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1. 发明专利

JP2004119417A Rotary silicon wafer cleaning equipment 有权
公开(公告)号：JP2004119417A
公开(公告)日：2004-04-15
申请号：JP2002276818
申请日：2002-09-24
申请人： Fujikin Inc , Tadahiro Omi , Pre-Tech Co Ltd , 大見忠弘 , 株式会社フジキン , 株式会社プレテック
发明人： OMI TADAHIRO , SHIRAI YASUYUKI , FUJITA TAKUMI , MINAMI YUKIO , IKEDA SHINICHI , MORIMOTO AKIHIRO , KAWADA KOJI
IPC分类号： H01L21/304 , F26B17/24 , F26B17/30 , H01L20060101 , H01L21/00 , H01L21/02 , H01L21/30 , H01L21/302
CPC分类号： H01L21/67034 , H01L21/02052
摘要： PROBLEM TO BE SOLVED: To enhance stability of a silicon wafer furthermore by performing more complete hydrogen termination of the silicon wafer cleaned with chemical or pure water.
SOLUTION: The rotary silicon wafer cleaning equipment comprising a unit 3 for supporting/rotary driving a silicon wafer encased in a case body 2 and cleaning a silicon wafer with pure water following to chemical is further provided with a silicon wafer dryer comprising a panel 5 for supplying mixture gas of hydrogen gas and inert gas, a mixed gas supply pipe A having one end coupled with the gas mixer of the gas supply panel, a unit B for heating the mixture gas, and a unit for forming hydrogen radical at a part touching the heated high temperature mixture gas. Outer surface of the silicon wafer is dried and subjected to hydrogen termination by jetting mixture gas containing hydrogen radicals formed by the hydrogen radical forming unit onto the cleaned silicon wafer under rotation. High-degree hydrogen termination is thereby ensured and the outer surface of the Si wafer is sustained in a stable state over a long term.
COPYRIGHT: (C)2004,JPO

2. 发明专利

JP2004136163A Method of forming platinum coating catalyst layer of reaction furnace for producing moisture 有权
公开(公告)号：JP2004136163A
公开(公告)日：2004-05-13
申请号：JP2002301423
申请日：2002-10-16
申请人： Fujikin Inc , Tadahiro Omi , 大見忠弘 , 株式会社フジキン
发明人： OMI TADAHIRO , IKEDA SHINICHI , MORIMOTO AKIHIRO , KITANO MASASHI , MINAMI YUKIO , KAWADA KOJI
IPC分类号： B01J21/04 , B01J23/42 , B01J32/00 , B01J37/02 , B01J37/08 , B01J37/10 , C01B5/00
CPC分类号： B01J12/007 , B01J21/04 , B01J23/42 , B01J37/0225 , B01J37/0226 , B01J37/08 , C01B5/00
摘要： PROBLEM TO BE SOLVED: To make inexpensively and simply formable a barrier film, which is uniform in thickness, enhanced in the fixing force to a matrix and high in the protecting function of a platinum film, to the inner wall surface of the reaction space of a reaction furnace for producing moisture.
SOLUTION: In the reaction furnace for producing moisture by reacting hydrogen and oxygen without causing high temperature combustion, the reaction furnace for producing moisture is formed using an aluminum-containing alloy and the selective oxidation of aluminum is applied to the inner wall surface of the reaction furnace for producing moisture to form the barrier film based on aluminum oxide (Al
2 O
3 ). Thereafter, the platinum film is laminated and fixed to the surface of the barrier film to form a platinum coating catalyst layer.
COPYRIGHT: (C)2004,JPO

