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1. 发明授权

US6422264B2 Parallel divided flow-type fluid supply apparatus, and fluid-switchable pressure-type flow control method and fluid-switchable pressure-type flow control system for the same fluid supply apparatus 有权
标题翻译：平行分流式流体供给装置和流体切换式压力式流量控制方法以及用于同一流体供给装置的流体切换型压力式流量控制系统
公开(公告)号：US6422264B2
公开(公告)日：2002-07-23
申请号：US73464000
申请日：2000-12-13
申请人： FUJIKIN KK , OHMI TADAHIRO , TOKYO ELECTRON LTD
发明人： OHMI TADAHIRO , KAGATSUME SATOSHI , SUGIYAMA KAZUHIKO , MINAMI YUKIO , NISHINO KOUJI , DOHI RYOUSUKE , YONEHANA KATSUNORI , IKEDA NOBUKAZU , YAMAJI MICHIO , HIROSE JUN , FUKAZAWA KAZUO , KOIZUMI HIROSHI , NAGAOKA HIDEKI , MORIMOTO AKIHIRO , UNO TOMIO , IDETA EIJI , MATSUMOTO ATSUSHI , UENOYAMA TOYOMI , HIROSE TAKASHI
IPC分类号： G05D7/06
CPC分类号： G05D7/0658 , G05D7/0664 , Y10S438/935 , Y10T137/0396 , Y10T137/7759 , Y10T137/7761 , Y10T137/86389 , Y10T137/87877 , Y10T137/87917
摘要： A fluid supply apparatus with a plurality of flow lines branching out from one pressure regulator with the flow lines arranged in parallel and constructed so that opening or closing one flow passage will have no transient effect on the steady flow of the other flow passages. Each flow passage is provided with a time delay-type mass flow controller MFC so that when one closed fluid passage is opened, the mass flow controller on that flow passage reaches a set flow rate Qs in a specific delay time DELTAt from the starting point.The invention includes a method and an apparatus in which a plurality of gas types can be controlled in flow rate with high precision by one pressure-type flow control system.
摘要翻译：一种流体供给装置，具有从一个压力调节器分支出的多个流动管线，流动线平行布置并构造成使得打开或关闭一个流动通道对其它流动通道的稳定流动将没有暂时的影响。每个流路设置有时间延迟型质量流量控制器MFC，使得当一个封闭流体通道打开时，该流路上的质量流量控制器在起始点的特定延迟时间DELTAt中达到设定流量Qs。本发明包括通过一个压力式流量控制系统以高精度控制多种气体类型的方法和装置。

2. 发明专利

CA2457986A1 METHOD FOR SUPPLYING DIVIDED GAS TO A CHAMBER FROM GAS SUPPLY APPARATUS EQUIPPED WITH FLOW-RATE CONTROL SYSTEM 未知
公开(公告)号：CA2457986A1
公开(公告)日：2003-12-11
申请号：CA2457986
申请日：2003-01-20
申请人： FUJIKIN KK , TOKYO ELECTRON LTD
发明人： DOHI RYOUSUKE , NISHINO KOUJI , UENOYAMA TOYOMI , IKEDA NOBUKAZU , SUGIYAMA KAZUHIKO
IPC分类号： H01L21/205 , G05D7/06
摘要： A method for supplying a specified quantity Q of processing gas while dividi ng at a desired flow rate ratio Q1/Q2 accurately and quickly from a gas supply facility equipped with a flow controller into a chamber. When a specified quantity Q of gas is supplied while being divided at a desired flow rate rat io Q1/Q2 from a gas supply facility equipped with a flow controller into a pressure reduced chamber C through a plurality of branch supply lines and shower plates fixed to the ends thereof, pressure type division quantity controllers FV1 and FV2 are provided in the plurality of branch supply lines GL1 and GL2. Opening control of both division quantity controllers FV1 and FV2is started by an initial flow rate set signal from a division quantity control board FRC for fully opening the control valve CV of the pressure typ e division quantity controller having a higher flow rate and pressures P3~ and P3~ on the downstream side of the control valve CV are regulated thus supplying a total quantity Q=Q1+Q2 of gas while dividing into the chamber C through orifice holes (3a, 4a) made in shower plates (3, 4) at desired division quantities Q1 and Q2 represented by formulas Q1=C1P3~ and Q2=C2P3~ (where, C1 and C2 are constants dependent on the cross-sectional area of the orifice hole or the gas temperature on the upstream side thereof).

