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1. 发明专利

JP2011175703A Magnetic recording medium and manufacturing method thereof 审中-公开
标题翻译：磁记录介质及其制造方法
公开(公告)号：JP2011175703A
公开(公告)日：2011-09-08
申请号：JP2010038815
申请日：2010-02-24
申请人： Fuji Electric Device Technology Co Ltd , 富士電機デバイステクノロジー株式会社
发明人： UCHIDA SHINJI
IPC分类号： G11B5/65 , G11B5/738 , G11B5/82 , G11B5/84 , G11B5/855
CPC分类号： G11B5/855 , B82Y10/00 , G11B5/59688 , G11B5/743 , G11B5/82 , G11B5/865
摘要： PROBLEM TO BE SOLVED: To provide a magnetic recording medium without need of separately writing servo information.
SOLUTION: The magnetic recording medium includes a data region for recording data and servo information that is disposed adjacent to the data region and contains information for controlling a magnetic head. The data region has a pattern of dots separated from each other by grooves or nonmagnetic material. The servo region lacks the pattern of dots, and includes magnetic information written in a flat region.
COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供磁记录介质，而不需要单独写入伺服信息。解决方案：磁记录介质包括用于记录数据的数据区域和与数据区域相邻设置的伺服信息，并且包含用于控制磁头的信息。数据区具有由凹槽或非磁性材料彼此分开的点图案。伺服区域缺少点图案，并且包括写在平坦区域中的磁信息。版权所有（C）2011，JPO＆INPIT

2. 发明专利

JP2011129168A Anodic oxidation device and method for manufacturing magnetic disk medium using the same 审中-公开
标题翻译：阳极氧化装置及使用其制造磁性介质的方法
公开(公告)号：JP2011129168A
公开(公告)日：2011-06-30
申请号：JP2009283532
申请日：2009-12-15
申请人： Fuji Electric Device Technology Co Ltd , 富士電機デバイステクノロジー株式会社
发明人： UCHIDA SHINJI
IPC分类号： G11B5/84 , C25D17/10 , C25D17/12 , G11B5/855
摘要： PROBLEM TO BE SOLVED: To provide a manufacturing device and manufacturing method for forming magnetic dots the fluctuation of which is suppressed in a pattern medium, using an alumina nanohole.
SOLUTION: A plurality of substrate electrodes to be connected to an outer circumference of a substrate of a magnetic disk medium are used in an anodic oxidation treatment step for forming alumina the nanohole; and when a center of the substrate is used as a vertex of an angle and a line connecting an outer circumferential-direction end part of the substrate electrode to the center of the substrate is used as a side of the angle, an angles formed facing two sides of adjacent substrate electrodes is specified as being smaller than 180°. The substrate electrode is, preferably, formed of two semi-circular electrodes.
COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供一种使用氧化铝纳米孔在图案介质中形成抑制波动的磁性点的制造装置和制造方法。解决方案：在用于在纳米孔中形成氧化铝的阳极氧化处理步骤中使用与磁盘介质的基板的外周连接的多个基板电极; 使用基板的中心作为角度的顶点，将基板电极的外周方向端部与基板的中心连接的线作为角度的一侧，形成为两面的角度相邻基板电极的侧面被规定为小于180°。基板电极优选由两个半圆形电极形成。版权所有（C）2011，JPO＆INPIT

3. 发明专利

JP2011005732A Imprint apparatus 审中-公开
标题翻译： IMPRINT APPARATUS
公开(公告)号：JP2011005732A
公开(公告)日：2011-01-13
申请号：JP2009151124
申请日：2009-06-25
申请人： Fuji Electric Device Technology Co Ltd , 富士電機デバイステクノロジー株式会社
发明人： MATSUSHITA TAKESHI , UCHIDA SHINJI
IPC分类号： B29C59/02 , B29C33/50 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To make a stamper and a molded material separable in high reliability in an imprint apparatus for transferring the uneven pattern of the stamper to the molded material.SOLUTION: The imprint apparatus has a suction holding means for sucking/holding the stampers 14 and 16 and an elastic deformation means for elastically deforming the stampers 14 and 16 held by the suction holding means to urge the separation of the molded material 12 and the stampers 14 and 16 from each other. The suction holding means can exert suction power on the periphery of the stamper, and the elastic deformation means can deform the stamper to make the central part of the stamper protrude toward the molded material.
摘要翻译：要解决的问题：在压印装置中制造压模和模塑材料，以便将压模的不均匀图案转印到模制材料上，可靠地分离。解决方案：压印装置具有用于吸附/保持压模的吸附保持装置 14和16以及用于使由吸引保持装置保持的冲压机14和16弹性变形以促使模制材料12和冲压机14和16彼此分离的弹性变形装置。吸引保持装置可以对压模的周边施加吸力，并且弹性变形装置可以使压模变形，使得压模的中心部分向模制材料突出。