3. 发明专利

JP2005207483A Vacuum heat insulation valve 有权
标题翻译：真空热绝缘阀
公开(公告)号：JP2005207483A
公开(公告)日：2005-08-04
申请号：JP2004014032
申请日：2004-01-22
申请人： Fujikin Inc , Tadahiro Omi , 忠弘大見 , 株式会社フジキン
发明人： OMI TADAHIRO , MINAMI YUKIO , TSUBOTA KENJI , SHINOHARA TSUTOMU , YAMAJI MICHIO , IKEDA SHINICHI , MORIMOTO AKIHIRO , KAWADA KOJI , NARAI TOSHIRO
IPC分类号： F16L59/06 , F16K27/00 , F16K51/00 , F16K51/02
CPC分类号： F16K51/02 , Y10T137/6606 , Y10T137/7043 , Y10T137/7062
摘要： PROBLEM TO BE SOLVED: To provide a vacuum heat insulation valve serviceable in a high-temperature condition in a gas supply system and an exhaust system and capable of being embodied in a small size and a compact construction to a great extent owing to an excellent heat insulating performance. SOLUTION: The vacuum heat insulation valve is formed from a valve furnished with a valve body and an actuator and a vacuum heat insulation box to accommodate the valve, wherein the vacuum heat insulation box S is formed from a lower vacuum jacket S 5 in an angular shape with the box S positioned at the side and furnished with a vacuum heat insulation pipe socket J in a cylindrical shape while the over-part is left open and an upper vacuum jacket S 4 in an angular shape to be fitted to the lower vacuum jacket S 5 from above air-tightly while the under-part is left open. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供一种在气体供应系统和排气系统中可在高温条件下使用的真空隔热阀，并且能够在很大程度上体现在小尺寸和紧凑的结构中，这是由于绝热性能极佳。
解决方案：真空隔热阀由配有阀体和致动器的阀形成，以及用于容纳阀的真空隔热箱，其中真空隔热箱S由下部真空套S形成， SB> 5 ，其中盒S位于侧面并且配有真空绝热管插座J为圆柱形，而外部部件保持打开，上真空套S 4 成角度的形状，从而从空气密闭地安装到下部真空套筒S 5 ，同时底部部件打开。版权所有（C）2005，JPO＆NCIPI

4. 发明专利

JP2004214640A Sealed vessel with internal atmosphere switching mechanism 有权
公开(公告)号：JP2004214640A
公开(公告)日：2004-07-29
申请号：JP2003416848
申请日：2003-12-15
申请人： Fujikin Inc , 株式会社フジキン
发明人： MINAMI YUKIO , IKEDA SHINICHI , TANIGAWA TAKESHI , YAMAJI MICHIO , MORIMOTO AKIHIRO
IPC分类号： H01L21/673 , H01L21/68
摘要： PROBLEM TO BE SOLVED: To provide a sealed vessel which can hold vacuum or pressure and which can readily eject particles inside the vessel. SOLUTION: The vessel is constituted of a vessel body, a vessel lid which is detachably fixed on the vessel body in a sealed manner, and an internal atmosphere switching mechanism 4, which comprises a vacuum-holding valve mechanism 17 and a pressure-holding vacuum breaking valve mechanism 18. The vacuum-keeping valve mechanism 17 opens and closes the communicating passages 19 to 22 for communication between the inside of the vessel body and the outside of the vessel lid. The vacuum-holding valve mechanism 17 is configured so that a valve is opened to produce vacuum in the vessel body, when vacuum is produced in an operation space, formed outside the container lid and the valve, is opened to hold a predetermined vacuum level in the vessel body, when the operation space is opened to the atmosphere. The pressure-holding vacuum breaking valve mechanism 18 is configured so that a valve will be closed to pressurize the vessel body, when the operation space is pressurized, and the valve will be closed to hold a predetermined pressure level in the vessel body when the operation space is opened to the atmosphere. COPYRIGHT: (C)2004,JPO&NCIPI

