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1. 发明公开

KR20180039743A 보조 전자기장의 도입에 기초한 1차 스캐터로메트리 오버레이의 새로운 접근법 审中-公开
公开(公告)号：KR20180039743A
公开(公告)日：2018-04-18
申请号：KR20187009582
申请日：2016-08-18
申请人： KLA TENCOR CORP
发明人： LEVINSKI VLADIMIR , PASKOVER YURI , LUBASHEVSKY YUVAL , MANASSEN AMNON
IPC分类号： G01N21/47 , G01J3/44
CPC分类号： G01B11/272 , G01B9/0201 , G01N21/4788 , G03F7/70633
摘要： 메트롤로지측정방법및 툴이제공되며, 이는고정된조명원에의해고정된회절타겟을조명하고, 0차회절신호와 1차회절신호의합으로구성된신호를측정하고, 상기회절타겟과상기조명원을고정되게유지하면서상기 0차회절신호와상기 1차회절신호사이의복수의관계에대하여상기측정단계를반복하며, 측정된합으로부터상기 1차회절신호를유도한다. 조명은간섭성일수 있고, 측정은동공평면에있을수 있거나, 조명은비간섭성일수 있고, 측정은필드평면에있을수 있으며, 어느경우이든, 0차및 1차회절차수의부분중첩이측정된다. 조명은환형일수 있으며, 회절타겟은중첩영역을분리하기위해상이한피치를갖는주기적구조를갖는 1(one) 셀 SCOL 타겟일수 있다.

2. 发明专利

SG11201906424WA MITIGATION OF INACCURACIES RELATED TO GRATING ASYMMETRIES IN SCATTEROMETRY MEASUREMENTS 未知
公开(公告)号：SG11201906424WA
公开(公告)日：2019-08-27
申请号：SG11201906424W
申请日：2017-12-15
申请人： KLA TENCOR CORP
发明人： ADAM IDO , LEVINSKI VLADIMIR , MANASSEN AMNON , LUBASHEVSKY YUVAL
IPC分类号： H01L21/66 , G03F7/20
摘要： COARSEPITCH COARSE PITCH OFFSET+f j.. 4 HEIGHT 80A- \ CELL 1 868 DIFFRACTION COEFFICIENTS r + AND r - 81 80 86A 81 DIFFRACTION COEFFICIENTS r+ AND r' 82 878 87A 82 1-1 cc N 00 O C (12) INTERNATIONAL APPLICATION PUBLISHED UNDER THE PATENT COOPERATION TREATY (PCT) (19) World Intellectual Property Organization International Bureau (43) International Publication Date 16 August 2018 (16.08.2018) WIPO I PCT ill mu °million °nolo DID Ho oimIE (10) International Publication Number WO 2018/147938 Al (51) International Patent Classification: GO3F 7/20 (2006.01) H01L 21/66 (2006.01) (21) International Application Number: PCT/US2017/066853 (22) International Filing Date: 15 December 2017 (15.12.2017) (25) Filing Language: English (26) Publication Language: English (30) Priority Data: 62/457,787 10 February 2017 (10.02.2017) US (71) Applicant: KLA-TENCOR CORPORATION [US/US]; Legal Dept., One Technology Drive, Milpitas, CA 95035 (US). (72) Inventors: ADAM, Ido; Nehar Hayarden 21, 55450 Qiriat Ono (IL). LEVINSKI, Vladimir; Hermon 9, 23100 Migdal HaEmek (IL). MANASSEN, Amnon; 10 Golda Meir, 34892 Haifa (IL). LUBASHEVSKY, Yuval; 22 Smolen- skin St., 3436606 Haifa (IL). (74) Agent: MCANDREWS, Kevin et al.; KLA-Tencor Corpo- ration, Legal Dept., One Technology Drive, Milpitas, CA 95035 (US). (81) Designated States (unless otherwise indicated, for every kind of national protection available): AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW. (84) Designated States (unless otherwise indicated, for every kind of regional protection available): ARIPO (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, (54) Title: MITIGATION OF INACCURACIES RELATED TO GRATING ASYMMETRIES IN SCATTEROMETRY MEASURE- MENTS Figure 1 (57) : Scatterometry overlay targets as well as target design and measurement methods are provided, which mitigate the effects of grating asymmetries in diffraction based overlay measurements. Targets comprise additional cells with sub-resolved structures replacing resolved coarse pitch gratings and/or comprise alternating sub-resolved structures with coarse pitch periodicity - to isolate and remove inaccuracies that result from grating asymmetries. Measurement methods utilize orthogonally polarized illumination to isolate the grating asymmetry effects in different measurement directions, with respect to the designed target structures. [Continued on next page] WO 2018/147938 Al MIDEDIMOMMIONERIOMMIMMIEDIOMMOVOIMIE UG, ZM, ZW), Eurasian (AM, AZ, BY, KG, KZ, RU, TJ, TM), European (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR), OAPI (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG). Published: — with international search report (Art. 21(3))

