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1. 发明授权

US08755928B2 Automatic selection of reference spectra library 有权
标题翻译：自动选择参考光谱库
公开(公告)号：US08755928B2
公开(公告)日：2014-06-17
申请号：US13095802
申请日：2011-04-27
申请人： Jimin Zhang , Harry Q. Lee , Zhihong Wang , Jeffrey Drue David , Boguslaw A. Swedek , Dominic J. Benvegnu
发明人： Jimin Zhang , Harry Q. Lee , Zhihong Wang , Jeffrey Drue David , Boguslaw A. Swedek , Dominic J. Benvegnu
IPC分类号： G06F19/24
CPC分类号： B24B37/013 , B24B37/042 , B24B49/05 , B24B49/12 , G01J3/28
摘要： A computer-implemented method of generating reference spectra includes polishing a plurality of set-up substrates, the plurality of set-up substrates comprising at least three set-up substrates, measuring a sequence of spectra from each of the plurality of set-up substrates during polishing with an in-situ optical monitoring system to provide a plurality of sequences of spectra, generating a plurality of sequences of potential reference spectra from the plurality of sequences of spectra, determining which sequence of potential reference spectra of the plurality of sequences provides a best match to remaining sequences of the plurality of sequences, and storing the sequence of potential reference spectra determined to provide the best match as reference spectra, and selecting and storing the sequence of potential reference spectra.
摘要翻译：计算机实现的产生参考光谱的方法包括抛光多个设置基板，所述多个设置基板包括至少三个设置基板，测量来自多个设置基板中的每一个的光谱序列在用原位光学监测系统进行抛光时提供多个光谱序列，从多个光谱序列产生多个潜在参考光谱序列，确定多个序列中的哪个潜在参考光谱序列提供一个最佳匹配多个序列的剩余序列，并存储确定为提供最佳匹配的参考光谱序列作为参考光谱，以及选择和存储潜在参考光谱序列。

2. 发明授权

US08535115B2 Gathering spectra from multiple optical heads 有权
公开(公告)号：US08535115B2
公开(公告)日：2013-09-17
申请号：US13016504
申请日：2011-01-28
申请人： Jeffrey Drue David , Boguslaw A. Swedek , Dominic J. Benvegnu , Sivakumar Dhandapani
发明人： Jeffrey Drue David , Boguslaw A. Swedek , Dominic J. Benvegnu , Sivakumar Dhandapani
IPC分类号： B24B1/00
CPC分类号： B24B49/12 , B24B37/013 , B24B37/105
摘要： A polishing apparatus includes a platen to hold a polishing pad having a plurality of optical apertures, a carrier head to hold a substrate against the polishing pad, a motor to generate relative motion between the carrier head and the platen, and an optical monitoring system. The optical monitoring system includes at least one light source, a common detector, and an optical assembly configured to direct light from the at least one light source to each of a plurality of separated positions in the platen, to direct light from each position of the plurality of separated positions to the substrate as the substrate passes over said each position, to receive reflected light from the substrate as the substrate passes over said each position, and to direct the reflected light from each of the plurality of separated positions to the common detector.

3. 发明授权

US08292693B2 Using optical metrology for wafer to wafer feed back process control 有权
标题翻译：使用光学测量技术进行晶圆反馈过程控制
公开(公告)号：US08292693B2
公开(公告)日：2012-10-23
申请号：US12625480
申请日：2009-11-24
申请人： Jeffrey Drue David , Harry Q. Lee , Boguslaw A. Swedek , Dominic J. Benvegnu , Zhize Zhu , Wen-Chiang Tu
发明人： Jeffrey Drue David , Harry Q. Lee , Boguslaw A. Swedek , Dominic J. Benvegnu , Zhize Zhu , Wen-Chiang Tu
IPC分类号： B24B49/00 , B24B51/00 , B24B1/00 , C23F1/00 , H01L21/306 , H01L21/302 , H01L21/461 , G01N21/55 , G01B11/06 , G06F19/00
CPC分类号： B24B37/013 , B24B49/12 , H01L22/12 , H01L22/20 , H01L2924/0002 , H01L2924/00
摘要： A method of controlling the polishing of a substrate includes polishing a substrate on a first platen using a first set of parameters, obtaining first and second sequences of measured spectra from first and second regions of the substrate with an in-situ optical monitoring system, generating first and second sequences of values from the first and second sequences of measured spectra, fitting first and second linear functions to the first and second sequences of values, determining a difference between the first linear function and the second linear function, adjusting at least one parameter of the first set of parameters based on the difference, and polishing the second substrate on the first platen using the adjusted parameter.
摘要翻译：控制衬底抛光的方法包括使用第一组参数在第一压板上抛光衬底，用原位光学监测系统从衬底的第一和第二区域获得测量光谱的第一和第二序列，产生来自第一和第二测量光谱序列的第一和第二序列值，将第一和第二线性函数拟合到第一和第二序列序列，确定第一线性函数和第二线性函数之间的差异，调整至少一个参数基于所述差异的所述第一组参数，并且使用所述调整参数来研磨所述第一台板上的所述第二基板。

