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    • 5. 发明授权
    • Network power management apparatus and method
    • 网络电源管理装置及方法
    • US08782453B2
    • 2014-07-15
    • US13327615
    • 2011-12-15
    • Ki-Won KimHo-Young Song
    • Ki-Won KimHo-Young Song
    • G06F11/30G06F1/32
    • G06F11/3062G06F1/28G06F11/3006H04L43/0817H04L45/00Y04S40/168
    • A network power management apparatus and method. The network power management apparatus includes a protocol management unit configured to be connected to a local communication apparatus and establish and manage a path between the local communication apparatus and neighboring communication apparatuses in the same network. The protocol management unit includes a delivery unit to deliver link information and power information of the local communication apparatus to the neighboring communication apparatuses, a first database to store the link information and the power information of the local communication apparatus and link information and power information of each of the neighboring communication apparatuses, a path management unit to calculate and establish a path using the information stored in the first database, and a packet generating unit to generate a power message using the power information of the local communication apparatus and deliver the generated power message to the neighboring communication apparatuses.
    • 一种网络电源管理装置及方法。 网络电源管理装置包括被配置为连接到本地通信装置并且建立和管理本地通信装置与同一网络中的相邻通信装置之间的路径的协议管理单元。 协议管理单元包括:向本地通信装置发送本地通信装置的链路信息和功率信息的分发单元,存储本地通信装置的链路信息和功率信息的第一数据库以及本地通信装置的链路信息和功率信息 每个相邻通信装置,使用存储在第一数据库中的信息来计算和建立路径的路径管理单元,以及分组生成单元,用于使用本地通信装置的功率信息生成电力消息,并且传递生成的功率 消息给相邻的通信设备。
    • 6. 发明授权
    • Fabrication method of lithography mask and formation method of fine pattern using the same
    • 光刻掩模的制作方法和使用其的精细图案的形成方法
    • US08445166B2
    • 2013-05-21
    • US12333566
    • 2008-12-12
    • Ho Young SongDong You KimWon Ho JungYoung Jin ChoYoung Chun Kim
    • Ho Young SongDong You KimWon Ho JungYoung Jin ChoYoung Chun Kim
    • G03F1/00G03F1/08G03F7/00
    • G03F1/68G03F1/50G03F1/60
    • There is provided a method of fabricating a lithography mask, the method including: forming a transparent polymer layer on a surface of a first substrate where a convex-concave pattern is formed; separating the transparent polymer layer from the first substrate, the transparent polymer layer having a convex-concave surface formed by the convex-concave pattern of the first substrate transferred thereonto; depositing a metal thin film on the convex-concave surface; forming a viscous film on a second substrate; disposing the transparent polymer layer on the second substrate such that the viscous film and metal thin film are partially bonded together; and separating the transparent polymer layer from the second substrate such that a portion of the metal thin film bonded to the viscous film is removed, wherein a metal thin film pattern having the portion of the metal thin film removed therefrom is formed on the convex-concave surface.
    • 提供一种制造光刻掩模的方法,该方法包括:在形成凸凹图案的第一基板的表面上形成透明聚合物层; 从所述第一基板分离所述透明聚合物层,所述透明聚合物层具有由其上转印有所述第一基板的凸凹图案形成的凸凹表面; 在所述凹凸表面上沉积金属薄膜; 在第二基板上形成粘性膜; 将所述透明聚合物层设置在所述第二基板上,使得所述粘性膜和金属薄膜部分地粘合在一起; 并且将透明聚合物层与第二基板分离,使得与粘性膜结合的金属薄膜的一部分被去除,其中从其上去除了金属薄膜部分的金属薄膜图案形成在凸凹 表面。