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1. 发明专利

JP2004265928A Valve for evacuation system 有权
公开(公告)号：JP2004265928A
公开(公告)日：2004-09-24
申请号：JP2003034762
申请日：2003-02-13
申请人： Fujikin Inc , Tadahiro Omi , 忠弘大見 , 株式会社フジキン
发明人： OMI TADAHIRO , IKEDA SHINICHI , YAMAJI MICHIO , KITANO MASASHI , MORIMOTO AKIHIRO
IPC分类号： H01L21/205 , F16K7/14 , F16K27/00 , F16K51/02
CPC分类号： F16K7/14 , F16K27/003 , F16K51/02
摘要： PROBLEM TO BE SOLVED: To provide a valve to prevent internal corrosion or clogging, sheet leak, and the like, due to deposition of dissociated products resulting from decomposition of gas as the scale of an evacuation system facility is reduced and the diameter of the piping in the evacuation system is decreased in order to reduce the cost and to shorten the evacuation time. SOLUTION: The valve for evacuation system comprises a body 2 provided with a valve seat 8 on the bottom face of a valve chamber 7 communicating with an inflow channel 5 and an outflow channel 6, a valve element seated in the valve seat or unseated therefrom, and a drive means 4 for seating the valve element in the valve seat or unseating it therefrom. In the valve 1 for controlling flow of fluid by seating the valve element in the valve seat or unseating it therefrom thereby interrupting or opening the channel, at least the surface of the body 2 touching the fluid is subjected to aluminium passivation. COPYRIGHT: (C)2004,JPO&NCIPI

2. 发明专利

JP2004263576A Diaphragm valve for evacuation system 有权
公开(公告)号：JP2004263576A
公开(公告)日：2004-09-24
申请号：JP2003039541
申请日：2003-02-18
申请人： Fujikin Inc , Tadahiro Omi , 忠弘大見 , 株式会社フジキン
发明人： OMI TADAHIRO , IKEDA SHINICHI , YAMAJI MICHIO , KITANO MASASHI , MORIMOTO AKIHIRO
IPC分类号： F04B45/04 , F16K7/16 , F16K51/02
CPC分类号： F16K7/16 , F16K51/02
摘要： PROBLEM TO BE SOLVED: To prevent seat leak, corrosion of a member caused by deposition and adherence of products generated by heat decomposition of gas, or clogging with the products, and to respond to size reduction of equipment of an evacuation system resulting in lowering a cost, and reduction in diameter of piping of the evacuation system for shortening evacuation time, in a diaphragm valve for a evacuation system applied to semiconductor manufacturing equipment.
SOLUTION: The diaphragm valve 1 comprises: a body 2 having an inflow passage 6, an outflow passage 7, and a valve seat 8 formed therebetween; a diaphragm 3 disposed to the body 2 and brought into contact with or separated from the valve seat 8; and a drive means 4 disposed to the body 2 and makes the diaphragm 3 contact with or separated from the valve seat 8. A predetermined thickness of synthetic resin coat 5 is applied to a fluid contact part 25 between the body 2 and the diaphragm 3.
COPYRIGHT: (C)2004,JPO&NCIPI

3. 发明专利

JP2008103754A Method of using valve for vacuum evacuation system 有权
标题翻译：使用阀门进行真空脱气系统的方法
公开(公告)号：JP2008103754A
公开(公告)日：2008-05-01
申请号：JP2007318195
申请日：2007-12-10
申请人： Fujikin Inc , Tadahiro Omi , 忠弘大見 , 株式会社フジキン
发明人： OMI TADAHIRO , IKEDA SHINICHI , YAMAJI MICHIO , KITANO MASASHI , MORIMOTO AKIHIRO
IPC分类号： H01L21/205 , C23C16/44
摘要： PROBLEM TO BE SOLVED: To provide a method for using a valve which prevents internal corrosion or clogging, seat leakage, and the like, owing to deposition of dissociated products resulting from decomposition of gas, as the scale of a vacuum evacuation system facility is reduced and the diameter of the piping in the evacuation system is decreased in order to reduce the cost and to shorten the evacuation time.
SOLUTION: The valve for the vacuum evacuation system includes aluminum passivity on the part thereof that is brought into contact with a fluid gas. By using the valve for the vacuum evacuation system, the decomposition of the gas owing to the rise in temperature is perfectly controlled even if an inner wall of a pipe in the valve for the vacuum evacuation system is heated at high temperature on baking, thereby preventing: the adhesion of gas decomposition products and water; the corrosion or clogging in the inner wall of the pipe; and the occurrence of the seat leakage.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种使用防止内部腐蚀或堵塞，阀座泄漏等的阀，由于气体分解产生的离解产物的沉积，作为真空排气系统的规模设备减少，并且减少系统中管道的直径减小，以便降低成本并缩短撤离时间。解决方案：用于真空排气系统的阀包括与流体气体接触的部分的铝被动。通过使用真空抽气系统的阀门，即使在真空抽真空系统的阀门中的管道的内壁在烘烤时在高温下被加热，也能够完全控制由于温度上升引起的气体分解，从而防止：气体分解产物和水的附着力; 管内壁的腐蚀或堵塞; 并发生座位泄漏。版权所有（C）2008，JPO＆INPIT