4. 发明专利

JP2010146682A Transfer device 有权
标题翻译：传输设备
公开(公告)号：JP2010146682A
公开(公告)日：2010-07-01
申请号：JP2008325921
申请日：2008-12-22
申请人： Fuji Electric Device Technology Co Ltd , 富士電機デバイステクノロジー株式会社
发明人： MATSUSHITA TAKESHI , KATANO TOMONORI , UCHIDA SHINJI
IPC分类号： G11B5/84 , B29C59/02 , H01L21/027
CPC分类号： B29C59/022 , B29C2059/023 , G11B5/855 , Y10S425/81
摘要： PROBLEM TO BE SOLVED: To easily and quickly remove a stamper from a substrate after a transfer process, and clean an atmosphere in a transfer device. SOLUTION: A protruding mechanism which separates a substrate D for a recording medium from stampers STA and STB after transfer is formed by a sleeve 50 and a coil spring 78, which are movably provided in a stamp-moving stand 68 having an exhaust passage 68a, and a sleeve 40 and a coil spring 38 which are movably provided in a stamp-fixing stand 28 having an exhaust passage 28a. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：在转移处理之后容易且快速地从基板上移除压模，并清洁转印装置中的气氛。解决方案：通过套筒50和螺旋弹簧78形成一个将记录介质的基板D与压印机STA和STB分离的突起机构，该套筒50和螺旋弹簧78可移动地设置在具有排气口的冲压移动架68中通道68a以及可移动地设置在具有排气通道28a的印章固定架28中的套筒40和螺旋弹簧38。版权所有（C）2010，JPO＆INPIT

5. 发明专利

JP2009117013A Method for manufacturing magnetic recording medium 审中-公开
标题翻译：制造磁记录介质的方法
公开(公告)号：JP2009117013A
公开(公告)日：2009-05-28
申请号：JP2007292346
申请日：2007-11-09
申请人： Fuji Electric Device Technology Co Ltd , 富士電機デバイステクノロジー株式会社
发明人： UCHIDA SHINJI
IPC分类号： G11B5/84 , G11B5/851
CPC分类号： G11B5/8404
摘要： PROBLEM TO BE SOLVED: To provide a method for manufacturing discrete track media and patterned media, which enables a magnetic recording layer having excellent magnetic characteristics to be obtained without imparting damage to a crystal orientation control layer which becomes a surface when forming the magnetic recording layer.
SOLUTION: The method for manufacturing the magnetic recording media includes: a step of forming a soft magnetic layer on a substrate; a step of forming a first crystal orientation control layer on the soft magnetic layer; a step of providing a depression in at least part of the first crystal orientation control layer; a step of performing heat treatment of the first crystal orientation control layer; and a step of forming a magnetic recording layer on the first crystal orientation control layer.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：解决的问题：提供一种用于制造离散轨道介质和图案化介质的方法，其使得能够获得具有优异磁特性的磁记录层，而不会对成为表面的晶体取向控制层造成损害磁记录层。解决方案：磁记录介质的制造方法包括：在基板上形成软磁性层的工序; 在软磁性层上形成第一晶体取向控制层的步骤; 在所述第一晶体取向控制层的至少一部分中设置凹陷的步骤; 执行第一晶体取向控制层的热处理的步骤; 以及在第一晶体取向控制层上形成磁记录层的步骤。版权所有（C）2009，JPO＆INPIT

