会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 3. 发明公开
    • Electro-surgical cutting and cauterizing tool
    • 电外科切割和烧灼工具
    • EP0085658A2
    • 1983-08-10
    • EP83830064.8
    • 1983-03-23
    • Jacobsen, Stephen C.Hanover, Barry K.Tanner, Howard M.
    • Jacobsen, Stephen C.Hanover, Barry K.Tanner, Howard M.
    • A61B17/38
    • A61B18/1402A61B2018/00958
    • A disposable electro-surgical cutting and cauterizing tool is provided as a hand held tool for regulating the applications of electric power impulses or signals to an electro-surgical electrode. Cutting and coagulation signals can be selectively applied by the actuation of switches in a handle supporting the electrode. The handle of the tool is shaped to comfortably conform to the human hand and contains an index finger operated tactile switch for actuating the tool in either a cutting or coagulation mode of operation. The tool is made simple and inexpensive and is sterilized during packaging. It is disposable so that re-sterilization expenses are avoided. A reversible tip is provided to permit the user to select the best operating tool.
    • 提供一次性电手术切割和烧灼工具作为手持工具,用于调节电动脉冲或信号对电手术电极的应用。 切割和凝固信号可以通过致动支撑电极的手柄中的开关来选择性地施加。 该工具的手柄被成形为舒适地符合人的手并且包含食指操作的触觉开关,用于在切割或凝结模式的操作中致动该工具。 该工具制造简单,价格低廉,并在包装​​过程中进行灭菌。 它是一次性的,以避免重新消毒费用。 提供可逆的尖端以允许用户选择最佳的操作工具。
    • 4. 发明公开
    • Electro-surgical cutting and cauterizing tool
    • 电子切割和切割工具
    • EP0085658A3
    • 1985-04-24
    • EP83830064
    • 1983-03-23
    • Jacobsen, Stephen C.Hanover, Barry K.Tanner, Howard M.
    • Jacobsen, Stephen C.
    • A61B17/38
    • A61B18/1402A61B2018/00958
    • A disposable electro-surgical cutting and cauterizing tool is provided as a hand held tool for regulating the applications of electric power impulses or signals to an electro-surgical electrode. Cutting and coagulation signals can be selectively applied by the actuation of switches in a handle supporting the electrode. The handle of the tool is shaped to comfortably conform to the human hand and contains an index finger operated tactile switch for actuating the tool in either a cutting or coagulation mode of operation. The tool is made simple and inexpensive and is sterilized during packaging. It is disposable so that re-sterilization expenses are avoided. A reversible tip is provided to permit the user to select the best operating tool.
    • 提供一次性电切割和烧灼工具作为用于调节电力脉冲或信号到电手术电极的应用的手持工具。 可以通过在支撑电极的手柄中的开关的致动来选择性地施加切割和凝结信号。 工具的手柄成形为舒适地符合人的手,并且包含食指操作的触觉开关,用于在切割或凝固操作模式下致动工具。 该工具简单而便宜,并在包装​​过程中消毒。 它是一次性的,以避免再灭菌费用。 提供了一个可逆的提示,以允许用户选择最佳的操作工具。
    • 5. 发明公开
    • Method and apparatus for fabrication of thin film semiconductor devices using non-planar, exposure beam lithography
    • 用于制造使用非平面射线曝光光刻的薄膜半导体器件的方法和装置。
    • EP0613170A1
    • 1994-08-31
    • EP93102409.5
    • 1993-02-16
    • Jacobsen, Stephen C.
    • Jacobsen, Stephen C.
    • H01J37/317
    • B82Y10/00B82Y40/00G03F7/24H01J37/3174H01J2237/20242H01J2237/20285H01J2237/3151H01L21/3085H05K1/0284H05K3/0082
    • An apparatus and method for the nonplanar treatment of a volumetric workpiece or substrate utilizing exposure beam lithography are disclosed. The method includes supplying one or more layers of one or more semiconductor materials to surfaces of the substrate, applying a resist over the semiconductor layers, setting the resist, and then directing an exposure beam, such as an electron beam, toward the substrate. The substrate is then moved in at least two degrees freedom of movement, relative to the beam, with one degree of freedom of movement being the rotating of the substrate about an axis generally perpendicular to the beam. The other degree of freedom of movement could be moving the substrate linearly in a direction generally parallel to the axis. By such movement, the resist is exposed to the beam in a predetermined pattern. The exposed resist is then developed and a layer or layers under the exposed resist are etched. The remaining resist is then removed yielding the desired semiconductor device.
    • 对于非平面体积工件或利用曝光束光刻衬底的处理的装置和方法是游离缺失盘。 该方法包括供应的一个或多个半导体材料的一个或多个层的基板的表面,涂敷抗蚀剂的半导体层上方,设置抗蚀剂,然后在曝光光束引导,作为谋求电子束,朝向基板。 衬底然后在移动中的至少两个自由度,相对于射束垂直于光束移动,以绕轴线基因反弹运动是所述基片的旋转的一个自由度。 另一运动自由度的可在平行于轴线基因反弹的方向线性地移动所述基片。 通过寻求运动,将抗蚀剂暴露于光束以预定的图案。 曝光的抗蚀剂进行显影,并在暴露的一层或多层的抗蚀剂进行蚀刻。 剩余的抗蚀剂然后除去,得到所需的半导体器件。