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1. 发明申请

US20160070394A1 BEZEL CIRCUIT 审中-公开
标题翻译：贝尔电路
公开(公告)号：US20160070394A1
公开(公告)日：2016-03-10
申请号：US14481589
申请日：2014-09-09
申请人： Uni-Pixel Displays, Inc.
发明人： Daniel Van Ostrand , Kenny Huy Pham
IPC分类号： G06F3/047 , G06F3/044 , G06F3/045 , G09G5/00
CPC分类号： G06F3/047 , G06F3/044 , G06F3/045 , G06F2203/04112 , G09G2300/0426 , G09G2310/0281
摘要： A method of designing a bezel circuit includes identifying a plurality of channels in a representation of a conductive pattern. For each channel, a representation of a channel connector is placed that connects to the channel outside a viewable area of the conductive pattern. An interface location outside the viewable area of the conductive pattern is identified. For each channel, a representation of an interface connector within the interface location is placed and a representation of an interconnect route that connects its placed interface connector to its corresponding placed channel connector is placed with at least a minimum interconnect route-to-interconnect route spacing. The at least one interconnect route expands into available space within a bezel area as the interconnect route routes from the interface connector toward the channel connector while maintaining the at least minimum interconnect route-to-interconnect route spacing.
摘要翻译：设计边框电路的方法包括在导电图案的表示中识别多个通道。对于每个通道，放置通道连接器的表示，其连接到导电图案的可视区域外部的通道。识别导电图案的可视区域外的界面位置。对于每个通道，放置接口位置内的接口连接器的表示，并且将其放置的接口连接器连接到其相应的放置的信道连接器的互连路由的表示被放置成具有至少最小的互连路由到互连路由间隔。当互连路由从接口连接器朝向信道连接器路由时，至少一个互连路由扩展到边框区域内的可用空间中，同时保持至少最小互连路由到互连路由间隔。

2. 发明申请

US20150234219A1 METHOD OF PASSIVATING A CONDUCTIVE PATTERN WITH SELF-ASSEMBLING MONOLAYERS 审中-公开
标题翻译：使用自组装单片机传导导图的方法
公开(公告)号：US20150234219A1
公开(公告)日：2015-08-20
申请号：US14183623
申请日：2014-02-19
申请人： Uni-Pixel Displays, Inc.
发明人： Robert J. Petcavich
IPC分类号： G02F1/1333 , G06F3/0488
CPC分类号： G02F1/13338 , G06F3/0416 , G06F3/044 , G06F3/0488 , G06F2203/04103 , G06F2203/04112
摘要： A method includes disposing a conductive pattern on a substrate. Self-assembling monolayers are applied to exposed portions of the conductive pattern. The self-assembling monolayers self-organize and bond to the exposed portions of the conductive pattern. The substrate is cleaned.
摘要翻译：一种方法包括将导电图案设置在基板上。将自组装单层施加到导电图案的暴露部分。自组装单层自组织并结合到导电图案的暴露部分。清洗基材。

3. 发明申请

US20160202811A1 METHOD OF FABRICATING ELECTRICALLY ISOLATED CONDUCTORS USING FLEXOGRAPHIC VOIDING 审中-公开
标题翻译：使用FLEXOGRAPHIC VOIDING制造电气隔离导体的方法
公开(公告)号：US20160202811A1
公开(公告)日：2016-07-14
申请号：US14594804
申请日：2015-01-12
申请人： Uni-Pixel Displays, Inc.
发明人： Kenneth B. Frame
IPC分类号： G06F3/047 , G09G5/00
CPC分类号： G06F3/044 , G06F3/041 , G06F2203/04103 , H04K1/00
摘要： A method of fabricating isolated conductors using flexographic voiding includes disposing a base pattern of catalytic material on a substrate, flexographically printing a void pattern of dielectric ink that resists metallization on a portion of the base pattern, and metallizing exposed portions of the catalytic material that are not covered by the dielectric ink.
摘要翻译：使用柔性版空洞制造隔离导体的方法包括将催化材料的基底图案设置在基底上，在印刷图案上印刷在基底图案的一部分上抵抗金属化的电介质墨的空穴图案，以及金属化催化材料的暴露部分，不被电介质墨覆盖。

