会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 2. 发明授权
    • Method of manufacturing semiconductor device, method of manufacturing active matrix substrate, and electrooptic device
    • 制造半导体器件的方法,制造有源矩阵衬底的方法和电光器件
    • US06306693B1
    • 2001-10-23
    • US09657901
    • 2000-09-08
    • Hideto IshiguroMinoru MatsuoHiroyuki MuraiMasami Hayashi
    • Hideto IshiguroMinoru MatsuoHiroyuki MuraiMasami Hayashi
    • H01L2100
    • H01L27/127H01L27/1214H01L27/1255H01L29/66757H01L29/78621H01L2029/7863
    • To provide a method of manufacturing a semiconductor device, a method of manufacturing an active matrix substrate, and an electrooptic device in which in forming different type TFTs on the same substrate, a variation in the LDD length or offset length of TFT can be suppressed by a small number of steps. In the method of manufacturing an active matrix substrate, a patterning mask 554 used for forming gate electrodes 15 and 25 is left, and used in introducing a medium concentration of phosphorus ion to introduce impurities in self alignment with the patterning mask 554. Next, with the patterning mask 554 removed, low-concentration of phosphorus ion is introduced by using the gate electrodes 15 and 25 as a mask to form low-concentration source-drain regions 111, 121, 211 and 221 in self alignment with the gate electrodes 15 and 25. The LDD length of each of the regions is equal to the amount of side etching caused in patterning the gate electrodes 15 and 25.
    • 为了提供一种制造半导体器件的方法,制造有源矩阵衬底的方法和电光器件,其中在同一衬底上形成不同类型的TFT时,TFT的LDD长度或偏移长度的变化可以通过 少数步骤。 在制造有源矩阵基板的方法中,留下用于形成栅电极15和25的图形掩模554,用于引入中等浓度的磷离子以引入与图案化掩模554自对准的杂质。接下来, 去除图案化掩模554,通过使用栅电极15和25作为掩模来引入低浓度的磷离子,以形成与栅电极15自对准的低浓度源极 - 漏极区域111,121,211和221,以及 每个区域的LDD长度等于在图案化栅电极15和25时引起的侧蚀刻量。
    • 6. 发明授权
    • Method of driving pixel circuit, light-emitting apparatus, and electronic apparatus
    • 驱动像素电路,发光装置和电子设备的方法
    • US08310416B2
    • 2012-11-13
    • US12499485
    • 2009-07-08
    • Satoshi YatabeHideto Ishiguro
    • Satoshi YatabeHideto Ishiguro
    • G09G3/30G09G5/00G06F3/038
    • G09G3/3233G09G2300/043G09G2300/0819G09G2300/0852G09G2320/043
    • There is provided a method of driving a pixel circuit. The method includes: performing a compensating operation of asymptotically causing the voltage across the storage capacitance to converge with a voltage corresponding to a threshold voltage of the driving transistor by applying a first reference voltage to the gate of the driving transistor, over a time duration variably set according to a gradation value designated to the pixel circuit, in a compensating period after the elapse of the resetting period; changing the voltage across the storage capacitance from a voltage set by the compensating operation to a voltage corresponding to the gradation value by applying a gradation voltage corresponding to the gradation value from a signal line to the gate of the driving transistor, in a writing period after the elapse of the compensating period.
    • 提供了驱动像素电路的方法。 该方法包括:通过在可变的时间段上施加第一参考电压到驱动晶体管的栅极,执行渐近地使存储电容两端的电压与对应于驱动晶体管的阈值电压的电压收敛的补偿操作 在经过复位周期后的补偿期间,根据指定给像素电路的灰度值进行设定; 将存储电容的电压从通过补偿操作设定的电压改变为对应于灰度值的电压,通过在写入周期之后的写入周期中将与来自信号线的灰度值相对应的灰度电压施加到驱动晶体管的栅极 经过补偿期。
    • 7. 发明授权
    • Liquid crystal device
    • 液晶装置
    • US08089476B2
    • 2012-01-03
    • US12180092
    • 2008-07-25
    • Hideto IshiguroEiji KandaHitoshi Ota
    • Hideto IshiguroEiji KandaHitoshi Ota
    • G06F3/042
    • G06F3/0412G02F1/13338G02F2001/13312G06F3/042G09G3/3648G09G2300/0465G09G2360/148
    • A liquid crystal device includes a plurality of selection lines, a plurality of signal lines, a plurality of pixel portions, a plurality of photosensor portions, a plurality of first power lines, and a plurality of sense lines. The plurality of selection lines are provided in a line direction. The plurality of signal lines are provided in a column direction. The plurality of pixel portions are provided at positions corresponding to intersections of the selection lines and the signal lines. The plurality of photosensor portions are provided in correspondence with a portion of the plurality of pixel portions. The plurality of first power lines are provided in the line direction. The plurality of sense lines are provided in the column direction. Each of the plurality of pixel portions includes a first switching element and a liquid crystal.
    • 液晶装置包括多条选择线,多条信号线,多个像素部分,多个光电传感器部分,多个第一电力线以及多条感测线。 沿线方向设置多条选择线。 多个信号线沿列方向设置。 多个像素部分设置在与选择线和信号线的交点对应的位置。 多个光传感器部分与多个像素部分的一部分相对应地设置。 沿线方向设置多个第一电力线。 在列方向上设置多条检测线。 多个像素部分中的每一个包括第一开关元件和液晶。
    • 9. 发明授权
    • Electroluminescent device, method for manufacturing electroluminescent device, and electronic apparatus
    • 电致发光器件,电致发光器件的制造方法和电子设备
    • US07796101B2
    • 2010-09-14
    • US11668129
    • 2007-01-29
    • Takahiro IwashitaHideto Ishiguro
    • Takahiro IwashitaHideto Ishiguro
    • G09G3/30
    • H01L27/3244H01L51/5218H01L51/5237H01L51/5246H01L51/5253H01L51/5265H01L51/5271H01L2251/5315
    • An electroluminescent device includes a substrate; a light-emitting region including a plurality of sub-pixels including switching elements, portions of an organic planarization layer for covering irregularities caused by the switching elements, reflective layers arranged on the organic planarization layer, protective layers extending over the respective reflective layers, light-transmissive first electrode layers which lie on the respective protective layers and which are electrically connected to the switching elements, portions of an organic light-emitting layer lying over the first electrode layers, and portions of a second electrode layer lying on the organic light-emitting layer; and a non-light-emitting region located outside the light-emitting region. The light-emitting region and the non-light-emitting region are arranged on the substrate. The organic planarization layer extends from the light-emitting region to the non-light-emitting region and has an upper portion which is located in the non-light-emitting region and which is exposed from the protective layers.
    • 电致发光器件包括:衬底; 包括多个子像素的发光区域,包括开关元件,用于覆盖由开关元件引起的凹凸的有机平坦化层的部分,布置在有机平坦化层上的反射层,在各个反射层上延伸的保护层,光 位于各个保护层上并且与开关元件电连接的位于第一电极层上的有机发光层的部分和位于有机发光层上的第二电极层的部分的透射性第一电极层, 发光层; 以及位于发光区域外的非发光区域。 发光区域和非发光区域布置在基板上。 有机平面化层从发光区域延伸到非发光区域,并且具有位于非发光区域中并从保护层露出的上部。