: To provide a method and system of forming a substantially planar face in a substrate.SOLUTION: The method comprises: directing at least one beam at a first surface of a substrate to remove material from the substrate, the beam being offset from a normal to the first surface by a nonzero curtaining angle; sweeping the beam in a plane that is perpendicular to the first surface to mill one or more initial cuts in the substrate so as to expose a second surface that is substantially perpendicular to the first surface; rotating the substrate through a nonzero rotation angle about an axis other than an axis that is normal or parallel to the beam; directing the first beam at the second surface to remove additional material from the substrate without changing the nonzero curtaining angle; and scanning the beam in a pattern across the second surface to mill one or more finishing cuts in the substrate.
摘要翻译：要解决的问题：提供在基板中形成基本平坦的面的方法和系统。解决方案：该方法包括：将至少一个光束引导到基板的第一表面以从基板去除材料，所述光束被偏移从法线到第一表面非零的夹角; 在垂直于第一表面的平面中扫掠光束以研磨衬底中的一个或多个初始切口，以暴露基本上垂直于第一表面的第二表面; 围绕除了正常或平行于光束的轴线之外的轴线旋转基板非零的旋转角度; 在所述第二表面处引导所述第一光束以从所述衬底移除附加材料而不改变所述非零的绘制角度; 并且以跨过第二表面的图案扫描光束以研磨衬底中的一个或多个精加工切口。

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