6. 发明专利

JP2008126450A Mold, manufacturing method therefor and magnetic recording medium 审中-公开
标题翻译：模具及其制造方法及磁记录介质
公开(公告)号：JP2008126450A
公开(公告)日：2008-06-05
申请号：JP2006312058
申请日：2006-11-17
申请人： Fuji Electric Device Technology Co Ltd , 富士電機デバイステクノロジー株式会社
发明人： UCHIDA SHINJI
IPC分类号： B29C33/38 , B29L17/00 , B81C99/00 , G11B5/65 , G11B5/84 , H01L21/027
CPC分类号： G03F7/0017 , B82Y10/00 , B82Y40/00 , G03F7/0002 , Y10T428/24479
摘要： PROBLEM TO BE SOLVED: To provide a mold which can inexpensively provide a magnetic recording medium capable of obtaining a signal having higher signal intensity and a high S/N by a nanoimprint, a manufacturing method therefor and a magnetic recording medium made by using the mold. SOLUTION: The manufacturing method for the mold used for the nanoimprint has at least a transfer process which transfers an uneven pattern on a resist layer by peeling a master mold having an uneven pattern after press-bonding the master mold to a resist layer formed on the surface of a substrate, and an uneven pattern forming process which forms the uneven pattern on the substrate by exposing an under substrate in a recessed part of the resist where the uneven pattern is formed by the transfer process and etching the exposed substrate. The manufacturing method for the mold is characterized in that the substrate is side etched during the substrate etching in the uneven pattern forming process. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：解决的问题：提供一种能够廉价地提供能够通过纳米压印获得具有较高信号强度和高S / N的信号的磁记录介质的模具，其制造方法和由使用模具。解决方案：用于纳米压印的模具的制造方法至少具有通过在将母模压接到抗蚀剂层之后剥离具有不均匀图案的母模而在抗蚀剂层上转印不均匀图案的转印工艺形成在基板的表面上，以及凹凸图案形成工艺，其通过在转印工艺中形成不均匀图案的抗蚀剂的凹部中暴露下面的基板，并蚀刻暴露的基板，在基板上形成凹凸图案。模具的制造方法的特征在于，在不均匀图案形成工序中，在基板蚀刻期间对基板进行侧面蚀刻。版权所有（C）2008，JPO＆INPIT

7. 发明专利

JP2011181123A Method of manufacturing magnetic recording medium 审中-公开
标题翻译：制造磁记录介质的方法
公开(公告)号：JP2011181123A
公开(公告)日：2011-09-15
申请号：JP2010041807
申请日：2010-02-26
申请人： Fuji Electric Device Technology Co Ltd , 富士電機デバイステクノロジー株式会社
发明人： UCHIDA SHINJI
IPC分类号： G11B5/84
CPC分类号： G11B5/855 , C23C14/042 , C23C14/48
摘要： PROBLEM TO BE SOLVED: To provide a method of manufacturing a magnetic recording medium of excellent productivity which does not deteriorate a ratio (duty) of a magnetic portion and a separating portion caused by the horizontal expansion of a magnetic characteristic damage, and is manufactured by a simple method. SOLUTION: The method includes a separating portion forming process. The process alters magnetic characteristics of a magnetic recording layer at positions corresponding to concave portions of a mask layer by ion implantation or exposure to an activated halogen-containing reactive gas via the mask layer having a concavo-convex pattern formed thereon by imprinting, thereby forming the separating portion that magnetically separates magnetic portions of the magnetic recording layer in positions corresponding to convex portions of the mask layer. A resist material forming the mask layer varies the shape of the concavo-convex pattern after an imprinting process, and a taper angle of a stepped portion of the concavo-convex pattern in the mask layer when starting the separating portion forming process is between 66° and 88°. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：解决的问题：提供一种生产率优异的磁记录介质的制造方法，其不会劣化由磁特性损伤的水平膨胀引起的磁性部分和分离部分的比例（占空比），以及通过简单的方法制造。解决方案：该方法包括分离部分形成过程。该方法通过离子注入在掩模层的凹部对应的位置处改变磁记录层的磁特性，或通过印刷在其上形成凹凸图案的掩模层暴露于活化的含卤素反应气体，从而形成所述分离部分在与所述掩模层的凸部对应的位置中磁性地分离所述磁记录层的磁性部分。形成掩模层的抗蚀剂材料在压印过程之后改变凹凸图案的形状，并且当开始分离部分形成工艺时，掩模层中的凹凸图案的阶梯部分的锥角在66° 和88°。版权所有（C）2011，JPO＆INPIT

