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1. 发明申请

US20080291419A1 PROJECTION OBJECTIVE FOR IMMERSION LITHOGRAPHY 审中-公开
公开(公告)号：US20080291419A1
公开(公告)日：2008-11-27
申请号：US12187116
申请日：2008-08-06
申请人： Karl-Stefan Weissenrieder , Alexander Hirnet , Alexandra Pazidis , Karl-Heinz Schuster , Christoph Zaczek , Michael Lill , Patrick Scheible , Guenter Scheible , Harald Schink , Markus Brotsack , Ulrich Loering , Toralf Gruner , Sigrid Scheible
发明人： Karl-Stefan Weissenrieder , Alexander Hirnet , Alexandra Pazidis , Karl-Heinz Schuster , Christoph Zaczek , Michael Lill , Patrick Scheible , Guenter Scheible , Harald Schink , Markus Brotsack , Ulrich Loering , Toralf Gruner , Sigrid Scheible
IPC分类号： G03B27/54 , G03B27/32
CPC分类号： G03F7/70983 , G03F7/70341
摘要： In a projection objective provided for imaging a pattern arranged in an object plane of the projection objective into an image plane of the projection objective with the aid of an immersion medium arranged between a last optical element of the projection objective in the light path and the image plane, the last optical element has a transparent substrate and a protective layer system that is fitted to the substrate, is provided for contact with the immersion medium and serves for increasing the resistance of the last optical element to degradation caused by the immersion medium.

2. 发明申请

US20050225737A1 Projection objective for immersion lithography 有权
标题翻译：浸没光刻的投影目标
公开(公告)号：US20050225737A1
公开(公告)日：2005-10-13
申请号：US11015553
申请日：2004-12-20
申请人： Karl-Stefan Weissenrieder , Alexander Hirnet , Alexandra Pazidis , Karl-Heinz Schuster , Christoph Zaczek , Michael Lill , Patrick Scheible , Harald Schink , Markus Brotsack , Ulrich Loering , Toralf Gruner , Guenter Scheible
发明人： Karl-Stefan Weissenrieder , Alexander Hirnet , Alexandra Pazidis , Karl-Heinz Schuster , Christoph Zaczek , Michael Lill , Patrick Scheible , Harald Schink , Markus Brotsack , Ulrich Loering , Toralf Gruner , Guenter Scheible
IPC分类号： G03B27/42 , G03F7/20
CPC分类号： G03F7/70983 , G03F7/70341
摘要： In a projection objective provided for imaging a pattern arranged in an object plane of the projection objective into an image plane of the projection objective with the aid of an immersion medium arranged between a last optical element of the projection objective in the light path and the image plane, the last optical element has a transparent substrate and a protective layer system that is fitted to the substrate, is provided for contact with the immersion medium and serves for increasing the resistance of the last optical element to degradation caused by the immersion medium.
摘要翻译：在投影物镜中，借助于设置在光路中的投影物镜的最后一个光学元件与图像之间的浸没介质，将布置在投影物镜的物平面中的图案成像到投影物镜的像平面中平面，最后一个光学元件具有透明基板和与基板相配合的保护层系统，用于与浸没介质接触，用于增加最后一个光学元件对浸入介质引起的劣化的电阻。

3. 发明申请

US20070242250A1 Objective with crystal lenses 审中-公开
标题翻译：目标水晶镜片
公开(公告)号：US20070242250A1
公开(公告)日：2007-10-18
申请号：US11765200
申请日：2007-06-19
申请人： Aksel Goehnermeier , Alexandra Pazidis , Birgit Kuerz , Christoph Zaczek , Daniel Kraehmer
发明人： Aksel Goehnermeier , Alexandra Pazidis , Birgit Kuerz , Christoph Zaczek , Daniel Kraehmer
IPC分类号： G02B27/28 , G03B27/52 , H01L21/00
CPC分类号： G02B1/02 , G02B1/08 , G02B5/3083 , G02B13/14 , G02B27/0043 , G02B27/286 , G03F7/70225 , G03F7/70241 , G03F7/70566 , G03F7/70958 , G03F7/70966
摘要： Objective, in particular a projection objective for a microlithography projection-exposure installation, with at least one fluoride crystal lens. A reduction in the detrimental influence of birefringence is achieved if this lens is a (100)-lens with a lens axis which is approximately perpendicular to the {100} crystallographic planes or to the crystallographic planes equivalent thereto of the fluoride crystal. In the case of objectives with at least two fluoride crystal lenses, it is favorable if the fluoride crystal lenses are arranged such that they are rotated with respect to one another. The lens axes of the fluoride crystal lenses may in this case point not only in the crystallographic direction but also in the crystallographic direction or in the crystallographic direction. A further reduction in the detrimental influence of birefringence is achieved by the simultaneous use of groups with (100)-lenses rotated with respect to one another and groups with (111)-lenses or (110)-lenses rotated with respect to one another. A further reduction in the detrimental influence of birefringence is obtained by covering an optical element with a compensation coating.
摘要翻译：目的，特别是具有至少一种氟化物晶体透镜的微光刻投影曝光装置的投影物镜。如果该透镜是具有近似垂直于{100}晶面的透镜轴或与氟化物晶体相当的结晶平面的透镜轴，则实现双折射的有害影响的减小。在具有至少两个氟化物晶体透镜的物镜的情况下，如果将氟化物晶体透镜相对于彼此旋转布置是有利的。在这种情况下，氟化物晶体透镜的透镜轴不仅在<100>晶体方向，而且在<111>晶体方向或<110>晶体方向。双折射的有害影响的进一步减少是通过同时使用具有相对于彼此旋转的（100） - 相的组和具有相对于彼此旋转的（111） - 透镜或（110）相的组而实现的。通过用补偿涂层覆盖光学元件来获得双折射的有害影响的进一步减少。

