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1. 发明申请

WO2008136666A2 IMAGE SENSOR, METHOD FOR IMAGE DETECTION AND COMPUTER PROGRAM PRODUCT 审中-公开
标题翻译：图像传感器，图像检测方法和计算机程序产品
公开(公告)号：WO2008136666A2
公开(公告)日：2008-11-13
申请号：PCT/NL2008/050264
申请日：2008-04-29
申请人： ASML Netherlands B.V. , STAALS, Frank , LOF, Joeri , LOOPSTRA, Erik, Roelof , TEL, Wim, Tjibbo , MOEST, Bearrach
发明人： STAALS, Frank , LOF, Joeri , LOOPSTRA, Erik, Roelof , TEL, Wim, Tjibbo , MOEST, Bearrach
IPC分类号： G03F7/20 , G03F9/00
CPC分类号： G03F7/7085 , G03F7/70341 , G03F7/70483 , G03F9/7088
摘要： The invention relates to an image for detection of an aerial pattern comprising spatial differences in radiation intensity in a cross section of a beam of radiation in a lithographic apparatus for exposing a substrate. The image sensor comprises a lens arranged to form a detection image of the aerial pattern and an image detector arranged to measure radiation intensities in a plurality of positions in the detection image.
摘要翻译：本发明涉及一种用于检测天线图案的图像，其包括用于曝光基板的光刻设备中的辐射束的横截面中的辐射强度的空间差异。图像传感器包括布置成形成天线图案的检测图像的透镜和布置成测量检测图像中的多个位置中的辐射强度的图像检测器。

2. 发明申请

WO2014044496A3 METHOD OF CALIBRATING A RELUCTANCE ACTUATOR ASSEMBLY, RELUCTANCE ACTUATOR AND LITHOGRAPHIC APPARATUS COMPRISING SUCH RELUCTANCE ACTUATOR 审中-公开
公开(公告)号：WO2014044496A3
公开(公告)日：2014-03-27
申请号：PCT/EP2013/067623
申请日：2013-08-26
申请人： ASML NETHERLANDS B.V.
发明人： AKKERMANS, Johannes, Antonius, Gerardus , LEMMEN, Bas, Pieter , HUIBERTS, Sjoerd, Martijn , LOF, Joeri , RUTGERS, Petrus, Theodorus , HOL, Sven, Antoin, Johan , SINGH, Harmeet , HEIJMANS, Peter, Michel, Silvester, Maria
IPC分类号： G03F7/20 , H02K41/02 , H02K41/03 , H02K1/14 , H02K1/16 , H02K3/52 , H02K19/06 , H01L21/68 , H02K19/10 , H02P6/00
摘要： A reluctance actuator assembly comprising a reluctance actuator, a flux sensor to measure a magnetic flux in a gap of the reluctance actuator, and a flux amplifier to drive an actuator coil of the reluctance actuator based on a flux set point and the flux measured by the flux sensor. A method comprising providing to the flux amplifier a flux setpoint, the flux setpoint comprising a time constant component and a sinusoidally varying component at an excitation frequency, measuring a force generated by the reluctance actuator in response to the flux setpoint, and calibrating the reluctance actuator assembly from the measured force.

3. 发明申请

WO2017144277A1 SUBSTRATE HANDLING SYSTEM AND LITHOGRAPHIC APPARATUS 审中-公开
标题翻译：基板处理系统和光刻设备
公开(公告)号：WO2017144277A1
公开(公告)日：2017-08-31
申请号：PCT/EP2017/052806
申请日：2017-02-09
申请人： ASML NETHERLANDS B.V.
发明人： VERVOORDELDONK, Michael, Johannes , LOF, Joeri
IPC分类号： G03F7/20 , H01L21/677
CPC分类号： G03F7/7075 , G03F7/70733 , G03F7/70875
摘要： There is provided a substrate handling system (200) for handling a substrate (W), comprising a holder (202), a rotation device (206) and a mover (204). The holder is for holding the substrate. The rotation device is for rotating the holder around an axis (208) perpendicular to a plane. The mover is for moving the holder along a path in the plane relative to the axis. Further, there is provided a lithographic apparatus comprising the substrate handling system. The substrate handling system may comprise a coupling device (210) arranged to couple the holder to one of the mover and the rotation device in a first situation. The coupling device may be arranged to decouple the holder from the one of the mover and the rotation device in a second situation.
摘要翻译：提供了用于处理基板（W）的基板处理系统（200），其包括支架（202），旋转装置（206）和移动器（204）。保持器用于保持基板。旋转装置用于使支架围绕垂直于平面的轴线（208）旋转。移动器用于沿着平面中的相对于轴线的路径移动保持器。此外，提供了一种包括衬底处理系统的光刻设备。基板处理系统可以包括联接装置（210），联接装置（210）被布置成在第一情况下将支架联接到移动器和旋转装置中的一个。联接装置可以布置成在第二种情况下将保持器从动子和旋转装置中的一个解耦。

