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1. 发明专利

DE69832956D1 未知
公开(公告)号：DE69832956D1
公开(公告)日：2006-02-02
申请号：DE69832956
申请日：1998-08-13
申请人： FUJIKIN KK , TOKYO ELECTRON LTD , OHMI TADAHIRO
发明人： OHMI TADAHIRO , KAGAZUME TETU , SUGIYAMA KAZUHIKO , FUKADA OSAMU , OZAWA SUSUMU , SATOU YOSHIHIRO , DOHI RYOUSUKE , UNO TOMIO , NISHINO KOUJI , FUKUDA HIROYUKI , IKEDA NOBUKAZU , YAMAJI MICHIO
IPC分类号： B23P15/16 , F15D1/08 , G01F1/40 , G01F1/42 , G05D7/01
摘要： An orifice for use in pressure type flow rate control unit which can be manufactured easily and inexpensively, and which has a linear relationship between pressure P1 upstream of the orifice and the flow rate over a wide range of pressure ratio P2/P1 (where P1 is the pressure upstream of the orifice and P2 is the pressure downstream of same), with the flow rate characteristic relationship among a plurality of orifices being easily adjustable. More specifically, the orifice has a structure comprising a tapered inlet section (1) wherein one open end of a bottom hole (6) bored into a main body member (D) is cut into a shape like the mouthpiece of a trumpet, and a short drawn parallel part (2) continuing therefrom; and a short expanded tapered section (3) formed by expanding the diameter of the other open end of the bottom hole (6) and continuing from the drawn parallel part (2), and an expanded parallel part (4) continuing therefrom.

2. 发明专利

DE69832956T2 未知
公开(公告)号：DE69832956T2
公开(公告)日：2006-08-17
申请号：DE69832956
申请日：1998-08-13
申请人： FUJIKIN KK , TOKYO ELECTRON LTD , OHMI TADAHIRO
发明人： OHMI TADAHIRO , KAGAZUME TETU , SUGIYAMA KAZUHIKO , FUKADA OSAMU , OZAWA SUSUMU , SATOU YOSHIHIRO , DOHI RYOUSUKE , UNO TOMIO , NISHINO KOUJI , FUKUDA HIROYUKI , IKEDA NOBUKAZU , YAMAJI MICHIO
IPC分类号： F15D1/08 , B23P15/16 , G01F1/40 , G01F1/42 , G05D7/01
摘要： An orifice for use in pressure type flow rate control unit which can be manufactured easily and inexpensively, and which has a linear relationship between pressure P1 upstream of the orifice and the flow rate over a wide range of pressure ratio P2/P1 (where P1 is the pressure upstream of the orifice and P2 is the pressure downstream of same), with the flow rate characteristic relationship among a plurality of orifices being easily adjustable. More specifically, the orifice has a structure comprising a tapered inlet section (1) wherein one open end of a bottom hole (6) bored into a main body member (D) is cut into a shape like the mouthpiece of a trumpet, and a short drawn parallel part (2) continuing therefrom; and a short expanded tapered section (3) formed by expanding the diameter of the other open end of the bottom hole (6) and continuing from the drawn parallel part (2), and an expanded parallel part (4) continuing therefrom.

3. 发明专利

AT310985T 未知
公开(公告)号：AT310985T
公开(公告)日：2005-12-15
申请号：AT98937819
申请日：1998-08-13
申请人： FUJIKIN KK , TOKYO ELECTRON LTD , OHMI TADAHIRO
发明人： OHMI TADAHIRO , KAGAZUME TETU , SUGIYAMA KAZUHIKO , DOHI RYOUSUKE , UNO TOMIO , NISHINO KOUJI , FUKUDA HIROYUKI , IKEDA NOBUKAZU , YAMAJI MICHIO
IPC分类号： F16K17/22 , G05D7/06 , G05D16/20 , F16K7/16 , F16K7/14
摘要： A pressure-type flow rate control apparatus for use especially in the gas supply system in semiconductor manufacturing facilities. The flow control apparatus is provided with a bore-variable orifice, which permits easy switching of the fluid flow rate control range as well as size reduction of the pressure-type flow control apparatus, and offers other advantages including improved gas replaceability, prevention of dust formation, and reduced manufacturing costs of the flow control system. The pressure-type flow rate control apparatus comprises an orifice, a control valve provided on the upstream side of the orifice, a pressure detector provided between the control valve and the orifice, and a control unit to calculate a fluid flow rate Q on the basis of a pressure P1 detected by the pressure detector with the equation Q = KP1 (K = constant) and to output in a drive for the control valve the difference between the set flow rate signal Qs and the calculated flow rate signal Q as control signal Qy, wherein the pressure P1 on the upstream side of the orifice is regulated by actuating the control valve for controlling the flow rate of the fluid downstream of the orifice with the ratio P2/P1 between the pressure P1 on the upstream side of the orifice and the downstream pressure P2 maintained at not higher than the ratio of the critical pressure of the controlled fluid, characterized in that a direct touch type metal diaphragm valve unit functions as the orifice and that the ring-shaped gap between the valve seat and the diaphragm serves as variable orifice wherein the gap is adjusted by the orifice drive.

