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1. 发明专利

JP2003193241A PLASMA CVD FILM DEPOSITION APPARATUS 审中-公开
公开(公告)号：JP2003193241A
公开(公告)日：2003-07-09
申请号：JP2001394140
申请日：2001-12-26
申请人： KOBE STEEL LTD , MORI YUZO
发明人： HAYASHI KAZUYUKI , KUGIMIYA TOSHIHIRO , GOTO YASUSHI , KOBAYASHI AKIRA , HOSOKAWA YOSHIYUKI , INOUE KENICHI , MORI YUZO
IPC分类号： C23C16/509
摘要： PROBLEM TO BE SOLVED: To provide a plasma CVD film deposition apparatus capable of performing high-speed film deposition on a base material with a large area, and depositing a uniform film. SOLUTION: The plasma CVD film deposition apparatus comprises two or more rollers 22a-22f and 23, a conductive endless belt electrode 21 supported and traveled by these rollers 22a-22f and 23, a base material holding means 5 to hold the base material 4 to be film-deposited at the position facing a part of the belt electrode 21, and a plasma generating means to generate plasma P in a space between the belt electrode 21 and the base material 4. The two or more rollers 22a-22f and 23 are provided so that the radius of curvature of the belt electrode 21 in a plasma generating area P is larger than the radius of the rollers 22a-22f and 23. COPYRIGHT: (C)2003,JPO

2. 发明专利

JP2003129245A APPARATUS AND METHOD FOR FORMING PLASMA CVD FILM 审中-公开
公开(公告)号：JP2003129245A
公开(公告)日：2003-05-08
申请号：JP2001326200
申请日：2001-10-24
申请人： KOBE STEEL LTD , MORI YUZO
发明人： ISHIBASHI KIYOTAKA , GOTO YASUSHI , KUGIMIYA TOSHIHIRO , HAYASHI KAZUYUKI , HOSOKAWA YOSHIYUKI , HIRANO TAKAYUKI , KOBAYASHI AKIRA , MORI YUZO
IPC分类号： G03G5/08 , C23C16/509 , H01L21/205
摘要： PROBLEM TO BE SOLVED: To make it possible to perform high-speed film formation and to prolong the maintenance cycle of an apparatus in a method comprising rotating a substrate having a cylindrical outer periphery and forming a film on the cylindrical periphery by a plasma CVD process. SOLUTION: The plasma CVD film formation apparatus comprises a high-frequency electrode opposite to the substrate; a rotation means that rotates the substrate; a linear plasma generation space formed by cooperatively partitioning a reactor with the substrate and the high-frequency electrode; a partitioning member for forming a film formation region comprising a gas introduction space and a gas discharge space between which the plasma generation space is sandwiched; an atmosphere pressure adjustment means that sets and adjusts the pressure of the atmosphere in the plasma generation space within the range of 1 k to 200 kPa; and a high-frequency electric power source that supplies a high-frequency electric power to the high-frequency electrode in order to generate a linear plasma by glow discharge between the high-frequency electrode and the cylindrical outer periphery of the substrate.