5. 发明专利

JP2006027974A Reaction furnace for generating water and water generating and supplying equipment using it 有权
标题翻译：用于生成水和水的产生和供应设备的反应炉
公开(公告)号：JP2006027974A
公开(公告)日：2006-02-02
申请号：JP2004211129
申请日：2004-07-20
申请人： Fujikin Inc , 株式会社フジキン
发明人： NARAI TOSHIRO , KAWADA KOJI , HIRAO YOSHIYUKI , MINAMI YUKIO , MORIMOTO AKIHIRO , IKEDA SHINICHI
IPC分类号： C01B5/00
CPC分类号： B01J12/007 , B01J2219/00078 , B01J2219/00087 , B01J2219/00096 , B01J2219/00135 , C01B5/00 , F28D2021/0029 , F28F3/02 , H01L21/67017
摘要： PROBLEM TO BE SOLVED: To double the amount of the generated water safely with a reaction furnace for generating water having a limited volume capacity by enhancing the heat dissipation characteristics of the reaction furnace body in a reaction furnace for generating water. SOLUTION: The reaction furnace for generating water is comprised of causing the reaction of hydrogen and oxygen under a non-combustion condition by activating the reactivities of hydrogen and oxygen which are supplied into the reaction furnace body by contacting them with a platinum-coated catalyst layer, wherein the cooler is formed by an exit side cooler constructed of a base plate which is fixed on the outer surface of the exit side furnace body material and has an insertion hole drilled in the center thereof for a heater, and of a plurality of heat dissipation members which are erected vertically and in parallel on the part other than the insertion hole for the heater of the base plate, and a part of the heater is inserted through the insertion hole for the heater of the exit side cooler and fixed to the outer surface of the exit side furnace body material. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：通过在用于产生水的反应炉中提高反应炉体的散热特性，通过用于产生具有有限体积容量的水的反应炉来安全地使产生的水量增加一倍。解决方案：用于产生水的反应炉包括在非燃烧条件下使氢和氧的反应通过活化与反应炉体中的氢和氧的反应性，使其与铂 - 涂布催化剂层，其中，所述冷却器由出口侧冷却器形成，所述出口侧冷却器由基板固定，所述基板固定在所述出口侧炉体材料的外表面上，并且在其中心钻有用于加热器的插入孔，在基板的加热器的插入孔以外的部分上垂直设置的多个散热构件，并且一部分加热器插入通过用于出口侧冷却器的加热器的插入孔并固定到出口侧炉体材料的外表面。版权所有（C）2006，JPO＆NCIPI

6. 发明专利

JP2012036027A Reaction furnace for moisture generation 有权
标题翻译：水分生成反应炉
公开(公告)号：JP2012036027A
公开(公告)日：2012-02-23
申请号：JP2010175790
申请日：2010-08-04
申请人： Fujikin Inc , Tohoku Univ , 国立大学法人東北大学 , 株式会社フジキン
发明人： OMI TADAHIRO , KAWADA KOJI , IKEDA SHINICHI , MORIMOTO AKIHIRO , MINAMI YUKIO , HIRAO KEISHI , SAKAMOTO SHINJI , KITANO MASASHI
IPC分类号： C01B5/00 , B01J23/63
摘要： PROBLEM TO BE SOLVED: To provide a reaction furnace for moisture generation, which generates moisture with a high purity at a catalyst reaction temperature lower than ignition temperatures of a hydrogen gas and an oxygen gas without burning by supplying and catalytically reacting the hydrogen gas and the oxygen gas into a reaction furnace having a platinum catalyst layer, and which maintains the catalytic performance of the platinum catalyst layer for a long period of time and maintains the adherence to a barrier layer installed in between the platinum catalyst layer and a reaction-furnace base material.SOLUTION: The reaction furnace for moisture generation includes a reaction furnace body having a gas entrance and a moisture exit formed thereon, a barrier layer formed on the internal surface of the reaction furnace body, and a platinum catalyst layer formed on the barrier layer. The barrier layer contains YOwith a content of 90-99.5 wt.% and a metal oxide with a content of 0.5-10 wt.%, the metal oxide being other than YOand having -200 kJ/mol or lower of standard enthalpy change of formation per 1 mol of single bond between a metal atom and an oxygen atom.
摘要翻译：要解决的问题：提供一种用于产生水分的反应炉，其在低于氢气和氧气的点火温度的催化剂反应温度下产生高纯度的水分，而不会通过供应氢气和催化氢反应而燃烧气体和氧气进入具有铂催化剂层的反应炉中，并且长时间保持铂催化剂层的催化性能并保持与安装在铂催化剂层和反应之间的阻挡层的粘附 - 基础材料。解决方案：用于产生水分的反应炉包括：反应炉体，其具有形成在其上的气体入口和湿气出口;形成在反应炉主体的内表面上的阻挡层，以及形成在该阻挡层上的铂催化剂层层。阻挡层含有含量为90-99.5重量％的Y 2 O 3 0.5-10重量％，金属氧化物不同于Y 3 ，并且具有-200kJ / mol以下每1mol金属原子和氧原子之间的单键形成的标准焓变。版权所有（C）2012，JPO＆INPIT