3. 发明公开

EP1096351A4 PARALLEL BYPASS TYPE FLUID FEEDING DEVICE, AND METHOD AND DEVICE FOR CONTROLLING FLUID VARIABLE TYPE PRESSURE SYSTEM FLOW RATE USED FOR THE DEVICE 审中-公开
标题翻译：旁路类型和调节压力系统与可变液体压力流量的方法和设备布置成平行液装置这FLÜSSIGLEITSSPEISEVORRICHTUNGUSED
公开(公告)号：EP1096351A4
公开(公告)日：2004-12-15
申请号：EP00913087
申请日：2000-04-03
申请人： FUJIKIN KK , TOKYO ELECTRON LTD , OHMI TADAHIRO
发明人： OHMI TADAHIRO , KAGATSUME SATOSHI , SUGIYAMA KAZUHIKO , MINAMI YUKIO , NISHINO KOUJI , DOHI RYOUSUKE , YONEHANA KATSUNORI , IKEDA NOBUKAZU , YAMAJI MICHIO , HIROSE JUN , FUKAZAWA KAZUO , KOIZUMI HIROSHI , NAGAOKA HIDEKI , MORIMOTO AKIHIRO , UNO TOMIO , IDETA EIJI , MATSUMOTO ATSUSHI , UENOYAMA TOYOMI , HIROSE TAKASHI
IPC分类号： G05D7/06
CPC分类号： G05D7/0658 , G05D7/0664 , Y10S438/935 , Y10T137/0396 , Y10T137/7759 , Y10T137/7761 , Y10T137/86389 , Y10T137/87877 , Y10T137/87917
摘要： A fluid feeding device having a plurality of flow paths disposed in parallel with each other starting at a regulator for pressure regulation, wherein a mass flow controller for flow control or a pressure system flow control device is disposed in each flow path so that the opening and closing operations for fluid supply in each flow path do not provide a transient variation in a stable supply to the other flow paths and, when the fluid supply in a flow path is changed from close to open, a set flow rate is reached a specified delay time after the start of the operation of the mass flow controller in that flow path.
摘要翻译：用的流线从一个调节器，用于压力调整分支出来的多个流体供给装置中，流线平行地布置，worin的量度取，DASS模具手术，也就是，开口或一个流路的开闭将没有在其它流动通道的稳流瞬态效应。为了这个目的，每个流动通道设置有一个时间延迟型质量流量控制器MFC所以没有当一个封闭流体通道打开时，质量流量控制器上没有流动通道达在一个特定的延迟时间ΔT的一组流量Qs 从起点。这样提供了一种方法和用于其中的气体类型的多元性可与精度高流速通过一个压力式流量控制装置来控制上述装置的速率。为了做到端，用于计算气体的流动的公式理论上推导做了与压力比不低于临界压力比更高流动。从做过公式，则流程因数被定义，所以做了式可以被应用到许多用流动因素气体类型。该方法包括：在下游侧计算通过传递到孔口雅丁式QC = KP1（K =常数）具有压力P1的气体的QC流量上设置节流孔上游侧的两次或更多次高于压力P2 ，worin流量因数FF为每种气体的计算如下： FF =（K /伽马S）A2 /（卡帕+ 1）U <1 /（卡帕-1）>是κ/ A（卡帕 + 1）RUU <1.2> 和worin，如果气体类型A的计算的流速是QA，并且，当将B型气体被允许在相同的压力下，通过相同的孔中流动的上游侧并在上游侧相同的温度，流率QB的计算公式如下： QB =（FFB / FFA）QA 其中YS =标准状态的气体的浓度; Kappa值=气体的比热的比值; R为气体的=常数; K =比例常数不依赖于气体的类型; FFA =气体类型A的流动系数; 气体类型B. 的和FFB =流量系数

4. 发明专利

JP2004005308A METHOD OF DIVIDING FLOW SUPPLY OF GAS TO CHAMBER FROM GAS SUPPLY PLANT EQUIPPED WITH FLOW-CONTROL DEVICE 审中-公开
公开(公告)号：JP2004005308A
公开(公告)日：2004-01-08
申请号：JP2002161086
申请日：2002-06-03
申请人： TOKYO ELECTRON LTD , FUJIKIN KK
发明人： SUGIYAMA KAZUHIKO , IKEDA SHINICHI , NISHINO KOJI , DOI RYOSUKE , UENOYAMA TOYOMI
IPC分类号： H01L21/205 , G05D7/06
摘要： PROBLEM TO BE SOLVED: To accurately and quickly supply a desirable flow rate Q of the processing gas at a desirable flow ratio Q 1 /Q 2 from a gas supply plant equipped with a flow rate control device. SOLUTION: Pressure type divided flow rate controllers FV 1 and FV 2 are interposed in a plurality of branch supply lines GL 1 and GL 2 , and opening control of both the divided flow rate controllers FV 1 and FV 2 is started on the basis of the initial flow rate setting signal from a divided flow rate control board FRC for full opening a control valve CV of the pressure type divided flow rate controller having a larger flow rate. Downstream side pressure P 3 ' and P 3 " of the control valve CV are respectively adjusted to supply the total quantity Q = Q 1 + Q 2 of the gas into the chamber C at a desirable divided flow rate Q 1 and Q 2 expressed with a formula Q 1 = C 1 P 3 ' and Q 2 = C 2 P 3 " (C 1 and C 2 means a constant to be decided on the basis of a cross sectional area of orifice holes and gas temperature in the upstream side of the orifice holes) through the orifice holes 3a and 4a provided in shower plates 3 and 4. COPYRIGHT: (C)2004,JPO

