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2. 发明申请

WO2005063687A3 NEW PROCESS FOR THE SYNTHESIS OF ENEAMIDE DERIVATIVES 审中-公开
标题翻译：用于合成活性衍生物的新工艺
公开(公告)号：WO2005063687A3
公开(公告)日：2005-10-27
申请号：PCT/IB2004004363
申请日：2004-12-22
申请人： PPG SIPSY , BURGOS ALAIN , BERTRAND BLANDINE , ROUSSIASSE SONIA , PLUVIE JEAN-FRANCOIS , BLANCHET SYLVIE , MARTIN JULIETTE , PERRIN FLORENCE , BOURDEAU FRANCOISE
发明人： BURGOS ALAIN , BERTRAND BLANDINE , ROUSSIASSE SONIA , PLUVIE JEAN-FRANCOIS , BLANCHET SYLVIE , MARTIN JULIETTE , PERRIN FLORENCE , BOURDEAU FRANCOISE
IPC分类号： C07C231/10 , C07C233/00 , C07C233/06
CPC分类号： C07C231/10 , C07C233/06 , C07C2602/08 , C07C2602/10
摘要： A process for the production of ene-amide derivatives represented by the formula (I) wherein R1 and R2 and R3 are independently a hydrogen atom, an alkyl, a cycloalkyl, a cycloalkylalkyl, an alkylaryl, an aryl, a heterocycle, a cyano, an alkoxy, an aryloxy, a carboxyl, a carbamoyl, -CONR5R6 (in which R5 and R6 are independently an alkyl, arylalkyl or aryl group said ring being substituted or not with a functional group or with R5) or -COOR5 group (in which R5 is an alkyl, alkylaryl or aryl group), said alkyl, cycloalkyl, cycloalkylalkyl, alkylaryl and aryl groups being substituted or not with a functional group or with R5; or R1 and R2 taken together, may form a ring (which terms includes mono-, di- and higher polycyclic ring systems); R4 is a hydrogen atom, an alkyl, an aryl, an alkylaryl, said groups are substituted or not with a halogen atom as Cl, Br, or F; X is an oxygen atom or a leaving group and m is an integer 1 or 2; when m is 1 then X is a leaving group; when m is 2 then X is a oxygen atom, which comprise: a hydrogenation/isanerization reaction in presence of a heterogeneous catalyst, of an oxime derivatives of formula (II) wherein R1, R2 and R3 are as defined above with an acyl derivative of formula (III) (R4CO)mXwherein R4, m and X are as defined above
摘要翻译：制备由式（I）表示的烯 - 酰胺衍生物的方法，其中R 1和R 2和R 3独立地为氢原子，烷基，环烷基，环烷基烷基，烷基芳基，芳基，杂环，氰基，烷氧基，芳氧基，羧基，氨基甲酰基-CONR 5 R 6（其中R 5和R 6独立地是烷基，芳基烷基或芳基，所述环被取代或不被官能团或与R5）或-COOR5基团（其中 R5是烷基，烷基芳基或芳基），所述烷基，环烷基，环烷基烷基，烷基芳基和芳基被官能团取代或不与R5取代; 或R 1和R 2一起形成环（该术语包括单环，二和更高多环系统）; R4是氢原子，烷基，芳基，烷基芳基，所述基团被卤素原子取代或未被取代为Cl，Br或F; X是氧原子或离去基团，m是整数1或2; 当m为1时，X为离去基团; 当m为2时，X为氧原子，其包括：在非均相催化剂存在下的式（II）的肟衍生物，其中R 1，R 2和R 3的定义如上所定义的肟衍生物与酰基衍生物式（III）（R4CO）mX其中R4，m和X如上所定义

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