4. 发明专利

AT314580T 未知
公开(公告)号：AT314580T
公开(公告)日：2006-01-15
申请号：AT98937820
申请日：1998-08-13
申请人： FUJIKIN KK , TOKYO ELECTRON LTD , OHMI TADAHIRO
发明人： OHMI TADAHIRO , KAGAZUME TETU , SUGIYAMA KAZUHIKO , FUKADA OSAMU , OZAWA SUSUMU , SATOU YOSHIHIRO , DOHI RYOUSUKE , UNO TOMIO , NISHINO KOUJI , FUKUDA HIROYUKI , IKEDA NOBUKAZU , YAMAJI MICHIO
IPC分类号： G01F1/40 , G05D7/01 , F15D1/08 , B23P15/16 , G01F1/42
摘要： An orifice for use in pressure type flow rate control unit which can be manufactured easily and inexpensively, and which has a linear relationship between pressure P1 upstream of the orifice and the flow rate over a wide range of pressure ratio P2/P1 (where P1 is the pressure upstream of the orifice and P2 is the pressure downstream of same), with the flow rate characteristic relationship among a plurality of orifices being easily adjustable. More specifically, the orifice has a structure comprising a tapered inlet section (1) wherein one open end of a bottom hole (6) bored into a main body member (D) is cut into a shape like the mouthpiece of a trumpet, and a short drawn parallel part (2) continuing therefrom; and a short expanded tapered section (3) formed by expanding the diameter of the other open end of the bottom hole (6) and continuing from the drawn parallel part (2), and an expanded parallel part (4) continuing therefrom.

5. 发明专利

DE69928047D1 未知
公开(公告)号：DE69928047D1
公开(公告)日：2005-12-08
申请号：DE69928047
申请日：1999-01-11
申请人： FUJIKIN KK , TOKYO ELECTRON LTD , OHMI TADAHIRO
发明人： OHMI TADAHIRO , KAGAZUME TETU , SUGIYAMA KAZUHIKO , DOHI RYOUSUKE , MINAMI YUKIO , NISHINO KOUJI , KAWATA KOUJI , IKEDA NOBUKAZU , YAMAJI MICHIO
IPC分类号： C01B5/00 , F16K31/06 , G05D7/06 , G05D11/13 , G05D21/00
摘要： A fluid feeding apparatus for use in a gas supply system as in semiconductor manufacturing facilities which permits high-precision control of the flow of fluid without causing transient overshooting phenomena of fluid at the start of fluid feeding or fluid changeover. The fluid feeding apparatus of the present invention comprises a pressure flow controller to regulate the flow of fluid, a fluid changeover valve to open and close the fluid passage on the secondary side of the pressure flow controller and a fluid feeding control unit to control the actuation of the pressure flow controller and the fluid changeover valve, said pressure flow controller including: an orifice 5, a control valve 1 provided on the upstream side of the orifice 5, a pressure detector 3 provided between the control valve 1 and the orifice 5 and a calculation control unit 6 which inputs in a drive 2 for said control valve 1 a difference between a flow rate signal Qc and a flow rate specifying signal Qs as control signal Qy, said flow rate signal Qc calculated with flow rate Qc = KP1 (K = constant) on the basis of a pressure P1 detected by the pressure detector 3, wherein the flow rate on the downstream side of the orifice 5 is controlled by regulating the pressure P1 on the upstream side of the orifice 5 through the opening and closing of said control valve 1.

