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1. 发明专利

JP2008286812A Differential flow meter 有权
标题翻译：差分流量计
公开(公告)号：JP2008286812A
公开(公告)日：2008-11-27
申请号：JP2008228485
申请日：2008-09-05
申请人： Fujikin Inc , Tadahiro Omi , Tokyo Electron Ltd , 忠弘大見 , 東京エレクトロン株式会社 , 株式会社フジキン
发明人： OMI TADAHIRO , SUGIYAMA KAZUHIKO , UNO TOMIO , IKEDA SHINICHI , NISHINO KOJI , NAKAMURA OSAMU , DOI RYOSUKE , MATSUMOTO ATSUSHI
IPC分类号： G01F1/36 , G01F1/00 , G01F1/50
摘要： PROBLEM TO BE SOLVED: To provide a differential flow meter, having such a simple structure as to lower the cost of production, which can highly accurately measure flow rates with an error E of not more than (1%SP) over a wide flow rate range of 100% to 1% in real time and in an in-line state.
SOLUTION: The differential flow meter that measures a flow rate range of 100% to 10% of the maximum flow rate and a differential flow meter that measures a flow rate range of 10% to 1% of the maximum flow rate are combined. Fluid to be measured is selectively supplied to either of the differential flow meters through a switching valve in accordance with the flow rate ranges. This makes it possible to highly accurately measure flow rates over a wide flow rate range.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种差分流量计，具有降低生产成本的简单结构，其可以高精度地测量流量，误差E不超过（1％SP）的误差E超过宽流量范围为100％至1％，实时和在线状态。
解决方案：测量流量范围为最大流量的100％至10％的差分流量计和测量最大流量的10％至1％流量范围的差分流量计相结合。根据流量范围通过切换阀选择性地将待测量的流体提供给差分流量计中的任一个。这使得可以在宽的流量范围内高精度地测量流量。版权所有（C）2009，JPO＆INPIT

2. 发明专利

JP2005024421A Differential pressure type flow meter and differential pressure type flow control system 有权
标题翻译：差压式流量计和差压式流量控制系统
公开(公告)号：JP2005024421A
公开(公告)日：2005-01-27
申请号：JP2003190988
申请日：2003-07-03
申请人： Fujikin Inc , Tadahiro Omi , Tokyo Electron Ltd , 忠弘大見 , 東京エレクトロン株式会社 , 株式会社フジキン
发明人： OMI TADAHIRO , SUGIYAMA KAZUHIKO , UNO TOMIO , IKEDA SHINICHI , NISHINO KOJI , NAKAMURA OSAMU , DOI RYOSUKE , MATSUMOTO ATSUSHI
IPC分类号： G01F1/00 , G01F1/42 , G01F1/50 , G01F1/88 , G01F7/00 , G05D7/06
CPC分类号： G01F1/50 , G01F1/42 , G05D7/0635
摘要： PROBLEM TO BE SOLVED: To lower the manufacturing cost of a differential pressure type flow meter by simplifying the structure and to perform accurate flow measurement with an error E of (1%SP) or less in a wide flow range of 100% to 1%, in real time and an in-line state.
SOLUTION: The differential pressure type flow meter comprises an orifice, a detector of pressure P
1 upstream the orifice, a detector of pressure P
2 downstream the orifice, a detector of fluid temperature upstream the orifice, and a control operation circuit for calculating a fluid flow rate Q flowing in the orifice by using the detected pressures P
1 and P
2 and the detected temperature T of each detectors. The fluid flow rate Q is calculated with Q=C
1 × P
1 / √T × [(P
2 /P
1 )
m -(P
2 /P
1 )
n ]
1/2 (here, C
1 is a constant of proportion, m and n are constants).
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题为了通过简化结构并且在100％的宽流动范围内以误差E为（1％SP）以下的误差E来降低差压式流量计的制造成本）到1％，实时和在线状态。解决方案：差压式流量计包括孔口，孔口上游压力P 1 的检测器，孔口下游的压力P 2 检测器，a 在孔口上游的流体温度检测器，以及控制运算电路，用于通过使用检测压力P 1 和P 2 计算在孔中流动的流体流量Q，每个检测器的检测温度T。流体流量Q用Q = C ×P 1 /√T×[（P 2 / P 1 ）米 - （P 2 / P 1 ）名词] 1/2 （这里，C 1 是比例常数，m和n是常数）。版权所有（C）2005，JPO＆NCIPI

