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1. 发明授权

US08440118B2 Master mold, master mold fabrication method, and method for fabricating liquid crystal display device using the same 有权
标题翻译：主模具，母模制造方法以及使用其制造液晶显示装置的方法
公开(公告)号：US08440118B2
公开(公告)日：2013-05-14
申请号：US13183210
申请日：2011-07-14
申请人： Gyoo-Chul Jo , Jin-Wuk Kim , Chang-Hee Lee
发明人： Gyoo-Chul Jo , Jin-Wuk Kim , Chang-Hee Lee
IPC分类号： B29D11/00
CPC分类号： H01L27/1288 , H01L27/1214
摘要： A method for fabricating a liquid crystal display (LCD) device wherein a photolithography technique is replaced by soft lithography is disclosed. The method includes: forming a thin film transistor array substrate; forming a color filter substrate; bonding the thin film transistor array substrate and the color filter substrate; and applying a liquid crystal between the thin film transistor array substrate and the color filter substrate, wherein at least one of the forming the thin film transistor array substrate and the forming the color filter substrate includes a pattern forming method using a soft mold. The pattern forming method may be a soft lithography process that includes: contacting a soft mold having a particular pattern with a surface of a buffer layer and applying a constant heat to the soft mold and buffer layer to transfer the particular pattern onto the buffer layer.
摘要翻译：公开了一种通过软光刻替代光刻技术的液晶显示（LCD）器件的制造方法。该方法包括：形成薄膜晶体管阵列基板; 形成滤色器基板; 接合薄膜晶体管阵列基板和滤色器基板; 并且在薄膜晶体管阵列基板和滤色器基板之间施加液晶，其中形成薄膜晶体管阵列基板和形成滤色器基板的至少一个包括使用软模的图案形成方法。图案形成方法可以是软光刻工艺，其包括：使具有特定图案的软模具与缓冲层的表面接触，并向软模和缓冲层施加恒定的热量以将特定图案转移到缓冲层上。

2. 发明授权

US08003023B2 Master mold, master mold fabrication method, and method for fabricating liquid crystal display device using the same 有权
标题翻译：主模具，母模制造方法以及使用其制造液晶显示装置的方法
公开(公告)号：US08003023B2
公开(公告)日：2011-08-23
申请号：US11477909
申请日：2006-06-30
申请人： Gyoo-Chul Jo , Jin-Wuk Kim , Chang-Hee Lee
发明人： Gyoo-Chul Jo , Jin-Wuk Kim , Chang-Hee Lee
IPC分类号： B32B15/04 , G03C11/22 , G02F1/13
CPC分类号： H01L27/1288 , H01L27/1214
摘要： A method for fabricating a liquid crystal display (LCD) device wherein a photolithography technique is replaced by soft lithography is disclosed. The method includes: forming a thin film transistor array substrate; forming a color filter substrate; bonding the thin film transistor array substrate and the color filter substrate; and applying a liquid crystal between the thin film transistor array substrate and the color filter substrate, wherein at least one of the forming the thin film transistor array substrate and the forming the color filter substrate includes a pattern forming method using a soft mold. The pattern forming method may be a soft lithography process that includes: contacting a soft mold having a particular pattern with a surface of a buffer layer and applying a constant heat to the soft mold and buffer layer to transfer the particular pattern onto the buffer layer.
摘要翻译：公开了一种通过软光刻替代光刻技术的液晶显示（LCD）器件的制造方法。该方法包括：形成薄膜晶体管阵列基板; 形成滤色器基板; 接合薄膜晶体管阵列基板和滤色器基板; 并且在薄膜晶体管阵列基板和滤色器基板之间施加液晶，其中形成薄膜晶体管阵列基板和形成滤色器基板的至少一个包括使用软模的图案形成方法。图案形成方法可以是软光刻工艺，其包括：使具有特定图案的软模具与缓冲层的表面接触，并向软模和缓冲层施加恒定的热量以将特定图案转移到缓冲层上。