4. 发明授权

US07239447B2 Objective with crystal lenses 有权
标题翻译：目标水晶镜片
公开(公告)号：US07239447B2
公开(公告)日：2007-07-03
申请号：US10931745
申请日：2004-09-01
申请人： Aksel Goehnermeier , Alexandra Pazidis , Birgit Kuerz , Christoph Zaczek , Daniel Kraehmer
发明人： Aksel Goehnermeier , Alexandra Pazidis , Birgit Kuerz , Christoph Zaczek , Daniel Kraehmer
IPC分类号： G02B5/30
CPC分类号： G02B1/02 , G02B1/08 , G02B5/3083 , G02B13/14 , G02B27/0043 , G02B27/286 , G03F7/70225 , G03F7/70241 , G03F7/70566 , G03F7/70958 , G03F7/70966
摘要： An objective, in particular a projection objective for a microlithography projection-exposure installation, with at least one fluoride crystal lens is disclosed. A reduction in the detrimental influence of birefringence is achieved if this lens is a (100)-lens with a lens axis which is approximately perpendicular to the {100} crystallographic planes or to the crystallographic planes equivalent thereto of the fluoride crystal. A further reduction in the detrimental influence of birefringence is obtained by covering an optical element with a compensation coating.
摘要翻译：公开了具有至少一种氟化物晶体透镜的目的，特别是用于微光刻投影曝光装置的投影物镜。如果该透镜是具有近似垂直于{100}晶面的透镜轴或与氟化物晶体相当的结晶平面的透镜轴，则实现双折射的有害影响的减小。通过用补偿涂层覆盖光学元件来获得双折射的有害影响的进一步减少。

5. 发明申请

US20050157401A1 Objective with crystal lenses 有权
标题翻译：目标水晶镜片
公开(公告)号：US20050157401A1
公开(公告)日：2005-07-21
申请号：US10931745
申请日：2004-09-01
申请人： Aksel Goehnermeier , Alexandra Pazidis , Birgit Kuerz , Christoph Zaczek , Daniel Kraehmer
发明人： Aksel Goehnermeier , Alexandra Pazidis , Birgit Kuerz , Christoph Zaczek , Daniel Kraehmer
IPC分类号： G02B1/02 , G02B5/30 , G03F7/20 , G02B21/02
CPC分类号： G02B1/02 , G02B1/08 , G02B5/3083 , G02B13/14 , G02B27/0043 , G02B27/286 , G03F7/70225 , G03F7/70241 , G03F7/70566 , G03F7/70958 , G03F7/70966
摘要： Objective, in particular a projection objective for a microlithography projection-exposure installation, with at least one fluoride crystal lens. A reduction in the detrimental influence of birefringence is achieved if this lens is a (100)-lens with a lens axis which is approximately perpendicular to the {100} crystallographic planes or to the crystallographic planes equivalent thereto of the fluoride crystal. In the case of objectives with at least two fluoride crystal lenses, it is favorable if the fluoride crystal lenses are arranged such that they are rotated with respect to one another. The lens axes of the fluoride crystal lenses may in this case point not only in the crystallographic direction but also in the crystallographic direction or in the crystallographic direction. A further reduction in the detrimental influence of birefringence is achieved by the simultaneous use of groups with (100)-lenses rotated with respect to one another and groups with (111)-lenses or (110)-lenses rotated with respect to one another. A further reduction in the detrimental influence of birefringence is obtained by covering an optical element with a compensation coating.
摘要翻译：目的，特别是具有至少一种氟化物晶体透镜的微光刻投影曝光装置的投影物镜。如果该透镜是具有近似垂直于{100}晶面的透镜轴或与氟化物晶体相当的结晶平面的透镜轴，则实现双折射的有害影响的减小。在具有至少两个氟化物晶体透镜的物镜的情况下，如果将氟化物晶体透镜相对于彼此旋转布置是有利的。在这种情况下，氟化物晶体透镜的透镜轴不仅在<100>晶体方向，而且在<111>晶体方向或<110>晶体方向。双折射的有害影响的进一步减少是通过同时使用具有相对于彼此旋转的（100） - 相的组和具有相对于彼此旋转的（111） - 透镜或（110）相的组而实现的。通过用补偿涂层覆盖光学元件来获得双折射的有害影响的进一步减少。