4. 发明申请

WO2015135782A1 SENSOR SYSTEM, SUBSTRATE HANDLING SYSTEM AND LITHOGRAPHIC APPARATUS 审中-公开
标题翻译：传感器系统，基板处理系统和平面设备
公开(公告)号：WO2015135782A1
公开(公告)日：2015-09-17
申请号：PCT/EP2015/054276
申请日：2015-03-02
申请人： ASML NETHERLANDS B.V.
发明人： LOF, Joeri , KAUFFMAN, Joost , PETERS, Martin, Dieter, Nico , RUTGERS, Petrus, Theodorus , STOPEL, Martijn, Hendrikus, Wilhelmus , VAN DEN EIJKEL, Gerard , VAN DER SCHOOT, Harmen, Klaas , VISSER, Raimond
IPC分类号： G03F7/20 , G03F9/00
CPC分类号： G03F7/70775 , G01B11/272 , G03F7/7075 , G03F9/7011 , H01L21/681 , H01L21/682 , H01L21/68707 , H01L22/12
摘要： The invention relates to a sensor system (PSS) configured to determine a position of a substrate (W) having an edge (WE). The sensor system comprises a radiation source (LS) arranged to emit a radiation bundle (LB), a reflective element (RE), a detector device (DD) and a substrate table (PWT) having a supporting surface for supporting the substrate. The supporting surface is at least partly along a plane. The radiation source and the detector device are arranged on a first side of the plane. The reflective element is arranged on a second side of the plane other than the first side. The reflective element is arranged to create a reflected bundle by reflecting the radiation bundle. The reflective element is arranged to illuminate the edge with the reflected bundle. The detector device is arranged to receive the reflected bundle.
摘要翻译：本发明涉及一种被配置为确定具有边缘（WE）的衬底（W）的位置的传感器系统（PSS）。传感器系统包括布置成发射辐射束（LB）的辐射源（LS），反射元件（RE），检测器装置（DD）和具有用于支撑衬底的支撑表面的衬底台（PWT）。支撑表面至少部分地沿着平面。辐射源和检测器装置布置在平面的第一侧上。反射元件布置在除了第一侧之外的平面的第二侧上。反射元件布置成通过反射辐射束来产生反射束。反射元件布置成用反射束照射边缘。检测器装置被布置成接收反射束。

5. 发明公开

EP2142961A2 IMAGE SENSOR FOR LITHOGRAPHY 审中-公开
标题翻译： BILDSENSORFÜRDIE LITHOGRAPHIE
公开(公告)号：EP2142961A2
公开(公告)日：2010-01-13
申请号：EP08741685.5
申请日：2008-04-29
申请人： ASML Netherlands B.V.
发明人： STAALS, Frank , LOF, Joeri , LOOPSTRA, Erik, Roelof , TEL, Wim, Tjibbo , MOEST, Bearrach
IPC分类号： G03F7/20 , G03F9/00
CPC分类号： G03F7/7085 , G03F7/70341 , G03F7/70483 , G03F9/7088
摘要： The invention relates to an image for detection of an aerial pattern comprising spatial differences in radiation intensity in a cross section of a beam of radiation in a lithographic apparatus for exposing a substrate. The image sensor comprises a lens (5) arranged to form a detection image of the aerial pattern and an image detector (6) arranged to measure radiation intensities in a plurality, of positions in the detection image.
摘要翻译：本发明涉及一种用于检测天线图案的图像，其包括用于曝光基板的光刻设备中的辐射束的横截面中的辐射强度的空间差异。图像传感器包括布置成形成天线图案的检测图像的透镜（5）和布置成测量检测图像中的多个位置中的辐射强度的图像检测器（6）。