5. 发明专利

JP2000322130A METHOD FOR VARIABLE FLUID FLOW RATE CONTROL BY FLOW FACTOR AND ITS DEVICE 失效
公开(公告)号：JP2000322130A
公开(公告)日：2000-11-24
申请号：JP12910999
申请日：1999-05-10
申请人： FUJIKIN KK , OMI TADAHIRO , TOKYO ELECTRON LTD
发明人： OMI TADAHIRO , MORIMOTO AKIHIRO , UNO TOMIO , IKEDA SHINICHI , DOI RYOSUKE , NISHINO KOJI , IDETA EIJI , MATSUMOTO ATSUSHI , UENOYAMA TOYOMI , YAMAJI MICHIO , HIROSE TAKASHI , KAGATSUME SATORU , HIROSE JUN , FUKAZAWA KAZUO , KOIZUMI HIROSHI , NAGAOKA HIDEKI
IPC分类号： G01F1/42 , G05D7/06
摘要： PROBLEM TO BE SOLVED: To obtain the method for performing high-precision flow rate control over different kinds of gas by one flow rate controller by calculating a factor under specific conditions and calculating the flow rate of another gas kind when the gas kind is circulated through the same orifice under conditions of the same upstream pressure and the same upstream temperature on condition that the calculated flow rate of one gas kind is specific. SOLUTION: Flow factors FF is calculated by gas kinds from FF=(k/γs)(2/(κ+1))1/(κ-1)(κ/((κ+1)R))1/2 and on condition that the calculated flow rate of a gas kind A is QA, the flow rate QB of a gas kind B is calculated from QB=(FFB/FFA)QA when the gas kind B is circulated through the same orifice under the conditions of the same upstream side pressure and the same upstream temperature. Here, γs is the density of gas in a standard state, κ is the specific heat ratio of the gas, R is the gas constant, (k) is a proportion constant which does not depend upon the gas kind, FFA is the flow factor of the gas kind A, and FFB is the flow factor of the gas kind B.

6. 发明公开

EP1637859A4 AUTOMATIC ZERO POINT-CORRECTING DEVICE FOR PRESSURE SENSOR, PRESSURE CONTROLLER, AND PRESSURE-TYPE FLOW RATE CONTROLLER 审中-公开
标题翻译：自动零点校正装置用于压力传感器，压力控制和流量控制压式
公开(公告)号：EP1637859A4
公开(公告)日：2007-02-14
申请号：EP04745748
申请日：2004-06-10
申请人： FUJIKIN KK , OHMI TADAHIRO
发明人： OHMI TADAHIRO , SUGIYAMA KAZUHIKO , HINO SHOICHI , TAKAHASHI EIJI , SAEGUSA MAKOTO , IKEDA NOBUKAZU , NISHINO KOUJI , DOHI RYOUSUKE , UENOYAMA TOYOMI , SUGITA KATSUYUKI
IPC分类号： G01L19/02 , G01L19/00 , G01L19/04
CPC分类号： G01L19/02 , G01L9/065 , G01L19/0023 , G05D7/0635

