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1. 发明申请

US20130064918A1 Apparatus comprising substrate and conductive layer 有权
公开(公告)号：US20130064918A1
公开(公告)日：2013-03-14
申请号：US13621204
申请日：2012-09-15
申请人： Hae-sung Kim , Hyoung-soo Ko , Seung-bum Hong , Jin-seung Sohn , Sung-hoon Choa , Chee-kheng Lim
发明人： Hae-sung Kim , Hyoung-soo Ko , Seung-bum Hong , Jin-seung Sohn , Sung-hoon Choa , Chee-kheng Lim
IPC分类号： B29C59/00
CPC分类号： G03F1/14 , B29C59/002 , B82Y10/00 , B82Y40/00 , G03F7/0002 , Y10T428/24917
摘要： A nano imprint master and a method of manufacturing the same are provided. The method includes: implanting conductive metal ions into a substrate including quartz to form a conductive layer inside the quartz substrate; coating a resist on the quartz substrate in which the conductive layer is formed, to form a resist coating layer; exposing the resist coating layer to an electron beam to form micropatterns; etching the quartz substrate by using the resist coating layer, in which the micropatterns are formed, as a mask; and removing the resist coating layer to obtain a master in which micropatterns are formed.

2. 发明授权

US07998661B2 Method of nano-patterning using surface plasmon effect and method of manufacturing nano-imprint master and discrete track magnetic recording media using the nano-patterning method 有权
标题翻译：使用表面等离子体效应的纳米图案化方法和使用纳米图案法制造纳米压印母版和离散轨道磁记录介质的方法
公开(公告)号：US07998661B2
公开(公告)日：2011-08-16
申请号：US12048421
申请日：2008-03-14
申请人： Hae-sung Kim , Myung-bok Lee , Jin-seung Sohn
发明人： Hae-sung Kim , Myung-bok Lee , Jin-seung Sohn
IPC分类号： G03F7/20
CPC分类号： G03F7/2014 , G03F1/50 , G03F7/70375
摘要： A method of nano-patterning, a method of manufacturing a nano-imprinting master and a discrete track magnetic recording medium are all provided. The method of nano-patterning includes (a) sequentially forming on a substrate an etching object material layer, a photoresist layer, and a metal layer patterned to a first pattern having a structure in which line patterns are repeatedly arranged with a predetermined interval; (b) irradiating light onto a surface of the metal layer to excite surface plasmon so that the photoresist layer is exposed to a second pattern by the surface plasmon; (c) removing the metal layer and developing the photoresist layer; and (d) etching the etching object material layer using the photoresist layer patterned to the second pattern as a mask.
摘要翻译：提供纳米图案化方法，制造纳米压印母版和离散轨道磁记录介质的方法。纳米图案化方法包括：（a）在衬底上依次形成蚀刻对象材料层，光致抗蚀剂层和图案化为具有以预定间隔反复排列线图案的结构的第一图案的金属层; （b）将光照射到金属层的表面上以激发表面等离子体激元，使得光致抗蚀剂层通过表面等离子体激元暴露于第二图案; （c）去除金属层并显影光致抗蚀剂层; 和（d）使用图案化为第二图案的光致抗蚀剂层作为掩模蚀刻蚀刻对象物层。

3. 发明授权

US07742368B2 Near field light generating device and heat assisted magnetic recording head with the same 有权
标题翻译：近场光产生装置与热辅助磁记录头相同
公开(公告)号：US07742368B2
公开(公告)日：2010-06-22
申请号：US11492860
申请日：2006-07-26
申请人： Myung-bok Lee , Jin-seung Sohn , Sung-dong Suh , Hae-sung Kim
发明人： Myung-bok Lee , Jin-seung Sohn , Sung-dong Suh , Hae-sung Kim
IPC分类号： G11B11/00
CPC分类号： G11B5/1278 , G11B5/314 , G11B7/1387 , G11B2005/0021
摘要： A near field light generating device generating near field light from incident light by using a solid immersion mirror and a heat assisted magnetic recording head with the same are provided. The near field light generating device includes a light source; a waveguide core which transmits light; and a solid immersion mirror, which generates near field light, including an upper transmission surface through which light from the waveguide core is transmitted into the solid immersion mirror, a lower reflection surface, opposite the upper transmission surface, which reflections light incident thereon, lateral reflection surfaces, facing each other at sides of the solid immersion mirror, which reflect light incident thereon, and a lower transmission region disposed at a center of the lower reflection surface. Light reflected from the lateral reflection surfaces forms a light spot on the lower transmission region.
摘要翻译：提供了通过使用固体浸没镜从入射光产生近场光的近场光产生装置和具有该近场光产生装置的热辅助磁记录头。近场光产生装置包括光源; 透光的波导芯; 以及固体浸没镜，其产生近场光，包括上传播面，通过该透射面将来自波导芯的光透过该固体浸没镜;上反射面，反射入射在其上的光的上反射面;侧面反射面，其反射入射在其上的光的固体浸没镜的侧面，以及设置在下反射面的中心的下部透射区域。从侧面反射面反射的光在下部透射区域上形成光斑。

