专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US09043193B2 Manufacturing method and system of target 有权
标题翻译：目标的制造方法和制度
公开(公告)号：US09043193B2
公开(公告)日：2015-05-26
申请号：US13428568
申请日：2012-03-23
申请人： Jikai Zhang , Jiyu Wan , Hongjiang Wu , Seungmoo Rim
发明人： Jikai Zhang , Jiyu Wan , Hongjiang Wu , Seungmoo Rim
IPC分类号： G01B21/18 , C23C14/34 , H01J37/34
CPC分类号： G01B21/18 , C23C14/3414 , G01B2210/56 , H01J37/3414 , H01J37/3491
摘要： The disclosed technology provides a manufacturing method of a target comprising obtaining an initial mass and a residual mass of the target sample, and calculating an etching mass; determining a relative etching depth of the target sample; calculating a relative etching mass based on the etching mass and the relative etching depth; determining a utilization parameter of the target sample based on the relative etching mass and the initial mass of the target sample before being used; and performing a simulation and optimization process on the utilization parameter of the target sample, obtaining target parameters corresponding to a preset value of the utilization parameter, and outputting the target parameters to a manufacturing control center for manufacturing a target. The disclosed technology also provides a manufacturing system of a target.
摘要翻译：所公开的技术提供了一种靶的制造方法，包括获得目标样品的初始质量和剩余质量，并计算蚀刻质量; 确定目标样品的相对蚀刻深度; 基于蚀刻质量和相对蚀刻深度计算相对蚀刻质量; 在使用前基于相对蚀刻质量和目标样品的初始质量确定目标样品的利用参数; 对所述目标样本的利用参数进行模拟和优化处理，获得与所述利用参数的预设值相对应的目标参数，并将所述目标参数输出到制造对象的制造控制中心。所公开的技术还提供了目标的制造系统。

2. 发明申请

US20120287523A1 COLOR FILTER AND MANUFACTURING METHOD THEREOF 有权
标题翻译：彩色滤光片及其制造方法
公开(公告)号：US20120287523A1
公开(公告)日：2012-11-15
申请号：US13466472
申请日：2012-05-08
申请人： Hongjiang WU , Chongxi WEI , Yiming CHEN , Seungmoo RIM , Xibin SHAO
发明人： Hongjiang WU , Chongxi WEI , Yiming CHEN , Seungmoo RIM , Xibin SHAO
IPC分类号： G02B5/22 , G03F7/20
CPC分类号： G02B5/201 , G03F7/0007
摘要： A color filter and a manufacturing method thereof are provided, in which a stacked structure composed of several color film layers having different colors is formed in a non-transmitting partitioning region of the color filter in such a way that the stacked structure can prevent light from passing through the color filter via the partitioning region.
摘要翻译：提供了一种滤色器及其制造方法，其中在彩色滤光片的非透光分隔区域中形成由具有不同颜色的多个彩色薄膜层组成的层叠结构，使得层叠结构能够防止来自通过分色区域通过滤色片。

3. 发明申请

US20120281170A1 COLOR FILTER SUBSTRATE AND PRODUCING PROCESS AND DEVICE FOR MANUFACTURING THE SAME 审中-公开
标题翻译：彩色滤光片基板和制造工艺及其制造装置
公开(公告)号：US20120281170A1
公开(公告)日：2012-11-08
申请号：US13461994
申请日：2012-05-02
申请人： Hongjiang WU , Min LI , Dong WANG , Song WANG , Seungmoo RIM
发明人： Hongjiang WU , Min LI , Dong WANG , Song WANG , Seungmoo RIM
IPC分类号： G02F1/1335 , B05D5/12 , B05D5/06 , G02B5/22
CPC分类号： G02F1/13394 , G02F2001/133519 , G02F2001/136236
摘要： The embodiments of the disclosed technology disclose a color filter substrate and the producing process and device for the same. The producing process of the color filter substrate according to the embodiments of the disclosed technology comprises: forming a transparent conductive layer on a side of a base substrate; forming a black matrix on the other side of the base substrate; forming a color filer layer within the black matrix; and forming an insulated material layer comprising both post spacers and a protection film formed integrally on the color filer layer.
摘要翻译：所公开技术的实施例公开了一种滤色器基板及其制造方法和装置。根据所公开技术的实施例的滤色器基板的制造方法包括：在基底基板的一侧上形成透明导电层; 在所述基底基板的另一侧上形成黑矩阵; 在黑矩阵内形成彩色滤光层; 以及形成包括柱状间隔物和整体形成在所述彩色滤光层上的保护膜的绝缘材料层。

4. 发明申请

US20130187853A1 DISPLAY SYSTEM 审中-公开
标题翻译：显示系统
公开(公告)号：US20130187853A1
公开(公告)日：2013-07-25
申请号：US13700075
申请日：2012-07-16
申请人： Jianfeng Yuan , Jiannan Zhang , Seungmoo Rim , Zhenyu Zhang , Qiang Zheng
发明人： Jianfeng Yuan , Jiannan Zhang , Seungmoo Rim , Zhenyu Zhang , Qiang Zheng
IPC分类号： G06F3/03
CPC分类号： G06F3/0308 , G06F3/0304 , G06F3/03542 , G06F3/0412 , G06F3/042
摘要： An embodiment of the present invention provides a display system, and the display system comprises a light beam emitting device, emitting a first light beam for marking an input position and a second light beam for confirming the input position, the first light beam being visible light, and the second light beam differing from the first light beam; and a display device, comprising a displaying area, photo-sensitive devices distributed within the displaying area, processing devices coupled with the photo-sensitive devices. The photo-sensitive devices are used for sensing the second light beam projected upon the displaying area and achieving a sensing result; the processing devices are used for determining the projecting position of the second light beam upon the displaying area according to the sensing result, and performing a corresponding operation based on the sensing result. The present invention is capable of performing remote touch operation on the display device.
摘要翻译：本发明的实施例提供了一种显示系统，并且显示系统包括发射用于标记输入位置的第一光束的光束发射装置和用于确认输入位置的第二光束，第一光束是可见光，并且所述第二光束与所述第一光束不同; 以及显示装置，包括显示区域，分布在显示区域内的感光装置，与感光装置耦合的处理装置。感光装置用于感测投射在显示区域上的第二光束并实现感测结果; 处理装置用于根据感测结果确定第二光束在显示区域上的投影位置，并且基于感测结果执行相应的操作。本发明能够在显示装置上执行远程触摸操作。