3. 发明专利

SG11201900996VA OPTICAL NEAR-FIELD METROLOGY 未知
公开(公告)号：SG11201900996VA
公开(公告)日：2019-04-29
申请号：SG11201900996V
申请日：2017-07-10
申请人： KLA TENCOR CORP
发明人： PASKOVER YURI , MANASSEN AMNON , LEVINSKI VLADIMIR
IPC分类号： G01B11/02 , G01B9/02
摘要： Systems and methods are provided which utilize optical microcavity probes to map wafer topography by near-field interactions therebetween in a manner which complies with high volume metrology requirements. The optical microcavity probes detect features on a wafer by shifts in an interference signal between reference radiation and near-field interactions of radiation in the microcavities and wafer features, such as device features and metrology target features. Various illumination and detection configurations provide quick and sensitive signals which are used to enhance optical metrology measurements with respect to their accuracy and sensitivity. The optical microcavity probes may be scanned at a controlled height and position with respect to the wafer and provide information concerning the spatial relations between device and target features.

4. 发明专利

SG11201900509YA SIMULTANEOUS CAPTURING OF OVERLAY SIGNALS FROM MULTIPLE TARGETS 未知
公开(公告)号：SG11201900509YA
公开(公告)日：2019-02-27
申请号：SG11201900509Y
申请日：2017-07-28
申请人： KLA TENCOR CORP
发明人： HILL ANDY (ANDREW) , MANASSEN AMNON , PASKOVER YURI , LUBASHEVSKY YUVAL
IPC分类号： G01N21/47 , G01B11/00 , G01N21/95 , G02B27/28 , G02B27/42
摘要： Metrology methods and systems are provided, in which the detected image is split at a field plane of the collection path of the metrology system's optical system into at least two pupil plane images. Optical elements such as prisms may be used to split the field plane images, and multiple targets or target cells may be measured simultaneously by spatially splitting the field plane and/or the illumination sources and/or by using two polarization types. The simultaneous capturing of multiple targets or target cells increases the throughput of the disclosed metrology systems.

5. 发明专利

SG10201912818WA TOPOGRAPHIC PHASE CONTROL FOR OVERLAY MEASUREMENT 未知
公开(公告)号：SG10201912818WA
公开(公告)日：2020-02-27
申请号：SG10201912818W
申请日：2016-05-19
申请人： KLA TENCOR CORP
发明人： LEVINSKI VLADIMIR , PASKOVER YURI , MANASSEN AMNON , SHALIBO YONI
摘要： Metrology tools and methods are provided, which estimate the effect of topographic phases corresponding to different diffraction orders, which result from light scattering on periodic targets, and adjust the measurement conditions to improve measurement accuracy. In imaging, overlay error magnification may be reduced by choosing appropriate measurement conditions based on analysis of contrast function behavior, changing illumination conditions (reducing spectrum width and illumination NA), using polarizing targets and/or optical systems, using multiple defocusing positions etc. On-the-fly calibration of measurement results may be carried out in imaging or scatterometry using additional measurements or additional target cells.