6. 发明专利

DE69832467T2 未知
公开(公告)号：DE69832467T2
公开(公告)日：2006-08-17
申请号：DE69832467
申请日：1998-08-13
申请人： FUJIKIN KK , TOKYO ELECTRON LTD , OHMI TADAHIRO
发明人： OHMI TADAHIRO , KAGAZUME TETU , SUGIYAMA KAZUHIKO , DOHI RYOUSUKE , UNO TOMIO , NISHINO KOUJI , FUKUDA HIROYUKI , IKEDA NOBUKAZU , YAMAJI MICHIO
IPC分类号： F16K17/22 , G05D7/06 , F16K7/14 , F16K7/16 , G05D16/20
摘要： A pressure-type flow rate control apparatus for use especially in the gas supply system in semiconductor manufacturing facilities. The flow control apparatus is provided with a bore-variable orifice, which permits easy switching of the fluid flow rate control range as well as size reduction of the pressure-type flow control apparatus, and offers other advantages including improved gas replaceability, prevention of dust formation, and reduced manufacturing costs of the flow control system. The pressure-type flow rate control apparatus comprises an orifice, a control valve provided on the upstream side of the orifice, a pressure detector provided between the control valve and the orifice, and a control unit to calculate a fluid flow rate Q on the basis of a pressure P1 detected by the pressure detector with the equation Q = KP1 (K = constant) and to output in a drive for the control valve the difference between the set flow rate signal Qs and the calculated flow rate signal Q as control signal Qy, wherein the pressure P1 on the upstream side of the orifice is regulated by actuating the control valve for controlling the flow rate of the fluid downstream of the orifice with the ratio P2/P1 between the pressure P1 on the upstream side of the orifice and the downstream pressure P2 maintained at not higher than the ratio of the critical pressure of the controlled fluid, characterized in that a direct touch type metal diaphragm valve unit functions as the orifice and that the ring-shaped gap between the valve seat and the diaphragm serves as variable orifice wherein the gap is adjusted by the orifice drive.

7. 发明专利

DE69928047T2 未知
公开(公告)号：DE69928047T2
公开(公告)日：2006-07-13
申请号：DE69928047
申请日：1999-01-11
申请人： FUJIKIN KK , TOKYO ELECTRON LTD , OHMI TADAHIRO
发明人： OHMI TADAHIRO , KAGAZUME TETU , SUGIYAMA KAZUHIKO , DOHI RYOUSUKE , MINAMI YUKIO , NISHINO KOUJI , KAWATA KOUJI , IKEDA NOBUKAZU , YAMAJI MICHIO
IPC分类号： F16K31/06 , C01B5/00 , G05D7/06 , G05D11/13 , G05D21/00
摘要： A fluid feeding apparatus for use in a gas supply system as in semiconductor manufacturing facilities which permits high-precision control of the flow of fluid without causing transient overshooting phenomena of fluid at the start of fluid feeding or fluid changeover. The fluid feeding apparatus of the present invention comprises a pressure flow controller to regulate the flow of fluid, a fluid changeover valve to open and close the fluid passage on the secondary side of the pressure flow controller and a fluid feeding control unit to control the actuation of the pressure flow controller and the fluid changeover valve, said pressure flow controller including: an orifice 5, a control valve 1 provided on the upstream side of the orifice 5, a pressure detector 3 provided between the control valve 1 and the orifice 5 and a calculation control unit 6 which inputs in a drive 2 for said control valve 1 a difference between a flow rate signal Qc and a flow rate specifying signal Qs as control signal Qy, said flow rate signal Qc calculated with flow rate Qc = KP1 (K = constant) on the basis of a pressure P1 detected by the pressure detector 3, wherein the flow rate on the downstream side of the orifice 5 is controlled by regulating the pressure P1 on the upstream side of the orifice 5 through the opening and closing of said control valve 1.