4. 发明申请

US20120196511A1 Gathering Spectra From Multiple Optical Heads 有权
标题翻译：从多个光头收集光谱
公开(公告)号：US20120196511A1
公开(公告)日：2012-08-02
申请号：US13016504
申请日：2011-01-28
申请人： Jeffrey Drue David , Boguslaw A. Swedek , Dominic J. Benvegnu , Sivakumar Dhandapani
发明人： Jeffrey Drue David , Boguslaw A. Swedek , Dominic J. Benvegnu , Sivakumar Dhandapani
IPC分类号： B24B49/00
CPC分类号： B24B49/12 , B24B37/013 , B24B37/105
摘要： A polishing apparatus includes a platen to hold a polishing pad having a plurality of optical apertures, a carrier head to hold a substrate against the polishing pad, a motor to generate relative motion between the carrier head and the platen, and an optical monitoring system. The optical monitoring system includes at least one light source, a common detector, and an optical assembly configured to direct light from the at least one light source to each of a plurality of separated positions in the platen, to direct light from each position of the plurality of separated positions to the substrate as the substrate passes over said each position, to receive reflected light from the substrate as the substrate passes over said each position, and to direct the reflected light from each of the plurality of separated positions to the common detector.
摘要翻译：抛光装置包括用于保持具有多个光学孔的抛光垫的压板，用于将衬底保持在抛光垫上的载体头，用于在承载头和压板之间产生相对运动的电动机以及光学监控系统。所述光学监视系统包括至少一个光源，公共检测器和配置成将来自所述至少一个光源的光引导到所述压板中的多个分离位置中的每一个的光学组件，以引导来自所述至少一个光源的每个位置的光当衬底越过所述每个位置时，多个分离的位置到衬底，以在衬底经过所述每个位置时接收来自衬底的反射光，并将来自多个分离位置中的每一个的反射光引导到公共检测器。

5. 发明授权

US08039397B2 Using optical metrology for within wafer feed forward process control 有权
标题翻译：使用光学测量在晶片前馈过程控制中
公开(公告)号：US08039397B2
公开(公告)日：2011-10-18
申请号：US12625489
申请日：2009-11-24
申请人： Jeffrey Drue David , Harry Q. Lee , Boguslaw A. Swedek , Dominic J. Benvegnu , Zhize Zhu , Wen-Chiang Tu
发明人： Jeffrey Drue David , Harry Q. Lee , Boguslaw A. Swedek , Dominic J. Benvegnu , Zhize Zhu , Wen-Chiang Tu
IPC分类号： H01L21/302
CPC分类号： B24B37/013 , B24B49/12 , H01L22/12 , H01L22/20 , H01L2924/0002 , H01L2924/00
摘要： A method of controlling the polishing of a substrate includes polishing a substrate on a first platen using a first set of parameters, obtaining first and second sequences of measured spectra from first and second regions of the substrate with an in-situ optical monitoring system, generating first and second sequences of values from the first and second sequences of measured spectra, fitting first and second linear functions to the first and second sequences of values, determining a difference between the first linear function and the second linear function, adjusting at least one parameter of a second set of parameters based on the difference, and polishing the substrate on a second platen using the adjusted parameter.
摘要翻译：控制衬底抛光的方法包括使用第一组参数在第一压板上抛光衬底，用原位光学监测系统从衬底的第一和第二区域获得测量光谱的第一和第二序列，产生来自第一和第二测量光谱序列的第一和第二序列值，将第一和第二线性函数拟合到第一和第二序列序列，确定第一线性函数和第二线性函数之间的差异，调整至少一个参数基于所述差异的第二组参数，以及使用所述调整参数在所述第二压板上抛光所述衬底。