3. 发明专利

JP2004264881A Flow control method of hydrogen fluoride gas, and flow control device for hydrogen fluoride gas used therefor 有权
公开(公告)号：JP2004264881A
公开(公告)日：2004-09-24
申请号：JP2003010162
申请日：2003-01-17
申请人： Fujikin Inc , Tadahiro Omi , Tokyo Electron Ltd , 忠弘大見 , 東京エレクトロン株式会社 , 株式会社フジキン
发明人： OMI TADAHIRO , SUGIYAMA KAZUHIKO , MIZUSAWA KANEYOSHI , TAKAHASHI EIJI , UNO TOMIO , NISHINO KOJI , DOI RYOSUKE , IKEDA SHINICHI , NAGASE MASAAKI
IPC分类号： G05D7/06
CPC分类号： H01L21/67023 , G05D7/0635 , Y10T137/6416 , Y10T137/6606 , Y10T137/7761
摘要： PROBLEM TO BE SOLVED: To enable the precise flow control, with respect to a flow rate range of about 3-300 SCCM, of HF gas to be supplied to a vacuum chamber or the like by use of a pressure type flow control device. SOLUTION: In this flow control method of hydrogen fluoride gas using the pressure type flow control device, the flow rate of the gas passing through an orifice in the state where the ratio P 2 /P 1 of the gas pressure P 1 on the orifice upstream side gas and the gas pressure P 2 on the orifice downstream side is retained at a critical pressure ratio of gas or less is calculated as Q=KP 1 (wherein K is a constant). The hydrogen fluoride gas is passed through the orifice while heating the pressure type flow control device to a temperature of 40°C or higher. COPYRIGHT: (C)2004,JPO&NCIPI

4. 发明专利

JP2005195525A Small hole diameter automatic measuring instrument, small hole diameter measuring method, and shower plate manufacturing method 有权
标题翻译：小孔直径自动测量仪器，小孔直径测量方法和淋浴板制造方法
公开(公告)号：JP2005195525A
公开(公告)日：2005-07-21
申请号：JP2004003718
申请日：2004-01-09
申请人： Fujikin Inc , Tadahiro Omi , 忠弘大見 , 株式会社フジキン
发明人： OMI TADAHIRO , NAGASE MASAAKI , DOI RYOSUKE , NISHINO KOJI , NAKAMURA OSAMU , UNO TOMIO , IKEDA SHINICHI
IPC分类号： G01B13/10
CPC分类号： G01B13/10 , Y10T29/49432
摘要： PROBLEM TO BE SOLVED: To continuously, highly efficiently, and accurately, measure the diameter or cross section area of each of a plurality of small holes formed in a plate while determining and reporting small holes having diameter errors exceeding a set value. SOLUTION: This small hole diameter automatic measuring instrument comprises: a flow measuring part B mainly composed of an automatic pressure controller 4 for supplying a fluid to the inlet side of the small holes 8 with a set inlet side pressure P 1 controlled at a desired value while keeping an outlet side pressure P 2 of the small holes 8 in a plate 7 and an inlet side pressure P 1 of the small holes 8 in a critical state of the fluid; a plate supporter 12 for rotatably supporting the plate 7; a test probe supporter 13 thereabove for supporting a test probe 6 in an ascendable/descendable and traversable manner, the test probe 6 supplying the fluid from the measuring part B by making close contact airtightly with the inlet side of the small holes 8; a plate hold part C comprising controllers 14 and 15 for the two supporters 12 and 13; and a control part C equipped with a calculation/determination part C 2 for calculating the diameter or cross section area of each of the small holes 8 in process of supplying the fluid based on flow measurement values from the measuring part B, and an external output part C 3 for outputting relevant calculation values to the exterior. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：为了连续，高效，准确地测量形成在板中的多个小孔中的每一个的直径或横截面积，同时确定和报告具有超过设定值的直径误差的小孔。
解决方案：该小孔径自动测量仪器包括：主要由自动压力控制器4组成的流量测量部分B，该自动压力控制器4用于将流体供应到小孔8的入口侧，设定的入口侧压力P 1 控制在期望值，同时保持板7中的小孔8的出口侧压力P 2 和入口侧压力P 1 处于临界状态的小孔8; 用于可旋转地支撑板7的板支撑件12; 测试探针支撑件13，用于以可升降/可移动的方式支撑测试探针6，测试探针6通过与小孔8的入口侧紧密接触而从测量部分B供应流体; 包括用于两个支撑件12和13的控制器14和15的板保持部分C; 以及配备有计算/确定部件C 2 的控制部件C，用于根据来自测量装置的流量测量值计算供给流体的每个小孔8的直径或横截面面积部分B和用于将相关计算值输出到外部的外部输出部分C 3 。版权所有（C）2005，JPO＆NCIPI

