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    • 3. 发明授权
    • Silicon carbide bipolar semiconductor device
    • 碳化硅双极半导体器件
    • US08154026B2
    • 2012-04-10
    • US12097019
    • 2006-12-13
    • Ryosuke IshiiKoji NakayamaYoshitaka SugawaraToshiyuki MiyanagiHidekazu TsuchidaIsaho KamataTomonori Nakamura
    • Ryosuke IshiiKoji NakayamaYoshitaka SugawaraToshiyuki MiyanagiHidekazu TsuchidaIsaho KamataTomonori Nakamura
    • H01L29/15
    • H01L29/1604H01L21/0465H01L21/047H01L29/0615H01L29/0619H01L29/0661H01L29/1608H01L29/6606H01L29/66068H01L29/8613
    • In a SiC bipolar semiconductor device with a mesa structure having a SiC drift layer of a first conductive type and a SiC carrier injection layer of a second conductive type that are SiC epitaxial layers grown from a surface of a SiC single crystal substrate, the formation of stacking faults and the expansion of the area thereof are prevented and thereby the increase in forward voltage is prevented. Further, a characteristic of withstand voltage in a reverse biasing is improved. An forward-operation degradation preventing layer is formed on a mesa wall or on a mesa wall and a mesa periphery to separate spatially the surface of the mesa wall from a pn-junction interface. In one embodiment, the forward-operation degradation preventing layer is composed of a silicon carbide low resistance layer of a second conductive type that is equipotential during the application of a reverse voltage. In another embodiment, the forward-operation degradation preventing layer is composed of a silicon carbide conductive layer of a second conductive type, and a metal layer that is equipotential during the application of a reverse voltage is formed on a surface of the silicon carbide conductive layer. In still another embodiment, the forward-operation degradation preventing layer is composed of a high resistance amorphous layer.
    • 在具有由SiC单晶衬底的表面生长的SiC外延层的具有第一导电类型的SiC漂移层和第二导电类型的SiC载流子注入层的台阶结构的SiC双极型半导体器件中,形成 防止堆垛层错及其面积的膨胀,从而防止正向电压的增加。 此外,提高了反向偏置中的耐受电压的特性。 在台面壁或台面壁和台面周边上形成正向操作降解防止层,以在空间上分离台面壁的表面与pn结界面。 在一个实施例中,正向操作降解防止层由在施加反向电压期间具有等电位的第二导电类型的碳化硅低电阻层构成。 在另一个实施方案中,正向操作降解防止层由第二导电类型的碳化硅导电层构成,并且在施加反向电压期间具有等电位的金属层形成在碳化硅导电层的表面上 。 在另一个实施方案中,正向操作降解防止层由高电阻非晶层组成。
    • 5. 发明授权
    • Inkjet recording apparatus
    • 喷墨记录装置
    • US08079698B2
    • 2011-12-20
    • US11782725
    • 2007-07-25
    • Koji Nakayama
    • Koji Nakayama
    • B41J2/01
    • B41J29/17B41J11/0015B41J11/007
    • There is disclosed an inkjet recording apparatus including a feeding device, a remover, and an inkjet head. The feeding device feeds a recording medium along a feed path passing through a removing area. A part of an opposingly-feeding surface extends opposed to the ink jet head and along the feed path, and the removing area is located under the opposingly-feeding surface and within the opposingly-feeding surface as seen in a vertical direction. The remover removes foreign matter from a surface of the recording medium during the recording medium is fed through the removing area by the feeding device. The inkjet head is disposed downstream of the remover with respect to a feeding direction in which the recording medium is fed. The inkjet head has an ink ejection surface in which a nozzle is open, and an ink droplet is ejected from the nozzle toward a recording surface of the recording medium while the recording medium is fed along at least a part of the opposingly-feeding surface.
    • 公开了一种喷墨记录装置,其包括进料装置,去除剂和喷墨头。 馈送装置沿着通过去除区域的馈送路径馈送记录介质。 反向进给表面的一部分与喷墨头相对并且沿着进给路径延伸,并且在垂直方向上看去除区域位于相对输送表面下方和相对进给表面内。 在记录介质通过进给装置通过去除区域供给时,去除器从记录介质的表面去除异物。 喷墨头相对于记录介质被供给的进给方向设置在去除器的下游。 喷墨头具有其中喷嘴打开的喷墨表面,并且当记录介质沿着相对输送表面的至少一部分进给时,墨滴从喷嘴朝向记录介质的记录表面喷射。