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1. 发明申请

US20120115333A1 POLYBENZOXAZOLE PRECURSOR, PHOTOSENSITIVE RESIN COMPOSITION USING THE SAME, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE 有权
标题翻译：聚苯并噻唑前驱体，使用其的感光树脂组合物和半导体器件的制造方法
公开(公告)号：US20120115333A1
公开(公告)日：2012-05-10
申请号：US13352589
申请日：2012-01-18
申请人： Kenichiro SATO , Tsukasa YAMANAKA
发明人： Kenichiro SATO , Tsukasa YAMANAKA
IPC分类号： H01L21/312 , C08G73/14 , C07D403/12
CPC分类号： H01L21/02118 , C08F2/50 , C08G69/48 , C08G73/22 , G03F7/0233 , G03F7/037 , H01L21/312
摘要： A polybenzoxazole precursor is represented by the following formula (1): wherein R1a to R4a, R1b to R4b, X1, Y1 and m are defined in the specification.
摘要翻译：聚苯并恶唑前体由下式（1）表示：其中R1a至R4a，R1b至R4b，X1，Y1和m在本说明书中定义。

2. 发明申请

US20100200416A1 METHOD AND DEVICE FOR IMMERSION TREATMENT OF VEHICLE 有权
标题翻译：用于车辆冲洗处理的方法和装置
公开(公告)号：US20100200416A1
公开(公告)日：2010-08-12
申请号：US12530213
申请日：2008-03-06
申请人： Yusuke Hagihara , Masaki Takahashi , Makoto Takayanagi , Hideki Ikeda , Naoya Kanke , Tsukasa Yamanaka , Takayuki Tahara
发明人： Yusuke Hagihara , Masaki Takahashi , Makoto Takayanagi , Hideki Ikeda , Naoya Kanke , Tsukasa Yamanaka , Takayuki Tahara
IPC分类号： C25D5/34 , C25D17/02
CPC分类号： B05D7/14 , B05C3/09 , B05C3/10 , B05D1/18 , B65G49/045 , C25D13/22
摘要： An immersion treatment method with which a vehicle body horizontally immersed in liquid is taken out in a tilted position. The vehicle body is taken out of the liquid at high speed in a tilted position. Foreign matter is separated from the vehicle body and removed together with the liquid.
摘要翻译：将水平浸没在液体中的车体倾斜地取出的浸渍处理方法。车体在倾斜的位置被高速地从液体中取出。异物与车身分离并与液体一起除去。

3. 发明授权

US07749678B2 Photosensitive composition and pattern forming method using the same 有权
标题翻译：光敏组合物和使用其的图案形成方法
公开(公告)号：US07749678B2
公开(公告)日：2010-07-06
申请号：US11085482
申请日：2005-03-22
申请人： Tsukasa Yamanaka
发明人： Tsukasa Yamanaka
IPC分类号： G03F7/00 , G03F7/004
CPC分类号： G03F7/0045 , G03F7/0392 , G03F7/0397 , Y10S430/106 , Y10S430/114
摘要： A photosensitive composition comprising (A) a resin that is decomposed by the action of an acid to increase solubility in an alkali developing solution, (B) a compound that generates an acid upon irradiation of an actinic ray or radiation, and (C1) a compound having a molecular weight of 1,000 or less and containing an aliphatic ring and an aromatic ring, and a photosensitive composition comprising (A) a resin that is decomposed by the action of an acid to increase solubility in an alkali developing solution, (B) a compound that generates an acid upon irradiation of an actinic ray or radiation, and (C2) a resin containing a hydroxystyrene unit; and a pattern forming method using these photosensitive composition.
摘要翻译：一种感光性组合物，其包含（A）通过酸的作用而分解以增加在碱性显影液中的溶解度的树脂，（B）在光化射线或辐射照射时产生酸的化合物，和（C1）（A）通过酸的作用而分解的树脂以增加在碱性显影液中的溶解度的树脂，（B）分子量为1000以下的含有脂肪族环和芳香环的化合物，在光化射线或辐射照射时产生酸的化合物，和（C2）含有羟基苯乙烯单元的树脂; 以及使用这些感光性组合物的图案形成方法。

