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    • 2. 发明申请
    • PROJECTION OPTICAL SYSTEM AND PROJECTION IMAGE DISPLAY APPARATUS
    • 投影光学系统和投影图像显示设备
    • US20080158439A1
    • 2008-07-03
    • US11868783
    • 2007-10-08
    • Jun NISHIKAWA
    • Jun NISHIKAWA
    • H04N5/64G02B9/00
    • H04N5/7408G02B17/08G02B17/0852G02B27/0025G03B21/28
    • A projection optical system for magnifying an image on a primary imaging plane onto a secondary imaging plane includes a first optical system for forming an intermediate image and a second optical system including a concave reflecting surface disposed between the intermediate image and the secondary plane. The first optical system includes first and second groups respectively having negative and positive power, an aperture, and a third group having positive power from the intermediate image. The surfaces of the first and second optical systems have rotational symmetry about a light axis. A ray traveling from the center of the primary plane to the center of the secondary plane intersects the light axis, is reflected off the reflecting surface, intersects the light axis again, and reaches the secondary plane. The following conditions are satisfied: 0.5
    • 用于将主成像平面上的图像放大到二次成像平面上的投影光学系统包括用于形成中间图像的第一光学系统和包括设置在中间图像和次要平面之间的凹面反射表面的第二光学系统。 第一光学系统包括分别具有负功率和正功率的第一组和第二组,孔径以及具有来自中间图像的正功率的第三组。 第一和第二光学系统的表面具有围绕光轴的旋转对称性。 从主平面的中心向二次平面的中心行进的光线与光轴相交,从反射面反射,再次与光轴相交,到达二次面。 满足以下条件:0.5
    • 3. 发明申请
    • PROJECTION IMAGE DISPLAY DEVICE AND PROJECTION OPTICAL SYSTEM
    • 投影图像显示设备和投影光学系统
    • US20100128234A1
    • 2010-05-27
    • US12622471
    • 2009-11-20
    • Jun NISHIKAWA
    • Jun NISHIKAWA
    • G03B5/04G03B21/28G02B27/18
    • G03B5/04G02B17/0896G03B21/28H04N9/3105
    • A projection image display device includes a light source; an illumination optical system that uniformly irradiates a surface of an image modulating element (primary image surface) with a light beam emitted from the light source; and a projection optical system that performs with respect to a screen (a secondary image surface) extended projection on image information provided at the primary image surface and modulated by the image modulating element. The projection optical system includes a first optical system having a positive refractive power, and a second optical system having a concave reflecting surface. The first optical system has a common optical axis at which all optical components of the first optical system have rotationally symmetric surfaces, and a screen shift function that causes the secondary image surface to be moved by moving at least one of the optical components of the first optical system substantially perpendicularly to the optical axis.
    • 投影图像显示装置包括光源; 照明光学系统,其利用从光源发射的光束均匀地照射图像调制元件(原始图像表面)的表面; 以及投影光学系统,其相对于在主图像表面上提供并由图像调制元件调制的图像信息上的屏幕(次级图像表面)延伸投影执行。 投影光学系统包括具有正折光力的第一光学系统和具有凹面反射面的第二光学系统。 第一光学系统具有共同的光轴,在该公共光轴处,第一光学系统的所有光学部件都具有旋转对称的表面,以及通过移动第二光学部件的光学部件中的至少一个来使第二图像表面移动的屏幕移动功能 光学系统基本上垂直于光轴。
    • 4. 发明申请
    • ELECTRONIC COMPONENT, MOUNTING STRUCTURE OF ELECTRONIC COMPONENT, AND PROCESS FOR PRODUCING ELECTRONIC COMPONENT
    • 电子元件,电子元器件的安装结构以及电子元器件的生产工艺
    • US20080118721A1
    • 2008-05-22
    • US11968716
    • 2008-01-03
    • Shigeyuki HORIEYutaka OTAJun NISHIKAWA
    • Shigeyuki HORIEYutaka OTAJun NISHIKAWA
    • B32B3/00
    • H01G4/2325H01C1/148H01C7/18H01G4/30Y10T428/24917
    • A high-reliability electronic component without reduction in insulation resistance under high-temperature and high-humidity conditions has satisfactory solderability of external electrodes. The electronic component includes a main body and external electrodes disposed on surfaces of the main body, the external electrodes include underlying electrode layers each containing a metal, alloy layers each disposed on the corresponding underlying electrode layer, Ni plating layers each disposed on the corresponding alloy layer, Ni oxide layers each disposed on the corresponding Ni plating layers, and upper plating layers each disposed on the corresponding Ni oxide layer, each Ni oxide layer having a thickness of about 150 nm or less, and each Ni plating layer having an average particle size of Ni particles of about 2 μm or more. To form the Ni plating layers having reduced grain boundaries, heat treatment is performed at about 500° C. to about 900° C. inclusive in a reducing atmosphere having an oxygen concentration of about 100 ppm or less.
    • 在高温高湿条件下绝缘电阻降低的高可靠性电子元件具有良好的外部电极的可焊性。 电子部件包括主体和设置在主体的表面上的外部电极,外部电极包括各自包含金属的下部电极层,各自设置在相应的下部电极层上的合金层,各自设置在相应的合金上的Ni镀层 各自设置在相应的Ni镀层上的Ni氧化物层和分别设置在相应的Ni氧化物层上的上部镀层,每个Ni氧化物层的厚度为约150nm以下,并且每个Ni镀层具有平均粒子 Ni颗粒的大小约2μm或更大。 为了形成具有减小的晶界的Ni镀层,在约500℃至约900℃(包括在氧浓度为约100ppm或更低的还原气氛中)进行热处理。