5. 发明专利

JP2005115501A Chamber internal pressure controller and internal pressure controlled chamber 有权
标题翻译：室内压力控制器和内压控制室
公开(公告)号：JP2005115501A
公开(公告)日：2005-04-28
申请号：JP2003346497
申请日：2003-10-06
申请人： Fujikin Inc , Tadahiro Omi , 忠弘大見 , 株式会社フジキン
发明人： OMI TADAHIRO , TERAMOTO AKINOBU , UNO TOMIO , DOI RYOSUKE , NISHINO KOJI , NAKAMURA OSAMU , MATSUMOTO ATSUSHI , NAGASE MASAAKI , IKEDA SHINICHI
IPC分类号： G05D7/06 , G05D16/20
CPC分类号： G05D16/208 , Y10T137/7761 , Y10T137/8741 , Y10T137/87507
摘要： PROBLEM TO BE SOLVED: To control a chamber internal pressure with high precision over a wide range while regulating a gas flow rate fed to a chamber by preventing a flow rate control precision in a low flow rate area from lowering greatly and accurately controlling the flow rate over the whole flow rate control area. SOLUTION: A gas supply device formed of a plurality of pressure type flow rate controllers connected in parallel and a controller controlling operation of them supplies a desired gas to a chamber evacuated by a vacuum pump while controlling a gas flow rate. One of the pressure type flow rate controllers serves as a controller controlling a gas flow area for up to 10% of the maximum flow rate supplied to the chamber, while the rest of the pressure type flow rate controllers control the rest of the gas flow rate areas. A pressure detector is arranged in the chamber, and the detection value of the pressure detector is inputted to the controller for regulating a control signal to the pressure type flow rate controller. In this way, the gas supply quantity to the chamber is controlled, and the chamber internal pressure is controlled. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：通过防止低流量区域中的流量控制精度降低大大和精确地控制，通过在宽范围内以高精度控制室内压力，同时调节供给到室的气体流量整个流量控制区域的流量。解决方案：由并联连接的多个压力式流量控制器形成的气体供给装置和控制其操作的控制器在控制气体流量的同时将期望的气体供应到由真空泵抽真空的室。压力式流量控制器中的一个用作控制气体流动面积达到提供给腔室的最大流量的10％的控制器，而其余的压力式流量控制器控制气体流量的其余部分区域。压力检测器设置在腔室中，压力检测器的检测值被输入到控制器，用于调节对压力型流量控制器的控制信号。以这种方式，控制到室的气体供应量，并且控制室内压力。版权所有（C）2005，JPO＆NCIPI

6. 发明专利

JP2006031498A Flow control method of clustered fluid and flow control apparatus for clustered fluid to be used therefor 有权
标题翻译：用于其所使用的聚集流体的流体流量和流量控制装置的流量控制方法
公开(公告)号：JP2006031498A
公开(公告)日：2006-02-02
申请号：JP2004210967
申请日：2004-07-20
申请人： Fujikin Inc , Tohoku Univ , Tokyo Electron Ltd , 国立大学法人東北大学 , 東京エレクトロン株式会社 , 株式会社フジキン
发明人： OMI TADAHIRO , SUGIYAMA KAZUHIKO , MIZUSAWA KANEYOSHI , TAKAHASHI EIJI , UNO TOMIO , NISHINO KOJI , DOI RYOSUKE , IKEDA SHINICHI , NAGASE MASAAKI
IPC分类号： G05D7/06
摘要： PROBLEM TO BE SOLVED: To attain flow control with high precision of a clustered fluid such as a hydrogen fluoride gas to be supplied to a vacuum chamber or the like with respect to a flow rate range of 3-300SCCM by using a compression flow controller.
SOLUTION: The flow control method for the clustered fluid to use the compression flow controller which operates as Q=KP
1 (where K is a constant) a flow rate Q of a gas circulating through an orifice in a state that gas pressure P
1 on an orifice upstream side and gas pressure P
2 on an orifice downstream side are held equal to or below a critical pressure ratio of the gas. In the method, by warming the compression flow controller up to a temperature at 40°C or higher or adding a dilution gas to the clustered fluid to make it equal to or lower than partial pressure, association of molecules is dissociated and the clustered fluid put into a single molecular state is later circulated through the orifice.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：为了通过使用压缩方式相对于3-300SCCM的流量范围来获得要供应到真空室等的诸如氟化氢气体的聚集流体的高精度的流量控制流量控制器解决方案：聚集流体使用压缩流量控制器的流量控制方法，该压缩流量控制器作为Q = KP 1 （其中K是常数），循环通过孔口上游侧的气体压力P 1 的孔口和孔口下游侧的气体压力P 2 保持在等于或低于加油站。在该方法中，通过将压缩流量控制器加热至40℃以上的温度，或者向聚集流体添加稀释气体使其等于或低于分压，使分子的缔合解离，聚集的液体放置进入单一分子状态后来循环通过孔口。版权所有（C）2006，JPO＆NCIPI

