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1. 发明专利

JPH0251509A UNSATURATED BETA-KETO-ESTER ACETAL, AND ITS PREPARATION AND USE 失效
公开(公告)号：JPH0251509A
公开(公告)日：1990-02-21
申请号：JP15033389
申请日：1989-06-13
申请人： CIBA GEIGY AG
发明人： SCHULTHESS ADRIAN , HUNZIKER MAX
IPC分类号： C07D207/452 , C07D317/30 , C07D319/06 , C07D405/12 , C08F16/14 , C08F20/26 , C08F20/52 , C08F22/36 , C08F116/16 , C08F120/26 , C08F120/58 , C08F122/00 , C08F122/20 , C08F122/38 , C08F122/40 , G03F7/004 , H01L21/027

2. 发明专利

AU683002B2 Aliphatic epoxy compounds 未知
公开(公告)号：AU683002B2
公开(公告)日：1997-10-23
申请号：AU1009097
申请日：1997-01-09
申请人： CIBA GEIGY AG
发明人： STEINMANN BETTINA , WOLF JEAN PIERRE , SCHULTHESS ADRIAN , HUNZIKER MAX
IPC分类号： C07D303/40 , C08G59/20 , C08G59/24 , C08G59/32 , G03F7/027
摘要： New (cyclo)aliphatic epoxide compounds which contain at least one acrylate group and at least one cycloaliphatic epoxide group in the molecule can be used for the preparation of coating compositions, adhesives, photoresists or in stereolithography; since they contain a coherent, homogeneous network, the mouldings have very good green strength and very good strength properties.

3. 发明专利

AU671184B2 Polymerisable compositions containing tetraacrylates 未知
公开(公告)号：AU671184B2
公开(公告)日：1996-08-15
申请号：AU5759194
申请日：1994-03-04
申请人： CIBA GEIGY AG
发明人： WOLF JEAN-PIERRE , SCHULTHESS ADRIAN , STEINMANN BETTINA , HUNZIKER MAX
IPC分类号： C08F20/34 , C08F20/10 , C08F290/00 , C08F299/02 , C08G18/67 , C09D4/00 , G03F7/00 , G03F7/027 , C08F120/36 , C08F220/36 , G03F7/031
摘要： Photopolymerisable mixtures containing (a) a tetraacrylate of the formula I or II in which R1 is a hydrogen atom or methyl, X1 and X2, independently of one another, are each -O- or -CO-O-, R2 is a divalent, aliphatic, cycloaliphatic or aromatic radical of a diglycidyl compound no longer containing glycidyl ether or ester groups, A is a divalent aliphatic, cycloaliphatic or aromatic radical of a diisocyanate compound no longer containing isocyanate groups, n is an integer from 1 to 8, and R3 is a tetravalent cycloaliphatic radical of a diepoxide compound no longer containing 1,2-epoxide groups bonded to the cycloaliphatic ring, (b) at least one liquid, free-radical-polymerisable compound other than component (a), and (c) a free-radical photoinitiator, are preferentially suitable for the production of three-dimensional articles by stereolithography.

4. 发明专利

AU658780B2 Photosensitive compositions 未知
公开(公告)号：AU658780B2
公开(公告)日：1995-04-27
申请号：AU5252493
申请日：1993-12-20
申请人： CIBA GEIGY AG
发明人： STEINMANN BETTINA , WOLF JEAN-PIERRE , SCHULTHESS ADRIAN , HUNZIKER MAX
IPC分类号： C08G59/18 , C08F283/00 , C08F283/10 , C08G59/00 , C08G59/14 , C08G59/40 , C08G59/62 , C08G59/68 , C08L63/00 , G03F7/00 , G03F7/027 , G03F7/029 , G03F7/038 , C08L63/10 , C08L67/00 , C08L67/04 , C08L71/00 , C08L75/04
摘要： The invention relates to photosensitive compositions containing A) 40-80% by weight of at least one liquid epoxy resin having an epoxide functionality equal to or greater than 2, B) 0.1-10% by weight of at least one cationic photoinitiator for component A), C) 5-40% by weight of at least one liquid cycloaliphatic or aromatic diacrylate, D) 0-15% by weight of at least one liquid poly(meth)acrylate having a (meth)acrylate functionality greater than 2, the content of component D) in the total (meth)acrylate content being at most 50% by weight, E) 0.1-10% by weight of at least one free-radical photoinitiator for the components C) and, if present, D) and F) 5-40% by weight of at least one OH-terminated polyether, polyester or polyurethane, which compositions are particularly suitable, for example, for producing photopolymerised layers, especially of three-dimensional objects.