4. 发明授权

US07609591B2 Heat-assisted magnetic recording head 有权
标题翻译：热辅助磁记录头
公开(公告)号：US07609591B2
公开(公告)日：2009-10-27
申请号：US11508996
申请日：2006-08-24
申请人： Sung-dong Suh , Young-hun Im , Hae-sung Kim
发明人： Sung-dong Suh , Young-hun Im , Hae-sung Kim
IPC分类号： G11B11/00 , G11B5/127
CPC分类号： G11B5/127 , G11B5/02 , G11B5/314 , G11B2005/001 , G11B2005/0021
摘要： A heat-assisted magnetic recording head mounted on an end of a slider having an Air Bearing Surface (“ABS”) for recording data on a recording medium. The heat-assisted magnetic recording head includes a magnetic path forming unit that generates a magnetic field for recording the data, a light source that emits light heating a local region of the recording medium, a waveguide located on a side of the magnet path forming unit to transmit the light emitted from the light source, an optical path conversion unit that changes a direction of the light transmitted from the waveguide to the local region of the recording medium, and a nano-aperture that generates an enhanced near-field effect by converting an energy distribution of the light transmitted via the optical path conversion unit.
摘要翻译：安装在具有用于在记录介质上记录数据的空气轴承表面（“ABS”）的滑块的端部上的热辅助磁记录头。热辅助磁记录头包括产生用于记录数据的磁场的磁路形成单元，对记录介质的局部区域发光的光源，位于磁路形成单元侧的波导传输从光源发射的光，将从波导传输的光的方向改变到记录介质的局部区域的光路转换单元，以及通过转换产生增强的近场效应的纳米孔径经由光路转换单元传输的光的能量分布。

5. 发明申请

US20070292773A1 NANO IMPRINT MASTER AND METHOD OF MANUFACTURING THE SAME 有权
标题翻译： NANO IMPRINT MASTER及其制造方法
公开(公告)号：US20070292773A1
公开(公告)日：2007-12-20
申请号：US11745609
申请日：2007-05-08
申请人： Hae-sung KIM , Hyoung-soo KO , Seung-bum HONG , Jin-seung SOHN , Sung-hoon CHOA , Chee-kheng LIM
发明人： Hae-sung KIM , Hyoung-soo KO , Seung-bum HONG , Jin-seung SOHN , Sung-hoon CHOA , Chee-kheng LIM
IPC分类号： G03F1/00
CPC分类号： G03F1/14 , B29C59/002 , B82Y10/00 , B82Y40/00 , G03F7/0002 , Y10T428/24917
摘要： A nano imprint master and a method of manufacturing the same are provided. The method includes: implanting conductive metal ions into a substrate including quartz to form a conductive layer inside the quartz substrate; coating a resist on the quartz substrate in which the conductive layer is formed, to form a resist coating layer; exposing the resist coating layer to an electron beam to form micropatterns; etching the quartz substrate by using the resist coating layer, in which the micropatterns are formed, as a mask; and removing the resist coating layer to obtain a master in which micropatterns are formed.
摘要翻译：提供了纳米压印母版及其制造方法。该方法包括：将导电金属离子注入包括石英的衬底中，以在石英衬底内形成导电层; 在其上形成导电层的石英基板上涂覆抗蚀剂，以形成抗蚀剂涂层; 将抗蚀剂涂层暴露于电子束以形成微图案; 通过使用其中形成有微图案的抗蚀剂涂层作为掩模来蚀刻石英基板; 并除去抗蚀剂涂层以获得形成微图案的母版。