3. 发明申请

US20070153222A1 Master mold, master mold fabrication method, and method for fabricating liquid crystal display device using the same 有权
标题翻译：主模具，母模制造方法以及使用其制造液晶显示装置的方法
公开(公告)号：US20070153222A1
公开(公告)日：2007-07-05
申请号：US11477909
申请日：2006-06-30
申请人： Gyoo-Chul Jo , Jin-Wuk Kim , Chang-Hee Lee
发明人： Gyoo-Chul Jo , Jin-Wuk Kim , Chang-Hee Lee
IPC分类号： G02F1/13
CPC分类号： H01L27/1288 , H01L27/1214
摘要： A method for fabricating a liquid crystal display (LCD) device wherein a photolithography technique is replaced by soft lithography is disclosed. The method includes: forming a thin film transistor array substrate; forming a color filter substrate; bonding the thin film transistor array substrate and the color filter substrate; and applying a liquid crystal between the thin film transistor array substrate and the color filter substrate, wherein at least one of the forming the thin film transistor array substrate and the forming the color filter substrate includes a pattern forming method using a soft mold. The pattern forming method may be a soft lithography process that includes: contacting a soft mold having a particular pattern with a surface of a buffer layer and applying a constant heat to the soft mold and buffer layer to transfer the particular pattern onto the buffer layer.
摘要翻译：公开了一种通过软光刻替代光刻技术的液晶显示（LCD）器件的制造方法。该方法包括：形成薄膜晶体管阵列基板; 形成滤色器基板; 接合薄膜晶体管阵列基板和滤色器基板; 并且在薄膜晶体管阵列基板和滤色器基板之间施加液晶，其中形成薄膜晶体管阵列基板和形成滤色器基板的至少一个包括使用软模的图案形成方法。图案形成方法可以是软光刻工艺，其包括：使具有特定图案的软模具与缓冲层的表面接触，并向软模和缓冲层施加恒定的热量以将特定图案转移到缓冲层上。

4. 发明授权

US08378349B2 Organic light emitting display apparatus and method of manufacturing the same 有权
标题翻译：有机发光显示装置及其制造方法
公开(公告)号：US08378349B2
公开(公告)日：2013-02-19
申请号：US12902629
申请日：2010-10-12
申请人： Moo-Soon Ko , Jae-Ho Yoo , Gyoo-Chul Jo
发明人： Moo-Soon Ko , Jae-Ho Yoo , Gyoo-Chul Jo
IPC分类号： H01L21/00
CPC分类号： H01L51/5265 , H01L27/3211 , H01L27/3246 , H01L51/5215 , H01L51/5218
摘要： An organic light emitting display apparatus and a method of manufacturing the same. The display apparatus includes first, second, and third sub-pixels formed on a substrate. The first sub-pixel includes a first pixel electrode, a first transmissive conductive layer formed on the first pixel electrode, a second transmissive conductive layer formed on the first transmissive conductive layer, a first organic light emitting layer formed on the second transmissive conductive layer, and a counter electrode formed on the first organic light emitting layer. The second sub-pixel includes a second pixel electrode, the first transmissive conductive layer formed on the second pixel electrode, a first protector covering an edge of the first transmissive conductive layer, a second organic light emitting layer electrically connected to the first transmissive conductive layer, and the counter electrode formed on the second organic light emitting layer. The third sub-pixel includes a third pixel electrode, a second protector covering an outer edge of the third pixel electrode, a third protector formed on the second protector, a third organic light emitting layer electrically connected to the third pixel electrode, and the counter electrode formed on the third organic light emitting layer.
摘要翻译：一种有机发光显示装置及其制造方法。显示装置包括形成在基板上的第一，第二和第三子像素。第一子像素包括第一像素电极，形成在第一像素电极上的第一透射导电层，形成在第一透射导电层上的第二透射导电层，形成在第二透射导电层上的第一有机发光层，以及形成在第一有机发光层上的对电极。第二子像素包括第二像素电极，形成在第二像素电极上的第一透射导电层，覆盖第一透射导电层的边缘的第一保护器，与第一透射导电层电连接的第二有机发光层以及形成在第二有机发光层上的对电极。第三子像素包括第三像素电极，覆盖第三像素电极的外边缘的第二保护器，形成在第二保护器上的第三保护器，与第三像素电极电连接的第三有机发光层，电极，形成在第三有机发光层上。