3. 发明专利

DE10129595A1 未知
公开(公告)号：DE10129595A1
公开(公告)日：2002-03-14
申请号：DE10129595
申请日：2001-06-20
申请人： KOBE STEEL LTD
发明人： ADACHI SHIGETO , IIDA SHINZO , HAGA JUNJI , MIURA MASAHIKO , HOSOKAWA YOSHIYUKI
IPC分类号： A61L2/03 , C02F1/46 , C02F11/00 , C02F3/02
摘要： To provide a high voltage treatment equipment in which even if a voltage applied between a pair of electrodes is lowered to not more than a predetermined value, field strength is produced between the pair of electrodes, a discharge having a wide spread is formed and liquid can be reformed with high efficiency, and economically advantageously. A liquid treatment equipment comprising at least a pair of electrodes, wherein at least one electrode is arranged so as to be dipped into liquid, and a pulsed power is applied between the pair of electrodes to form a discharge state between the electrodes to thereby reform liquid present between the electrodes, wherein a region having field strength raised to a value not smaller than 500 kV/cm is present in the vicinity of the electrode dipped into the liquid. To this end, the electrode dipped into the liquid is in the form of a rod, whose diameter is not more than 1 mm phi. Further, operation is carried out, while moving at least one electrode out of a set of a pair of electrodes, by changing a discharge generation part on the moving electrode. Furthermore, a liquid treatment equipment wherein a treated liquid is supplied into a pipeline continuously or intermittently, and a discharge state is formed between a ring-like or tubular electrode arranged coaxially with the inner peripheral surface of the pipeline and a linear electrode arranged along the axial center of the pipeline to reform the treated liquid within the pipeline, wherein the ring-like or tubular electrode is embedded in the pipeline wall leaving the inner surface of the electrode.

4. 发明专利

JP2002331337A ELECTROMAGNETIC MIXING METHOD AND APPARATUS IN CONTINUOUS CASTING MOLD 审中-公开
公开(公告)号：JP2002331337A
公开(公告)日：2002-11-19
申请号：JP2001400951
申请日：2001-12-28
申请人： KOBE STEEL LTD
发明人： MORISHITA MASAFUMI , MORI HIDEO , NAKAOKA TAKEHIRO , HOSOKAWA YOSHIYUKI
IPC分类号： B22D11/04 , B22D11/115
摘要： PROBLEM TO BE SOLVED: To provide an electromagnetic mixing method capable of manufacturing a slab casting piece reduced occurrences of defects to the utmost by properly controlling a molten steel flow in a mold in continuous casting and also provide an useful apparatus implementing such the method. SOLUTION: Molten steel in the vicinity of the lengthwise mold is accelerated in a horizontal and relatively reverse direction by at least one linear motor arranged along each long side of the mold, A frequency f1 (Hz) of a moving magnetic field generated by the linear motor arranged on one of the lengthwise mold and a frequency f2 (Hz) of a moving field generated by the linear motor arranged on other of the lengthwise mold are operated to satisfy the following equation (1). 0.1/P

5. 发明专利

JP2001085398A PLASMA TREATMENT APPARATUS 失效
公开(公告)号：JP2001085398A
公开(公告)日：2001-03-30
申请号：JP25820199
申请日：1999-09-13
申请人： KOBE STEEL LTD
发明人： ISHIBASHI KIYOTAKA , NOZAWA TOSHIHISA , SHIGEYAMA KAZUKI , KUSUMI YUKIHIRO , HOSOKAWA YOSHIYUKI , MUNEMASA ATSUSHI
IPC分类号： H01L21/302 , C23F4/00 , H01L21/3065 , H01L21/68 , H01L21/683 , H05H1/46
摘要： PROBLEM TO BE SOLVED: To provide a plasma treatment apparatus which has a uniform plasma treatment in a plasma treatment chamber and can suppress generation of thermal stresses in an anode electrode by unifying the temperature distribution in the anode electrode. SOLUTION: A chuck-holding block 3, working as a top plate of a chamber 5, is installed with an electrostatic chuck electrode 6 covered by an insulation layer and connected to a power supply. By supplying a potential to the electrostatic chuck electrode 6, an anode electrode 1 can be attracted and held by the chuck-holding block 3 by means of electrostatics. Thereby, there is no tightening force generated on the anode electrode nor a difference in temperature in the anode electrode due to uneven quantity of heat transmitted to the electrode, preventing the uneven plasma processing due to the difference in the temperature of the anode electrode, the destruction of the anode electrode due to thermal stress or other problems.

