专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明公开

KR20200143278A 감방사선성 수지 조성물 및 레지스트 패턴 형성 방법 审中-公开
公开(公告)号：KR20200143278A
公开(公告)日：2020-12-23
申请号：KR20200070129
申请日：2020-06-10
申请人： JSR CORP
发明人： NISHIKORI KATSUAKI , MARUYAMA KEN , KASAHARA KAZUKI , FURUKAWA TSUYOSHI , KINOSHITA NATSUKO
IPC分类号： G03F7/004 , C08F212/14 , C08F220/14 , G03F7/033 , G03F7/20 , G03F7/26
摘要： 본발명은, 페놀성수산기를포함하는제1 구조단위, 하기식 (1)로표시되는기를포함하는제2 구조단위및 산해리성기를포함하는제3 구조단위를갖는중합체와, 감방사선성산 발생체와, 하기식 (2)로표시되는화합물을함유하는감방사선성수지조성물및 그것을사용한레지스트패턴형성방법이다. TIFFpat00032.tif5476

2. 发明公开

KR20200137976A 변성 공액 디엔계 중합체의 제조 방법, 변성 공액 디엔계 중합체, 중합체 조성물, 가교체 및 타이어 审中-公开
公开(公告)号：KR20200137976A
公开(公告)日：2020-12-09
申请号：KR20200046641
申请日：2020-04-17
申请人： JSR CORP
发明人： ITO KEN ICHI , SHIN KANYOU , TAKII KOICHIRO , WATANABE KEISUKE
IPC分类号： C08F236/10 , B60C1/00 , C08F8/30 , C08F8/42 , C08K3/36 , C08L9/06 , C08L15/00
摘要： (과제) 무니점도가적절히높아, 가공성이양호한고무조성물을얻을수 있고, 또한우수한저발열성을나타내는가교체를얻을수 있는변성공액디엔계중합체를얻는것이다. (해결수단) 알칼리금속화합물또는알칼리토금속화합물과, (A) 화합물을혼합하여얻어지는금속아미드화합물의존재하에서공액디엔화합물을포함하는모노머를중합하여, 활성말단을갖는공액디엔계중합체를얻는공정과, 활성말단을갖는공액디엔계중합체와, 식 (1)로나타나는화합물을반응시키는공정을포함하는방법에의해변성공액디엔계중합체를제조한다. (A) 보호된 2급아미노기및 3급아미노기로이루어지는군으로부터선택되는적어도 1종의질소함유기와, 1개의 2급아미노기를갖는화합물이다. JPEGpat00016.jpg2688

