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    • 4. 发明授权
    • Substrate damage prevention system and method
    • 基板损伤预防系统及方法
    • US08845810B2
    • 2014-09-30
    • US11874365
    • 2007-10-18
    • Young Joo Hwang
    • Young Joo Hwang
    • C23C16/00C23C16/50C23F1/00H01L21/306H01J37/32H01L21/683
    • H01J37/32788H01J37/3244H01L21/6831H01L21/68742
    • A substrate damage prevention system and method for a plasma treating apparatus are provided. The system may include a lower electrode on which a substrate may be mounted, an inert gas supply unit which may supply an inert gas to an upper surface of the lower electrode on which the substrate is mounted, and an air supply unit which may supply air to the upper surface of the lower electrode. An inert gas may be supplied between the lower electrode and the substrate in order to control the temperature of the substrate during the chucking. Air may be supplied between the lower electrode and the substrate during dechucking in order to allow the substrate to be easily separated from the lower electrode.
    • 提供了一种用于等离子体处理装置的基板损伤预防系统和方法。 该系统可以包括可以在其上安装基板的下电极,可以向安装有基板的下电极的上表面供应惰性气体的惰性气体供应单元和可供应空气的空气供应单元 到下电极的上表面。 可以在下电极和基板之间供应惰性气体,以便在卡盘期间控制基板的温度。 在脱扣时可以在下电极和基板之间供应空气,以便允许基板容易地与下电极分离。