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1. 发明专利

TW201826439A 晶圓支承裝置以及晶圓處理裝置审中-公开
简体标题：晶圆支承设备以及晶圆处理设备
公开(公告)号：TW201826439A
公开(公告)日：2018-07-16
申请号：TW106135802
申请日：2017-10-19
申请人：普雷帝克股份有限公司 , PRE-TECH CO., LTD.
发明人：古閑哲二 , KOGA, TETSUJI , 原田康之 , HARADA, YASUYUKI
IPC分类号： H01L21/683 , H01L21/304
摘要：提供一種晶圓支承裝置，能防止藥液對桌台內部的侵入，再者，能防止因晶圓滑移所產生的噴濺。一種晶圓支承裝置，係水平地支承晶圓，並使晶圓旋轉，該晶圓支承裝置包含：桌台，包括上桌台以及支撐上桌台的桌台本體；複數支夾持銷，於上桌台的上表面以圍繞晶圓的方式而配置，自側面支承晶圓；以及桌台支撐軸，其中夾持銷相對於回轉軸而偏心地立設於可旋轉的夾持從動部之上，該夾持從動部收納在該上桌台的內部，且於內部收納有磁鐵，夾持驅動部則與該夾持從動部非接觸地收納在桌台本體內的夾持從動部的下方的對應位置。
简体摘要：提供一种晶圆支承设备，能防止药液对桌台内部的侵入，再者，能防止因晶圆滑移所产生的喷溅。一种晶圆支承设备，系水平地支承晶圆，并使晶圆旋转，该晶圆支承设备包含：桌台，包括上桌台以及支撑上桌台的桌台本体；复数支夹持销，于上桌台的上表面以围绕晶圆的方式而配置，自侧面支承晶圆；以及桌台支撑轴，其中夹持销相对于回转轴而偏心地立设于可旋转的夹持从动部之上，该夹持从动部收纳在该上桌台的内部，且于内部收纳有磁铁，夹持驱动部则与该夹持从动部非接触地收纳在桌台本体内的夹持从动部的下方的对应位置。

2. 发明专利

TW200709291A 基板之洗滌裝置审中-公开
简体标题：基板之洗涤设备
公开(公告)号：TW200709291A
公开(公告)日：2007-03-01
申请号：TW095103950
申请日：2006-02-06
申请人：普雷帝克股份有限公司 PRE-TECH CO., LTD.
发明人：內藤洋右 , 加藤正行 MASAYUKI KATO , 原田康之
IPC分类号： H01L , B08B
CPC分类号： H01L21/67051 , H01L21/68728 , H01L21/68735
摘要：提供一種基板之洗滌裝置1,至少具備:基板支撐構件3,用以支撐該基板9;及洗滌液供給構件2,用以對藉由該基板支撐構件支撐的基板供給由純水或藥液所構成洗滌液6,該基板支撐構件含有:定位用銷4,用以決定基板支撐構件在3點以上支撐基板的端面之位置;及突起部5;沿著被該定位用銷定位之基板的下面周圍,連續地配置有長短的突起5a、5b,其中從洗滌液供給構件供給純水或是藥液來洗滌基板時,係以藉由定位用銷支撐之基板下面與突起部之間所形成的間隙,被純水或藥液密封的狀態來洗滌基板。藉此,能夠提供一種洗滌裝置,在進行被要求很高潔淨度之半導體基板等的基板洗滌時,在能夠防止洗滌淨液流進與洗滌面相反側的面之同時,亦能夠防止微粒等滯留局部而造成污染。
简体摘要：提供一种基板之洗涤设备1,至少具备:基板支撑构件3,用以支撑该基板9;及洗涤液供给构件2,用以对借由该基板支撑构件支撑的基板供给由纯水或药液所构成洗涤液6,该基板支撑构件含有:定位用销4,用以决定基板支撑构件在3点以上支撑基板的端面之位置;及突起部5;沿着被该定位用销定位之基板的下面周围,连续地配置有长短的突起5a、5b,其中从洗涤液供给构件供给纯水或是药液来洗涤基板时,系以借由定位用销支撑之基板下面与突起部之间所形成的间隙,被纯水或药液密封的状态来洗涤基板。借此,能够提供一种洗涤设备,在进行被要求很高洁净度之半导体基板等的基板洗涤时,在能够防止洗涤净液流进与洗涤面相反侧的面之同时,亦能够防止微粒等滞留局部而造成污染。