3. 发明公开

KR20070111354A VERTICAL ALIGNMENT TYPE LIQUID CRYSTAL ALIGNING AGENT AND VERTICAL ALIGNMENT TYPE LIQUID CRYSTAL DISPLAY 审中-公开
标题翻译：垂直对准型液晶标准代理和垂直对准型液晶显示
公开(公告)号：KR20070111354A
公开(公告)日：2007-11-21
申请号：KR20070047005
申请日：2007-05-15
申请人： JSR CORP
发明人： KUMAGAI TSUTOMU , FUKUMA SATOSHI , NISHIKAWA MICHINORI
IPC分类号： C09K19/56
CPC分类号： C09K19/56 , C08G73/1003 , C08L79/08 , G02F1/133723
摘要： A vertical type liquid crystal aligning agent is provided to ensure excellent voltage maintenance characteristics in a vertical type liquid crystal device while exhibiting good coatability on a substrate. A vertical type liquid crystal aligning agent comprises a polymer having at least one of amic acid repeating units represented by the following formula 1a and imide repeating units represented by the following formula 2, wherein Q1 in formula 1a and Q2 in formula 1b contains at least one divalent organic group represented by the following formulae 2a and 2b, and at least one divalent organic group represented by the formula of -X2-3-X2. In formulae 1a and 1b, each of P1 and P2 represents a tetravalent organic group forming a tetracarboxylic acid, and each of Q1 and Q2 represents a divalent organic group forming a diamine. In formulae 2a and 2b, X1 is a single bond, -O-, -CO-, -COO-, -OCO-, -NHCO-, -CONH-, -S-, methylene, C2-C6 alkylene or phenylene; R1 is a C10-20 alkyl, C4-C40 alicyclic monovalent organic group or C6-C20 fluorine-containing monovalent organic group; and R2 is a C4-C40 alicyclic divalent organic group or C5-C30 fluorine-containing divalent organic group. In the formula of -X2-3-X2, X2 independently represents methylene or a C2-C20 alkylene; and R3 is an aromatic ring-containing backbone, organosiloxane backbone, divalent organic group represented by the formula of -R-(O-C2H4)n-O-R- (wherein R is a C2-C5 alkylene and n is 1-100), a divalent organic group represented by the formula of -R-(O-C2H4)n-O-R- (wherein R is a C2-C5 alkylene, and n is 1-50), C4-C40 alicyclic ring backbone-containing divalent organic group.
摘要翻译：提供了垂直型液晶取向剂，以确保在垂直型液晶装置中优异的电压维持特性，同时在基板上表现出良好的涂布性。垂直型液晶取向剂包括具有由下式1a表示的至少一种酰胺酸重复单元和由下式2表示的酰亚胺重复单元的聚合物，其中式1a中的Q1和式1b中的Q2包含至少一个由下式2a和2b表示的二价有机基团和由式-X2-3-X2表示的至少一种二价有机基团。在式1a和1b中，P1和P2各自表示形成四羧酸的四价有机基团，Q1和Q2各自表示形成二胺的二价有机基团。在式2a和2b中，X 1是单键，-O - ， - CO - ， - COO - ， - OCO - ， - NHCO - ， - CONH - ， - S-，亚甲基，C 2 -C 6亚烷基或亚苯基; R1是C10-20烷基，C4-C40脂环族一价有机基团或C6-C20含氟一价有机基团; R2为C4-C40脂环族二价有机基团或C5-C30含氟二价有机基团。在-X2-3-X2的式中，X2独立地表示亚甲基或C2-C20亚烷基; R3为含芳香环的骨架，有机硅氧烷骨架，由式-R-（O-C 2 H 4）nOR-表示的二价有机基团（其中R为C2-C5亚烷基且n为1-100），二价由式-R-（O-C 2 H 4）nOR-（其中R为C 2 -C 5亚烷基，n为1-50）表示的有机基团，含有C 4 -C 40脂环族骨架的二价有机基团。

4. 发明公开

KR20070104259A PHOTO-SENSITIVE RESIN COMPOSITION CONTAINING INORGANIC PARTICLE, PHOTO-SENSITIVE FILM, AND PROCESS OF FORMING INORGANIC PATTERN 审中-公开
标题翻译：含有无机颗粒的光敏树脂组合物，感光膜和形成无机图案的方法
公开(公告)号：KR20070104259A
公开(公告)日：2007-10-25
申请号：KR20070038235
申请日：2007-04-19
申请人： JSR CORP
发明人： KUDOU KAZUNARI , MASUKO HIDEAKI
IPC分类号： G03F7/004 , G02B5/20 , G03F7/027 , G03F7/028 , G03F7/033 , H01J9/02 , H01J9/227 , H01J11/22 , H01J11/34 , H01J11/36 , H01J11/38 , H01J11/42 , H01J11/44
CPC分类号： G03F7/0047 , G03F7/0007 , G03F7/027 , G03F7/028
摘要： A photosensitive resin composition containing an inorganic particle for forming a display member, a photosensitive film prepared by using the composition, a method for forming an inorganic pattern by using the composition, and a method for preparing a flat panel display by the method are provided to improve the precision of pattern and the thermal decomposition of an organic component and to reduce the contraction after sintering. A photosensitive resin composition comprises an inorganic particle; an alkali-soluble resin; a radiation curing agent having at least two (meth)acryloyl groups and at least one bond selected from an acetal bond, a hemiacetal ester bond and a monothioacetal bond; and a photopolymerization initiator. Preferably the radiation curing agent has at least one group selected from the groups represented by the formula 1 or 2, wherein R1 and R4 are H or a methyl group; R2 and R5 are an organic residue; R3 and R6 are H or an organic residue; and * represents the position bonded to a molecular frame.
摘要翻译：含有用于形成显示部件的无机粒子的感光性树脂组合物，使用该组合物制备的感光性膜，使用该组合物形成无机图案的方法以及通过该方法制备平板显示器的方法，提高有机成分的图案精度和热分解，降低烧结后的收缩。光敏树脂组合物包含无机颗粒; 碱溶性树脂; 具有至少两个（甲基）丙烯酰基和至少一个选自缩醛键，半缩醛酯键和一硫缩醛键的键的辐射固化剂; 和光聚合引发剂。优选地，辐射固化剂具有选自由式1或2表示的基团中的至少一个基团，其中R 1和R 4是H或甲基; R2和R5是有机残基; R3和R6是H或有机残基; 和*表示键合到分子框架的位置。

