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1. 发明申请

WO2010032910A1 SUBSTRATE-TRANSFERRING DEVICE, SUBSTRATE-PROCESSING APPARATUS HAVING THE SAME, AND METHOD OF TRANSFERRING SUBSTRATE USING THE SUBSTRATE-TRANSFERRING DEVICE 审中-公开
标题翻译：基板传输装置，具有该基板的基板处理装置以及使用基板传送装置传送基板的方法
公开(公告)号：WO2010032910A1
公开(公告)日：2010-03-25
申请号：PCT/KR2009/001752
申请日：2009-04-06
申请人： SEMES CO., LTD. , KIM, Dae-Ho , HONG, Sang-Seok , PARK, Joo-Jib , PARK, Sun-Yong
发明人： KIM, Dae-Ho , HONG, Sang-Seok , PARK, Joo-Jib , PARK, Sun-Yong
IPC分类号： H01L21/687
CPC分类号： H01L21/67781 , H01L21/67303 , H01L21/67766
摘要： Provided is a substrate-transferring device including a plurality of horizontally movable arms, a body, and a plurality of guides. The plurality of horizontally movable arms, each is adapted for loading a substrate. The body is coupled to the arms and moving the respective arms horizontally. The plurality of guides are fixed to the body, and disposed respectively behind the arms, and guide positions of substrates loaded on the respectively corresponding arms when the arms move rearward. Accordingly, the substrate-transferring device prevents a substrate from being removed while transferring the substrate and transfers a substrate stably, so as to improve transfer efficiency.
摘要翻译：提供一种基板转印装置，其包括多个水平可移动的臂，主体和多个引导件。多个可水平移动的臂各自适于装载基底。主体联接到臂并水平移动相应的臂。当臂向后移动时，多个引导件固定到主体并且分别设置在臂后面，以及装载在分别对应的臂上的基板的引导位置。因此，基板转印装置防止在转印基板并且稳定地传送基板时去除基板，从而提高转印效率。

2. 发明申请

WO2010024512A1 SUBSTRATE-PROCESSING APPARATUS AND METHOD OF TRANSFERRING SUBSTRATE IN THE SAME 审中-公开
标题翻译：基板处理装置及其基板转印方法
公开(公告)号：WO2010024512A1
公开(公告)日：2010-03-04
申请号：PCT/KR2009/001829
申请日：2009-04-09
申请人： SEMES CO., LTD. , HONG, Kwang-Jin , YOU, Jun-Ho
发明人： HONG, Kwang-Jin , YOU, Jun-Ho
IPC分类号： H01L21/677
CPC分类号： H01L21/67276 , H01L21/67253 , H01L21/67742 , H01L21/67745 , H01L21/67766
摘要： Provided is a substrate-processing apparatus including a storage member, a transfer member, and a control unit. The transfer member includes a plurality of transfer arms that load or pick up a substrate to or from the storage member. The control unit controls velocity of the transfer arms such that the simultaneously driven transfer arms simultaneously arrive at target points. Accordingly, the transfer member loads or takes out a plurality of wafers at once to or from the storage member, so that the substrate-processing apparatus reduces transfer time and improves productivity.
摘要翻译：提供了包括存储部件，转印部件和控制单元的基板处理装置。传送构件包括多个传送臂，用于将基板加载到存储构件或从存储构件拾取基板。控制单元控制传送臂的速度，使得同时驱动的传送臂同时到达目标点。因此，转印构件一次加载或取出多个晶片，从而使得基板处理装置减少转印时间并提高生产率。