4. 发明申请

US20160040294A1 METHOD OF CONTROLLING OXYGEN LEVELS FOR ELECTROLESS PLATING OF CATALYTIC FINE LINES OR FEATURES 审中-公开
标题翻译：控制催化细管线或特性的电镀镀层的氧含量的方法
公开(公告)号：US20160040294A1
公开(公告)日：2016-02-11
申请号：US14455181
申请日：2014-08-08
申请人： Uni-Pixel Displays, Inc.
发明人： Danliang Jin , John-Paul O'Neil , Yieu Chyan
IPC分类号： C23C18/16
CPC分类号： C23C18/1683 , C23C18/1608 , C23C18/1617 , C23C18/1675
摘要： A method of controlling oxygen levels for electroless plating of catalytic fine lines or features includes selecting a substrate that includes a plurality of catalytic lines or features that are part of or are disposed on the substrate. The plurality of catalytic lines or features include at least one catalytic fine line or feature and at least one catalytic standard line or feature. A dissolved oxygen concentration of an electroless plating solution is regulated to a candidate controlled oxygen level. The candidate controlled oxygen level is set to a smallest value in a regulated range in a first pass of the method. The substrate is submerged in the solution for a period of time sufficient to initiate plating of the at least one catalytic standard line or feature. The substrate is evaluated and candidate controlled oxygen level is incremented or the previous value is selected as the regulated oxygen level.
摘要翻译：控制催化细线或特征的化学镀的氧含量的方法包括选择包括多个催化剂线的基材或者作为基材的一部分或者被设置在基材上的特征。多个催化剂线或特征包括至少一个催化细线或特征以及至少一个催化标准品系或特征。将化学镀溶液的溶解氧浓度调节到候选受控氧水平。在该方法的第一次通过中，候选控制氧水平被设定在调节范围内的最小值。将基底浸入溶液中足以引发至少一种催化标准品系或特征的电镀的时间。评估底物，并增加候选控制氧水平，或选择先前的值作为调节氧水平。

5. 发明授权

US09223201B2 Method of manufacturing a photomask with flexography 有权
标题翻译：用柔版印刷制造光掩模的方法
公开(公告)号：US09223201B2
公开(公告)日：2015-12-29
申请号：US13929533
申请日：2013-06-27
申请人： Uni-Pixel Displays, Inc.
发明人： Ed S. Ramakrishnan , Robert J. Petcavich
IPC分类号： G03F1/00 , G03F1/92 , B41C1/05 , B41N1/12
CPC分类号： G03F1/92 , B41C1/05 , B41N1/12 , G03F1/68 , G03F7/202 , G03F7/2032 , G03F7/24
摘要： A method of manufacturing a flexographic printing plate includes designing a photomask patterned design. The photomask patterned designed is laser-ablated into a thermal imaging layer. The laser-ablated thermal imaging layer is laminated to a top side of a flexographic printing plate substrate. A bottom side of the flexographic printing plate substrate is exposed to UV-A radiation. The top side of the flexographic printing plate substrate is exposed to UV-A radiation. The thermal imaging layer is removed. The flexographic printing plate substrate is developed. A flexographic printing system for printing a photomask includes an ink roll, an anilox roll, a printing plate cylinder, a flexographic printing plate disposed on the printing plate cylinder, and an impression cylinder. The flexographic printing plate comprises embossing patterns corresponding to a photomask patterned design. The flexographic printing plate may be used in a flexographic printing system to manufacture a photomask with flexography.
摘要翻译：柔版印刷版的制造方法包括设计光掩模图案化设计。图案图案设计的光掩模被激光烧蚀成热成像层。将激光烧蚀的热成像层层叠到柔性版印刷基板的顶侧。柔性版印刷基板的底侧暴露于UV-A辐射。柔性版印刷基板的顶侧暴露于UV-A辐射。去除热成像层。印刷柔版印刷版基板。用于印刷光掩模的柔性版印刷系统包括墨辊，网纹辊，印版滚筒，设置在印版滚筒上的柔版印刷印版和压印滚筒。柔版印刷版包括对应于光掩模图案设计的压花图案。柔性版印刷版可以用于柔性版印刷系统中以用柔版印刷制造光掩模。

6. 发明申请

US20150237720A1 WATERMARKED CONDUCTIVE PATTERN 审中-公开
标题翻译：水印导电图案
公开(公告)号：US20150237720A1
公开(公告)日：2015-08-20
申请号：US14182164
申请日：2014-02-17
申请人： Uni-Pixel Displays, Inc.
发明人： Daniel Van Ostrand
IPC分类号： H05K1/02 , H05K1/09
CPC分类号： G06F3/044 , G06F2203/04109 , G06F2203/04112 , H05K1/0269 , H05K2201/09936 , H05K2201/10128
摘要： A watermarked conductive pattern includes a conductive pattern disposed on a transparent substrate, a plurality of watermark filler shapes disposed on the transparent substrate in a predetermined watermark area, and a plurality of background filler shapes disposed on the transparent substrate in an area adjacent to the predetermined watermark area.
摘要翻译：带有水印的导电图案包括设置在透明基板上的导电图案，在预定水印区域中设置在透明基板上的多个水印填充图形，以及布置在透明基板上的与预定水印区域相邻的区域中的多个背景填充图形。水印区域。