5. 发明公开

KR20070085160A RADIATION-SENSITIVE POSITIVE RESIN COMPOSITION FOR PRODUCING PLATED SHAPED ARTICLES, TRANSFER FILM, AND PROCESS FOR PRODUCING DEPOSITS 审中-公开
标题翻译：用于生产镀层制品的辐射敏感性阳性树脂组合物，转印膜和用于生产沉积物的方法
公开(公告)号：KR20070085160A
公开(公告)日：2007-08-27
申请号：KR20070017471
申请日：2007-02-21
申请人： JSR CORP
发明人： MORI KOUSUKE , NISHIKAWA KOUJI
IPC分类号： G03F7/004 , G03F7/039
CPC分类号： G03F7/0392 , G03F7/40 , G03F7/0045
摘要： Provided is a radiation-sensitive positive resin composition which is excellent in sensitivity, resolution and adhesion to a substrate, is developed to form clear apertures without residues, does not contaminate a plating solution, is capable of forming a resin film (resist) which is resistant to cracks after plating, resistant to indentation by plating, and resistant to lifting. A radiation-sensitive positive resin composition comprises a polymer(A) which has at least one end terminated with -SR (wherein R is a linear or branched alkyl group of 1 to 20 carbon atoms, a cyclic alkyl group of 3 to 20 carbon atoms, or a derivative thereof) and includes a structural unit having an acid-dissociative functional group which is dissociated by an acid to yield an acidic functional group; a radiation-sensitive acid generator(B); and an organic solvent(C). The polymer(A) is obtained using a chain transfer agent represented by the formula of R-SR, in which R is a linear or branched alkyl group of 1 to 20 carbon atoms, a cyclic alkyl group of 3 to 20 carbon atoms, or a derivative thereof.
摘要翻译：提供了对基材的灵敏度，分辨率和粘附性优异的辐射敏感性阳性树脂组合物，被开发成形成无残留物的透明孔，不污染电镀液，能够形成树脂膜（抗蚀剂）电镀后耐裂纹，耐电镀压痕，耐起吊。辐射敏感性阳性树脂组合物包含具有至少一个末端以-SR（其中R为碳原子数1〜20的直链或支链烷基），碳原子数为3〜20的环状烷基的聚合物（A）或其衍生物），并且包括具有酸解离官能团的结构单元，其被酸解离以产生酸性官能团; 辐射敏感酸产生剂（B）; 和有机溶剂（C）。使用由式R-SR表示的链转移剂得到聚合物（A），其中R为碳原子数1〜20的直链或支链烷基，碳原子数3〜20的环状烷基，或其衍生物。