5. 发明授权

US08929007B2 Color filter and manufacturing method thereof 有权
标题翻译：滤色器及其制造方法
公开(公告)号：US08929007B2
公开(公告)日：2015-01-06
申请号：US13466472
申请日：2012-05-08
申请人： Hongjiang Wu , Chongxi Wei , Yiming Chen , Seungmoo Rim , Xibin Shao
发明人： Hongjiang Wu , Chongxi Wei , Yiming Chen , Seungmoo Rim , Xibin Shao
IPC分类号： G02B5/22 , G02B5/20 , G03F7/00
CPC分类号： G02B5/201 , G03F7/0007
摘要： A color filter and a manufacturing method thereof are provided, in which a stacked structure composed of several color film layers having different colors is formed in a non-transmitting partitioning region of the color filter in such a way that the stacked structure can prevent light from passing through the color filter via the partitioning region.
摘要翻译：提供了一种滤色器及其制造方法，其中在彩色滤光片的非透光分隔区域中形成由具有不同颜色的多个彩色薄膜层组成的层叠结构，使得层叠结构能够防止来自通过分色区域通过滤色片。

6. 发明申请

US20120314150A1 ARRAY SUBSTRATE, MANUFACTURING METHOD THEREOF AND LIQUID CRYSTAL DISPLAY 审中-公开
标题翻译：阵列基板，其制造方法和液晶显示
公开(公告)号：US20120314150A1
公开(公告)日：2012-12-13
申请号：US13490782
申请日：2012-06-07
申请人： Liang SUN , Zhaohui HAO , Chunxia MENG , Ying QIN , Seungmoo RIM
发明人： Liang SUN , Zhaohui HAO , Chunxia MENG , Ying QIN , Seungmoo RIM
IPC分类号： G02F1/136 , H01L33/08
CPC分类号： G02F1/136286 , G02F1/134336 , G02F2201/122
摘要： An array substrate is disclosed. The array substrate comprises a plurality of gate lines, a plurality of data lines, and a plurality of pixel units defined by the gate lines and the data lines and arranged in an array, each of the pixel units comprising a thin film transistor (TFT) for switching the pixel unit and a driving electrode for driving liquid crystal, and the driving electrode being formed with slit-shaped openings. The two corresponding pixel units respectively provided on two sides of the gate line are different from each other in structure, and the pixel unit on one side of the gate line can be obtained by rotating the pixel unit on the other side of the gate line by 180° respect to the central point of the section of the gate line between the two pixel units.
摘要翻译：公开了阵列基板。阵列基板包括多条栅极线，多条数据线和由栅极线和数据线限定并排列成阵列的多个像素单元，每个像素单元包括薄膜晶体管（TFT）用于切换像素单元和用于驱动液晶的驱动电极，并且驱动电极形成有狭缝形开口。分别设置在栅极线的两侧的两个对应的像素单元在结构上彼此不同，并且栅极线的一侧上的像素单元可以通过将栅极线的另一侧上的像素单元旋转而获得相对于两个像素单元之间的栅极线的截面的中心点为180°。

7. 发明申请

US20120245725A1 MANUFACTURING METHOD AND SYSTEM OF TARGET 有权
标题翻译：目标的制造方法和系统
公开(公告)号：US20120245725A1
公开(公告)日：2012-09-27
申请号：US13428568
申请日：2012-03-23
申请人： Jikai ZHANG , Jiyu WAN , Hongjiang WU , Seungmoo RIM
发明人： Jikai ZHANG , Jiyu WAN , Hongjiang WU , Seungmoo RIM
IPC分类号： G06F19/00
CPC分类号： G01B21/18 , C23C14/3414 , G01B2210/56 , H01J37/3414 , H01J37/3491
摘要： The disclosed technology provides a manufacturing method of a target comprising obtaining an initial mass and a residual mass of the target sample, and calculating an etching mass; determining a relative etching depth of the target sample; calculating a relative etching mass based on the etching mass and the relative etching depth; determining a utilization parameter of the target sample based on the relative etching mass and the initial mass of the target sample before being used; and performing a simulation and optimization process on the utilization parameter of the target sample, obtaining target parameters corresponding to a preset value of the utilization parameter, and outputting the target parameters to a manufacturing control center for manufacturing a target. The disclosed technology also provides a manufacturing system of a target.
摘要翻译：所公开的技术提供了一种靶的制造方法，包括获得目标样品的初始质量和剩余质量，并计算蚀刻质量; 确定目标样品的相对蚀刻深度; 基于蚀刻质量和相对蚀刻深度计算相对蚀刻质量; 在使用前基于相对蚀刻质量和目标样品的初始质量确定目标样品的利用参数; 对所述目标样本的利用参数进行模拟和优化处理，获得与所述利用参数的预设值相对应的目标参数，并将所述目标参数输出到制造对象的制造控制中心。所公开的技术还提供了目标的制造系统。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式