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    • 1. 发明专利
    • Multifunctional eating and drinking implement
    • 多功能饮水和饮水处理
    • JP2005013449A
    • 2005-01-20
    • JP2003182155
    • 2003-06-26
    • Tatsuo Abe龍雄 阿部
    • ABE TATSUO
    • A47G21/18A47G21/04
    • PROBLEM TO BE SOLVED: To provide a convenient multifunctional eating and drinking implement for surely spooning food or drink in a container without tilting the container and surely sucking even fluid food or drink on the bottom of the container.
      SOLUTION: The multifunctional eating and drinking implement 10 is provided with: an elongated pipe part 12 having an internal pipeline 16 communicating with the outside on both of upper and lower sides; and a spooning part 14 provided integrally at the lower end side of the pipe part 12 and having a spoon surface spread in a crossing direction with respect to the pipe part 12. The spoon part 14 is formed so as to carry the food or drink X while the pipe part 12 is stood in the container Y and so as to keep the state of carrying the food or drink X when moving the pipe part 12 upward. The spoon part 14 is formed so as to suck the fluid food or drink on the bottom of the container Y through the pipe part 12 while the pipe part 12 is stood.
      COPYRIGHT: (C)2005,JPO&NCIPI
    • 要解决的问题:提供一种方便的多功能饮食器具,确保将容器中的食物或饮料舀取而不倾斜容器,并确保在容器底部均匀吸入流体食物或饮料。 解决方案:多功能饮食用具10设置有:细长管部12,其具有在上下两侧与外部连通的内部管线16; 以及整体设置在管部12的下端侧并且具有相对于管部12在交叉方向上分散的勺子表面的勺部14。勺部14形成为携带食物或饮料X 同时将管部12放置在容器Y中,以便在向上移动管部12时保持携带食物或饮料X的状态。 勺部14形成为在管部12站立时通过管部12吸收容器Y的底部的流体食品或饮料。 版权所有(C)2005,JPO&NCIPI
    • 6. 发明申请
    • METHOD FOR CLEANING SEMICONDUCTOR WAFER
    • 清洗半导体波形的方法
    • US20140048100A1
    • 2014-02-20
    • US14113329
    • 2012-05-11
    • Tatsuo AbeHitoshi Kabasawa
    • Tatsuo AbeHitoshi Kabasawa
    • H01L21/02
    • H01L21/02052
    • The present invention provides a method for cleaning a semiconductor wafer, in which the method includes cleaning steps of HF cleaning, ozonated water cleaning and HF cleaning in this order at least one time, wherein in the HF cleaning carried out last in the method for cleaning the semiconductor wafer, cleaning is so carried out that an oxide film formed on a surface of the semiconductor wafer by the ozonated water is not entirely removed and to remain a part of a thickness thereof on the surface of the semiconductor wafer. As a result, a method for cleaning a semiconductor wafer in which a metal impurity level and a particle level can be reduced simultaneously in the cleaning of the semiconductor wafer is provided.
    • 本发明提供了一种清洗半导体晶片的方法,其中该方法包括以下顺序的HF清洗,臭氧水清洗和HF清洗的清洗步骤至少一次,其中在清洗方法中最后进行的HF清洗 半导体晶片进行清洁,使得通过臭氧水形成在半导体晶片的表面上的氧化膜未被完全去除并且在半导体晶片的表面上保持其厚度的一部分。 结果,提供了一种用于清洁半导体晶片的方法,其中可以在半导体晶片的清洁中同时减少金属杂质水平和颗粒水平。
    • 7. 发明授权
    • Ultrasonic cleaning apparatus and ultrasonic cleaning method
    • 超声波清洗设备和超声波清洗方法
    • US08083856B2
    • 2011-12-27
    • US12864255
    • 2009-01-23
    • Tatsuo AbeHitoshi KabasawaIzumi Arai
    • Tatsuo AbeHitoshi KabasawaIzumi Arai
    • B08B3/12
    • B08B3/12H01L21/67057
    • An ultrasonic cleaning apparatus having at least a cleaning tank; an ultrasonic wave transmitting tank; a vibrating plate placed at a bottom portion of the ultrasonic wave transmitting tank, the vibrating plate superposing the ultrasonic waves on the transmitting water with a transducer; and a holding jig for holding the object to be cleaned in the cleaning tank, the apparatus in which the object to be cleaned is ultrasonically cleaned by immersing the object to be cleaned held with the holding jig in the cleaning liquid accommodated in the cleaning tank, putting the cleaning tank into the transmitting water accommodated in the ultrasonic wave transmitting tank, and transmitting the ultrasonic waves superposed with the vibrating plate to the cleaning tank through the transmitting water, the apparatus comprising a transmitting tank oscillating mechanism for oscillating the ultrasonic wave transmitting tank in a horizontal plane.
    • 一种至少具有清洗槽的超声波清洗装置; 超声波发射罐; 设置在所述超声波发送槽的底部的振动板,所述振动板用传感器将所述超声波叠加在所述透射水上; 以及用于将待清洁物体保持在清洗槽中的保持夹具,其中通过将保持夹具夹持的待清洁物体浸入容纳在清洗槽中的清洗液体中来对被清洁物体进行超声波清洗的装置, 将清洗槽放入容纳在超声波传送箱内的传送水中,并通过传送水将与振动板叠加的超声波传送到清洗槽,该设备包括一个用于使超声波传输槽振荡的传送槽振荡机构 在水平面。
    • 9. 发明申请
    • ULTRASONIC CLEANING APPARATUS AND ULTRASONIC CLEANING METHOD
    • 超声波清洗装置和超声波清洗方法
    • US20100294305A1
    • 2010-11-25
    • US12864255
    • 2009-01-23
    • Tatsuo AbeHitoshi KabasawaIzumi Arai
    • Tatsuo AbeHitoshi KabasawaIzumi Arai
    • B08B3/12
    • B08B3/12H01L21/67057
    • An ultrasonic cleaning apparatus having at least a cleaning an ultrasonic wave transmitting tank a vibrating plate placed at a bottom portion of the ultrasonic wave transmitting tank, the vibrating plate superposing the ultrasonic waves on the transmitting water with a transducer; and a holding jig for holding the object to be cleaned in the cleaning tank, the apparatus in which the object to be cleaned is ultrasonically cleaned by immersing the object to be cleaned held with the holding jig in the cleaning liquid accommodated in the cleaning tank, putting the cleaning tank into the transmitting water accommodated in the ultrasonic wave transmitting tank, and transmitting the ultrasonic waves superposed with the vibrating plate to the cleaning tank through the transmitting water, the apparatus comprising a transmitting tank oscillating mechanism for oscillating the ultrasonic wave transmitting tank in a horizontal plane.
    • 一种超声波清洗装置,其特征在于,具有至少清洗超声波透过箱,设置在所述超声波透过箱的底部的振动板,所述振动板用传感器将所述超声波重叠在所述透水上; 以及用于将待清洁物体保持在清洗槽中的保持夹具,其中通过将保持夹具夹持的待清洁物体浸入容纳在清洗槽中的清洗液体中来对被清洁物体进行超声波清洗的装置, 将清洗槽放入容纳在超声波传送箱内的传送水中,并通过传送水将与振动板叠加的超声波传送到清洗槽,该设备包括一个用于使超声波传输槽振荡的传送槽振荡机构 在水平面。