6. 发明授权

US08488103B2 Optical element for reflection of UV radiation, method for manufacturing the same and projection exposure apparatus comprising the same 有权
标题翻译：用于UV辐射反射的光学元件，其制造方法和包括该光学元件的投影曝光设备
公开(公告)号：US08488103B2
公开(公告)日：2013-07-16
申请号：US12780035
申请日：2010-05-14
申请人： Alexandra Pazidis , Christoph Zaczek , Horst Feldermann , Peter Huber
发明人： Alexandra Pazidis , Christoph Zaczek , Horst Feldermann , Peter Huber
IPC分类号： G03B27/54 , G03B27/42 , G02B5/08
CPC分类号： G02B5/0891 , G02B5/0833 , G03F7/70316 , G03F7/70958
摘要： An optical element (1a, 1b) for reflecting UV radiation at an operating wavelength below 250 nm, preferably at 193 nm, which has a substrate (2a, 2b), a reflective layer (3a, 3b) made of aluminum superimposed on the substrate (2a, 2b). The reflective aluminum layer (3a, 3b) is not transparent to UV radiation and is (111)-plane oriented. The reflective optical element (1a, 1b) has a reflectivity of more than 85%, preferably of more than 88%, and even more preferably of more than 92%, in a range of incident angles of at least 10°, preferably of at least 15°, at the operating wavelength. Also disclosed is an optical element having a reflective layer made from a material having a melting point higher than that of aluminum, as well as methods for producing such optical elements, and optical arrangements incorporating such optical elements.
摘要翻译：一种用于在工作波长低于250nm（优选193nm）下反射UV辐射的光学元件（1a，1b），其具有衬底（2a，2b），叠加在衬底上的由铝制成的反射层（3a，3b）（2a，2b）。反射铝层（3a，3b）对于紫外线辐射是不透明的，并且是（111）平面取向的。反射光学元件（1a，1b）在入射角至少为10°的范围内具有大于85％，优选大于88％，甚至更优选大于92％的反射率，优选地为至少15°，在工作波长。还公开了具有由熔点高于铝的材料制成的反射层的光学元件，以及用于制造这种光学元件的方法，以及包括这种光学元件的光学装置。

7. 发明授权

US08049964B2 Optical element with an antireflection coating, projection objective, and exposure apparatus comprising such an element 有权
标题翻译：具有抗反射涂层的光学元件，投影物镜和包括这种元件的曝光设备
公开(公告)号：US08049964B2
公开(公告)日：2011-11-01
申请号：US11917500
申请日：2006-06-13
申请人： Christoph Zaczek , Alexandra Pazidis
发明人： Christoph Zaczek , Alexandra Pazidis
IPC分类号： G02B1/10 , G02B5/08 , G02B5/20 , F21V9/04 , F21V9/06 , G03B27/42
CPC分类号： G03F7/70958 , G02B1/02 , G02B1/113 , G02B1/115 , G03F7/70341 , G03F7/70941
摘要： An optical element (14) transparent for radiation with a wavelength λ in the ultraviolet wavelength range below 250 nm, in particular at 193 nm, comprises a substrate (17) with a refractive index nS larger than 1.6, and an antireflection coating (16) formed on at least part of the surface of the substrate (17) between the substrate (17) and an ambient medium with a refractive index nA, preferably with nA=1.0. The antireflection coating (16) consists of a single layer of a material with a refractive index nL of about nL=√{square root over (nAnS)}, in particular nL>1.3, and the optical thickness dL of the single layer is about λ/4. The optical element (14) is preferably part of a projection objective (5) in a microlithography projection exposure apparatus (1) and located adjacent to a light-sensitive substrate (10).
摘要翻译：对于紫外线波长范围在250nm以下，特别是193nm的波长λ的辐射透光的光学元件（14）包括折射率nS大于1.6的基板（17）和抗反射涂层（16）形成在衬底（17）和具有折射率nA，优选nA = 1.0的环境介质之间的衬底（17）的至少部分表面上。抗反射涂层（16）由折射率nL约为nL =√{平方根（nAnS）}的材料的单层组成，特别是nL> 1.3，单层的光学厚度dL约为 λ/ 4。光学元件（14）优选在微光刻投影曝光装置（1）中的投影物镜（5）的一部分，并且位于与感光基板（10）相邻的位置。