3. 发明专利

JP2014038959A Cleaner using spin table 有权
标题翻译：清洁器使用旋转表
公开(公告)号：JP2014038959A
公开(公告)日：2014-02-27
申请号：JP2012181017
申请日：2012-08-17
申请人： Pre-Tech Co Ltd , 株式会社プレテック , National Institute Of Advanced Industrial & Technology , 独立行政法人産業技術総合研究所
发明人： NAITO YOSUKE , AMANO YUTAKA , HARA SHIRO
IPC分类号： H01L21/304
CPC分类号： H01L21/67051 , H01L21/6719 , H01L21/67724 , H01L21/67748 , H01L21/68785 , H01L21/68792
摘要： PROBLEM TO BE SOLVED: To provide a spin table type wafer cleaner which can efficiently clean a wafer with a plurality of cleaning mechanisms.SOLUTION: A wafer cleaner of the present invention comprises a spin table 5, a first cleaning mechanism 7, and a second cleaning mechanism 8. The spin table 5 has a setting surface 5a on which a wafer W is set, and is rotatable in a circumferential direction. The first cleaning mechanism 7 is mounted on the spin table 5 facing thereto and feeds first cleaning liquid to a side edge of the spin table 5. The second cleaning mechanism 8 is mounted on the spin table 5 facing thereto and feeds second cleaning liquid to a side edge of the spin table 5 different from that of the first cleaning mechanism 7. By rotating the spin table 5 and moving the wafer W from a first cleaning point to a second cleaning point, the wafer W can be washed with each of the first and second mechanisms 7 and 8, and the wafer W is revolved at a high speed on the spin table 5 to be dried using spinning motion.
摘要翻译：要解决的问题：提供一种能够利用多个清洁机构有效地清洁晶片的旋转台式晶片清洁器。解决方案：本发明的晶片清洁器包括旋转台5，第一清洁机构7和第二清洁机构7 清洁机构8.旋转台5具有设置表面5a，其上设置有晶片W，并且可以在周向上旋转。第一清洁机构7安装在面向其上的旋转台5上，并将第一清洁液供给到旋转台5的侧边缘。第二清洁机构8安装在面向其上的旋转台5上，并将第二清洁液体供给到旋转台5的侧边缘与第一清洁机构7不同。通过旋转旋转台5并将晶片W从第一清洁点移动到第二清洁点，晶片W可以用第一和第二机构7和8，并且晶片W在旋转台5上以高速旋转以通过旋转运动而被干燥。

4. 发明专利

JP2010080531A Ultrasonic cleaning apparatus and method 审中-公开
标题翻译：超声波清洗装置及方法
公开(公告)号：JP2010080531A
公开(公告)日：2010-04-08
申请号：JP2008244693
申请日：2008-09-24
申请人： Pre-Tech Co Ltd , 株式会社プレテック
发明人： SHIBA KAZUHIKO
IPC分类号： H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide an ultrasonic cleaning apparatus and ultrasonic cleaning method for ultrasonic-cleaning while suppressing damages on an object to be cleaned, and removing foreign matter from the object to be cleaned.
SOLUTION: The ultrasonic cleaning apparatus includes: at least a table for mounting and holding the object to be cleaned; a cleaning means for ultrasonic-cleaning by propagating oscillation of a piezoelectric oscillator to the object to be cleaned, which is held by the table, through atmosphere gas by an ultrasonic propagating body under a gas atmosphere; and an ultrasonic oscillator for applying a high frequency voltage on the piezoelectric oscillator of the cleaning means. An end surface of the ultrasonic propagating body on a side for propagating the ultrasonic oscillation to the object to be cleaned is formed in a tapered shape than an end surface, on which the piezoelectric oscillator is arranged, on an opposite side of the above end surface. The cleaning means propagates the ultrasonic oscillation to a surface of the object to be cleaned, and dry-cleans without contact.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于超声波清洗的超声波清洗装置和超声波清洗方法，同时抑制待清洁物体的损害，并且从待清洁物体中除去异物。解决方案：超声波清洗装置包括：至少一个用于安装和保持被清洁物体的工作台; 一种用于通过在气体气氛下通过超声波传播体将压电振动器振动传播到由工作台保持的待清洁物体进行超声波清洗的清洁装置; 以及用于在清洁装置的压电振荡器上施加高频电压的超声波振荡器。超声波传播体的用于将超声波振动传播到待清洁物体的一侧的端面形成为比配置有压电振荡器的端面在与上述端面相反的一侧的锥面形状。清洁装置将超声波振荡传播到待清洁物体的表面，并且不接触地干燥。版权所有（C）2010，JPO＆INPIT