3. 发明申请

WO2008143476A1 APPARATUS AND METHOD FOR DRYING SUBSTRATES 审中-公开
标题翻译：干燥基板的装置和方法
公开(公告)号：WO2008143476A1
公开(公告)日：2008-11-27
申请号：PCT/KR2008/002875
申请日：2008-05-22
申请人： SEMES CO., LTD. , JEONG, Young-Ju , LEE, Bok-Kyu , HWANG, Sun-Kyu , BAE, Jeong-Yong , YONG, Soo-Bin
发明人： JEONG, Young-Ju , LEE, Bok-Kyu , HWANG, Sun-Kyu , BAE, Jeong-Yong , YONG, Soo-Bin
IPC分类号： H01L21/30
CPC分类号： F26B21/14 , F26B3/00 , H01L21/02057 , H01L21/67034 , H01L21/67051
摘要： A method for drying substrates using isopropyl alcohol (IPA) includes: a pre-stage in which heated fluid is injected to a bottom surface of a substrate to raise a temperature of the substrate simultaneously to injection of an organic solvent to a top surface of the substrate and injection of a dry gas to the top surface thereof to improve a vaporization power of the organic solvent; and a final stage in which the injection of the heated fluid is stopped and the organic solvent and the dry gas are injected to the top surface of the substrate.
摘要翻译：使用异丙醇（IPA）干燥基材的方法包括：将加热的流体注入基材的底表面的前期，同时提高基材的温度以将有机溶剂注入到将干燥气体的基材和其上表面注入，以提高有机溶剂的汽化能力; 并且终止加热流体的注入并将有机溶剂和干燥气体注入到基板的顶表面的最终阶段。

4. 发明申请

WO2007049921A1 SPIN CHUCK 审中-公开
标题翻译：旋转卡
公开(公告)号：WO2007049921A1
公开(公告)日：2007-05-03
申请号：PCT/KR2006/004386
申请日：2006-10-26
申请人： SEMES CO., LTD. , KWON, Oh-Jin , BAE, Jeong-Yong , CHOI, Jeong-Yeol
发明人： KWON, Oh-Jin , BAE, Jeong-Yong , CHOI, Jeong-Yeol
IPC分类号： H01L21/02
CPC分类号： H01L21/6708 , H01L21/68728 , Y10T279/18
摘要： The present invention is directed to a spin chuck for use in a process, such as a cleaning process and an etching process, performed while rotating a substrate. The spin chuck includes a spin head on which a substrate is placed, a driving part configured to rotate the spin head, and a fix bracket installed on the spin head and having a contact surface that is in contact with a flat surface of a flat zone of the substrate at a position corresponding to the flat zone to prevent a vortex caused by the flat zone. Since the fix bracket has the same shape as the flat zone of the substrate, an air current unbalance resulting from the flat zone is suppressed to uniformly inject etchants to a rear surface of the substrate.
摘要翻译：本发明涉及一种旋转卡盘，用于在旋转基板的同时执行诸如清洁处理和蚀刻工艺的工艺。旋转卡盘包括其上放置基板的旋转头，构造成旋转旋转头的驱动部分和安装在旋转头上的固定支架，并且具有与平坦区域的平坦表面接触的接触表面在对应于平坦区域的位置处的基板，以防止由平坦区域引起的涡流。由于固定支架具有与基板的平坦区域相同的形状，所以抑制了由平坦区域产生的气流不平衡，以将蚀刻剂均匀地注入基板的后表面。

5. 发明申请

WO2010016650A1 SUBSTRATE-PROCESSING APPARATUS AND METHOD OF TRANSFERRING SUBSTRATE IN THE SAME 审中-公开
标题翻译：基板处理装置及其中的基板传输方法
公开(公告)号：WO2010016650A1
公开(公告)日：2010-02-11
申请号：PCT/KR2009/001836
申请日：2009-04-09
申请人： SEMES CO., LTD. , KIM, Kyung-Mo , HONG, Sang-Seok
发明人： KIM, Kyung-Mo , HONG, Sang-Seok
IPC分类号： H01L21/677
CPC分类号： H01L21/67781
摘要： Provided is a substrate-processing apparatus including a plurality of process chambers, a buffer unit, and a transfer member. The transfer member transfers the substrate between the process chambers and the buffer unit, and collects the substrates processed in at least two of the process chambers where processes are simultaneously finished, to transfer the processed substrates to the buffer unit at once. Accordingly, a number of times during which the transfer member transfers substrates is decreased, so that the substrate-processing apparatus reduces the process time and improves the productivity.
摘要翻译：提供了包括多个处理室，缓冲单元和转印构件的基板处理设备。传送构件在处理室和缓冲单元之间传送衬底，并且收集在同时完成处理的至少两个处理室中处理的衬底，以将处理的衬底一次传送到缓冲单元。因此，传送构件传送基板的次数减少，使得基板处理装置减少处理时间并提高生产率。