5. 发明授权

US08158467B2 Liquid crystal display device and method of fabricating the same 有权
标题翻译：液晶显示装置及其制造方法
公开(公告)号：US08158467B2
公开(公告)日：2012-04-17
申请号：US12699452
申请日：2010-02-03
申请人： Gee-Sung Chae , Gyoo-Chul Jo , Yong-Sup Hwang
发明人： Gee-Sung Chae , Gyoo-Chul Jo , Yong-Sup Hwang
IPC分类号： H01L21/00
CPC分类号： G02F1/1368 , G02F2001/136295
摘要： A liquid crystal display device includes a plurality of gate lines and data lines on a first substrate defining a plurality of pixel regions, a thin film transistor within the pixel regions, a pixel electrode within the pixel regions, and at least one TiOx layer provided with the thin film transistor.
摘要翻译：一种液晶显示装置包括在限定多个像素区域的第一基板上的多条栅极线和数据线，像素区域内的薄膜晶体管，像素区域内的像素电极以及设置有像素区域的至少一个TiOx层薄膜晶体管。

6. 发明申请

US20110212557A1 METHOD OF MANUFACTURING AN ARRAY SUBSTRATE FOR LCD DEVICE HAVING DOUBLE-LAYERED METAL STRUCTURE 有权
标题翻译：具有双层金属结构的液晶显示装置制造阵列基板的方法
公开(公告)号：US20110212557A1
公开(公告)日：2011-09-01
申请号：US13100883
申请日：2011-05-04
申请人： Won-Ho CHO , Gyoo-Chul Jo , Gue-Tai Lee , Jin-Gyu Kang , Beung-Hwa Jeong , Jin-Young Kim
发明人： Won-Ho CHO , Gyoo-Chul Jo , Gue-Tai Lee , Jin-Gyu Kang , Beung-Hwa Jeong , Jin-Young Kim
IPC分类号： H01L33/62
CPC分类号： G02F1/136286 , G02F2001/13629 , G02F2001/136295
摘要： The present invention is an array substrate for use in a liquid crystal display device, which includes a gate electrode, a gate line and a gate pad on a substrate, wherein the gate electrode, the gate line and the gate pad have a double-layered structure consisting of a first metal layer and a first barrier metal layer in series from the substrate, and wherein the first metal is one of aluminum and aluminum alloy; a gate insulation layer on the substrate covering the gate electrode, gate line and gate pad; an active layer and an ohmic contact layer sequentially formed on the gate insulation layer and over the gate electrode; a data line on the gate insulation layer perpendicularly crossing the gate line, source and drain electrodes contacting the ohmic contact layer, and a data pad on the gate insulation layer, wherein the data line, the source and drain electrode and the data pad have a double-layered structure consisting of a second barrier metal layer and a second metal layer of copper; a passivation layer formed on the gate insulation layer to cover the data line, source and drain electrodes, and data pad, wherein the passivation layer has a drain contact hole exposing a portion of the drain electrode, a gate pad contact hole exposing a portion of the gate pad, and a data pad contact hole exposing a portion of the data pad; and a pixel electrode, a gate pad terminal and a data pad terminal on the passivation layer, all of which are formed of a transparent conductive material on the passivation layer.
摘要翻译：本发明是一种用于液晶显示装置的阵列基板，其包括在基板上的栅电极，栅极线和栅极焊盘，其中栅电极，栅极线和栅极焊盘具有双层结构由第一金属层和与基板串联的第一阻挡金属层组成，其中第一金属是铝和铝合金之一; 覆盖栅电极，栅极线和栅极焊盘的基板上的栅极绝缘层; 依次形成在栅极绝缘层上和栅电极上的有源层和欧姆接触层; 垂直于栅极线的栅极绝缘层上的数据线，与欧姆接触层接触的源极和漏极以及栅极绝缘层上的数据焊盘，其中数据线，源极和漏极以及数据焊盘具有由第二阻挡金属层和铜的第二金属层组成的双层结构; 形成在所述栅极绝缘层上以覆盖所述数据线，源极和漏极以及数据焊盘的钝化层，其中所述钝化层具有暴露所述漏电极的一部分的漏极接触孔，栅极焊盘和暴露数据焊盘的一部分的数据焊盘接触孔; 以及钝化层上的像素电极，栅极焊盘端子和数据焊盘端子，所有这些都由钝化层上的透明导电材料形成。