5. 发明专利

JP2010010652A Single wafer cleaning apparatus 审中-公开
标题翻译：单面清洗装置
公开(公告)号：JP2010010652A
公开(公告)日：2010-01-14
申请号：JP2009022870
申请日：2009-02-03
申请人： Pre-Tech Co Ltd , 株式会社プレテック
发明人： SHIBA KAZUHIKO , NAITO YOSUKE
IPC分类号： H01L21/304 , B08B3/12 , H01L21/306 , H01L21/683
摘要： PROBLEM TO BE SOLVED: To provide a single wafer cleaning apparatus capable of preventing mutual contamination between cleaned objects which occurs when a backside of the cleaned object and a cleaning apparatus are in contact with each other, and suppressing reattachment of a cleaning liquid and cleaned dirt on the cleaned object. SOLUTION: The single wafer cleaning apparatus includes at least a chuck pin for holding a side surface of the cleaned object, a flange arranged beneath the cleaned object and having a discharge port for discharging a liquid, and a liquid splash preventing plate arranged on an outer side of the flange for preventing splash of the liquid discharged from the flange. A backside of the cleaned object is floated with a liquid by the flange in a non-contact state, and the chuck pin holds the side surface of the cleaned object to clean the cleaned object. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种能够防止被清洁物体的背面和清洁装置相互接触时发生的被清洁物体之间的相互污染的单个晶片清洁装置，并且抑制清洗液体的再附着并清洁被清洁物体上的污垢。解决方案：单晶片清洁装置至少包括用于保持被清洁物体的侧表面的卡盘销，布置在清洁物体下方的凸缘，并具有用于排出液体的排出口，以及布置在液体防溅板在凸缘的外侧上，用于防止从凸缘排出的液体飞溅。清洁物体的背面通过法兰在非接触状态下以液体浮动，并且卡盘销保持被清洁物体的侧表面以清洁被清洁物体。版权所有（C）2010，JPO＆INPIT

6. 发明专利

JP2008288541A Single wafer processing cleaning apparatus 审中-公开
标题翻译：单辊加工清洗装置
公开(公告)号：JP2008288541A
公开(公告)日：2008-11-27
申请号：JP2007189284
申请日：2007-07-20
申请人： Pre-Tech Co Ltd , 株式会社プレテック
发明人： SHIBA KAZUHIKO , KATO MASAYUKI , HATTORI MARE , NAITO YOSUKE
IPC分类号： H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide a single wafer processing cleaning apparatus by which damage to a substrate can be suppressed and high cleaning effect can be easily obtained even when treating a substrate having a substrate surface which is easy to get damaged and a substrate on which especially a device pattern is formed.
SOLUTION: The single wafer processing cleaning apparatus 1 includes a holding means 2 for holding a substrate W and a cleaning liquid exhaust means 4 which ejects a cleaning liquid 3 toward an upper surface W1 of the substrate held by the holding means. The apparatus includes at least a propagative water supply means 6 for supplying propagative water to a lower surface W2 of the substrate and a vibration means 7 which is so proximately arranged that a film 5 is formed just under the substrate by the propagative water, to apply ultrasonic vibration permeable to the substrate to the propagative water film. The ultrasonic vibration applied from the vibration means 7 to the propagative water film 5 is transmitted through the substrate W and applied to the cleaning liquid 3 on the upper surface W1 of the substrate, thereby the upper surface W1 of the substrate is cleaned.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种可以抑制基板损伤的单晶片处理清洁装置，即使在处理容易损坏的基板表面的基板和也可以容易地获得高清洗效果的情况下其上形成有特别是器件图案的衬底。解决方案：单个晶片处理清洁装置1包括用于保持基板W的保持装置2和清洁液体排出装置4，清洗液排出装置4朝向由保持装置保持的基板的上表面W1喷射。该装置至少包括用于向基底的下表面W2供应传播水的传播水供给装置6以及靠近布置的振动装置7，使得膜5通过传播水形成在基底下方，以施加超声波振动可透过基底至传播水膜。从振动装置7向传播水膜5施加的超声振动通过基板W透过，并被施加到基板的上表面W1上的清洗液体3，从而清洁基板的上表面W1。版权所有（C）2009，JPO＆INPIT