7. 发明专利

JP2010254525A Reaction furnace for moisture generation 有权
标题翻译：水分生成反应炉
公开(公告)号：JP2010254525A
公开(公告)日：2010-11-11
申请号：JP2009107139
申请日：2009-04-24
申请人： Fujikin Inc , Tohoku Univ , 国立大学法人東北大学 , 株式会社フジキン
发明人： OMI TADAHIRO , KAWADA KOJI , IKEDA SHINICHI , MORIMOTO AKIHIRO , MINAMI YUKIO , HIRAO KEISHI , SAKAMOTO SHINJI , KITANO MASASHI
IPC分类号： C01B5/00 , B01J23/42
CPC分类号： B01J23/63 , B01J12/007 , B01J23/42 , B01J35/023 , B01J37/0225 , B01J37/0244 , C01B5/00
摘要： PROBLEM TO BE SOLVED: To provide a reaction furnace which is one for generating high-purity moisture by feeding a hydrogen gas and an oxygen gas into a reaction furnace having a platinum catalyst layer and catalytically reacting them with each other without combustion at a catalytic reaction temperature lower than the point of ignition of the hydrogen gas/oxygen gas mixture, wherein a barrier layer interposed between a base material and the platinum catalyst can keep a high force of adhesion to the platinum catalyst layer for a long time. SOLUTION: The reaction furnace includes a reaction furnace body provided with a gas inlet and a moisture outlet, a Y 2 O 3 barrier layer formed as a film on at least part of the inner wall of the reaction furnace body, and a platinum catalyst layer formed as a film on at least part of the Y 2 O 3 barrier layer. The film thickness of the Y 2 O 3 barrier layer is desirably 50 nm to 5 μm. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于通过将氢气和氧气供给到具有铂催化剂层的反应炉中并且在没有燃烧的情况下彼此催化反应的情况下产生高纯度水分的反应炉催化反应温度低于氢气/氧气混合物的点火点，其中介于基材和铂催化剂之间的阻挡层可以长时间保持对铂催化剂层的高粘附力。解决方案：反应炉包括反应炉体，该反应炉主体设置有气体入口和水分出口，在其上形成为薄膜的Y 2 3 3 阻挡层反应炉体的内壁的至少一部分，以及在至少部分Y 2 SB 3 O 3 SB 3阻挡层上形成为薄膜的铂催化剂层。 Y 2 阻挡层的膜厚度优选为50nm〜5μm。版权所有（C）2011，JPO＆INPIT

8. 发明专利

AU2003264411A8 Rotary silicon wafer cleaning apparatus 未知
公开(公告)号：AU2003264411A8
公开(公告)日：2004-05-04
申请号：AU2003264411
申请日：2003-09-11
申请人： FUJIKIN KK , OHMI TADAHIRO , PRE TECH CO LTD
发明人： OHMI TADAHIRO , SHIRAI YASUYUKI , FUJITA TAKUMI , MINAMI YUKIO , IKEDA NOBUKAZU , MORIMOTO AKIHIRO , KAWADA KOJI
IPC分类号： H01L21/304 , F26B17/24 , F26B17/30 , H01L20060101 , H01L21/00 , H01L21/02 , H01L21/30 , H01L21/302
摘要： A rotary silicon wafer cleaning apparatus capable of enhancing the stability of silicon wafer through perfecting of the hydrogen termination for silicon wafer having undergone cleaning operation with the use of chemicals and pure water. The rotary silicon wafer cleaning apparatus comprises a silicon wafer drying equipment, the silicon wafer drying equipment composed of a mixed gas heating unit for heating a mixed gas consisting of a hydrogen gas, the hydrogen gas containing gaseous hydrogen in an amount of 0.05 vol.% or more, and an inert gas and a hydrogen radical generating unit provided with a platinum coating film capable of forming hydrogen radicals at portion in contact with the heated mixed gas, wherein a mixed gas containing hydrogen radicals generated by the hydrogen radical generating unit is jetted on a rotating silicon wafer after cleaning operation so that the drying and hydrogen termination treatment of the external surface of silicon wafer are simultaneously carried out.

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