8. 发明申请

US20080192335A1 Optical Element with an Antireflection Coating, Projection Objective, and Exposure Apparatus Comprising Such an Element 有权
标题翻译：具有抗反射涂层的光学元件，投射物镜和包括这种元件的曝光装置
公开(公告)号：US20080192335A1
公开(公告)日：2008-08-14
申请号：US11917500
申请日：2006-06-13
申请人： Christoph Zaczek , Alexandra Pazidis
发明人： Christoph Zaczek , Alexandra Pazidis
IPC分类号： G02B5/20 , G02B1/11
CPC分类号： G03F7/70958 , G02B1/02 , G02B1/113 , G02B1/115 , G03F7/70341 , G03F7/70941
摘要： An optical element (14) transparent for radiation with a wavelength λ in the ultraviolet wavelength range below 250 nm, in particular at 193 nm, comprises a substrate (17) with a refractive index nS larger than 1.6, and an antireflection coating (16) formed on at least part of the surface of the substrate (17) between the substrate (17) and an ambient medium with a refractive index nA, preferably with nA=1.0. The antireflection coating (16) consists of a single layer of a material with a refractive index nL of about nL=√{square root over (nAnS)}, in particular nL>1.3, and the optical thickness dL of the single layer is about λ/4. The optical element (14) is preferably part of a projection objective (5) in a microlithography projection exposure apparatus (1) and located adjacent to a light-sensitive substrate (10).
摘要翻译：在紫外线波长范围在250nm以下，特别是193nm的波长为λ的辐射透明的光学元件（14）包括具有大于1.6的折射率n S S的衬底（17），以及形成在基板（17）的表面的至少部分之间的抗反射涂层（16），所述基板（17）和折射率为n A的环境介质之间，优选为n < SUB> A = 1.0。抗反射涂层（16）由单层材料构成，折射率为nLL的材料的平均根数超过（n A 特别是nL 1.3，单层的光学厚度d L L大约是λ / 4。光学元件（14）优选在微光刻投影曝光装置（1）中的投影物镜（5）的一部分，并且位于与感光基板（10）相邻的位置。

9. 发明授权

US09684252B2 Optical element with an antireflection coating, projection objective, and exposure apparatus comprising such an element 有权
公开(公告)号：US09684252B2
公开(公告)日：2017-06-20
申请号：US13281138
申请日：2011-10-25
申请人： Christoph Zaczek , Alexandra Pazidis
发明人： Christoph Zaczek , Alexandra Pazidis
IPC分类号： G03F7/20 , G02B1/113 , G02B1/115 , G02B1/02
CPC分类号： G03F7/70958 , G02B1/02 , G02B1/113 , G02B1/115 , G03F7/70341 , G03F7/70941
摘要： An optical element (14) transparent for radiation with a wavelength λ in the ultraviolet wavelength range below 250 nm, in particular at 193 nm, comprises a substrate (17) with a refractive index ns larger than 1.6, and an antireflection coating (16) formed on at least part of the surface of the substrate (17) between the substrate (17) and an ambient medium with a refractive index nA, preferably with nA=1.0. The antireflection coating (16) consists of a single layer of a material with a refractive index nL of about nL=√{square root over (nAnS)}, in particular nL>1.3, and the optical thickness dL of the single layer is about λ/4. The optical element (14) is preferably part of a projection objective (5) in a microlithography projection exposure apparatus (1) and located adjacent to a light-sensitive substrate (10).

10. 发明授权

US08435726B2 Method of processing an optical element and an optical element, in particular for a microlithographic projection exposure apparatus 有权
标题翻译：特别是用于微光刻投影曝光装置的光学元件和光学元件的处理方法
公开(公告)号：US08435726B2
公开(公告)日：2013-05-07
申请号：US12135781
申请日：2008-06-09
申请人： Alexandra Pazidis , Christoph Zaczek , Alexander Hirnet , Herbert Fink , Dieter Schmerek
发明人： Alexandra Pazidis , Christoph Zaczek , Alexander Hirnet , Herbert Fink , Dieter Schmerek
IPC分类号： G02B3/00
CPC分类号： G03F7/70958
摘要： A method of processing an optical element which has a substrate (110) and a layer system (120) applied to the substrate (110), wherein the layer system (120) in a starting condition has a plurality of volume defects (130), wherein the method includes at least partially filling at least one of the volume defects (130) with a filling material (140). Also disclosed is an associated method of manufacturing an optical element.
摘要翻译：一种处理光学元件的方法，所述光学元件具有施加到所述衬底（110）上的衬底（110）和层系统（120），其中处于起始状态的层系统（120）具有多个体积缺陷（130），其中所述方法包括用填充材料（140）至少部分地填充所述体积缺陷（130）中的至少一个。还公开了一种制造光学元件的相关方法。

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