5. 发明专利

HK1005630A1 Photosensitive acrylate mixture 未知
公开(公告)号：HK1005630A1
公开(公告)日：1999-01-15
申请号：HK98104761
申请日：1998-06-02
申请人： CIBA GEIGY AG
发明人： STEINMANN BETTINA , WIESENDANGER ROLF , SCHULTHESS ADRIAN , HUNZIKER MAX
IPC分类号： C08F2/48 , C08F290/00 , C08F2/50 , C08F299/06 , C09D4/00 , C09D4/02 , G03F7/00 , G03F7/027 , G03F7/04 , G03F , G03C
摘要： Liquid mixtures containing (1) 40 to 80% by weight of a urethane (meth)acrylate having a functionality of 2 to 4 and a molecular weight (MG) of 500 to 10,000, (2) 5 to 40% by weight of an aliphatic or cycloaliphatic di(meth)acrylate containing hydroxyl groups, (3) 0 to 40% by weight of a mono(meth)acrylate or a mono-N-vinyl compound having an MG of not more than 500, (4) 0.1 to 10% by weight of a photoinitiator, (5) 0 to 30% by weight of an aliphatic or cycloaliphatic di(meth)acrylate which is different from (2), an aliphatic tri(meth)acrylate or an aromatic di- or tri(meth)acrylate, and (6) 0 to 5% by weight of standard additives, the proportion of the components (1) to (6) taken together being 100% by weight, are photosensitive mixtures which can be polymerised by means of actinic irradiation and are preferably suitable for producing three-dimensional objects by means of the stereolithographic process.

6. 发明专利

HK1005623A1 New(cyclo) aliphatic epoxy compounds 未知
公开(公告)号：HK1005623A1
公开(公告)日：1999-01-15
申请号：HK98104762
申请日：1998-06-02
申请人： CIBA GEIGY AG
发明人： STEINMANN BETTINA , WOLF JEAN-PIERRE , SCHULTHESS ADRIAN , HUNZIKER MAX
IPC分类号： C07D303/40 , C08G59/20 , C08G59/24 , C08G59/32 , G03F7/027 , C08G , C07D , C08L , G03F
摘要： New (cyclo)aliphatic epoxide compounds which contain at least one acrylate group and at least one cycloaliphatic epoxide group in the molecule can be used for the preparation of coating compositions, adhesives, photoresists or in stereolithography; since they contain a coherent, homogeneous network, the mouldings have very good green strength and very good strength properties.

7. 发明专利

CA2117572C LIQUID RADIATION-CURABLE FORMULATION, IN PARTICULAR FOR USE IN STEREOLITHOGRAPHY 未知
公开(公告)号：CA2117572C
公开(公告)日：1998-10-13
申请号：CA2117572
申请日：1994-08-24
申请人： CIBA GEIGY AG
发明人： WOLF JEAN-PIERRE , SCHULTHESS ADRIAN , STEINMANN BETTINA , HUNZIKER MAX
IPC分类号： C08F2/44 , C08F2/48 , C08F2/50 , C08F20/10 , C08F20/22 , C08F20/26 , C08F20/34 , C08F20/38 , C08F26/10 , C08F220/18 , C08F220/20 , C08F220/22 , C08F220/26 , C08F220/34 , C08F220/38 , C08F226/10 , C08F283/00 , C08G77/46 , C09D183/12 , G03C9/08 , G03F7/00 , G03F7/032 , G03F7/038 , G03F7/075
摘要： Liquid radiation-curable formation, in particular for stereolithography, based o n at least one compound that contains radically polymerisable groups, and at least one phot oinitiator suitable for the polymerisation, which formulation additionally contains a polyo xyalkylene-polysiloxane block copolymer that is selected from copolymers of the chemical formulae (I): R1-(OCcH2c)d-{¢T!-(CcH2cO)d-l-(CcH2c-OR1 (see fig. I) and (see fig. II) wherein: R1 is a hydrogen atom or a C1-C8alkyl group; R2 is a methyl or phenyl group; ¢T! is a polysiloxane group ¢PS! terminated as described in the specification in more detail; ¢PS! is the group of formula (see fig. III) and ¢Alk! is an alkylene group of 3 to 10 carbon atoms, as well as novel block c opolymers of formulae (I) and (II). The cured formulations have, inter alia, superior impa ct strength.