4. 发明专利

JP2004273472A Member for plasma processing system, member for processing system, plasma processing system, processing system, and plasma processing method 审中-公开
公开(公告)号：JP2004273472A
公开(公告)日：2004-09-30
申请号：JP2003028476
申请日：2003-02-05
申请人： Tadahiro Omi , Tokyo Electron Ltd , 忠弘大見 , 東京エレクトロン株式会社
发明人： OMI TADAHIRO , SHIRAI YASUYUKI , KITANO MASASHI
IPC分类号： C23C16/44 , C23C8/36 , C23C16/511 , H01J37/32 , H01L21/3065 , H01L21/31
CPC分类号： H01J37/32467 , C23C8/36
摘要： PROBLEM TO BE SOLVED: To form a dense oxide coating having enhanced corrosion resistance by modifying the surface of an aluminum alloy.
SOLUTION: An article T of aluminum alloy to be processed in a processing chamber 2 is set at a specified temperature and oxygen gas mixed with argon or krypton is introduced from a processing gas source 13 into the processing chamber 2. Plasma is generated in the processing chamber 2 by supplying microwaves from a microwave supply device 37 and the surface of the article T is subjected to radical oxidation with oxygen radicals generated from the plasma. Consequently, a dense oxide coating having enhanced corrosion resistance is formed on the surface of the article being processed.
COPYRIGHT: (C)2004,JPO&NCIPI

5. 发明专利

JP2004278308A Pump 有权
公开(公告)号：JP2004278308A
公开(公告)日：2004-10-07
申请号：JP2003066689
申请日：2003-03-12
申请人： Tadahiro Omi , 忠弘大見
发明人： OMI TADAHIRO , SHIRAI YASUYUKI , KITANO MASASHI
IPC分类号： F04B39/00 , F04B37/16 , F04C18/16 , F04C25/02 , F04C29/00
CPC分类号： F04C18/16 , F04C2220/12 , F04C2230/92 , F04C2280/04 , F05C2201/903 , F05C2203/0869
摘要： PROBLEM TO BE SOLVED: To solve the problem of being unable to reduce weight and the size of a vacuum pump as a result of requiring to constitute the vacuum pump of a highly corrosion resisting material for exhausting strongly reactive gas in a vacuum processing system for performing plasma oxidation. SOLUTION: A member for constituting the vacuum pump is composed of aluminum or an aluminum alloy. A dense and flat aluminum oxide coating film is formed by applying plasma oxidation processing and oxidation processing by an oxygen radical to a member surface, and the highly corrosion resisting vacuum pump is constituted thereby. COPYRIGHT: (C)2005,JPO&NCIPI

6. 发明专利

JP2004262133A Resin molding machine and member having passive state film 有权
公开(公告)号：JP2004262133A
公开(公告)日：2004-09-24
申请号：JP2003055909
申请日：2003-03-03
申请人： Tadahiro Omi , 忠弘大見
发明人： OMI TADAHIRO , KITANO MASASHI , TANAHASHI NAOKI
IPC分类号： B29C33/38 , B29C33/56 , B29C45/17 , B29C45/37 , B29K23/00 , B29L11/00 , C23C8/10 , C23C8/14 , C23C8/18 , C23C30/00
CPC分类号： B29C33/56 , B29C33/38 , B29C45/37 , B29L2031/3475 , C23C8/10 , C23C8/14 , C23C8/18 , C23C30/00 , Y10S425/808
摘要： PROBLEM TO BE SOLVED: To drastically-improve a yield by eliminating foreign substances caused by the degradation of a molten resin to be mixed into a molding.
SOLUTION: A resin molding machine is composed of a member for the resin molding machine which has a surface contacted with the molten resin and in which at least part of the contact surface is covered with a matrix material or the oxidized film of a component of a part contained in the matrix material. By doing molding with the use of the member, the mixing of the foreign substances associated with the degradation of the molten resin into the molding can be prevented.
COPYRIGHT: (C)2004,JPO&NCIPI

