专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明公开

EP0282724A1 Negative resist compositions 失效
标题翻译：消极抵抗
公开(公告)号：EP0282724A1
公开(公告)日：1988-09-21
申请号：EP88101849.3
申请日：1988-02-09
申请人： International Business Machines Corporation
发明人： Allen, Robert David , Frechet, Jean M J , Twieg, Robert James , Willson, Carlton Grant
IPC分类号： G03F7/038 , G03F7/029
CPC分类号： G03F7/038 , G03F7/029 , G03F7/039 , Y10S430/115 , Y10S430/12 , Y10S430/122 , Y10S430/126 , Y10S430/128
摘要： Heat stable, negative resist compositions are provided for use, particularly in deep ultraviolet light x-ray and electron beams. The composition comprises an acid generting onium salt photoinitiator, a source of polyfunctional activated aromatic rings and a source of polyfunctional carbonium ions, with at least one of said sources being a polymer.
摘要翻译：提供了热稳定的负型抗蚀剂组合物，特别是在深紫外光x射线和电子束中。所述组合物包含酸产生鎓盐光引发剂，多官能活化芳环的来源和多官能碳鎓离子源，所述源中的至少一种为聚合物。

2. 发明公开

EP0482779A2 Photorefractive material 失效
$Photorefractive material$
标题翻译： Photorefraktives材料。
公开(公告)号：EP0482779A2
公开(公告)日：1992-04-29
申请号：EP91309082.5
申请日：1991-10-03
申请人： International Business Machines Corporation
发明人： Ducharme, Stephen Paul , Moerner, William Esco , Scott, John Campbell , Twieg, Robert James
IPC分类号： G02F1/01 , G03H1/02
CPC分类号： G02F1/0018 , G02F1/3615 , G02F1/3616 , G03H1/02 , G03H2001/026 , G03H2001/0264 , G03H2260/35 , G03H2260/54
摘要： The present invention relates to materials comprising a polymer, a non-linear chromophore, and a charge transport agent, that exhibit an erasable photorefractive effect. The amorphous photorefractive material can be fabricated into optical devices such as optical wave guides.
摘要翻译：本发明涉及显示出可消除光折射效应的聚合物，非线性发色团和电荷输送剂的材料。无定形光折射材料可以制造成诸如光波导的光学器件。

3. 发明公开

EP0435531A3 Photoacid generating composition and sensitizer therefor 失效
标题翻译：光致发光组合物及其敏化剂
公开(公告)号：EP0435531A3
公开(公告)日：1992-03-25
申请号：EP90313654.7
申请日：1990-12-14
申请人： International Business Machines Corporation
发明人： Allen, Robert David , Hinsberg III, William Dinan , Simpson, Logan Lloyd , Twieg, Robert James , Wallraff, Gregory Michael , Willson, Carlton Grant
IPC分类号： G03F7/039
CPC分类号： G03F7/031
摘要： A composition including an initiator which generates acid upon exposure to radiation in the presence of a sensitizer. The composition may be mixed with an acid sensitive polymer or prepolymer to make a visible light or laser imageable photoresist. The sensitizer has phenylethynyl and methoxy substituents which, when properly positioned, allow it to utilize all of the visible argon ion laser lines.

4. 发明授权

EP0097220B1 The stabilization of leucomethylene blue dyes on a printing substrate 失效
标题翻译：在印刷基板上的紫外线蓝光染料的稳定性
公开(公告)号：EP0097220B1
公开(公告)日：1988-06-08
申请号：EP83101757.9
申请日：1983-02-23
申请人： International Business Machines Corporation
发明人： Gendler, Paul Lewis , Jaffe, Annette Bronkesh , Twieg, Robert James , Bernier, William Emmett
IPC分类号： B41M5/12 , B41M5/20 , B41M5/26 , B41M1/36
CPC分类号： B41M5/3375 , B41M1/36 , B41M5/128 , B41M5/20

5. 发明公开

EP0179365A2 Process for filling deep dielectric isolation trenches in semiconductor devices 失效
标题翻译：用于填充深沟槽用于半导体器件中的介电隔离的方法。
公开(公告)号：EP0179365A2
公开(公告)日：1986-04-30
申请号：EP85112903.1
申请日：1985-10-11
申请人： International Business Machines Corporation
发明人： Cheng, Ying Ying , Dawson. Daniel Joseph , Economy, James , Swanson, Sally Ann , Twieg, Robert James
IPC分类号： H01L21/76 , H01L21/312
CPC分类号： H01L21/02118 , H01L21/02282 , H01L21/312 , H01L21/76224
摘要： Deep dielectric isolation trenches in semiconductor devices filled by a process using a filtered solution of a polyaromatic oligomer with reactive ethynyl groups, said solution having a viscosity of between 2 x 10 -6 and 2 x 10' 3 m 2 /s.
摘要翻译：使用具有反应性基团乙炔多芳低聚物的过滤的溶液在由填充工序的半导体器件的电介质深隔离沟槽，具有的粘度所述溶液2和2×10之间×10 <-6> <-3>米<2> /秒。

6. 发明公开

EP0097220A3 The stabilization of leucomethylene blue dyes on a printing substrate 失效
标题翻译：在印刷基板上的紫杉醇蓝色染料的稳定性
公开(公告)号：EP0097220A3
公开(公告)日：1985-05-22
申请号：EP83101757
申请日：1983-02-23
申请人： International Business Machines Corporation
发明人： Gendler, Paul Lewis , Jaffe, Annette Bronkesh , Twieg, Robert James , Bernier, William Emmett
IPC分类号： B41M05/12 , B41M05/20 , B41M05/26 , B41M01/36
CPC分类号： B41M5/3375 , B41M1/36 , B41M5/128 , B41M5/20
摘要： Substrates for printing are provided by stabilizing the leucomethylene blue dye contained therein with an additive selected from the group consisting of citric acid, aspartic acid, malonic acid, oxalic acid, ascorbic acid, tartaric acid, ketomalonic acid monohydrate, glucose and methionine.