8. 发明专利

AU5759194A Polymerisable compositions containing tetraacrylates 未知
公开(公告)号：AU5759194A
公开(公告)日：1994-09-08
申请号：AU5759194
申请日：1994-03-04
申请人： CIBA GEIGY AG
发明人： WOLF JEAN-PIERRE , SCHULTHESS ADRIAN , STEINMANN BETTINA , HUNZIKER MAX
IPC分类号： C08F20/34 , C08F20/10 , C08F290/00 , C08F299/02 , C08G18/67 , C09D4/00 , G03F7/00 , G03F7/027 , C08F120/36 , C08F220/36 , G03F7/031
摘要： Photopolymerisable mixtures containing (a) a tetraacrylate of the formula I or II in which R1 is a hydrogen atom or methyl, X1 and X2, independently of one another, are each -O- or -CO-O-, R2 is a divalent, aliphatic, cycloaliphatic or aromatic radical of a diglycidyl compound no longer containing glycidyl ether or ester groups, A is a divalent aliphatic, cycloaliphatic or aromatic radical of a diisocyanate compound no longer containing isocyanate groups, n is an integer from 1 to 8, and R3 is a tetravalent cycloaliphatic radical of a diepoxide compound no longer containing 1,2-epoxide groups bonded to the cycloaliphatic ring, (b) at least one liquid, free-radical-polymerisable compound other than component (a), and (c) a free-radical photoinitiator, are preferentially suitable for the production of three-dimensional articles by stereolithography.

9. 发明专利

CA2088031A1 NOVEL DIACRYLATES AND DIMETHACRYLATES 未知
公开(公告)号：CA2088031A1
公开(公告)日：1993-07-28
申请号：CA2088031
申请日：1993-01-25
申请人： CIBA GEIGY AG
发明人： STEINMANN BETTINA , SCHULTHESS ADRIAN , HUNZIKER MAX
IPC分类号： C07B61/00 , C07C69/54 , C08F2/48 , C08F20/30 , G03C1/73 , G03F7/027 , G03F7/028 , C07C317/46 , C07C323/62 , C07C69/75
摘要： FS/K-18945/A Novel diacrylates and dimethacrylates Compounds of formulae (Ia) and (Ib) (Ia), (Ib), wherein the substituents R1 are each independently of the other hydrogen or methyl, R2 is an unsubstituted C1-C20alkyl group or a C1-C20alkyl group which is substituted by one or more than one substituent selected from the group consisting of hydroxy, C6-C14aryl and halogen, an unsubstituted phenyl group or a phenyl group which issubstituted by one or more than one substituent selected from the group consisting of C1-C6alkyl, hydroxy or halogen, or is a radical of formula -CH2-OR3, wherein R3 is an unsubstituted C1-C20alkyl group or a C1-C20alkyl group which is substituted by one or more than one substituent selected from the group consisting of hydroxy, C6-C14aryl and halogen, an unsubstituted phenyl group or a phenyl group which is substituted by one or more than one substituent selected from the group consisting of C1-C6alkyl, hydroxy and halogen, or is a C2-C6alkenyl group, a C2-C20acyl group or an unsubstituted cyclohexyl-carbonyl group or a cyclohexylcarbonyl group which is substituted by one or more than one substituent selected from the group consisting of C1-C6alkyl, hydroxy and halogen, Z is a group of formulae (IIa)-(IIe) (IIa), (IIb), (IIc), (IId), (IIe), wherein Y is a direct bond, C1-C6alkylene, -S-, -O-, -SO-, -SO2- or -CO-, and R1 is hydrogen or methyl, and wherein the aromatic and cycloaliphatic rings of formulae (IIa)-(IIe) are unsubstituted or substituted by one or more than one substituent selected from the group consisting of C1-C6alkyl, chloro and bromo, form, in conjunction with other acrylates or methacrylates, low viscosity photocurable compositions which, when fully cured, give moulded articles of excellent flexibility.

10. 发明专利

CA2028537A1 PROCESS FOR ADJUSTING THE SENSITIVITY TO RADIATION OF PHOTOPOLYMERIZABLE COMPOSITIONS 未知
公开(公告)号：CA2028537A1
公开(公告)日：1991-04-28
申请号：CA2028537
申请日：1990-10-25
申请人： CIBA GEIGY AG
发明人： HOFMANN MANFRED , KLINGERT BERND , HUNZIKER MAX , WIESENDANGER ROLF , SCHULTHESS ADRIAN , BERNHARD PAUL
IPC分类号： B29C67/00 , C08F2/48 , C08F4/00 , C08F4/32 , C08F4/42 , C08F20/10 , C08F20/20 , C08F299/02 , G03F7/00 , G03F7/028 , G03F7/029 , G03F7/031
摘要： A method is described for producing photopolymerisable compositions by adjusting the photosensitivity, in which the photopolymerisable compositions can be photopolymerised by irradiation with emission lines of different wavelength from a UV/visible laser light source and contain a photopolymerisable compound and at least two photoinitiators. The ratio of the concentrations of the individual photoinitiators is adjusted in such a way that the composition has virtually the same optical density for the irradiation of the different emission lines at which the photoinitiators are active.

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