4. 发明申请

US20080076849A1 POLYBENZOXAZOLE PRECURSOR, PHOTOSENSITIVE RESIN COMPOSITION USING THE SAME, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE 有权
标题翻译：聚苯并噻唑前驱体，使用其的感光树脂组合物和半导体器件的制造方法
公开(公告)号：US20080076849A1
公开(公告)日：2008-03-27
申请号：US11855302
申请日：2007-09-14
申请人： Kenichiro SATO , Tsukasa YAMANAKA
发明人： Kenichiro SATO , Tsukasa YAMANAKA
IPC分类号： C08G73/00 , C08F2/50 , H01L21/469
CPC分类号： H01L21/02118 , C08F2/50 , C08G69/48 , C08G73/22 , G03F7/0233 , G03F7/037 , H01L21/312
摘要： A polybenzoxazole precursor is represented by the following formula (1): wherein R1a to R4a, R1b to R4b, X1, Y1 and m are defined in the specification.
摘要翻译：聚苯并恶唑前体由下式（1）表示：其中R 1 a至R 4 a，R 1至B < 在说明书中定义了＆lt; 4＆gt; b，X＆gt;，Y＆lt; 1＆gt;和m。

5. 发明授权

US07348122B2 Photosensitive resin composition and method for manufacturing semiconductor device using the same 失效
标题翻译：光敏树脂组合物及其制造方法
公开(公告)号：US07348122B2
公开(公告)日：2008-03-25
申请号：US11511375
申请日：2006-08-29
申请人： Kenichiro Sato , Tsukasa Yamanaka
发明人： Kenichiro Sato , Tsukasa Yamanaka
IPC分类号： G03F7/023 , G03F7/30
CPC分类号： G03F7/022 , G03F7/0233 , G03F7/40
摘要： A photosensitive resin composition comprising: a quinone diazide sulfonic acid ester of a phenol compound represented by formula (I) as defined in the specification; and a polybenzoxazole precursor, and a method for manufacturing a semiconductor device using the same
摘要翻译：一种光敏树脂组合物，其包含：如说明书中定义的由式（I）表示的酚化合物的醌二叠氮磺酸酯; 和聚苯并恶唑前体，以及使用其制造半导体器件的方法

6. 发明授权

US5824451A Positive photosensitive composition 失效
标题翻译：正光敏组合物
公开(公告)号：US5824451A
公开(公告)日：1998-10-20
申请号：US497795
申请日：1995-07-03
申请人： Toshiaki Aoai , Tsukasa Yamanaka
发明人： Toshiaki Aoai , Tsukasa Yamanaka
IPC分类号： G03F7/004
CPC分类号： G03F7/0045 , Y10S430/106
摘要： A positive photosensitive composition comprising (a)a resin soluble in an aqueous alkali solution containing a specific structure unit; (b) a compound which generates an acid with irradiation of an active ray or radiation; and (c) a low molecular weight acid-decomposable dissolution inhibitor having a molecular weight of not more than 3000, which possesses a tertiary alkyl ester group and whose solubility in an aqueous alkali solution is increased by the action of an acid; wherein compound (c) is a compound having at least two tertiary alkyl ester groups, in which the longest distance with respect to the distance between two tertiary ester groups selected arbitrarily comprises at least 10 bonding atoms except for the atoms contained in the ester groups or a compound having at least three tertiary alkyl ester groups, in which the longest distance with respect to the distance between two tertiary ester groups selected arbitrarily comprises at least 9 bonding atoms except for the atoms contained in the ester groups. The positive photosensitive composition has a high sensitivity, high resolution and good profile and excels in storage stability and heat resistance of the resist solution.
摘要翻译：一种正型感光性组合物，其包含（a）可溶于含有特定结构单元的碱性水溶液中的树脂; （b）通过活性射线或辐射的照射产生酸的化合物; 和（c）分子量不大于3000的低分子量可酸分解溶解抑制剂，其具有叔烷基酯基，并且其在碱性水溶液中的溶解度通过酸的作用而增加; 其中化合物（c）是具有至少两个叔烷基酯基团的化合物，其中相对于任选地选择的两个叔酯基团之间的距离最长的距离包含至少10个键合原子，除了酯基团中包含的原子，或具有至少三个叔烷基酯基的化合物，其中相对于任意选择的两个叔酯基团之间的距离最长的距离包含除了酯基中包含的原子以外的至少9个键合原子。正型感光性组合物具有高灵敏度，高分辨率和良好的轮廓，并且抗蚀剂溶液的储存稳定性和耐热性优异。

7. 发明申请

US20070212899A1 Photosensitive resin composition and method for manufacturing semiconductor apparatus using the same 失效
标题翻译：光敏树脂组合物及其制造方法
公开(公告)号：US20070212899A1
公开(公告)日：2007-09-13
申请号：US11715883
申请日：2007-03-09
申请人： Tsukasa Yamanaka , Kenichiro Sato
发明人： Tsukasa Yamanaka , Kenichiro Sato
IPC分类号： H01L21/469 , G03C5/00
CPC分类号： G03F7/0233
摘要： A photosensitive resin composition comprises: a polybenzoxazole precursor (A); a naphthoquinone diazide photosensitizer (B); and a specific phenolic hydroxyl group-containing compound (C).
摘要翻译：光敏树脂组合物包含：聚苯并恶唑前体（A）; 萘醌二氮嗪光敏剂（B）; 和特定的含酚羟基的化合物（C）。

