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    • 1. 发明授权
    • Charge neutralizer for glass substrate
    • 玻璃基板电荷中和剂
    • US07529074B2
    • 2009-05-05
    • US11443246
    • 2006-05-31
    • Hitoshi InabaMasaharu FujinoYasuhiko FukuchiKazuyoshi NakajimaMasato Kochi
    • Hitoshi InabaMasaharu FujinoYasuhiko FukuchiKazuyoshi NakajimaMasato Kochi
    • H02H1/00
    • H05F3/06B65G49/061B65G2249/02H05K9/0067
    • The present invention provides a charge neutralizer for accurately irradiating a soft X ray into a narrow gap after a glass substrate is lifted up.A soft X ray is introduced into a gap “d” from a soft X ray charge neutralizer 14, and the soft X ray is detected by a soft X ray optical axis monitor 16. Mounting position adjusting means 15 is adjusted by a detection output from said soft X ray optical axis monitor, and optical axis alignment is performed. Next, according to information from a database 19, a control unit 17 controls gap adjusting means 13, and charge neutralization is performed. Charge neutralization can also be performed by controlling the gap “d” by the gap adjusting means 13 while judging neutralizing conditions as to whether a charged potential measured by an electrometer 18 is within an allowable value by the control unit 17 or not.
    • 本发明提供一种电荷中和剂,用于在将玻璃基板提起之后将软X射线精确地照射到窄间隙中。 软X射线从软X射线电荷中和器14引入间隙“d”,软X射线由软X射线光轴监视器16检测。安装位置调整装置15通过来自 所述软X射线光轴监视器和光轴对准被执行。 接下来,根据来自数据库19的信息,控制单元17控制间隙调节装置13,并执行电荷中和。 还可以通过间隙调节装置13控制间隙“d”,同时判断由静电计18测量的带电电位是否在控制单元17的允许值内的中和条件来执行电荷中和。
    • 2. 发明申请
    • Charge neutralizer for glass substrate
    • 玻璃基板电荷中和剂
    • US20070188970A1
    • 2007-08-16
    • US11443246
    • 2006-05-31
    • Hitoshi InabaMasaharu FujinoYasuhiko FukuchiKazuyoshi NakajimaMasato Kochi
    • Hitoshi InabaMasaharu FujinoYasuhiko FukuchiKazuyoshi NakajimaMasato Kochi
    • H02H1/00
    • H05F3/06B65G49/061B65G2249/02H05K9/0067
    • The present invention provides a charge neutralizer for accurately irradiating a soft X ray into a narrow gap after a glass substrate is lifted up. A soft X ray is introduced into a gap “d” from a soft X ray charge neutralizer 14, and the soft X ray is detected by a soft X ray optical axis monitor 16. Mounting position adjusting means 15 is adjusted by a detection output from said soft X ray optical axis monitor, and optical axis alignment is performed. Next, according to information from a database 19, a control unit 17 controls gap adjusting means 13, and charge neutralization is performed. Charge neutralization can also be performed by controlling the gap “d” by the gap adjusting means 13 while judging neutralizing conditions as to whether a charged potential measured by an electrometer 18 is within an allowable value by the control unit 17 or not.
    • 本发明提供一种电荷中和剂,用于在将玻璃基板提起之后将软X射线精确地照射到窄间隙中。 软X射线从软X射线电荷中和器14引入间隙“d”,软X射线由软X射线光轴监视器16检测。安装位置调整装置15通过来自 所述软X射线光轴监视器和光轴对准被执行。 接下来,根据来自数据库19的信息,控制单元17控制间隙调节装置13,并执行电荷中和。 还可以通过间隙调节装置13控制间隙“d”,同时判断由静电计18测量的带电电位是否在控制单元17的允许值内的中和条件来执行电荷中和。
    • 8. 发明授权
    • Apparatus for neutralizing charged body
    • 用于中和带电体的装置
    • US5596478A
    • 1997-01-21
    • US185829
    • 1994-01-24
    • Tadahiro OhmiHitoshi Inaba
    • Tadahiro OhmiHitoshi Inaba
    • C23C14/58C23C16/56G02F1/1333G21K1/14H01L21/02H01L21/265H01L21/677H05F3/06
    • H05F3/06G21K1/14
    • An apparatus which can neutralize charge bodies such as processed substrates for semiconductor device and for flat display, free from electromagnetic noise, impurity contamination, and residual potentials. To process in a prescribed way a wafer(5) to be processed, the wafer(5) is, for example, moved from a pretreatment chamber(2) to a low pressure reaction chamber(3). In this case, a gas, which does not react on the wafer, such as nitrogen and argon, is introduced into the pretreatment chamber(2), and is kept under a predetermined pressure by a vacuum pump(15). Then, ultraviolet rays are projected in the pretreatment chamber(2) from an ultraviolet rays lamp(11) constituting a means for generating neutralization charge, and positive and negative floating charged particles(electrons and positive ions) are generated by exiting the atmosphere in the chamber(2). Since the charges are removed by projecting the ultraviolet rays from the outside of a case(1) and the case(2) and moreover in a non-contact way, no electromagnetic noise is generated and the residual potentials are vanished too.
    • PCT No.PCT / JP92 / 00948 Sec。 371日期:1994年1月24日 102(e)日期1994年1月24日PCT提交1992年7月24日PCT公布。 出版物WO93 / 02467 日期:1993年2月4日,一种可以中和电荷体的装置,例如半导体器件的处理衬底和平面显示器,没有电磁噪声,杂质污染和残留电位。 为了以规定的方式处理要处理的晶片(5),晶片(5)例如从预处理室(2)移动到低压反应室(3)。 在这种情况下,将不与晶圆反应的气体(例如氮气和氩气)引入预处理室(2),并通过真空泵(15)保持在预定压力下。 然后,紫外线从构成产生中和电荷的装置的紫外线灯(11)投射到预处理室(2)中,并且通过离开空气中的气氛而产生正,负浮动带电粒子(电子和正离子) 室(2)。 由于通过从壳体(1)和壳体(2)的外部投射紫外线而且以非接触方式移除电荷,因此不会产生电磁噪声并且剩余电位也消失。
    • 10. 发明授权
    • Video muting apparatus
    • 视频静音设备
    • US5382981A
    • 1995-01-17
    • US74442
    • 1993-06-10
    • Hitoshi InabaHidenobu Kimura
    • Hitoshi InabaHidenobu Kimura
    • H04N3/20H04N3/24H04N5/44H04N5/57
    • H04N5/57H04N3/24
    • The video muting apparatus is provided with a controlling apparatus which calculates the video muting time TM from the correlation between the power feeding time T1 counted by the first counter and the power feed stopping time T2 counted by the second counter and controls the operation of the switch on the basis of the calculated video muting TM. The switch will operate to be opened on the basis of the controlling signal from the controlling apparatus during the period from the starting time point when the power feed by the power supply circuit is started until the video muting time TM elapses and will operate to be closed on the basis of the controlling signal from the controlling apparatus immediately after the the video muting time TM elapses.
    • 视频静音装置设置有控制装置,其根据由第一计数器计数的供电时间T1和由第二计数器计数的供电停止时间T2之间的相关性来计算视频静音时间TM,并且控制开关的操作 在计算的视频静音TM的基础上。 在从供电电路的供电开始直到视频静音时间TM经过并且将被操作为闭合的开始时间点的期间,开关将基于来自控制装置的控制信号而被操作 基于来自控制装置的控制信号,紧接在视频静音时间TM之后。