6. 发明公开

KR20200134161A 광학 필터 및 그의 용도 审中-公开
公开(公告)号：KR20200134161A
公开(公告)日：2020-12-01
申请号：KR20200058864
申请日：2020-05-18
申请人： JSR CORP
发明人： SHIGEOKA DAISUKE , NAGAYA KATSUYA , UCHIDA YOSUKE , KISHIDA HIROYUKI , KAWABE YASUNORI , OHASHI YUKIE
IPC分类号： G02B5/20 , B32B17/10 , G02B5/08 , G02B5/22
摘要： [과제] 두께가얇아도근적외선차폐성이우수한광학필터를제공하는것. [해결수단] 하기요건 (a) 내지 (d)를충족하는것을특징으로하는광학필터: (a) 파장 700nm 내지 900nm의영역에있어서, 광학필터의면에대하여수직방향으로부터입사하는광에대한광학농도(OD값)의최솟값(ODa-0)이 2.0 이상이다; (b) 파장 430nm 내지 580nm의영역에있어서, 광학필터의면에대하여수직방향으로부터입사하는광의투과율의평균값(Ta-0)이 40% 이상이다; (c) 파장 420nm 내지 900nm의영역에있어서, 광학필터의면에대하여수직방향에대하여 5도의각도로입사하는광에대한반사율의평균값(Rfa-5)이 20% 이하이다; (d) 파장 650nm 이상 950nm 미만의영역에흡수극대를갖는화합물 (A)를적어도 3종함유하는층을포함한다.

7. 发明公开

KR20200130358A 감방사선성 수지 조성물 및 그의 제조 방법 그리고 레지스트 패턴 형성 방법 审中-公开
公开(公告)号：KR20200130358A
公开(公告)日：2020-11-18
申请号：KR20207028406
申请日：2019-02-27
申请人： JSR CORP
发明人： MARUYAMA KEN , NONOYAMA YOSHIKI , SONE TAKUO , SHIRATANI MOTOHIRO
IPC分类号： G03F7/004 , C08F220/10 , G03F7/039 , G03F7/20
摘要： 결함억제성, LWR 성능및 감도가우수한감방사선성수지조성물의제공을목적으로한다. 본발명은하기식 (1)로표시되는제1 구조단위, 및하기식 (2)로표시되며산해리성기를포함하는제2 구조단위를갖는중합체와, 방사선의조사에의해제1 산을발생하는제1 산발생제와, 방사선의조사에의해제2 산을발생하는제2 산발생제를함유하고, 상기제1 산발생제로부터발생하는제1 산이, 80℃이상 140℃이하의온도조건에서 1분간가열하였을때에상기중합체중의상기산해리성기를해리시키는산이며, 상기제2 산발생제로부터발생하는제2 산이, 상기조건하에서실질적으로상기산해리성기를해리시키지않는산이며, 상기중합체의겔 투과크로마토그래피에의해측정되는폴리스티렌환산의중량평균분자량의수평균분자량에대한비(Mw/Mn)가 1.5보다작은감방사선성수지조성물이다. TIFFpct00027.tif4097

8. 发明公开

KR20180053277A 수소 첨가 공액 디엔계 중합체의 제조 방법, 수소 첨가 공액 디엔계 중합체, 중합체 조성물, 가교 중합체 및 타이어 审中-公开
公开(公告)号：KR20180053277A
公开(公告)日：2018-05-21
申请号：KR20177036480
申请日：2016-09-06
申请人： JSR CORP
发明人： ADACHI TAKUMI , SENGA HIROFUMI , TOYOKAWA FUMIHIRO , NOSAKA NAOYA , MATSUMOTO TAKAOMI , TANAKA RYOJI
IPC分类号： C08F8/04 , B60C1/00 , C08C19/02 , C08F36/04 , C08K3/36
CPC分类号： B60C1/00 , C08C19/02 , C08F8/04
摘要： 인장강도, 저히스테리시스로스특성, 웨트그립특성및, 내마모성을균형좋게겸비한고무재료를제공한다. 부타디엔에유래하는구조단위를갖는공액디엔계중합체의수소첨가물인수소첨가공액디엔계중합체를, 실리카와상호작용하는관능기를측쇄부분에갖는상기공액디엔계중합체를얻는공정과, 상기공액디엔계중합체의상기부타디엔에유래하는구조단위의수소첨가율이 80∼99%가되도록수소첨가하는공정을포함하는방법에의해제조한다.

