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    • 3. 发明授权
    • Yarn measuring device for flat bed knitting machines
    • 平床针织机用纱线测量装置
    • US07509821B1
    • 2009-03-31
    • US12122958
    • 2008-05-19
    • Yu-Sheng LinJoe Wang
    • Yu-Sheng LinJoe Wang
    • D04B15/48
    • D04B35/12
    • A yarn measuring device for a flat bed knitting machine which has a chassis, a needle bed, a track and a carriage. The carriage has a cam controller and a mask plate. The yarn measuring device includes a counter, a detection unit and a programmable logic circuit controller. The programmable logic circuit controller, the counter, the detection unit, the carriage and the cam controller are electrically interconnected. Knitting stitches can be measured in a bidirectional fashion. Measuring accuracy improves, measured value can be read directly and easier, and the position of cams can be adjusted quickly. Total yarn requirement can be calculated accurately, fabric quality can be improved and production efficiency can be enhanced.
    • 一种用于平床机的纱线测量装置,其具有底盘,针床,轨道和托架。 滑架具有凸轮控制器和掩模板。 纱线测量装置包括计数器,检测单元和可编程逻辑电路控制器。 可编程逻辑电路控制器,计数器,检测单元,托架和凸轮控制器电互连。 针织针脚可以双向测量。 测量精度提高,测量值可以直接读取更容易,凸轮位置可以快速调整。 可以准确计算总纱需求量,提高织物质量,提高生产效率。
    • 10. 发明授权
    • Operation stage for wafer edge inspection and review
    • 晶圆边缘检查和检查的操作阶段
    • US07919760B2
    • 2011-04-05
    • US12331336
    • 2008-12-09
    • Jack JauHong XiaoJoe WangZhongwei ChenYi Xiang WangEdward Tseng
    • Jack JauHong XiaoJoe WangZhongwei ChenYi Xiang WangEdward Tseng
    • G21K5/10
    • H01J37/28H01J37/20H01J2237/202H01J2237/2817H01L21/67288H01L21/6831
    • The present invention relates to an operation stage of a charged particle beam apparatus which is employed in a scanning electron microscope for substrate (wafer) edge and backside defect inspection or defect review. However, it would be recognized that the invention has a much broader range of applicability. A system and method in accordance with the present invention provides an operation stage for substrate edge inspection or review. The inspection region includes top near edge, to bevel, apex, and bottom bevel. The operation stage includes a supporting stand, a z-stage, an X-Y stage, an electrostatic chuck, a pendulum stage and a rotation track. The pendulum stage mount with the electrostatic chuck has the ability to swing from 0° to 180° while performing substrate top bevel, apex and bottom bevel inspection or review. In order to keep the substrate in focus and avoid a large position shift during altering the substrate observation angle by rotation the pendulum stage, one embodiment of the present invention discloses a method such that the rotation axis of the pendulum stage consist of the tangent of upper edge of the substrate to be inspected. The electrostatic chuck of the present invention has a diameter smaller than which of the substrate to be inspected. During the inspection process the substrate on the electrostatic chuck may be rotated about the central axis on the electrostatic chuck to a desired position, this design insures all position on the bevel and apex are able to be inspected.
    • 本发明涉及用于基板(晶片)边缘和背面缺陷检查或缺陷检查的扫描电子显微镜中的带电粒子束装置的操作阶段。 然而,应当认识到,本发明具有更广泛的应用范围。 根据本发明的系统和方法提供了用于衬底边缘检查或审查的操作阶段。 检查区域包括顶部近边缘,斜面,顶点和底部斜面。 操作台包括支撑台,z台,X-Y台,静电卡盘,摆台和旋转轨道。 具有静电卡盘的摆台安装具有从0°摆动到180°的能力,同时执行基板顶部斜面,顶部和底部斜面检查或检查。 为了将基板保持在对焦状态,并且通过旋转摆锤台来改变基板观察角度而避免大的位置偏移,本发明的一个实施例公开了一种方法,使得摆台的旋转轴线由上部的切线 要检查的基板的边缘。 本发明的静电卡盘的直径小于要检查的基板的直径。 在检查过程中,静电卡盘上的基板可以围绕静电卡盘上的中心轴线旋转到期望的位置,该设计确保能够检查斜面上的所有位置和顶点。