8. 发明专利

DE69832467D1 未知
公开(公告)号：DE69832467D1
公开(公告)日：2005-12-29
申请号：DE69832467
申请日：1998-08-13
申请人： FUJIKIN KK , TOKYO ELECTRON LTD , OHMI TADAHIRO
发明人： OHMI TADAHIRO , KAGAZUME TETU , SUGIYAMA KAZUHIKO , DOHI RYOUSUKE , UNO TOMIO , NISHINO KOUJI , FUKUDA HIROYUKI , IKEDA NOBUKAZU , YAMAJI MICHIO
IPC分类号： F16K17/22 , G05D7/06 , G05D16/20 , F16K7/16 , F16K7/14
摘要： A pressure-type flow rate control apparatus for use especially in the gas supply system in semiconductor manufacturing facilities. The flow control apparatus is provided with a bore-variable orifice, which permits easy switching of the fluid flow rate control range as well as size reduction of the pressure-type flow control apparatus, and offers other advantages including improved gas replaceability, prevention of dust formation, and reduced manufacturing costs of the flow control system. The pressure-type flow rate control apparatus comprises an orifice, a control valve provided on the upstream side of the orifice, a pressure detector provided between the control valve and the orifice, and a control unit to calculate a fluid flow rate Q on the basis of a pressure P1 detected by the pressure detector with the equation Q = KP1 (K = constant) and to output in a drive for the control valve the difference between the set flow rate signal Qs and the calculated flow rate signal Q as control signal Qy, wherein the pressure P1 on the upstream side of the orifice is regulated by actuating the control valve for controlling the flow rate of the fluid downstream of the orifice with the ratio P2/P1 between the pressure P1 on the upstream side of the orifice and the downstream pressure P2 maintained at not higher than the ratio of the critical pressure of the controlled fluid, characterized in that a direct touch type metal diaphragm valve unit functions as the orifice and that the ring-shaped gap between the valve seat and the diaphragm serves as variable orifice wherein the gap is adjusted by the orifice drive.

9. 发明公开

EP0931941A4 ORIFICE FOR PRESSURE TYPE FLOW RATE CONTROL UNIT AND PROCESS FOR MANUFACTURING ORIFICE 有权
标题翻译：流量控制器与压力控制及其制造方法NOZZLE
公开(公告)号：EP0931941A4
公开(公告)日：2003-05-21
申请号：EP98937820
申请日：1998-08-13
申请人： FUJIKIN KK , TOKYO ELECTRON LTD , OHMI TADAHIRO
发明人： OHMI TADAHIRO , KAGAZUME TETU , SUGIYAMA KAZUHIKO , FUKADA OSAMU , OZAWA SUSUMU , SATOU YOSHIHIRO , DOHI RYOUSUKE , UNO TOMIO , NISHINO KOUJI , FUKUDA HIROYUKI , IKEDA NOBUKAZU , YAMAJI MICHIO
IPC分类号： G01F1/40 , G05D7/01 , F15D1/08 , B23P15/16 , G01F1/42
CPC分类号： G01F1/40 , G05D7/0186
摘要： An orifice for use in pressure type flow rate control unit which can be manufactured easily and inexpensively, and which has a linear relationship between pressure P1 upstream of the orifice and the flow rate over a wide range of pressure ratio P2/P1 (where P1 is the pressure upstream of the orifice and P2 is the pressure downstream of same), with the flow rate characteristic relationship among a plurality of orifices being easily adjustable. More specifically, the orifice has a structure comprising a tapered inlet section (1) wherein one open end of a bottom hole (6) bored into a main body member (D) is cut into a shape like the mouthpiece of a trumpet, and a short drawn parallel part (2) continuing therefrom; and a short expanded tapered section (3) formed by expanding the diameter of the other open end of the bottom hole (6) and continuing from the drawn parallel part (2), and an expanded parallel part (4) continuing therefrom.

10. 发明公开

EP0952505A4 PRESSURE TYPE FLOW RATE CONTROL APPARATUS 有权
标题翻译：压力驱动流动控制设备
公开(公告)号：EP0952505A4
公开(公告)日：2004-04-21
申请号：EP98937819
申请日：1998-08-13
申请人： FUJIKIN KK , TOKYO ELECTRON LTD , OHMI TADAHIRO
发明人： OHMI TADAHIRO , KAGAZUME TETU , SUGIYAMA KAZUHIKO , DOHI RYOUSUKE , UNO TOMIO , NISHINO KOUJI , FUKUDA HIROYUKI , IKEDA NOBUKAZU , YAMAJI MICHIO
IPC分类号： F16K17/22 , G05D7/06 , F16K7/14 , F16K7/16 , G05D16/20
CPC分类号： G05D7/0647 , Y10T137/7759 , Y10T137/7761
摘要： A pressure type flow rate control apparatus to be used in a gas supply system for semiconductor manufacturing equipment, which calculates a flow rate (Q = KP1) by using a detected pressure P1 of a pressure detector (4) installed between an orifice (5) and a control valve provided upstream of the orifice (5) and outputs the difference between the calculated flow rate and a flow rate control signal as a control signal to the control valve. The orifice (5) is formed as a direct touch type metal diaphragm, and an annular gap between a valve seat and a diaphragm is made variable to allow the flow rate control range to be changed easily.

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