7. 发明专利

JP2005010108A Automatic zero point correction device for pressure sensor, pressure control device and pressure type flow control device 有权
标题翻译：压力传感器自动零点校正装置，压力控制装置和压力型流量控制装置
公开(公告)号：JP2005010108A
公开(公告)日：2005-01-13
申请号：JP2003177135
申请日：2003-06-20
申请人： Fujikin Inc , Tadahiro Omi , Tokyo Electron Ltd , 忠弘大見 , 東京エレクトロン株式会社 , 株式会社フジキン
发明人： OMI TADAHIRO , SUGIYAMA KAZUHIKO , HINO SHOICHI , TAKAHASHI EIJI , SAEGUSA SHIN , IKEDA SHINICHI , NISHINO KOJI , DOI RYOSUKE , UENOYAMA TOYOMI , SUGITA KATSUYUKI
IPC分类号： G01L19/02 , G01L19/00 , G01L19/04
CPC分类号： G01L19/02 , G01L9/065 , G01L19/0023 , G05D7/0635
摘要： PROBLEM TO BE SOLVED: To provide a pressure sensor capable of detecting accurately the pressure regardless of its using period by correcting automatically the temporal zero point drift of the pressure sensor, and a pressure control device and a flow control device using it. SOLUTION: This pressure sensor using a semiconductor pressure-sensitive element for measuring liquid pressure is operated as follows: a sensor output voltage from the pressure sensor is outputted to the outside through an amplifier; the sensor output voltage is inputted into a temporal zero point drift correction means of the pressure sensor through a D/A converter; it is determined whether the sensor output voltage is larger than a set value or not by a sensor output determination means in the temporal zero point drift correction means; an operation condition of the pressure sensor is determined by an operation condition determination means in the temporal zero point drift correction means; and when the sensor output voltage is larger than the set value and the operation condition of the pressure sensor is under the operation condition set beforehand, a zero point correction voltage having the same voltage as the sensor output voltage and the reverse polarity thereto is inputted into an offset terminal of the amplifier through the D/A converter and the temporal zero point drift of the pressure sensor is deleted. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供一种能够通过自动校正压力传感器的时间零点漂移以及使用该压力传感器的压力控制装置和流量控制装置来精确地检测压力而不管其使用周期的压力传感器。解决方案：使用半导体压敏元件测量液体压力的压力传感器如下操作：来自压力传感器的传感器输出电压通过放大器输出到外部; 传感器输出电压通过D / A转换器输入压力传感器的时间零点漂移校正装置; 通过时间零点漂移校正装置中的传感器输出确定装置确定传感器输出电压是否大于设定值; 压力传感器的操作条件由时间零点漂移校正装置中的操作条件确定装置确定; 并且当传感器输出电压大于设定值并且压力传感器的操作条件处于预先设置的操作条件下时，将具有与传感器输出电压相同的电压和与其相反极性的零点校正电压输入到通过D / A转换器的放大器的偏移端子和压力传感器的时间零点漂移被删除。版权所有（C）2005，JPO＆NCIPI

8. 发明专利

JP2005011258A Device and method for distributary supply of gas to chamber from gas supply plant equipped with flow-control device 有权
标题翻译：从配有流量控制装置的气体供应设备向气室分配供气的装置和方法
公开(公告)号：JP2005011258A
公开(公告)日：2005-01-13
申请号：JP2003177134
申请日：2003-06-20
申请人： Fujikin Inc , Tokyo Electron Ltd , 東京エレクトロン株式会社 , 株式会社フジキン
发明人： SUGIYAMA KAZUHIKO , IKEDA SHINICHI , NISHINO KOJI , DOI RYOSUKE , UENOYAMA TOYOMI
IPC分类号： F17D1/04 , G05D7/06 , H01L21/02 , H01L21/31
CPC分类号： G05D7/00 , G05D7/0623 , G05D7/0652 , G05D7/0658 , G05D7/0664 , G05D11/132 , Y10T137/0379 , Y10T137/0396 , Y10T137/2521 , Y10T137/2529 , Y10T137/2562 , Y10T137/263 , Y10T137/2663 , Y10T137/7761 , Y10T137/8175
摘要： PROBLEM TO BE SOLVED: To accurately, quickly and divergently supply a predetermined flow rate Q of the processing gas at a desirable flow ratio Q 1 /Q 2 into a chamber from a gas supply plant equipped with a flow rate control device. SOLUTION: This device supplies the predetermined flow rate Q of the gas G divergently at a predetermined flow ratio Q 1 /Q 2 into the chamber C through a plurality of branch supply lines GL 1 , GL 2 and shower plates 3, 4 fixed to the terminals from the gas supply plant 1 equipped with the flow rate control device QCS. Opening and closing valves OV 1 , OV 2 are respectively interposed on a plurality of branch supply lines GL 1 , GL 2 . A bypass line BL 1 branched from the GL 1 in the downstream of the OV 1 , a BL 2 branched from the GL 2 in the downstream of the OV 2 , a pressure type divided flow rate controller FV connected to the BL 1 and the BL 2 , a pressure sensor PS 1 measuring the pressure in the GL 1 , and a pressure sensor PS 2 measuring the pressure in the GL 2 are interposed. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：为了准确地，以期望的流量比Q＆lt; SB＆gt; / Q＆lt; SB＆gt; 2＆lt; / SB＆gt;将处理气体的预定流量Q快速地和分散地供给到来自配备有流量控制装置的气体供给装置。
解决方案：该装置以预定的流量比Q / Q 2 将气体G的预定流量Q通过多个分支供应线GL 1，SB <2>和从配备有流量控制装置QCS的气体供应设备1固定到端子的淋浴板3,4。打开和关闭阀OV 1 ，OV 2 分别插入在多个分支供应管线GL 1 ，GL SB>。在OV 1 的下游从GL 1 分支的旁路管线BL 1 ，支化的BL 2 在OV 2 的下游的GL 2 中，连接到BL 1 的压力型分流量控制器FV， SB> 2 ，测量GL 1 中的压力的压力传感器PS 1 和测量插入GL 2 中的压力。版权所有（C）2005，JPO＆NCIPI

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