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    • 1. 发明申请
    • Liquid crystal display having transparent conductive film on interlayer insulating film formed by coating
    • 在通过涂布形成的层间绝缘膜上具有透明导电膜的液晶显示器
    • US20090273752A1
    • 2009-11-05
    • US12458322
    • 2009-07-08
    • Shigeru KimuraAkitoshi MaedaSatoshi DoiTakayuki Ishino
    • Shigeru KimuraAkitoshi MaedaSatoshi DoiTakayuki Ishino
    • G02F1/1343
    • G02F1/136227G02F1/13439
    • A liquid crystal display is fabricated which has bus wires disposed in a grid shape, switching elements coupled to the bus wires, and pixel electrodes which are disposed on an interlayer insulating film formed by coating and which are coupled with the switching elements. In fabricating the liquid crystal display, when a transparent conductive film is formed on the interlayer insulating film which is formed by coating, the temperature of the substrate is controlled to become 100° C.-170° C. In another embodiment, when the transparent conductive film is formed on the interlayer insulating film in a non-heated condition, an oxygen flow rate ratio is set to 1% or lower, and annealing is performed after forming the film. Thereby, when etching the ITO film on the interlayer insulating film, etching residue is not produced. Further, contact resistance between the ITO film and the lower layer metal can be uniformly decreased, and display defects can be obviated.
    • 制造液晶显示器,其具有以栅格形状布置的总线,耦合到母线的开关元件和设置在由涂层形成并与开关元件耦合的层间绝缘膜上的像素电极。 在制造液晶显示器时,当在通过涂布形成的层间绝缘膜上形成透明导电膜时,将基板的温度控制为100℃-170℃。在另一个实施例中,当透明 在非加热状态下在层间绝缘膜上形成导电膜,将氧气流量比设定为1%以下,在形成膜之后进行退火。 因此,当蚀刻层间绝缘膜上的ITO膜时,不会产生蚀刻残留物。 此外,可以均匀地减少ITO膜和下层金属之间的接触电阻,并且可以避免显示缺陷。
    • 7. 发明授权
    • Color layer forming method
    • 彩色层成型方法
    • US06866972B2
    • 2005-03-15
    • US10438713
    • 2003-05-15
    • Takayuki Ishino
    • Takayuki Ishino
    • G02B5/20G03F7/00G03F7/40H01J9/20G02F1/1335
    • H01J9/20G02B5/201G03F7/0007G03F7/0035G03F7/40H01J2209/012
    • For each of colored resists, a resist coating step of coating a washed substrate with the colored resist, a reduced-pressure drying and temporary baking step of evaporating solvent contained in the colored resist, an exposing step of printing a pattern in the colored resist, a developing the printed pattern and a photo-curing and temporary post-baking step of hardening a surface portion of the resist to a hardness level, in which there is no defect of the printed colored resist pattern occurs in a coating step and a developing step, which are performed later, are repeated. In forming a last colored resist, a normal baking step of simultaneously hardening all of the coated colored resist patterns is performed, instead of the photo-curing and temporary post-baking step.
    • 对于每种着色抗蚀剂,使用着色抗蚀剂涂覆洗涤的基材的抗蚀剂涂布步骤,蒸发含在着色抗蚀剂中的溶剂的减压干燥和临时烘烤步骤,在着色抗蚀剂中印刷图案的曝光步骤, 显影印刷图案和光固化和临时后烘烤步骤,其在涂布步骤和显影步骤中发生将抗蚀剂表面部分硬化至硬度水平,其中不存在印刷的着色抗蚀剂图案的缺陷 ,以后再进行。 在形成最后的着色抗蚀剂时,进行同时硬化所有涂覆的着色抗蚀剂图案的正常烘烤步骤,而不是光固化和临时后烘烤步骤。