6. 发明申请

WO2011159725A3 DISCRETE POLARIZATION SCATTEROMETRY 审中-公开
标题翻译：离散极化分析
公开(公告)号：WO2011159725A3
公开(公告)日：2012-04-26
申请号：PCT/US2011040389
申请日：2011-06-14
申请人： KLA TENCOR CORP , HILL ANDREW V , MANASSEN AMNON , KANDEL DANIEL , LEVINSKI VLADIMIR , SELIGSON JOEL , SVIZHER ALEXANDER , WANG DAVID Y , ROTTER LAWRENCE D , DE VEER JOHANNES D
发明人： HILL ANDREW V , MANASSEN AMNON , KANDEL DANIEL , LEVINSKI VLADIMIR , SELIGSON JOEL , SVIZHER ALEXANDER , WANG DAVID Y , ROTTER LAWRENCE D , DE VEER JOHANNES D
IPC分类号： H01L21/027 , H01L21/66
CPC分类号： G02B27/141 , G01N21/474 , G01N21/4788 , G01N2021/4792 , G02B27/145 , G03F7/70633
摘要： Systems and methods for discrete polarization scatterometry are provided. One embodiment relates to an optical subsystem of a scatterometer. The optical subsystem includes one or more light sources configured to produce light having different polarizations. The optical subsystem also includes a polarizing beam splitter configured to separate the light into two different light beams having orthogonal and mutually exclusive polarizations. The optical subsystem further includes one or more second optical elements configured to control which one of the two different light beams illuminates the wafer during measurements. The optical subsystem also includes a detection subsystem configured to separately detect two different scattered light beams resulting from illumination of the wafer. The two different scattered light beams have orthogonal and mutually exclusive polarizations. All optical surfaces of the optical subsystem used for the measurements are stationary during the measurements.
摘要翻译：提供了离散极化散射法的系统和方法。一个实施例涉及一种散射仪的光学子系统。光学子系统包括被配置为产生具有不同偏振的光的一个或多个光源。光学子系统还包括偏振分束器，其被配置为将光分离成具有正交和相互排斥的极化的两个不同光束。光学子系统还包括一个或多个第二光学元件，其被配置为在测量期间控制两个不同光束中的哪一个照射晶片。光学子系统还包括被配置为分别检测由晶片的照明产生的两个不同散射光束的检测子系统。两个不同的散射光束具有正交和相互排斥的偏振。用于测量的光学子系统的所有光学表面在测量期间是静止的。

7. 发明申请

WO2010080732A3 SCATTEROMETRY METROLOGY TARGET DESIGN OPTIMIZATION 审中-公开
标题翻译：计量测量学目标设计优化
公开(公告)号：WO2010080732A3
公开(公告)日：2010-10-07
申请号：PCT/US2010020046
申请日：2010-01-04
申请人： KLA TENCOR CORP , ADEL MICHAEL E , MANASSEN AMNON , KANDEL DANIEL
发明人： ADEL MICHAEL E , MANASSEN AMNON , KANDEL DANIEL
IPC分类号： H01L21/66
CPC分类号： G03F7/70683 , G03F7/705 , G03F7/70633 , H01L22/12
摘要： A metrology target design may be optimized using inputs including metrology target design information, substrate information, process information, and metrology system information. Acquisition of a metrology signal with a metrology system may be modeled using the inputs to generate one or more optical characteristics of the metrology target. A metrology algorithm may be applied to the characteristics to determine a predicted accuracy and precision of measurements of the metrology target made by the metrology system. Part of the information relating to the metrology target design may be modified and the signal modeling and metrology algorithm may be repeated to optimize the accuracy and precision of the one or more measurements. The metrology target design may be displayed or stored after the accuracy and precision are optimized.
摘要翻译：度量目标设计可以使用包括度量衡目标设计信息，衬底信息，过程信息和度量衡系统信息的输入来优化。采用计量系统采集计量信号可以使用输入来建模以产生计量目标的一个或多个光学特性。计量算法可以应用于特征以确定由计量系统制造的计量目标的测量的预测精度和精度。与计量目标设计有关的部分信息可能会被修改，信号建模和计量算法可能会重复，以优化一个或多个测量的准确度和精确度。计量目标设计可以在精确度和精度得到优化之后显示或存储。