6. 发明申请

US20050263683A1 Integrated optical system and method of manufacturing the same and information recording and/or reproducing apparatus using the integrated optical system 失效
标题翻译：集成光学系统及其制造方法以及使用集成光学系统的信息记录和/或再现装置
公开(公告)号：US20050263683A1
公开(公告)日：2005-12-01
申请号：US11141052
申请日：2005-06-01
申请人： Jin-seung Sohn , Sung-dong Suh , Mee-suk Jung , Eun-hyoung Cho , Hae-sung Kim
发明人： Jin-seung Sohn , Sung-dong Suh , Mee-suk Jung , Eun-hyoung Cho , Hae-sung Kim
IPC分类号： G02B5/18 , G02B5/30 , G02B7/04 , G11B7/12 , G11B7/125 , G11B7/13 , G11B7/135 , G11B7/22 , H01J3/14
CPC分类号： G11B7/22 , G11B7/123 , G11B7/1263 , G11B7/131 , G11B7/1353 , G11B7/1362 , Y10T156/1052
摘要： An optical system and an information apparatus using the optical system are provided. The optical system includes an optical bench on which a light source and a photodetector including a main photodetector receiving the light are mounted. A lens unit is coupled to the optical bench, and an optical path separating member separates an optical path of light emitted from the light source and propagating toward the lens unit and an optical path of light incident from the lens unit. The optical system may include a monitor photodetector and/or an optical path forming unit coupled to the optical bench. The monitor photodetector receives a portion of the light emitted from the light source. The optical path forming unit includes a first mirror reflecting the light emitted from the light source and a second mirror reflecting the light incident from the lens unit and reflected by the first mirror.
摘要翻译：提供了使用该光学系统的光学系统和信息装置。该光学系统包括安装有光源的光学台和安装有接收光的主光电检测器的光电检测器。透镜单元耦合到光学台，并且光路分离构件将从光源发射的光的光路分离成朝向透镜单元传播并从透镜单元入射的光的光路。光学系统可以包括耦合到光学平台的监视器光电检测器和/或光路形成单元。监视器光电检测器接收从光源发射的光的一部分。光路形成单元包括反射从光源发射的光的第一镜和反射从透镜单元入射的光并由第一反射镜反射的第二镜。

7. 发明申请

US20050162733A1 Method of fabricating diffractive lens array and UV dispenser used therein 审中-公开
$Method of fabricating diffractive lens array and UV dispenser used therein$
标题翻译：制造其中使用的衍射透镜阵列和UV分配器的方法
公开(公告)号：US20050162733A1
公开(公告)日：2005-07-28
申请号：US11003353
申请日：2004-12-06
申请人： Eun-hyoung Cho , Myung-bok Lee , Jin-seung Sohn , Mee-suk Jung , Hae-sung Kim
发明人： Eun-hyoung Cho , Myung-bok Lee , Jin-seung Sohn , Mee-suk Jung , Hae-sung Kim
IPC分类号： G02B5/18 , B29D11/00 , G02B3/00 , G02B3/08 , G02B5/20
CPC分类号： G02B5/1876 , G02B3/0031 , G02B3/08 , G02B5/1885
摘要： A method of fabricating a diffractive lens array mold and an ultraviolet (UV) dispenser for use in the same. The method includes the steps of (a) fabricating a single or array diffractive lens mold using a nickel (Ni) shim; (b) fabricating a first diffractive lens array mold using an ultraviolet (UV) dispenser including the single diffractive lens mold; and (c) fabricating a second diffractive lens array mold having an inverted profile of the first diffractive lens array mold.
摘要翻译：一种制造衍射透镜阵列模具和用于其的紫外线（UV）分配器的方法。该方法包括以下步骤：（a）使用镍（Ni）垫片制造单个或阵列衍射透镜模具; （b）使用包括单个衍射透镜模具的紫外线（UV）分配器制造第一衍射透镜阵列模具; 和（c）制造具有第一衍射透镜阵列模具的倒置轮廓的第二衍射透镜阵列模具。

8. 发明授权

US08363185B2 Photonic crystal optical filter, transmissive color filter, transflective color filter, and display apparatus using the color filters 有权
标题翻译：光子晶体滤光器，透射滤色镜，透反射彩色滤光片，以及使用滤色片的显示装置
公开(公告)号：US08363185B2
公开(公告)日：2013-01-29
申请号：US12461530
申请日：2009-08-14
申请人： Eun-hyoung Cho , Jin-seung Sohn , Seock-hwan Kang , Hae-sung Kim
发明人： Eun-hyoung Cho , Jin-seung Sohn , Seock-hwan Kang , Hae-sung Kim
IPC分类号： G02F1/1335
CPC分类号： G02B5/201 , B82Y20/00 , G02B1/005 , G02B5/26 , G02F1/133514 , G02F1/133555 , G02F2001/133521 , G02F2202/32
摘要： Example embodiments relate to a photonic crystal optical filter, a transmissive color filter, a transflective color filter, and a display apparatus using the photonic crystal optical filter. The transmissive color filter may include a transparent substrate; a barrier layer formed on the transparent substrate and having a plurality of pixel areas; and a plurality of photonic crystal units formed on the plurality of pixel areas. Each of the plurality of photonic crystal units may have a structure such that a first material having a relatively high refractive index and a second material having a relatively low refractive index are periodically arranged so as to transmit light having a wavelength band corresponding to a photonic band gap. An optical cut-off layer may be formed on the first material.
摘要翻译：示例性实施例涉及光子晶体滤光器，透射滤色器，透反射滤色器以及使用光子晶体滤光器的显示装置。透射滤色器可以包括透明基板; 形成在所述透明基板上并具有多个像素区域的阻挡层; 以及形成在所述多个像素区域上的多个光子晶体单元。多个光子晶体单元中的每一个可以具有这样的结构，使得具有相对较高折射率的第一材料和具有相对低折射率的第二材料周期性地布置，以便透射具有对应于光子带的波长带的光间隙。可以在第一材料上形成光学截止层。