6. 发明申请

WO2010016649A1 SUBSTRATE-PROCESSING APPARATUS AND METHOD OF TRANSFERRING SUBSTRATE IN THE SAME 审中-公开
标题翻译：基板处理装置及其中的基板传输方法
公开(公告)号：WO2010016649A1
公开(公告)日：2010-02-11
申请号：PCT/KR2009/001747
申请日：2009-04-06
申请人： SEMES CO., LTD. , HONG, Sang-Seok , KIM, Hyun-Woo
发明人： HONG, Sang-Seok , KIM, Hyun-Woo
IPC分类号： H01L21/677
CPC分类号： H01L21/67781
摘要： Provided is a substrate-processing apparatus including a transfer member loading and taking out a substrate to and from a storage member, and a control unit controlling the transfer member. The transfer member includes a plurality of transfer arms and an arm-driving part moving the respective transfer arms horizontally, and substrates are loaded on the respective transfer arms. The control unit controls a movement velocity and a position of the transfer member and compares movement velocity profiles of the transfer arms, so as to control movement velocities of the respective transfer arms. Accordingly, the simultaneously driven transfer arms simultaneously arrive at target points, and thus the substrate-processing apparatus reduces transfer time and improves productivity.
摘要翻译：提供了一种基板处理装置，其包括将存储部件加载和取出基板的转印部件和控制转印部件的控制部。转印构件包括多个转印臂和臂驱动部分，水平地移动各个转印臂，并且基板被装载在相应的转印臂上。控制单元控制传送构件的移动速度和位置，并且比较传送臂的移动速度分布，以便控制各传送臂的移动速度。因此，同时驱动的传送臂同时到达目标点，因此基板处理装置减少传送时间并提高生产率。

7. 发明申请

WO2010024511A1 METHOD OF ADJUSTING VELOCITY OF TRANSFER MEMBER, METHOD OF TRANSFERRING SUBSTRATE USING THE METHOD, AND SUBSTRATE-PROCESSING APPARATUS 审中-公开
标题翻译：调整传送速度的方法，使用该方法传送基板的方法以及基板处理装置
公开(公告)号：WO2010024511A1
公开(公告)日：2010-03-04
申请号：PCT/KR2009/001755
申请日：2009-04-06
申请人： SEMES CO., LTD. , HONG, Kwang-Jin , JUN, Sang-Eun
发明人： HONG, Kwang-Jin , JUN, Sang-Eun
IPC分类号： H01L21/687
CPC分类号： H01L21/67742 , H01L21/67253 , H01L21/67259 , H01L21/67288
摘要： Provided is a method of adjusting a velocity of a transfer arm in a transfer member. The method includes, accelerating the transfer arm from a start point to a first point where a movement velocity reaches a preset reference velocity, dividing a division from the first point to a second point into movement divisions to move the transfer arm in any one of a deceleration motion, an acceleration motion, and a uniform motion according to the respective movement divisions, and decelerating the transfer arm from the second point to a target point. The motion of the transfer arm in the current movement division is different from that in the movement division just before the current movement division. Thus, a different impulse from that in the precedent movement division is applied to a substrate loaded on the transfer arm. Accordingly, the impulse response superposition cancels residual vibration of the substrate, so as to improve transfer efficiency of the transfer member.
摘要翻译：提供了一种调节传送构件中的传送臂的速度的方法。该方法包括：将传送臂从起始点移动到移动速度达到预设参考速度的第一点，将从第一点到第二点的分割分成运动分割，以将传送臂移动到减速运动，加速运动，以及根据各运动部分的均匀运动，以及将传送臂从第二点减速到目标点。传动臂在当前运动部分中的运动与在当前运动分割之前的运动分割中的运动不同。因此，与先前运动分割中的不同的脉冲施加到装载在传送臂上的基板。因此，脉冲响应叠加抵消了基板的残余振动，从而提高了转印部件的转印效率。

