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    • 1. 发明申请
    • SINGLE LAYER BGA SUBSTRATE PROCESS
    • 单层BGA基板工艺
    • WO2012103369A1
    • 2012-08-02
    • PCT/US2012/022776
    • 2012-01-26
    • MARVELL WORLD TRADE LTD.LIOU, Shiann-MingKAO, Huahung
    • LIOU, Shiann-MingKAO, Huahung
    • H01L21/48H01L23/498
    • H01L21/50H01L21/4832H01L21/486H01L23/49816H01L23/49861H01L2224/48091H01L2924/09701H01L2924/15311H01L2924/00014
    • Embodiments of the present disclosure provide semiconductor packaging techniques that form a substrate using metal and insulating materials. The substrate includes a first surface that is bonded to a semiconductor device and a second surface that is bonded to a printed circuit board. The substrate is formed using several techniques that minimize the amount of mask levels used to form the substrate. For example, a metal substrate is patterned to form a three dimensional pattern on the surface. A dielectric material is deposited on the three dimensional pattern. Using several patterning and polishing embodiments described herein, the metal/dielectric substrate is patterned and polished to form a substantially flush surface that is bonded to the semiconductor device. In one embodiment, the top surface of the metal/dielectric substrate is patterned to expose the underlying metal substrate and the bottom surface of the metal substrate is polished to be substantially flush with the dielectric material.
    • 本公开的实施例提供了使用金属和绝缘材料形成衬底的半导体封装技术。 基板包括接合到半导体器件的第一表面和结合到印刷电路板的第二表面。 使用几种最小化用于形成衬底的掩模水平的量的技术来形成衬底。 例如,将金属基板图案化以在表面上形成三维图案。 介电材料沉积在三维图案上。 使用本文所述的几种图案化和抛光实施例,金属/电介质基板被图案化和抛光以形成结合到半导体器件的基本上平齐的表面。 在一个实施例中,金属/电介质基板的顶表面被图案化以暴露下面的金属基底,金属基底的底表面被抛光以与电介质材料基本齐平。