7. 发明专利

JP2005109041A Production device system 有权
标题翻译：生产设备系统
公开(公告)号：JP2005109041A
公开(公告)日：2005-04-21
申请号：JP2003338681
申请日：2003-09-29
申请人： Tadahiro Omi , Taiyo Nippon Sanso Corp , Tokyo Electron Ltd , 忠弘大見 , 大陽日酸株式会社 , 東京エレクトロン株式会社
发明人： OMI TADAHIRO , SHIRAI YASUYUKI , KITANO MASASHI
IPC分类号： C23C16/44 , H01L21/205 , H01L21/3065
摘要： PROBLEM TO BE SOLVED: To inhibit the adsorption and adhesion of unwanted gas molecules and the unwanted adhesion or deposition of gas decomposition products on a substrate treating chamber and the internal surface of an exhaust piping system.
SOLUTION: A production device system for a semiconductor device, a plate display, a solar cell or a magnetic-substance sheet metal with the substrate treating chamber 1 has an inlet port and a discharge opening for a gas, a vacuum pump 4 for reducing the pressure of the treating chamber, exhaust piping 15 connected to the pump and a gas-removing device, and a gas recovery device 7 connected to exhaust pipe. A part or the whole of the metallic surface of a contacting fluid section, brought into contact with the gas with the treating chamber, the pump, the exhaust piping, the gas removing device, and the gas recovery device, are composed of a member coated with a protective film. In the production device system, a part or the whole of the contacting fluid section of the member coated with the protective film are controlled to a prescribed temperature.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：抑制不需要的气体分子的吸附和粘附以及气体分解产物在基材处理室和排气管道系统的内表面上的不期望的粘附或沉积。解决方案：具有基板处理室1的半导体装置，板显示器，太阳能电池或磁性物质金属板的生产装置系统具有用于气体的入口和排出口，真空泵4 用于降低处理室的压力，连接到泵的排气管道15和气体去除装置，以及连接到排气管的气体回收装置7。与处理室，泵，排气管道，气体去除装置和气体回收装置接触的接触流体部分的金属表面的一部分或全部由涂覆的部件带有保护膜。在生产装置系统中，涂覆有保护膜的构件的接触流体部分的一部分或全部被控制到规定的温度。版权所有（C）2005，JPO＆NCIPI

8. 发明专利

JP2004136163A Method of forming platinum coating catalyst layer of reaction furnace for producing moisture 有权
公开(公告)号：JP2004136163A
公开(公告)日：2004-05-13
申请号：JP2002301423
申请日：2002-10-16
申请人： Fujikin Inc , Tadahiro Omi , 大見忠弘 , 株式会社フジキン
发明人： OMI TADAHIRO , IKEDA SHINICHI , MORIMOTO AKIHIRO , KITANO MASASHI , MINAMI YUKIO , KAWADA KOJI
IPC分类号： B01J21/04 , B01J23/42 , B01J32/00 , B01J37/02 , B01J37/08 , B01J37/10 , C01B5/00
CPC分类号： B01J12/007 , B01J21/04 , B01J23/42 , B01J37/0225 , B01J37/0226 , B01J37/08 , C01B5/00
摘要： PROBLEM TO BE SOLVED: To make inexpensively and simply formable a barrier film, which is uniform in thickness, enhanced in the fixing force to a matrix and high in the protecting function of a platinum film, to the inner wall surface of the reaction space of a reaction furnace for producing moisture.
SOLUTION: In the reaction furnace for producing moisture by reacting hydrogen and oxygen without causing high temperature combustion, the reaction furnace for producing moisture is formed using an aluminum-containing alloy and the selective oxidation of aluminum is applied to the inner wall surface of the reaction furnace for producing moisture to form the barrier film based on aluminum oxide (Al
2 O
3 ). Thereafter, the platinum film is laminated and fixed to the surface of the barrier film to form a platinum coating catalyst layer.
COPYRIGHT: (C)2004,JPO