7. 发明申请

US20090286360A1 Etchant and method for fabricating electric device including thin film transistor using the same 有权
标题翻译：用于制造包括使用其的薄膜晶体管的电子器件的蚀刻剂和方法
公开(公告)号：US20090286360A1
公开(公告)日：2009-11-19
申请号：US12079008
申请日：2008-03-24
申请人： Gyoo-Chul Jo , Kwang-Nam Kim
发明人： Gyoo-Chul Jo , Kwang-Nam Kim
IPC分类号： H01L21/336 , C09K13/06
CPC分类号： C23F1/18 , C23F1/26 , H01L21/32134 , H01L29/458 , H01L29/4908 , H01L29/66765 , H01L51/0023
摘要： The present embodiments relate to an etchant and a method of fabricating an electric device including a thin film transistor. The etchant includes a fluorine ion (F−) source, hydrogen peroxide (H2O2), a sulfate, a phosphate, an azole-based compound, and a solvent. The etchant and method of fabricating an electric device including a thin film transistor, can etch a multi-layered film including copper layer, and a titanium or titanium alloy layer in a batch and can provide a thin film transistor having a good pattern profile at high yield. When reusing the etchant, uniform etching performance can be maintained with a long replacement period of the etchant, and therefore costs can be saved.
摘要翻译：本实施例涉及蚀刻剂和制造包括薄膜晶体管的电子器件的方法。蚀刻剂包括氟离子（F-）源，过氧化氢（H 2 O 2），硫酸盐，磷酸盐，唑类化合物和溶剂。制造包括薄膜晶体管的电子器件的蚀刻剂和方法可以一次蚀刻包括铜层的多层膜和钛或钛合金层，并且可以提供在高温下具有良好图案轮廓的薄膜晶体管产量。当重复使用蚀刻剂时，可以以较长的蚀刻剂更换周期来保持均匀的蚀刻性能，因此可以节省成本。

8. 发明授权

US07605877B2 Array substrate for LCD device having double-layered metal structure and manufacturing method thereof 有权
标题翻译：具有双层金属结构的液晶显示装置用阵列基板及其制造方法
公开(公告)号：US07605877B2
公开(公告)日：2009-10-20
申请号：US10875559
申请日：2004-06-25
申请人： Won-Ho Cho , Gyoo-Chul Jo , Gue-Tai Lee , Jin-Gyu Kang , Beung-Hwa Jeong , Jin-Young Kim
发明人： Won-Ho Cho , Gyoo-Chul Jo , Gue-Tai Lee , Jin-Gyu Kang , Beung-Hwa Jeong , Jin-Young Kim
IPC分类号： G02F1/136
CPC分类号： G02F1/136286 , G02F2001/13629 , G02F2001/136295
摘要： The present invention is an array substrate for use in a liquid crystal display device, which includes a gate electrode, a gate line and a gate pad on a substrate, wherein the gate electrode, the gate line and the gate pad have a double-layered structure consisting of a first metal layer and a first barrier metal layer in series from the substrate, and wherein the first metal is one of aluminum and aluminum alloy; a gate insulation layer on the substrate covering the gate electrode, gate line and gate pad; an active layer and an ohmic contact layer sequentially formed on the gate insulation layer and over the gate electrode; a data line on the gate insulation layer perpendicularly crossing the gate line, source and drain electrodes contacting the ohmic contact layer, and a data pad on the gate insulation layer, wherein the data line, the source and drain electrode and the data pad have a double-layered structure consisting of a second barrier metal layer and a second metal layer of copper; a passivation layer formed on the gate insulation layer to cover the data line, source and drain electrodes, and data pad, wherein the passivation layer has a drain contact hole exposing a portion of the drain electrode, a gate pad contact hole exposing a portion of the gate pad, and a data pad contact hole exposing a portion of the data pad; and a pixel electrode, a gate pad terminal and a data pad terminal on the passivation layer, all of which are formed of a transparent conductive material on the passivation layer.
摘要翻译：本发明是一种用于液晶显示装置的阵列基板，其包括在基板上的栅电极，栅极线和栅极焊盘，其中栅电极，栅极线和栅极焊盘具有双层结构由第一金属层和与基板串联的第一阻挡金属层组成，其中第一金属是铝和铝合金之一; 覆盖栅电极，栅极线和栅极焊盘的基板上的栅极绝缘层; 依次形成在栅极绝缘层上和栅电极上的有源层和欧姆接触层; 垂直于栅极线的栅极绝缘层上的数据线，与欧姆接触层接触的源极和漏极以及栅极绝缘层上的数据焊盘，其中数据线，源极和漏极以及数据焊盘具有由第二阻挡金属层和铜的第二金属层组成的双层结构; 形成在所述栅极绝缘层上以覆盖所述数据线，源极和漏极以及数据焊盘的钝化层，其中所述钝化层具有暴露所述漏电极的一部分的漏极接触孔，栅极焊盘和暴露数据焊盘的一部分的数据焊盘接触孔; 以及钝化层上的像素电极，栅极焊盘端子和数据焊盘端子，所有这些都由钝化层上的透明导电材料形成。