9. 发明公开

KR20100118078A Radiation sensitive resin composition, spacer or protective film for liquid crystal display device and method for forming the same 审中-公开
标题翻译：用于液晶显示装置的辐射敏感性树脂组合物，间隔件或保护膜及其形成方法
公开(公告)号：KR20100118078A
公开(公告)日：2010-11-04
申请号：KR20100038449
申请日：2010-04-26
申请人： JSR CORP
发明人： NAKAGAWA TSUYOSHI , SANO YUKA , SAKAI TAKAHIRO
IPC分类号： G03F7/027 , G03F7/031
CPC分类号： G03F7/028 , G03F7/033 , Y10S430/114
摘要： PURPOSE: A radiation-sensitive resin composition is provided to prevent coating unevenness and to save the solution. CONSTITUTION: A radiation-sensitive resin composition contains alkali-developable resin, polymeric unsaturated compound, radiation-sensitive polymerization initiator and solvent of chemical formula 1. In chemical formula 1, The content of the solvent is 5-90 mass% based on total solvent amount. The composition contains one or more selected from diethylene glycol dialkylethers, propylene glycol, alkyl ether acetates, ketones and esters.
摘要翻译：目的：提供辐射敏感性树脂组合物，以防止涂层不均匀并保存溶液。构成：辐射敏感性树脂组合物含有碱显影树脂，聚合不饱和化合物，辐射敏感聚合引发剂和化学式1的溶剂。在化学式1中，溶剂含量为总溶剂的5-90质量％量。该组合物含有选自二甘醇二烷基醚，丙二醇，烷基醚乙酸酯，酮和酯中的一种或多种。

10. 发明公开

KR20070113106A OPTICAL FILM, POLARIZING PLATE AND LIQUID CRYSTAL PANEL 审中-公开
标题翻译：光学薄膜，偏光板和液晶面板
公开(公告)号：KR20070113106A
公开(公告)日：2007-11-28
申请号：KR20070037395
申请日：2007-04-17
申请人： JSR CORP
发明人： TAMURA RYOU , SEKIGUCHI MASAYUKI , USHINO TAKUHIRO
IPC分类号： G02F1/13363 , G02B5/30 , G02F1/1335
CPC分类号： G02F1/133634 , G02B5/3033 , G02B5/3083 , G02F1/133528 , G02F1/134363
摘要： An optical film, a polarizing plate and an LC(Liquid Crystal) panel are provided to prevent generation of light leakage and color shift and supply wide viewing angle. An optical film is made from thermoplastic norbornene resin. At light wave 590nm, the maximum reflective index in a film surface is nx. A reflective index of a direction orthogonal to the nx in the film surface is ny. A reflective index of a film thickness direction is nz. A film thickness is d(nm). A phase difference of the film thickness direction Rth(590)[nm]={(nx+ny)/2-nz}xd belongs to a range between 10nm and 30nm.
摘要翻译：提供光学膜，偏振板和LC（液晶）面板，以防止产生漏光和色移，并提供宽视角。光学膜由热塑性降冰片烯树脂制成。在光波590nm处，膜表面的最大反射指数为nx。与膜表面的nx正交的方向的反射率为ny。膜厚方向的反射率为nz。膜厚度为d（nm）。膜厚方向Rth（590）[nm] = {（nx + ny）/ 2-nz} xd的相位差属于10nm和30nm之间的范围。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式