6. 发明专利

JPH115221A UNVULCANIZED RUBBER HEATER 失效
公开(公告)号：JPH115221A
公开(公告)日：1999-01-12
申请号：JP16079997
申请日：1997-06-18
申请人： KOBE STEEL LTD , NITTA KK
发明人： FUKUMOTO HIROHIKO , INOUE YOICHI , ADACHI SHIGETO , KINO NATSUSHIRO , SAKIYAMA KAZUHIKO , KUROKAWA YOSHINORI , HOSOKAWA YOSHIYUKI , WATANABE KOICHI , INOUE KIYOTAKA
IPC分类号： B32B15/06 , B29C35/08 , B29C35/14 , B29D30/00 , B29K21/00 , B29L9/00 , B29L31/00
摘要： PROBLEM TO BE SOLVED: To efficiently heat even unvulcanized rubber having any shape and size by an electromagnetic induction, by installing an induction coil at a position separate from a laminate so as not to interfere with shape and size of the laminate. SOLUTION: An induction coil 1 is provided not on an outer periphery of a laminate 20 but at a separate position. A magnetic circuit means 2 penetrating the inner periphery of the coil 1 is provided to penetrate an alternating magnetic field through the laminate 20 in a laminating direction. And, the field generated from the coil 1 is operated at the laminate 20 via fixed and movable platens 6, 7 by the means 2. Accordingly, it is not necessary to replace the coil 1 corresponding to changes of the shape and size of the laminate 20. And, the laminate 20 of various shape, size and height can be heated without altering specifications of the heater by the same heater without interfering with the coil 1.

7. 发明专利

JP2002001349A HIGH-VOLTAGE TREATING APPARATUS OF LIQUID 失效
公开(公告)号：JP2002001349A
公开(公告)日：2002-01-08
申请号：JP2000186493
申请日：2000-06-21
申请人： KOBE STEEL LTD
发明人： ADACHI SHIGETO , IIDA SHINZO , HAGA JUNJI , MIURA MASAHIKO , HOSOKAWA YOSHIYUKI
IPC分类号： C02F1/48 , C02F1/46
摘要： PROBLEM TO BE SOLVED: To provide a high-voltage treating apparatus of a liquid in which a sufficient electric field intensity is generated between a pair of electrodes even when a impressed voltage is controlled below a prescribed value, a discharge is spreaded in a wide-area, and the liquid is economically and efficiently reformed with high efficiency. SOLUTION: At least a pair of electrodes are provided, at least one electrode between the electrodes is dipped in a liquid, a high-voltage pulse is impressed between the electrodes to form a discharge between the electrodes, and the liquid between the electrodes is reformed by this liquid treating device. In this case, a region with the electric-field intensity increased to >=500 kV/cm is formed close to the electrode dipped in the liquid.

8. 发明专利

JP2004039799A Plasma cvd apparatus 有权
公开(公告)号：JP2004039799A
公开(公告)日：2004-02-05
申请号：JP2002193488
申请日：2002-07-02
申请人： Kobe Steel Ltd , Yuzo Mori , 株式会社神戸製鋼所 , 森勇蔵
发明人： HOSOKAWA YOSHIYUKI , HAYASHI KAZUYUKI , KUGIMIYA TOSHIHIRO , GOTO YASUSHI , MORI YUZO
IPC分类号： H05H1/24 , C23C16/509 , H01L21/205
摘要： PROBLEM TO BE SOLVED: To provide a method and an apparatus for the high speed formation of a high quality film using rotating electrodes. SOLUTION: A pair of rotating electrodes RE are so located as to face each other while they also face a base material 14. Powers 20 for generating plasma are supplied to the rotating electrodes to form a first plasma region 24 in a place where the two electrodes RE face each other, and a second plasma region 26 continuous with the first plasma region 24 in a space between the two electrodes RE and the surface of the base material 14. By the rotation of the rotating electrodes RE or by the other feeding means, a reactive gas is passed through the plasma regions 24 and 26 in the order of the first plasma region 24 first, and then the second plasma region 26 to cause a chemical reaction to form a thin film on the surface of the base material 14. COPYRIGHT: (C)2004,JPO