9. 发明授权

US07336324B2 Array substrate for liquid crystal display device and fabricating method thereof 有权
标题翻译：液晶显示装置用阵列基板及其制造方法
公开(公告)号：US07336324B2
公开(公告)日：2008-02-26
申请号：US10964922
申请日：2004-10-15
申请人： Jin-Young Kim , Gyoo-Chul Jo , Kyu-Tae Lee , Beung-Hwa Jeong , Jin-Gyu Kang
发明人： Jin-Young Kim , Gyoo-Chul Jo , Kyu-Tae Lee , Beung-Hwa Jeong , Jin-Gyu Kang
IPC分类号： G02F1/136 , H01I29/06
CPC分类号： G02F1/136286 , G02F2001/13629
摘要： A semiconductor device includes a substrate having source and drain regions, a gate insulating layer on the substrate, a gate electrode on the gate insulating layer, an interlayer on the gate electrode, a source electrode connected to the source region, and a drain electrode connected to the drain region, wherein at least one of the gate electrode, the source electrode and the drain electrode includes a first metal layer of molybdenum (Mo)-titanium (Ti) alloy, a second metal layer of one of metallic metals including copper (Cu), aluminum (Al), silver (Ag) and gold (Au) on the first metal layer.
摘要翻译：半导体器件包括具有源极和漏极区域的衬底，衬底上的栅极绝缘层，栅极绝缘层上的栅极电极，栅极电极上的中间层，连接到源极区域的源极和连接到漏极电极的漏电极其中所述栅电极，所述源电极和所述漏电极中的至少一个包括钼（Mo） - 钛（Ti）合金的第一金属层，包括铜的金属金属之一的第二金属层 Cu），铝（Al），银（Ag）和金（Au）。

10. 发明授权

US07196015B2 Pattern forming method and electric device fabricating method using the same 有权
标题翻译：图案形成方法及其装置的制造方法
公开(公告)号：US07196015B2
公开(公告)日：2007-03-27
申请号：US10669467
申请日：2003-09-25
申请人： Gee-Sung Chae , Gyoo-Chul Jo , Yong-Sup Hwang
发明人： Gee-Sung Chae , Gyoo-Chul Jo , Yong-Sup Hwang
IPC分类号： H01L21/302
CPC分类号： H01L29/66765 , H01L21/0332 , H01L21/0337 , H01L21/28123 , H01L21/32134 , H01L21/32135 , H01L21/32139
摘要： A pattern forming method includes: forming an etching-subject layer on a substrate; forming a Ti layer on the etching-subject layer; forming a TiOx layer by irradiating light on a portion of the Ti layer using a mask; etching the Ti layer to form a TiOx pattern; etching the etching-subject layer using the TiOx pattern as a mask; and removing the TiOx pattern.
摘要翻译：图案形成方法包括：在基板上形成蚀刻对象层; 在蚀刻对象层上形成Ti层; 通过使用掩模在所述Ti层的一部分上照射光来形成TiO x层; 蚀刻Ti层以形成TiOx图案; 使用TiOx图案作为掩模蚀刻蚀刻对象层; 并去除TiOx图案。

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