8. 发明申请

US20070172753A1 Photosensitive resin composition and manufacturing method of semiconductor device using the same 有权
标题翻译：光敏树脂组合物及使用其的半导体器件的制造方法
公开(公告)号：US20070172753A1
公开(公告)日：2007-07-26
申请号：US11655905
申请日：2007-01-22
申请人： Kenichiro Sato , Tsukasa Yamanaka
发明人： Kenichiro Sato , Tsukasa Yamanaka
IPC分类号： G03C5/18
CPC分类号： G03F7/0757 , G03F7/0046 , G03F7/022 , G03F7/0233
摘要： A positive photosensitive resin composition, which contains a polybenzoxazole precursor, a quinonediazide photosensitizer and a carbonate solvent, and a method of manufacturing a semiconductor device using the composition.
摘要翻译：含有聚苯并恶唑前体，醌二叠氮化物光敏剂和碳酸酯溶剂的正型感光性树脂组合物以及使用该组合物的半导体装置的制造方法。

9. 发明申请

US20070048656A1 Photosensitive resin composition and method for manufacturing semiconductor device using the same 失效
标题翻译：光敏树脂组合物及其制造方法
公开(公告)号：US20070048656A1
公开(公告)日：2007-03-01
申请号：US11511375
申请日：2006-08-29
申请人： Kenichiro Sato , Tsukasa Yamanaka
发明人： Kenichiro Sato , Tsukasa Yamanaka
IPC分类号： G03C5/18
CPC分类号： G03F7/022 , G03F7/0233 , G03F7/40
摘要： A photosensitive resin composition comprising: a quinone diazide sulfonic acid ester of a phenol compound represented by formula (I) as defined in the specification; and a polybenzoxazole precursor, and a method for manufacturing a semiconductor device using the same.
摘要翻译：一种光敏树脂组合物，其包含：如说明书中定义的由式（I）表示的酚化合物的醌二叠氮磺酸酯; 和聚苯并恶唑前体，以及使用其制造半导体器件的方法。

10. 发明授权

US06200729B1 Positive photosensitive composition 有权
标题翻译：正光敏组合物
公开(公告)号：US06200729B1
公开(公告)日：2001-03-13
申请号：US09422344
申请日：1999-10-21
申请人： Toshiaki Aoai , Kunihiko Kodama , Kazuya Uenishi , Tsukasa Yamanaka
发明人： Toshiaki Aoai , Kunihiko Kodama , Kazuya Uenishi , Tsukasa Yamanaka
IPC分类号： G03F7004
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/115 , Y10S430/122
摘要： Provided is a positive photosensitive composition which has high photosensitivity, is capable of giving an excellent resist pattern, and changes little with time after exposure. The positive photosensitive composition comprises (1) a resin having group(s) capable of decomposing by the action of an acid to enhance solubility of the resin in an alkaline developing solution and (2) a compound represented by formula (I), (II) or (III) which is capable of generating a sulfonic acid upon irradiation with actinic rays or a radiation: wherein R1 to R5 and R7 to R10 each represents a hydrogen atom, an alkyl group, a cycloalkyl group, an alkoxy group, a hydroxy group, a halogen atom, or a group represented by —S—R6, where R6 represents an alkyl group or an aryl group; X− represents the anion of a benzenesulfonic, naphthalenesulfonic, or anthracenesulfonic acid as deifined in the specification; and m, n, p and q each represents an integer of 1 to 3.
摘要翻译：提供了具有高光敏性的正光敏组合物，能够赋予优异的抗蚀剂图案，并且在曝光后随时间变化很小。正型感光性组合物包含（1）具有能够通过酸分解的基团的树脂，以提高树脂在碱性显影液中的溶解度，（2）由式（I）表示的化合物，（II ）或（III），其能够在用光化射线或辐射照射时产生磺酸：其中R 1至R 5和R 7至R 10各自表示氢原子，烷基，环烷基，烷氧基，羟基基团，卤素原子或-S-R6表示的基团，其中R6表示烷基或芳基; X-表示说明书中所述的苯磺酸，萘磺酸或蒽磺酸的阴离子; m，n，p和q各自表示1〜3的整数。

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