6. 发明授权

EP3117270B1 SUBSTRATE HANDLING SYSTEM AND LITHOGRAPHIC APPARATUS 有权
公开(公告)号：EP3117270B1
公开(公告)日：2018-07-18
申请号：EP15707146.5
申请日：2015-03-02
申请人： ASML Netherlands B.V.
发明人： LOF, Joeri , KAUFFMAN, Joost , PETERS, Martin Dieter Nico , RUTGERS, Petrus Theodorus , STOPEL, Martijn Hendrikus Wilhelmus , VAN DEN EIJKEL, Gerard , VAN DER SCHOOT, Harmen Klaas , VISSER, Raimond
IPC分类号： G03F7/20 , G03F9/00
CPC分类号： G03F7/70775 , G01B11/272 , G03F7/7075 , G03F9/7011 , H01L21/681 , H01L21/682 , H01L21/68707 , H01L22/12
摘要： A sensor system configured to determine a position of a substrate having an edge. The sensor system includes a radiation source arranged to emit a radiation bundle, a reflective element, a detector device and a substrate table having a supporting surface for supporting the substrate. The supporting surface is at least partly along a plane. The radiation source and the detector device are arranged on a first side of the plane. The reflective element is arranged on a second side of the plane other than the first side. The reflective element is arranged to create a reflected bundle by reflecting the radiation bundle. The reflective element is arranged to illuminate the edge with the reflected bundle. The detector device is arranged to receive the reflected bundle.

7. 发明授权

EP2142961B1 LITHOGRAPHIC APPARATUS 有权
公开(公告)号：EP2142961B1
公开(公告)日：2019-06-05
申请号：EP08741685.5
申请日：2008-04-29
申请人： ASML Netherlands B.V.
发明人： STAALS, Frank , LOF, Joeri , LOOPSTRA, Erik, Roelof , TEL, Wim, Tjibbo , MOEST, Bearrach
IPC分类号： G03F7/20 , G03F9/00

8. 发明公开

EP3117270A1 SENSOR SYSTEM, SUBSTRATE HANDLING SYSTEM AND LITHOGRAPHIC APPARATUS 有权
标题翻译： LENSOGRAFISCHE VORRICHTUNG SENSORSYSTEM，SUBSTRATHANDHABUNGSSYSTEM
公开(公告)号：EP3117270A1
公开(公告)日：2017-01-18
申请号：EP15707146.5
申请日：2015-03-02
申请人： ASML Netherlands B.V.
发明人： LOF, Joeri , KAUFFMAN, Joost , PETERS, Martin Dieter Nico , RUTGERS, Petrus Theodorus , STOPEL, Martijn Hendrikus Wilhelmus , VAN DEN EIJKEL, Gerard , VAN DER SCHOOT, Harmen Klaas , VISSER, Raimond
IPC分类号： G03F7/20 , G03F9/00
CPC分类号： G03F7/70775 , G01B11/272 , G03F7/7075 , G03F9/7011 , H01L21/681 , H01L21/682 , H01L21/68707 , H01L22/12
摘要： A sensor system configured to determine a position of a substrate having an edge. The sensor system includes a radiation source arranged to emit a radiation bundle, a reflective element, a detector device and a substrate table having a supporting surface for supporting the substrate. The supporting surface is at least partly along a plane. The radiation source and the detector device are arranged on a first side of the plane. The reflective element is arranged on a second side of the plane other than the first side. The reflective element is arranged to create a reflected bundle by reflecting the radiation bundle. The reflective element is arranged to illuminate the edge with the reflected bundle. The detector device is arranged to receive the reflected bundle.
摘要翻译：一种传感器系统，被配置为确定具有边缘的基底的位置。传感器系统包括布置成发射辐射束的辐射源，反射元件，检测器装置和具有用于支撑衬底的支撑表面的衬底台。支撑表面至少部分地沿着平面。辐射源和检测器装置布置在平面的第一侧上。反射元件布置在除了第一侧之外的平面的第二侧上。反射元件布置成通过反射辐射束来产生反射束。反射元件布置成用反射束照射边缘。检测器装置被布置成接收反射束。

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