7. 发明专利

JP2005056031A Device for supplying gas to chamber, and method for controlling internal pressure in chamber using the device 有权
标题翻译：用于向气室供应气体的装置以及使用装置控制室内压力的方法
公开(公告)号：JP2005056031A
公开(公告)日：2005-03-03
申请号：JP2003284527
申请日：2003-07-31
申请人： Fujikin Inc , Tokyo Electron Ltd , 東京エレクトロン株式会社 , 株式会社フジキン
发明人： KAWANAMI HIROSHI , UNO TOMIO , DOI RYOSUKE , NISHINO KOJI , NAKAMURA OSAMU , MATSUMOTO ATSUSHI , IKEDA SHINICHI
IPC分类号： H01L21/02 , G05D7/06
CPC分类号： G05D7/0652 , Y10T137/7761 , Y10T137/8741 , Y10T137/87507
摘要： PROBLEM TO BE SOLVED: To prevent the considerable reduction in flow control accuracy in a small flow range, to perform precise flow control over the entire flow control range, and to control the pressure in wide range in the chamber by the precise flow control. SOLUTION: A device for supplying gas to the chamber is formed by a plurality of pressure type flow control devices FCS(A), FCS(B) connected in parallel, and a control device 1 for controlling the operation of the plurality of pressure type flow control devices, and supplies desired gas to the chamber in which air has been exhausted by a vacuum pump while controlling the flow of the gas. One of the pressure type flow control devices is set as a device for controlling the gas flow range of 10% of the maximum flow rate to be supplied to the chamber, and the remaining pressure type flow control device is set as a device for controlling the remaining gas flow range. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题为了防止在小流量范围内的流量控制精度的显着降低，在整个流量控制范围内执行精确的流量控制，并且通过精确流量来控制腔室中的宽范围内的压力控制。解决方案：用于向腔室供给气体的装置由并联连接的多个压力式流量控制装置FCS（A），FCS（B）形成，控制装置1用于控制多个压力型流量控制装置，并且在控制气体流动的同时，向真空泵排出空气的室供给所需的气体。其中一个压力式流量控制装置被设置为用于控制要供应到室的最大流量的10％的气体流量范围的装置，并且剩余压力型流量控制装置被设置为用于控制剩余气体流量范围。版权所有（C）2005，JPO＆NCIPI

8. 发明专利

JP2004199109A Flow control method for fluid using pressure-type flow controller 有权
公开(公告)号：JP2004199109A
公开(公告)日：2004-07-15
申请号：JP2002363221
申请日：2002-12-16
申请人： Fujikin Inc , 株式会社フジキン
发明人： IKEDA SHINICHI , MORIMOTO AKIHIRO , DOI RYOSUKE , NISHINO KOJI , UNO TOMIO
IPC分类号： G01F1/36 , G01F1/50 , G01F25/00 , G05D7/06
摘要： PROBLEM TO BE SOLVED: To easily find the specific flow factor of a type of gas with high accuracy even if the physical properties of the type of gas are unknown in the case of a pressure-type flow controller. SOLUTION: This pressure-type flow controller calculates an actual flow Qg of an arbitrary fluid according to Qg = Qb×SFF when the arbitrary fluid Gg is assumed to be a flow-controlled fluid (where, Qb is a measured flow of the arbitrary fluid in the flow controller assuming that the flow-controlled fluid is a reference fluid Gb, and SFF is the specific flow factor of the arbitrary fluid Gg relative to the reference fluid Gb). The flow factor SFF is operated according to SFF = Δt(Gb)/Δt(Gg)×T(Gb)/T(Gg), (where, Δt(Gb) is time for which a pressure drop reaches an arbitrary set value under the pressure attenuation characteristic of an orifice with respect to the reference fluid Gb, Δt(Gg) is time for which a pressure drop reaches an arbitrary set value ΔP under the pressure attenuation characteristic of the orifice with respect to the arbitrary fluid Gg, T(Gb) is the temperature of the reference fluid Gb, and T(Gg) is the temperature of the arbitrary fluid Gg). COPYRIGHT: (C)2004,JPO&NCIPI