7. 发明公开

EP0085761A1 A positive resist composition 失效
标题翻译：正光致抗蚀剂组成。
公开(公告)号：EP0085761A1
公开(公告)日：1983-08-17
申请号：EP82110822.2
申请日：1982-11-23
申请人： International Business Machines Corporation
发明人： Clecak, Nicholas Jeffries , McKean, Dennis Richard , Miller, Robert Dennis , Tompkins, Terry Cady , Twieg, Robert James , Willson, Carlton Grant
IPC分类号： G03F7/08
CPC分类号： G03F7/022
摘要： Positive resists are formed from a soluble phenolic resin and a sensitizer which is a diester of a 1-oxo-2-diazonaphthalene sulfonic acid and of an unsymmetrical primary or secondary aliphatic diol which is a mixture of geometric and diastereoisomers.

8. 发明公开

EP0817539A2 Light emitting device 失效
标题翻译：发光装置
公开(公告)号：EP0817539A2
公开(公告)日：1998-01-07
申请号：EP97302681.8
申请日：1997-04-18
申请人： International Business Machines Corporation
发明人： Gordon, Joseph Grover, III , Held, Glenn Allen , Lowe, Anthony Cyril , Miller, Robert Dennis , Shroeder, Uwe Paul , Twieg, Robert James , Yoon, Do Yeung
IPC分类号： H05B33/14 , H05B33/10 , H01L33/00
CPC分类号： H01L51/5012 , H05B33/10 , H05B33/14
摘要： The invention relates to an organic electroluminescent device comprising a light emitting composition disposed between a first and second electrode. The composition comprises a charge transporting polymer and an organic salt comprising immobilized anions and cations nonuniformly distributed in the polymer matrix.
摘要翻译：本发明涉及包含设置在第一和第二电极之间的发光组合物的有机电致发光器件。该组合物包含电荷输送聚合物和包含不均匀分布于聚合物基质中的固定化阴离子和阳离子的有机盐。

9. 发明公开

EP0390759A1 Ferroelectric liquid crystals 失效
标题翻译： FerroelektrischeFlüssigkristalle。
公开(公告)号：EP0390759A1
公开(公告)日：1990-10-03
申请号：EP90850094.5
申请日：1990-03-05
申请人： International Business Machines Corporation
发明人： Betterton, Kathleen Mary , Hinsberg, William Dinan , Nguyen, Huu Tinh , Tang, Wing Tsang , Twieg, Robert James
IPC分类号： C07C327/32 , C09K19/28
CPC分类号： C09K19/28 , C07C327/32 , C09K19/322
摘要： Disclosed are compounds of the general formula:
R-O-Ar-COS-Ph-COO-R′
characterized by the presence of the thioester (-COS-) core and wherein R is an alkyl group with typically 8 to 16 carbon atoms, Ar is a substituted aromatic core group such as 1,4-benzene, 2,6-naphthalene, 4,4′-biphenyl, or 4,4′-diphenylethane, and R′ is a chiral branched alkyl group such as the 1-substituted cases 1-methylpropyl through 1-methyloctyl or 2-substituted case such as 2-methylbutyl. These materials or their mixtures possess ferroelectric phases and as such are of interest for electro-optical applications. In certain cases specific materials are of particular interest due to the existence of stable ferrorelectric phases near room temperature with large polarization density and fast electro-optic response.
摘要翻译：公开了以下通式的化合物：RO-Ar-COS-Ph-COO-R min，其特征在于存在硫酯（-COS-）核，其中R是具有通常8至16个碳原子的烷基，Ar是取代的芳族核心基团如1,4-苯，2,6-萘，4,4min-联苯或4,4min-二苯基乙烷，R min是手性支链烷基，例如1-取代的例子通过1-甲基辛基或2-取代的例如2-甲基丁基的1-甲基丙基。这些材料或其混合物具有铁电相，因此对于电光学应用是令人感兴趣的。在某些情况下，由于在室温附近存在稳定的铁电相，具有大的极化密度和快速的电光响应，特定材料是特别感兴趣的。

10. 发明授权

EP0115078B1 Elektrochromisches Druckmedium 有权
标题翻译：电子注册媒体
公开(公告)号：EP0115078B1
公开(公告)日：1989-04-26
申请号：EP83113165.1
申请日：1983-12-28
申请人： International Business Machines Corporation
发明人： Bernier, William Emmett , Emmi, Francis , Fey, Edmond Otto , Gendler, Paul Lewis , Twieg, Robert James
IPC分类号： B41M5/20
CPC分类号： B41M5/20

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式