7. 发明专利

JP2008068221A Ultrasonic cleaning device 审中-公开
标题翻译：超声波清洗装置
公开(公告)号：JP2008068221A
公开(公告)日：2008-03-27
申请号：JP2006250320
申请日：2006-09-15
申请人： Pre-Tech Co Ltd , 株式会社プレテック
发明人： SHIBA KAZUHIKO , GOTO AKIHIRO , IWAGAYA TERUYOSHI
IPC分类号： B08B3/12 , B06B1/06 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide an ultrasonic cleaning device capable of driving vibration plates of high frequency and large area regardless of capacitance of all the vibration plates in low current, applying ultrasonic vibration of the same phase to cleaning liquid, reducing cost and simplified in design. SOLUTION: This ultrasonic cleaning device 10 is provided with at least a cleaning tank 3 containing the cleaning liquid 4; a radiation plate 7 disposed on the wall face of the cleaning tank 3 and applying ultrasonic vibration to the cleaning tank 3; multiple vibration plates 2 jointed to vibrate the radiation plate 7; and an oscillator 1 vibrating the vibration plates 2. The adjacent two vibration plates 2 are electrically serially connected, and driven by one oscillator 1. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：为了提供能够驱动高频大面积振动板的超声波清洗装置，而不管所有振动板的电容在低电流下，施加相同相位的超声波振动到清洗液体上，降低了成本并简化设计。解决方案：该超声波清洗装置10至少设置有容纳清洗液4的清洗槽3，设置在清洗槽3的壁面上并向清洗槽3施加超声波振动的辐射板7; 多个振动板2接合以使辐射板7振动; 和振动器1振动振动板2.相邻的两个振动板2电连接并由一个振荡器1驱动。版权所有（C）2008，JPO＆INPIT

8. 发明专利

JP2007227496A Ashing device and ashing method 审中-公开
标题翻译： ASHING设备和ASHING方法
公开(公告)号：JP2007227496A
公开(公告)日：2007-09-06
申请号：JP2006044814
申请日：2006-02-22
申请人： Pre-Tech Co Ltd , 株式会社プレテック
发明人： KATO MASAYUKI , NAITO YOSUKE
IPC分类号： H01L21/3065
摘要： PROBLEM TO BE SOLVED: To provide an ashing device and an ashing method in which oxygen gas in a chamber can be exhausted efficiently and a work to be processed can be irradiated with UV-rays effectively.
SOLUTION: The device for ashing a work by irradiating it with UV-rays comprises a lamp for irradiating the work with UV-rays, a chamber for containing the work to be processed, a pressure gauge for measuring the pressure in the chamber, and a pump connected with the chamber wherein the work in the chamber having a pressure reduced to a predetermined level using the pump based on the pressure gauge is irradiated with UV-rays from the UV-ray irradiation lamp and ashed.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供可以有效地排出室内的氧气的灰化装置和灰化方法，并且可以有效地用紫外线照射待处理的工件。解决方案：通过用紫外线照射工件来灰化工件的装置包括用于用紫外线照射工件的灯，用于容纳待加工的工件的室，用于测量室中的压力的压力计以及与腔室连接的泵，其中使用来自UV射线照射灯的紫外线照射基于压力计的具有降低到预定水平的压力的室中的工作。版权所有（C）2007，JPO＆INPIT

