会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 3. 发明授权
    • Packaging integrated circuits for accelerated detection of transient particle induced soft error rates
    • 封装集成电路,用于加速检测瞬态粒子引起的软错误率
    • US07238547B2
    • 2007-07-03
    • US11098343
    • 2005-04-04
    • Janes Jones, legal representativeJerry D. AckaretMichael A. GaynesMichael S. GordonNancy C. LaBianca
    • Theodore H. Zabel, deceased
    • H01L21/56
    • G06F11/00
    • An IC device is packaged for accelerated transient particle emission by doping the underfill thereof with a transient-particle-emitting material having a predetermined, substantially constant emission rate. The emission rate may be tunable. In one aspect, a radioactive adhesive composition is provided for bonding a semiconductor device to a chip carrier. The radioactive adhesive composition is made from a cured reaction product including a resin and a filler, and may be reworkable or non-reworkable. Either the resin or the filler, individually or both together as a mix, are doped substantially uniformly with the transient-particle-emitting material, thereby putting the transient-particle-emitting in close proximity with the IC to be tested. The underfill is formulated to have a stable chemistry, and the doped particles are encapsulated, so as to contain the emissions. Accelerated transient-particle-emission testing may then be performed on the IC in situ to provide accelerated detection of soft errors.
    • 通过用具有预定的,基本上恒定的发射速率的瞬态粒子发射材料掺杂其底部填充物来封装IC器件用于加速瞬态粒子发射。 排放率可能是可调的。 在一个方面,提供了用于将半导体器件接合到芯片载体的放射性粘合剂组合物。 放射性粘合剂组合物由包括树脂和填料的固化反应产物制成,并且可以是可再加工的或不可再加工的。 单独或两者一起作为混合物的树脂或填料均以瞬态粒子发射材料基本上均匀地掺杂,从而使瞬态粒子发射紧密接近待测试的IC。 底层填料配制成具有稳定的化学性质,并且掺杂的颗粒被包封,以便包含排放物。 然后可以在IC上原位进行加速瞬态粒子发射测试,以提供软错误的加速检测。
    • 10. 发明授权
    • Thermal stabilization of photoresist images
    • 光致抗蚀剂图像的热稳定性
    • US4806455A
    • 1989-02-21
    • US34344
    • 1987-04-03
    • Nancy C. LaBianca
    • Nancy C. LaBianca
    • G03F7/40G03C5/00
    • G03F7/40
    • Application of a high temperature resistant film forming polymer has previously proved successful in stabilizing photoresist image layers, particularly those used for high resolution geometries in microelectronic applications, against distortion or degradation by the heat generated during subsequent etching, ion implantation processes and the like. It has been found that, when the thickness of the photoresist image layer exceeds about 1 micron, the coating of the film forming polymer tends to distort and/or cause cracks, breaks and the like in the photoresist resulting in loss of the required geometry in the image. In accordance with the invention this problem can be overcome by applying the film forming polymer in the form of an ultrasonically atomized spray under controlled conditions.
    • 耐高温成膜聚合物的应用先前证明在光致抗蚀剂图像层,特别是用于微电子应用中用于高分辨率几何形状的抗蚀剂图像层中,可以防止在随后的蚀刻,离子注入工艺等期间产生的热量的失真或劣化。 已经发现,当光致抗蚀剂图像层的厚度超过约1微米时,成膜聚合物的涂层倾向于在光致抗蚀剂中变形和/或引起裂纹,断裂等,导致所需几何形状的损失 图片。 根据本发明,可以通过在受控条件下以超声雾化喷雾的形式应用成膜聚合物来克服这个问题。