7. 发明申请

US20150033968A1 OPTICAL ALIGNMENT OF MULTI-STATION FLEXOGRAPHIC PRINTING SYSTEM USING MOIRE INTERFERENCE 审中-公开
标题翻译：使用光纤干涉的多站点智能打印系统的光学对位
公开(公告)号：US20150033968A1
公开(公告)日：2015-02-05
申请号：US14518923
申请日：2014-10-20
申请人： Uni-Pixel Displays, Inc.
发明人： Kevin J. Derichs , Evan M. Goldberg , Christopher Derichs
IPC分类号： B41F27/00 , B41F5/24
CPC分类号： B41F5/24 , B41F33/0081 , B41M1/04 , B41P2233/52
摘要： A method of aligning a multi-station flexographic printing system using Moiré interference includes printing, using a first flexographic printing station, at least one Moiré interference pattern in a unique location on a first side of a substrate for each of at least one subsequent flexographic printing stations of the system. For each of the at least one subsequent flexographic printing stations, at least one inverted Moiré interference pattern is printed on either side of the substrate in a location corresponding to that station's unique location on the substrate. An alignment of at least one of the at least one subsequent flexographic printing stations is adjusted when at least one Moiré interference pattern interferes with a corresponding at least one inverted Moiré interference pattern.
摘要翻译：使用莫尔干扰对准多工位柔版印刷系统的方法包括使用第一柔性版印刷工位在至少一个随后的柔性版印刷中的至少一个基片的第一侧上的唯一位置中印刷至少一个莫尔干涉图案系统站。对于至少一个随后的柔性版印刷站中的每一个，至少一个倒置的莫尔干涉图案被印刷在基板的任一侧上，该位置对应于该基板上该基站的唯一位置。当至少一个莫尔干涉图案干扰对应的至少一个反向莫尔干涉图案时，调整至少一个随后的柔性印刷站中的至少一个的对准。

8. 发明申请

US20150275040A1 RADIATION-CURABLE HARD-COAT COMPOSITION 审中-公开
标题翻译：辐射硬化硬质合金组成
公开(公告)号：US20150275040A1
公开(公告)日：2015-10-01
申请号：US14727789
申请日：2015-06-01
申请人： Uni-Pixel Displays, Inc.
发明人： Zhengwei Shi , Danliang Jin , Robert J. Petcavich , Xuanqi Zhang
IPC分类号： C09D175/14 , C09D167/00 , C09D133/00 , C09D171/00 , G06F3/041 , C09D163/10
CPC分类号： C09D175/14 , C09D4/00 , C09D4/06 , C09D163/10 , C09D167/00 , C09D171/00 , C09D175/16 , G06F3/041 , G06F2203/04103 , G06F2203/04107
摘要： A radiation-curable hard-coat composition includes a principal resin that includes multi-(meth)acrylate functionalized oligomers or polymers and a free radical-polymerization initiator. The initiator includes at least two photo-initiators in a predetermined ratio that generate a highly reactive species when irradiated with radiation.
摘要翻译：可辐射固化的硬涂层组合物包括包含多（甲基）丙烯酸酯官能化的低聚物或聚合物的主要树脂和自由基聚合引发剂。引发剂包括至少两个以辐射照射时产生高反应性物质的预定比例的光引发剂。

9. 发明授权

US09063426B2 Method of manufacturing a flexographic printing plate with support structures 有权
标题翻译：具有支撑结构的柔版印刷版的制造方法
公开(公告)号：US09063426B2
公开(公告)日：2015-06-23
申请号：US14037002
申请日：2013-09-25
申请人： Uni-Pixel Displays, Inc.
发明人： Ed S. Ramakrishnan , Daniel Van Ostrand
IPC分类号： G03F7/00 , G03F7/20 , B23K26/36
CPC分类号： G03F7/2002 , B23K26/355 , B23K26/364 , G03F7/202 , G03F7/2032 , G03F7/24 , Y10T156/1039
摘要： A method of manufacturing a flexographic printing plate includes designing a patterned design that includes a plurality of lines and a plurality of support structures and laser-ablating the patterned design into a thermal imaging layer. A support structure of the plurality of support structures is disposed at an offset relative to a line of the plurality of lines.
摘要翻译：制造柔性版印刷版的方法包括设计包括多条线和多个支撑结构并将图案化设计激光烧蚀成热成像层的图案化设计。多个支撑结构的支撑结构相对于多条线的一条线设置偏移。

10. 发明申请

US20160291478A1 CATALYTIC PHOTORESIST FOR PHOTOLITHOGRAPHIC METAL MESH TOUCH SENSOR FABRICATION 审中-公开
标题翻译：用于光刻金属触媒传感器制造的催化光电元件
公开(公告)号：US20160291478A1
公开(公告)日：2016-10-06
申请号：US14674372
申请日：2015-03-31
申请人： Uni-Pixel Displays, Inc.
发明人： Robert J. Petcavich
IPC分类号： G03F7/42 , G03F7/16 , G03F7/32 , G03F7/40 , G03F7/038 , G03F7/20
CPC分类号： G03F7/40 , G03F7/0047 , G03F7/038 , G03F7/16 , G03F7/162 , G03F7/2032 , G03F7/30 , G03F7/322 , G03F7/325 , G06F3/044 , G06F2203/00 , G06F2203/04103 , G06F2203/04112
摘要： A catalytic photoresist composition includes a negative photoresist component and a catalyst component that includes catalytic nanoparticles. The negative photoresist component content is in a range between 30 percent and 95 percent of the composition by weight. The catalyst component content is in a range between 5 percent and 70 percent of the composition by weight.
摘要翻译：催化光刻胶组合物包括负性光致抗蚀剂组分和包括催化纳米颗粒的催化剂组分。负光致抗蚀剂组分含量在组合物重量的30％至95％的范围内。催化剂组分含量在组合物重量的5％至70％的范围内。

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