8. 发明申请

WO2007035071A1 APPARATUS AND METHOD FOR TREATING SUBSTRATE 审中-公开
标题翻译：用于处理基板的装置和方法
公开(公告)号：WO2007035071A1
公开(公告)日：2007-03-29
申请号：PCT/KR2006/003818
申请日：2006-09-26
申请人： SEMES CO., LTD. , CHOI, Jong-Su , CHOI, Young-Kweon
发明人： CHOI, Jong-Su , CHOI, Young-Kweon
IPC分类号： H01L21/304
CPC分类号： H01L21/67248 , H01L21/6708
摘要： The present invention provides a method that can maintain the temperature of a wafer at a process temperature before a coating process is performed by supplying a photoresist. According to the present invention, a thinner which helps a diffusion of the photoresist is supplied onto the wafer before the photoresist is supplied. The thinner is supplied in a temperature-controlled state such that the wafer has the process temperature by the thinner.
摘要翻译：本发明涉及发酵罐，包括发酵罐的微波炉，以及控制发酵罐和微波炉的方法。本发明的发酵罐包括具有一个开口侧并限定发酵室的发酵罐壳体; 用于选择性地打开或关闭发酵室的发酵罐门; 用于向发酵室施加热量或从发酵室吸收热量的热电元件; 以及电流切换装置，用于转换提供给热电元件的电流，使得热电元件可以吸收或产生热量。根据本发明，可以非常方便地使用发酵罐，并且还可以提供具有各种功能的微波炉。

9. 发明申请

WO2006070959A1 FLUID SUPPLY SYSTEM USED IN AN APPARATUS FOR MANUFACTURING INTEGRATED CIRCUITS 审中-公开
标题翻译：用于制造集成电路的设备中使用的流体供应系统
公开(公告)号：WO2006070959A1
公开(公告)日：2006-07-06
申请号：PCT/KR2004/003550
申请日：2004-12-31
申请人： SEMES CO., LTD , AN, Doo-Keun , PARK, Pyeng-Jae
发明人： AN, Doo-Keun , PARK, Pyeng-Jae
IPC分类号： H01L21/306
CPC分类号： B01J4/02 , B01J4/002 , B01J2219/00164
摘要： The present invention is directed to a system for supplying chemicals to a plurality of nozzles to fabricate integrated circuits. The system includes a supply line, a return line, and a selecting part for supplying a constant amount of chemicals to the return line or one of nozzles. According to the invention, a constant amount of chemicals are supplied from a chemical storage irrespective of the number of nozzles requiring a supply of chemicals. This enables a pump to avoid overworking and suppresses the conventional problem that a determined time is required for enabling chemicals to reach a fixed temperature.
摘要翻译：本发明涉及一种用于向多个喷嘴提供化学品以制造集成电路的系统。该系统包括供应管线，返回管线和用于向返回管线或喷嘴中的一个供应恒定量的化学品的选择部件。根据本发明，不管需要供应化学品的喷嘴的数量如何，从化学品存储器供应恒定量的化学品。这使得泵避免过度劳累并且抑制了使化学品达到固定温度所需的确定时间的常规问题。

10. 发明申请

WO2007035071A8 APPARATUS AND METHOD FOR TREATING SUBSTRATE 审中-公开
标题翻译：用于处理基板的装置和方法
公开(公告)号：WO2007035071A8
公开(公告)日：2007-06-21
申请号：PCT/KR2006003818
申请日：2006-09-26
申请人： SEMES CO LTD , CHOI JONG-SU , CHOI YOUNG-KWEON
发明人： CHOI JONG-SU , CHOI YOUNG-KWEON
IPC分类号： H01L21/304
CPC分类号： H01L21/67248 , H01L21/6708
摘要： The present invention provides a method that can maintain the temperature of a wafer at a process temperature before a coating process is performed by supplying a photoresist. According to the present invention, a thinner which helps a diffusion of the photoresist is supplied onto the wafer before the photoresist is supplied. The thinner is supplied in a temperature-controlled state such that the wafer has the process temperature by the thinner.
摘要翻译：本发明提供了一种在通过供应光致抗蚀剂进行涂覆处理之前可以将晶片的温度保持在处理温度的方法。根据本发明，在提供光致抗蚀剂之前，有助于光致抗蚀剂扩散的薄膜被提供到晶片上。稀释剂以温度控制状态供应，使得晶片具有较薄的处理温度。

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