9. 发明专利

JP2012036027A Reaction furnace for moisture generation 有权
标题翻译：水分生成反应炉
公开(公告)号：JP2012036027A
公开(公告)日：2012-02-23
申请号：JP2010175790
申请日：2010-08-04
申请人： Fujikin Inc , Tohoku Univ , 国立大学法人東北大学 , 株式会社フジキン
发明人： OMI TADAHIRO , KAWADA KOJI , IKEDA SHINICHI , MORIMOTO AKIHIRO , MINAMI YUKIO , HIRAO KEISHI , SAKAMOTO SHINJI , KITANO MASASHI
IPC分类号： C01B5/00 , B01J23/63
摘要： PROBLEM TO BE SOLVED: To provide a reaction furnace for moisture generation, which generates moisture with a high purity at a catalyst reaction temperature lower than ignition temperatures of a hydrogen gas and an oxygen gas without burning by supplying and catalytically reacting the hydrogen gas and the oxygen gas into a reaction furnace having a platinum catalyst layer, and which maintains the catalytic performance of the platinum catalyst layer for a long period of time and maintains the adherence to a barrier layer installed in between the platinum catalyst layer and a reaction-furnace base material.SOLUTION: The reaction furnace for moisture generation includes a reaction furnace body having a gas entrance and a moisture exit formed thereon, a barrier layer formed on the internal surface of the reaction furnace body, and a platinum catalyst layer formed on the barrier layer. The barrier layer contains YOwith a content of 90-99.5 wt.% and a metal oxide with a content of 0.5-10 wt.%, the metal oxide being other than YOand having -200 kJ/mol or lower of standard enthalpy change of formation per 1 mol of single bond between a metal atom and an oxygen atom.
摘要翻译：要解决的问题：提供一种用于产生水分的反应炉，其在低于氢气和氧气的点火温度的催化剂反应温度下产生高纯度的水分，而不会通过供应氢气和催化氢反应而燃烧气体和氧气进入具有铂催化剂层的反应炉中，并且长时间保持铂催化剂层的催化性能并保持与安装在铂催化剂层和反应之间的阻挡层的粘附 - 基础材料。解决方案：用于产生水分的反应炉包括：反应炉体，其具有形成在其上的气体入口和湿气出口;形成在反应炉主体的内表面上的阻挡层，以及形成在该阻挡层上的铂催化剂层层。阻挡层含有含量为90-99.5重量％的Y 2 O 3 0.5-10重量％，金属氧化物不同于Y 3 ，并且具有-200kJ / mol以下每1mol金属原子和氧原子之间的单键形成的标准焓变。版权所有（C）2012，JPO＆INPIT

10. 发明专利

JP2010254525A Reaction furnace for moisture generation 有权
标题翻译：水分生成反应炉
公开(公告)号：JP2010254525A
公开(公告)日：2010-11-11
申请号：JP2009107139
申请日：2009-04-24
申请人： Fujikin Inc , Tohoku Univ , 国立大学法人東北大学 , 株式会社フジキン
发明人： OMI TADAHIRO , KAWADA KOJI , IKEDA SHINICHI , MORIMOTO AKIHIRO , MINAMI YUKIO , HIRAO KEISHI , SAKAMOTO SHINJI , KITANO MASASHI
IPC分类号： C01B5/00 , B01J23/42
CPC分类号： B01J23/63 , B01J12/007 , B01J23/42 , B01J35/023 , B01J37/0225 , B01J37/0244 , C01B5/00
摘要： PROBLEM TO BE SOLVED: To provide a reaction furnace which is one for generating high-purity moisture by feeding a hydrogen gas and an oxygen gas into a reaction furnace having a platinum catalyst layer and catalytically reacting them with each other without combustion at a catalytic reaction temperature lower than the point of ignition of the hydrogen gas/oxygen gas mixture, wherein a barrier layer interposed between a base material and the platinum catalyst can keep a high force of adhesion to the platinum catalyst layer for a long time. SOLUTION: The reaction furnace includes a reaction furnace body provided with a gas inlet and a moisture outlet, a Y 2 O 3 barrier layer formed as a film on at least part of the inner wall of the reaction furnace body, and a platinum catalyst layer formed as a film on at least part of the Y 2 O 3 barrier layer. The film thickness of the Y 2 O 3 barrier layer is desirably 50 nm to 5 μm. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于通过将氢气和氧气供给到具有铂催化剂层的反应炉中并且在没有燃烧的情况下彼此催化反应的情况下产生高纯度水分的反应炉催化反应温度低于氢气/氧气混合物的点火点，其中介于基材和铂催化剂之间的阻挡层可以长时间保持对铂催化剂层的高粘附力。解决方案：反应炉包括反应炉体，该反应炉主体设置有气体入口和水分出口，在其上形成为薄膜的Y 2 3 3 阻挡层反应炉体的内壁的至少一部分，以及在至少部分Y 2 SB 3 O 3 SB 3阻挡层上形成为薄膜的铂催化剂层。 Y 2 阻挡层的膜厚度优选为50nm〜5μm。版权所有（C）2011，JPO＆INPIT

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