8. 发明专利

SG11202100991PA OFF-AXIS ILLUMINATION OVERLAY MEASUREMENT USING TWO-DIFFRACTED ORDERS IMAGING 未知
公开(公告)号：SG11202100991PA
公开(公告)日：2021-03-30
申请号：SG11202100991P
申请日：2018-12-14
申请人： KLA TENCOR CORP
发明人： YONI SHALIBO , PASKOVER YURI , LEVINSKI VLADIMIR , MANASSEN AMNON , EISANBACH SHLOMO , LAREDO GILAD , HILDESHEIM ARIEL
IPC分类号： G03F7/20 , G01N21/47 , G01N21/952 , G02B7/38
摘要： Metrology methods and tools are provided, which enhance the accuracy of the measurements and enable simplification of the measurement process as well as improving the correspondence between the metrology targets and the semiconductor devices. Methods comprise illuminating the target in a Littrow configuration to yield a first measurement signal comprising a −1st diffraction order and a 0th diffraction order and a second measurement signal comprising a +1st distraction order and a 0th diffraction order, wherein the −1st diffraction order of the first measurement signal and the +1st diffraction order of the second measurement signal are diffracted at 180° to a direction of the illumination, performing a first measurement of the first measurement signal and a second measurement of the second measurement signal, and deriving metrology metric(s) therefrom. Optionally, a reflected 0th diffraction order may be split to yield components which interact with the −1st and +1st diffraction orders.

9. 发明专利

SG11201913458TA ENHANCING METROLOGY TARGET INFORMATION CONTENT 未知
公开(公告)号：SG11201913458TA
公开(公告)日：2020-07-29
申请号：SG11201913458T
申请日：2018-09-24
申请人： KLA TENCOR CORP
发明人： AMIT ERAN , MANASSEN AMNON , GUTMAN NADAV
IPC分类号： G01B11/27 , G01N21/47 , G01N21/956 , G03F7/20 , H01L23/544
摘要： Metrology targets designs, design methods and measurement methods are provided, which reduce noise and enhance measurement accuracy. Disclosed targets comprise an additional periodic structure which is orthogonal to the measurement direction along which given target structures are periodic. For example, in addition to two or more periodic structures along each measurement direction in imaging or scatterometry targets, a third, orthogonal periodic structure may be introduced, which provides additional information in the orthogonal direction, can be used to reduce noise, enhances accuracy and enables the application of machine learning algorithms to further enhance accuracy. Signals may be analyzed slice-wise with respect to the orthogonal periodic structure, which can be integrated in a process compatible manner in both imaging and scatterometry targets.

10. 发明专利

SG11201900804WA SYSTEM AND METHOD FOR GENERATING MULTI-CHANNEL TUNABLE ILLUMINATION FROM A BROADBAND SOURCE 未知
公开(公告)号：SG11201900804WA
公开(公告)日：2019-03-28
申请号：SG11201900804W
申请日：2017-08-09
申请人： KLA TENCOR CORP
发明人： HILL ANDY (ANDREW) , MANASSEN AMNON , BACHAR OHAD
IPC分类号： G01N21/31 , G02B27/28
摘要： A metrology system includes an illumination source to generate an illumination beam, a multi-channel spectral filter, a focusing element to direct illumination from the single optical column to a sample, and at least one detector to capture the illumination collected from the sample. The multi-channel spectral filter includes two or more filtering channels having two or more channel beam paths. The two or more filtering channels filter illumination propagating along the two or more channel beam paths based on two or more spectral transmissivity distributions. The multi-channel spectral filter further includes a channel selector to direct at least a portion of the illumination beam into at least one selected filtering channel to filter the illumination beam. The multi-channel spectral filter further includes at least one beam combiner to combine illumination from the two or more filtering channels to a single optical column.

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