9. 发明授权

US6422264B2 Parallel divided flow-type fluid supply apparatus, and fluid-switchable pressure-type flow control method and fluid-switchable pressure-type flow control system for the same fluid supply apparatus 有权
标题翻译：平行分流式流体供给装置和流体切换式压力式流量控制方法以及用于同一流体供给装置的流体切换型压力式流量控制系统
公开(公告)号：US6422264B2
公开(公告)日：2002-07-23
申请号：US73464000
申请日：2000-12-13
申请人： FUJIKIN KK , OHMI TADAHIRO , TOKYO ELECTRON LTD
发明人： OHMI TADAHIRO , KAGATSUME SATOSHI , SUGIYAMA KAZUHIKO , MINAMI YUKIO , NISHINO KOUJI , DOHI RYOUSUKE , YONEHANA KATSUNORI , IKEDA NOBUKAZU , YAMAJI MICHIO , HIROSE JUN , FUKAZAWA KAZUO , KOIZUMI HIROSHI , NAGAOKA HIDEKI , MORIMOTO AKIHIRO , UNO TOMIO , IDETA EIJI , MATSUMOTO ATSUSHI , UENOYAMA TOYOMI , HIROSE TAKASHI
IPC分类号： G05D7/06
CPC分类号： G05D7/0658 , G05D7/0664 , Y10S438/935 , Y10T137/0396 , Y10T137/7759 , Y10T137/7761 , Y10T137/86389 , Y10T137/87877 , Y10T137/87917
摘要： A fluid supply apparatus with a plurality of flow lines branching out from one pressure regulator with the flow lines arranged in parallel and constructed so that opening or closing one flow passage will have no transient effect on the steady flow of the other flow passages. Each flow passage is provided with a time delay-type mass flow controller MFC so that when one closed fluid passage is opened, the mass flow controller on that flow passage reaches a set flow rate Qs in a specific delay time DELTAt from the starting point.The invention includes a method and an apparatus in which a plurality of gas types can be controlled in flow rate with high precision by one pressure-type flow control system.
摘要翻译：一种流体供给装置，具有从一个压力调节器分支出的多个流动管线，流动线平行布置并构造成使得打开或关闭一个流动通道对其它流动通道的稳定流动将没有暂时的影响。每个流路设置有时间延迟型质量流量控制器MFC，使得当一个封闭流体通道打开时，该流路上的质量流量控制器在起始点的特定延迟时间DELTAt中达到设定流量Qs。本发明包括通过一个压力式流量控制系统以高精度控制多种气体类型的方法和装置。

10. 发明专利

DE60036362T2 未知
公开(公告)号：DE60036362T2
公开(公告)日：2008-06-12
申请号：DE60036362
申请日：2000-07-27
申请人： TOKYO ELECTRON LTD , FUJIKIN KK , OHMI TADAHIRO , IIDA SEIICHI
发明人： OHMI TADAHIRO , IIDA SEIICHI , KAGATSUME SATOSHI , HIROSE JUN , FUKASAWA KAZUO , KOIZUMI HIROSHI , NAGAOKA HIDEKI , UNO TOMIO , NISHINO KOUJI , IKEDA NOBUKAZU , DOHI RYOUSUKE , IDETA EIJI
IPC分类号： G01F1/36 , G05B23/02 , F16K17/22 , F16K37/00 , G01D21/00 , G05D7/06
摘要： A method checks the flow rate for abnormalities while controlling the flow rate of fluid in a pressure-type flow controller FCS using an orifice - the pressure-type flow controller wherein with the upstream pressure P1 maintained about two or more times higher than the downstream pressure P2, the downstream flow rate QC is calculated by the equation QC = KP1 (K: constant) and wherein the control valve CV is controlled on the basis of the difference signal QY between the calculated flow rate QC and the set flow rate QS. The method comprises, outputting a testing signal DELTA Qs having a testing amplitude Vo from a testing circuit provided separately or a flow rate setting circuit to the control valve CV, measuring the pressure amplitude V of the variable pressure DELTA P1 of the pressure P1 on the upstream side of the orifice that arises in response to actuation of the control valve CV and setting off an alarm for the clogging of the orifice when the pressure amplitude V is smaller than a limit amplitude Vt. If the testing signal DELTA Qs is superimposed on a steady-state set flow rate signal Qso and outputted to control the valve CV from the testing circuit or the flow rate setting circuit, the flow rate can be checked for abnormalities while controlling the flow rate by the steady-state set flow rate signal Qso.

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