9. 发明授权

US08264637B2 Photonic crystal optical filter, reflective color filter, display apparatus using the reflective color filter, and method of manufacturing the reflective color filter 有权
标题翻译：光子晶体滤光器，反射滤色器，使用反射滤色器的显示装置，以及反射滤色片的制造方法
公开(公告)号：US08264637B2
公开(公告)日：2012-09-11
申请号：US12461455
申请日：2009-08-12
申请人： Eun-hyoung Cho , Jin-seung Sohn , Seock-hwan Kang , Hae-sung Kim , Xianyu Wenxu
发明人： Eun-hyoung Cho , Jin-seung Sohn , Seock-hwan Kang , Hae-sung Kim , Xianyu Wenxu
IPC分类号： G02F1/1335 , G02F1/141 , G02B6/00
CPC分类号： G02B5/201 , G02B5/26 , G02F1/133514
摘要： Example embodiments relate to a photonic crystal optical filter, a reflective color filter using the photonic crystal optical filter, a display apparatus using the reflective color filter, and a method of manufacturing the reflective color filter. The photonic crystal optical filter may include a transparent substrate; a barrier layer formed on the transparent substrate; and a photonic crystal layer formed on the barrier layer. The photonic crystal layer may have a structure in which a first material having a relatively high refractive index and a second material having a relatively low refractive index are periodically arranged so as to reflect light having a wavelength band corresponding to a photonic band gap.
摘要翻译：示例实施例涉及光子晶体滤光器，使用光子晶体滤光器的反射滤色器，使用反射滤色器的显示装置以及制造反射滤色器的方法。光子晶体滤光器可以包括透明衬底; 形成在所述透明基板上的阻挡层; 以及形成在阻挡层上的光子晶体层。光子晶体层可以具有其中周期性地布置具有较高折射率的第一材料和具有较低折射率的第二材料以便反射具有与光子带隙对应的波长带的光的结构。

10. 发明申请

US20110223279A1 NANO IMPRINT MASTER AND METHOD OF MANUFACTURING THE SAME 有权
标题翻译： NANO IMPRINT MASTER及其制造方法
公开(公告)号：US20110223279A1
公开(公告)日：2011-09-15
申请号：US13113534
申请日：2011-05-23
申请人： Hae-sung Kim , Hyoung-soo Ko , Seung-bum Hong , Jin-seung Sohn , Sung-hoon Choa , Chee-kheng Lim
发明人： Hae-sung Kim , Hyoung-soo Ko , Seung-bum Hong , Jin-seung Sohn , Sung-hoon Choa , Chee-kheng Lim
IPC分类号： B29C59/02
CPC分类号： G03F1/14 , B29C59/002 , B82Y10/00 , B82Y40/00 , G03F7/0002 , Y10T428/24917
摘要： A nano imprint master and a method of manufacturing the same are provided. The method includes: implanting conductive metal ions into a substrate including quartz to form a conductive layer inside the quartz substrate; coating a resist on the quartz substrate in which the conductive layer is formed, to form a resist coating layer; exposing the resist coating layer to an electron beam to form micropatterns; etching the quartz substrate by using the resist coating layer, in which the micropatterns are formed, as a mask; and removing the resist coating layer to obtain a master in which micropatterns are formed.
摘要翻译：提供了纳米压印母版及其制造方法。该方法包括：将导电金属离子注入包括石英的衬底中，以在石英衬底内形成导电层; 在其上形成导电层的石英基板上涂覆抗蚀剂，以形成抗蚀剂涂层; 将抗蚀剂涂层暴露于电子束以形成微图案; 通过使用其中形成有微图案的抗蚀剂涂层作为掩模来蚀刻石英基板; 并除去抗蚀剂涂层以获得形成微图案的母版。

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