6. 发明授权

US07840375B2 Methods and apparatus for generating a library of spectra 有权
标题翻译：用于生成光谱库的方法和装置
公开(公告)号：US07840375B2
公开(公告)日：2010-11-23
申请号：US12059435
申请日：2008-03-31
申请人： Abraham Ravid , Boguslaw A. Swedek , Dominic J. Benvegnu , Jeffrey Drue David , Jun Qian , Sidney P. Huey , Ingemar Carlsson , Lakshmanan Karuppiah , Harry Q. Lee
发明人： Abraham Ravid , Boguslaw A. Swedek , Dominic J. Benvegnu , Jeffrey Drue David , Jun Qian , Sidney P. Huey , Ingemar Carlsson , Lakshmanan Karuppiah , Harry Q. Lee
IPC分类号： G01B5/00 , G06F19/00
CPC分类号： G01N21/31 , G01N21/253 , H01L21/67161 , H01L21/67207 , H01L21/67253 , H01L21/67766
摘要： A method of generating a library from a reference substrate for use in processing product wafers is described. The method includes measuring substrate characteristics at a plurality of well-defined points of a reference substrate, measuring spectra at plurality of measurement points of the reference substrate, there being more measurement points than well-defined points, and associating measured spectra with measured substrate characteristics.
摘要翻译：描述了从用于处理产品晶片的参考基板产生库的方法。该方法包括在参考基板的多个明确定义的点处测量衬底特性，测量参考衬底的多个测量点处的光谱，存在比明确定义的点多的测量点，以及将测量的光谱与测量的衬底特性相关联。

7. 发明申请

US20090033942A1 Determining Physical Property of Substrate 有权
标题翻译：确定基材的物理性质
公开(公告)号：US20090033942A1
公开(公告)日：2009-02-05
申请号：US12253160
申请日：2008-10-16
申请人： Abraham Ravid , Boguslaw A. Swedek , Jeffrey Drue David , Jun Qian , Ingemar Carlsson , Dominic J. Benvegnu , Harry Q. Lee , Lakshmanan Karuppiah
发明人： Abraham Ravid , Boguslaw A. Swedek , Jeffrey Drue David , Jun Qian , Ingemar Carlsson , Dominic J. Benvegnu , Harry Q. Lee , Lakshmanan Karuppiah
IPC分类号： G01N21/55 , G01B11/02
CPC分类号： G01B11/0683 , G01B11/0625 , Y10S707/99936
摘要： A method of determining a physical property of a substrate includes recording a first spectrum obtained from a substrate, the first spectrum being obtained during a polishing process that alters a physical property of the substrate. The method includes identifying, in a database, at least one of several previously recorded spectra that is similar to the recorded first spectrum. Each of the spectra in the database has a physical property value associated therewith. The method includes generating a signal indicating that a first value of the physical property is associated with the first spectrum, the first value being determined using the physical property value associated with the identified previously recorded spectrum in the database. A system for determining a physical property of a substrate includes a polishing machine, an endpoint determining module, and a database.
摘要翻译：确定基板的物理性质的方法包括记录从基板获得的第一光谱，第一光谱是在改变基板的物理性质的抛光工艺期间获得的第一光谱。该方法包括在数据库中识别与记录的第一光谱相似的几个先前记录的光谱中的至少一个。数据库中的每个光谱具有与之相关联的物理属性值。该方法包括产生指示物理属性的第一值与第一频谱相关联的信号，第一值使用与数据库中所识别的先前记录的频谱相关联的物理属性值来确定。用于确定基板的物理性质的系统包括抛光机，端点确定模块和数据库。