9. 发明专利

JP2007216209A Ultrasonic cleaner and ultrasonic cleaning method 审中-公开
标题翻译：超声波清洗机和超声波清洗方法
公开(公告)号：JP2007216209A
公开(公告)日：2007-08-30
申请号：JP2006278769
申请日：2006-10-12
申请人： Pre-Tech Co Ltd , 株式会社プレテック
发明人： SHIBA KAZUHIKO , GOTO AKIHIRO
IPC分类号： B08B3/12 , G02F1/13 , G02F1/1333 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide a cleaner and a cleaning method which enable the ultrasonic cleaning of a substrate without damage even if it is a damage-susceptable substrate such as a semiconductor wafer, a photomask substrate and a liquid crystal substrate.
SOLUTION: An ultrasonic cleaner 1 is a cleaner to ultrasonic clean an object to be cleaned 10 and is provided with at least an ultrasonic vibrator 3 which generates an ultrasonic vibration and a cleaning liquid 9 where the ultrasonic vibrator is installed and the ultrasonic vibration is applied and a means 2 which contacts the object to be cleaned and the ultrasonic vibrator gives the ultrasonic vibration in the transverse direction against the surface where the ultrasonic vibrator is installed and cleans the object to be cleaned by applying the ultrasonic vibration to the cleaning liquid.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种清洁器和清洁方法，其即使是诸如半导体晶片，光掩模基板和液晶基板的易损坏的基板，也能够对基板进行超声波清洗而不损坏。解决方案：超声波清洗器1是用于超声波清洁待清洁物体10的清洁器，并且至少设置有产生超声波振动的超声波振动器3和安装有超声波振动器的清洗液9，超声波清洗器施加振动，与待清洁物体接触的装置2和超声波振动器相对于安装超声波振动器的表面向横向方向施加超声波振动，并通过将超声波振动施加到清洁器上来清洁被清洁物体液体。版权所有（C）2007，JPO＆INPIT

10. 发明专利

JP2007035548A Coaxial cable and ultrasonic washer 有权
标题翻译：同轴电缆和超声波清洗机
公开(公告)号：JP2007035548A
公开(公告)日：2007-02-08
申请号：JP2005220462
申请日：2005-07-29
申请人： Pre-Tech Co Ltd , 株式会社プレテック
发明人： IWAGAYA TERUYOSHI
IPC分类号： H01B11/18 , B08B3/12 , H01B7/17
摘要： PROBLEM TO BE SOLVED: To provide a coaxial cable for high-frequency power transmission that has a sufficient shielding function, high flexibility, working efficiency, and storage properties, and then improved appearance, and to provide an ultrasonic washer using the coaxial cable.
SOLUTION: In the coaxial cable for high-frequency power transmission, at least an insulating layer, an external conductive layer, a first insulating coating layer, an aluminum laminate layer, at least a layer of ground conductor layer, and a second insulating coating layer are formed successively around a central conductor. The ultrasonic washer transmits high-frequency power generated by an ultrasonic oscillator to an ultrasonic vibrator by the coaxial cable, and the ultrasonic vibrator applies ultrasonic vibration to a cleaning liquid to wash an object to be cleaned.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：为了提供具有足够的屏蔽功能，高灵活性，工作效率和存储性能，然后改善外观的高频电力传输用同轴电缆，并提供使用同轴线的超声波清洗机电缆。解决方案：在用于高频电力传输的同轴电缆中，至少绝缘层，外部导电层，第一绝缘涂层，铝层压层，至少一层接地导体层和第二绝缘层绝缘涂层依次围绕中心导体形成。超声波洗衣机通过同轴电缆将由超声波振荡器产生的高频电力传递给超声波振动器，超声波振动器对清洗液施加超声波振动，以清洗待清洁物体。版权所有（C）2007，JPO＆INPIT

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