8. 发明专利

JP2011005830A Imprinting apparatus and imprinting method 审中-公开
标题翻译：印刷设备和印刷方法
公开(公告)号：JP2011005830A
公开(公告)日：2011-01-13
申请号：JP2009154002
申请日：2009-06-29
申请人： Fuji Electric Device Technology Co Ltd , 富士電機デバイステクノロジー株式会社
发明人： MATSUSHITA TAKESHI , UCHIDA SHINJI
IPC分类号： B29C59/02 , G11B5/84 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To appropriately transfer the uneven pattern of a stamper to a material to be molded even when not-negligible warpage occurs in the stamper in an imprinting apparatus for transferring the uneven pattern of the stamper to the material to be molded.SOLUTION: The imprinting apparatus has a suction holding means for sucking and holding the stampers 14 and 16, a pressurizing means for applying pressure to push the stampers 14 and 16 to the material 12 to be molded, and a release means for releasing the holding of the stampers 14 and 16 by the suction holding means before a pressure exceeding a prescribed pressure is applied between the stampers 14 and 16 and the material 12 to be molded by the pressurizing means.
摘要翻译：要解决的问题：即使在用于将压模的不均匀图案转印到待模制材料的压印装置中的压模中发生不可忽略的翘曲时，也可以将压模的不均匀图案适当地转印到待模制的材料上。：压印装置具有用于吸附和保持压模14和16的抽吸保持装置，用于施加压力以将压模14和16推压到待模制材料12的加压装置，以及释放装置，在压模超过规定压力的压力下，通过吸附保持机构施加冲压机14和16，以及由加压装置成型的材料12。

9. 发明专利

JP2010049745A Mold for nano-imprint, and magnetic recording medium fabricated by using the same 审中-公开
标题翻译：用于纳米印刷的模具和使用它的磁性记录介质
公开(公告)号：JP2010049745A
公开(公告)日：2010-03-04
申请号：JP2008213003
申请日：2008-08-21
申请人： Fuji Electric Device Technology Co Ltd , 富士電機デバイステクノロジー株式会社
发明人： UCHIDA SHINJI
IPC分类号： G11B5/855 , B29C33/38
CPC分类号： G11B5/855 , B29C33/38 , B29C33/40 , B29C33/424 , B29C33/56 , Y10T428/24364
摘要： PROBLEM TO BE SOLVED: To provide a mold to achieve an excellent S/N ratio in a magnetic recording medium after transfer of a pattern. SOLUTION: The magnetic recording medium includes a substrate, an intermediate layer adjacent to the substrate, and a pattern formation layer adjacent to the intermediate layer and having a fine protruding and recessing pattern on its surface, wherein the intermediate layer is composed of an adhesive containing an ultraviolet ray transmitting silicone resin, and its elastic coefficient is smaller than that of the substrate and is smaller than that of the pattern formation layer. COPYRIGHT: (C)2010,JPO&INPIT

10. 发明专利

JP2009262351A Imprint method and its apparatus 有权
标题翻译：印刷方法及其设备
公开(公告)号：JP2009262351A
公开(公告)日：2009-11-12
申请号：JP2008111763
申请日：2008-04-22
申请人： Fuji Electric Device Technology Co Ltd , 富士電機デバイステクノロジー株式会社
发明人： UCHIDA SHINJI
IPC分类号： B29C59/02 , H01L21/027
CPC分类号： G11B5/855
摘要： PROBLEM TO BE SOLVED: To provide a method which enabales nano-imprint working to efficiently be carried out and its apparatus. SOLUTION: The method includes at least an alignment process for setting a substrate coated with a resist for a room temperature imprint and a mold with an uneven pattern formed on its offset surface in an incorporation tool, a press process for pushing the pattern surface of the mold to the resist surface of the substrate, and a separation process in which the mold is separated from the substrate to be separated into the substrate, the mold, and the incorporation tool. In the imprint method, each process is carried out in an independent unit in which one process is carried out, and a conveyance process in which, from the alignment process to the separation process, the mold and the substrate are made a pair by the incorporation tool and conveyed between units is set between the units. The imprint apparatus has at least an alignment unit in which the alignment process is carried out, a press unit in which the press process is carried out, and a separation unit in which the separation process is carried out and is provided with a conveyance means for carrying out the conveyance process. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种有效地实现纳米压印工作的方法及其装置。解决方案：该方法至少包括用于设置涂覆有用于室温压印的抗蚀剂的基材和在其结合工具中形成在其偏移表面上的具有不平坦图案的模具的对准过程，用于推动图案模具的表面到基板的抗蚀剂表面，以及分离工艺，其中模具与基板分离以分离成基板，模具和结合工具。在压印方法中，每个处理在其中执行一个处理的独立单元中进行，并且通过结合使得从对准处理到分离处理，模具和基板成对的输送处理在单元之间设置工具并在单元之间传送。压印装置至少具有进行对准处理的对准单元，进行加压处理的压制单元和进行分离处理的分离单元，并且设置有用于进行运输过程。版权所有（C）2010，JPO＆INPIT

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