9. 发明专利

JP2002212711A VACUUM ARC EVAPORATION SOURCE 失效
公开(公告)号：JP2002212711A
公开(公告)日：2002-07-31
申请号：JP2001008303
申请日：2001-01-16
申请人： KOBE STEEL LTD
发明人： HOSOKAWA YOSHIYUKI , KUROKAWA YOSHINORI , KUMAKIRI TADASHI
IPC分类号： C23C14/32
摘要： PROBLEM TO BE SOLVED: To efficiently increase the circulation speed of an arc spot by making lines of magnetic force more parallel to an evaporation surface. SOLUTION: In an arc evaporation source having a magnetic field generation source 6 for generating lines of magnetic force including components parallel to the evaporation surface 4a of an evaporation material 4, the magnetic field generation source 6 has a central magnetic pole section 8 arranged nearly at the central position of the evaporation surface 4a and an outer peripheral magnetic pole section 9 provided so as to surround the outer periphery of the central magnetic pole section 8 and the evaporation material 4, and the central magnetic pole section 8 is allowed to have a magnetic pole different from that of the outer peripheral magnetic pole section 9 so that the lines of the magnetic force radially extending on the evaporation surface 4a between the central magnetic pole section 8 and the outer peripheral magnetic pole section 9 can be generated.

10. 发明专利

JP2004204323A Plasma processing apparatus 有权
标题翻译：等离子体加工设备
公开(公告)号：JP2004204323A
公开(公告)日：2004-07-22
申请号：JP2002376824
申请日：2002-12-26
申请人： Kobe Steel Ltd , 株式会社神戸製鋼所
发明人： HAYASHI KAZUYUKI , KUGIMIYA TOSHIHIRO , GOTO YASUSHI , INOUE KENICHI , HOSOKAWA YOSHIYUKI , KOBAYASHI AKIRA
IPC分类号： H05H1/24 , B01J19/08 , C23C16/509 , C23C16/54
摘要： PROBLEM TO BE SOLVED: To provide an apparatus which is hardly restricted by the size and the shape of a base material, and efficiently plasma-processing a surface of the base material with a simple constitution. SOLUTION: In a plasma processing apparatus, a rotary electrode 20 and a base material 28 face each other, plasma 42 is generated therebetween, reaction gas is subjected to chemical reaction by the plasma 42 to perform plasma processing of the base material 28. At least a part of the upstream side part, in the rotational direction of the rotary electrode 20, of the circumferential surface of the rotary electrode 20 is covered by a covering member 14, and the distance between the covering member 14 and the base material 28 is set to be larger than the distance between the rotary electrode 20 and the base material 28. Thus, reaction gas in the covering member 14 is entrained by the circumferential surface of the rotary electrode 20 and fed to the plasma 42 between the base material 28 and the rotary electrode, and gas back-flowing from a plasma forming area is released from a space 29A between the covering member 14 and the base material 28. COPYRIGHT: (C)2004,JPO&NCIPI
摘要翻译：要解决的问题：提供几乎不受基材尺寸和形状限制的设备，并且以简单的结构有效地等离子体处理基材的表面。解决方案：在等离子体处理装置中，旋转电极20和基材28彼此面对，产生等离子体42，反应气体通过等离子体42进行化学反应，进行基材28的等离子体处理旋转电极20的周面的旋转电极20的旋转方向的上游侧部分的至少一部分被覆盖部件14覆盖，覆盖部件14与基材之间的距离 28被设定为大于旋转电极20和基材28之间的距离。因此，覆盖部件14中的反应气体被旋转电极20的周面夹带，并被馈送到基体材料 28和旋转电极，以及从等离子体形成区域回流的气体从覆盖部件14和基材28之间的空间29A释放。（C）2004，JPO＆NCIPI

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