8. 发明申请

US20080239308A1 HIGH THROUGHPUT MEASUREMENT SYSTEM 失效
标题翻译：高通量测量系统
公开(公告)号：US20080239308A1
公开(公告)日：2008-10-02
申请号：US12059464
申请日：2008-03-31
申请人： Abraham Ravid , Boguslaw A. Swedek , Dominic J. Benvegnu , Jeffrey Drue David , Jun Qian , Sidney P. Huey , Ingemar Carlsson , Lakshmanan Karuppiah , Harry Q. Lee
发明人： Abraham Ravid , Boguslaw A. Swedek , Dominic J. Benvegnu , Jeffrey Drue David , Jun Qian , Sidney P. Huey , Ingemar Carlsson , Lakshmanan Karuppiah , Harry Q. Lee
IPC分类号： G01J3/40
CPC分类号： G01N21/31 , G01N21/253 , H01L21/67161 , H01L21/67207 , H01L21/67253 , H01L21/67766
摘要： A substrate processing system includes a processing module to process a substrate, a factory interface module configured to accommodate at least one cassette for holding the substrate, a spectrographic monitoring system positioned in or adjoining the factory interface module, and a substrate handler to transfer the substrate between the at least one cassette, the spectrographic monitoring system and the processing module.
摘要翻译：衬底处理系统包括处理衬底的处理模块，被配置为容纳用于保持衬底的至少一个盒的工厂接口模块，位于工厂接口模块中或邻接工厂接口模块的光谱监测系统，以及衬底处理器，用于传送衬底在所述至少一个盒，所述光谱监视系统和所述处理模块之间。

9. 发明授权

US08569174B2 Using spectra to determine polishing endpoints 有权
公开(公告)号：US08569174B2
公开(公告)日：2013-10-29
申请号：US12036174
申请日：2008-02-22
申请人： Harry Q. Lee , Boguslaw A. Swedek , Dominic J. Benvegnu , Jeffrey Drue David
发明人： Harry Q. Lee , Boguslaw A. Swedek , Dominic J. Benvegnu , Jeffrey Drue David
IPC分类号： H01L21/302 , H01L21/461 , B44C1/22 , C03C15/00 , C03C25/68 , G06F19/00
CPC分类号： H01L22/12 , B24B37/013 , B24B49/12 , H01L21/30625 , H01L2924/0002 , H01L2924/00
摘要： Methods of determining a polishing endpoint are described using spectra obtained during a polishing sequence. In particular, techniques for using only desired spectra, faster searching methods and more robust rate determination methods are described.

10. 发明授权

US08369978B2 Adjusting polishing rates by using spectrographic monitoring of a substrate during processing 有权
标题翻译：通过在加工过程中使用基板的光谱监测来调整抛光速率
公开(公告)号：US08369978B2
公开(公告)日：2013-02-05
申请号：US12553870
申请日：2009-09-03
申请人： Jeffrey Drue David , Dominic J. Benvegnu , Harry Q. Lee , Boguslaw A. Swedek
发明人： Jeffrey Drue David , Dominic J. Benvegnu , Harry Q. Lee , Boguslaw A. Swedek
IPC分类号： G06F19/00 , B24B49/00 , H01L21/00 , H01L21/302 , G01N21/00 , G01B11/28 , G01B11/02
CPC分类号： B24B37/005 , B24B37/013 , B24B49/12 , H01L21/302
摘要： A computer-implemented method includes receiving a sequence of current spectra of reflected light from a substrate; comparing each current spectrum from the sequence of current spectra to a plurality of reference spectra from a reference spectra library to generate a sequence of best-match reference spectra; determining a goodness of fit for the sequence of best-match reference spectra; and determining at least one of whether to adjust a polishing rate or an adjustment for the polishing rate, based on the goodness of fit.
摘要翻译：计算机实现的方法包括从基板接收反射光的当前光谱序列; 将来自当前光谱序列的每个当前光谱与来自参考光谱库的多个参考光谱进行比较，以生成最佳匹配参考光谱的序列; 确定最佳匹配参考光谱序列的拟合优度; 以及基于拟合优度确定是否调整抛光速率或抛光速率的调整中的至少一个。

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