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1. 发明授权

US06995091B2 Process for chemically mechanically polishing wafers 失效
公开(公告)号：US06995091B2
公开(公告)日：2006-02-07
申请号：US10304131
申请日：2002-11-25
申请人： Germar Schneider
发明人： Germar Schneider
IPC分类号： H01L21/302
CPC分类号： B24B37/005 , B24B49/12 , G01N1/2035 , G01N21/3103 , G01N21/69
摘要： The invention relates to a process for chemically mechanically polishing and grinding wafers. The CMP slurry that is used for grinding is analyzed using slurry atomic absorption spectroscopy. This allows rapid and sensitive analysis of the slurry constituents, in particular of interfering ions. The process can be automated and makes it possible to process wafers with a constant quality. Furthermore, rapid fault analysis or optimization of the process parameters used during the grinding is possible.

2. 发明授权

US07802830B2 Method and device for handling an article in the course of semiconductor fabrication 有权
标题翻译：在半导体制造过程中处理物品的方法和装置
公开(公告)号：US07802830B2
公开(公告)日：2010-09-28
申请号：US11838553
申请日：2007-08-14
申请人： Gerd Brueckner , Arthur Deutschlaender , Harald Heinrich , Germar Schneider , Steffen Schroeder
发明人： Gerd Brueckner , Arthur Deutschlaender , Harald Heinrich , Germar Schneider , Steffen Schroeder
IPC分类号： B25J15/06
CPC分类号： H01L21/68707 , H01L21/67742 , H01L21/68757 , Y10S294/902 , Y10S414/141
摘要： A method and apparatus for handling an article in semiconductor fabrication in which the article is completely separated from a gripper by a frozen liquid. The gripper includes a feeding device for introducing a liquid such as a high-purity water or a decontaminating liquid. The gripper also includes a cooling device for freezing the liquid. A suction take-in device applies negative pressure to hold the article against the frozen liquid.
摘要翻译：一种用于处理半导体制造中的制品的方法和装置，其中制品通过冷冻液体与夹具完全分离。夹持器包括用于引入诸如高纯度水或去污液体的液体的进料装置。夹具还包括用于冷冻液体的冷却装置。抽吸装置施加负压以将制品保持在冷冻液体上。

3. 发明申请

US20080038904A1 Method and Device for Handling an Article in the Course of Semiconductor Fabrication 有权
标题翻译：在半导体制造过程中处理物品的方法和装置
公开(公告)号：US20080038904A1
公开(公告)日：2008-02-14
申请号：US11838553
申请日：2007-08-14
申请人： Gerd Brueckner , Arthur Deutschlaender , Harald Heinrich , Germar Schneider , Steffen Schroeder
发明人： Gerd Brueckner , Arthur Deutschlaender , Harald Heinrich , Germar Schneider , Steffen Schroeder
IPC分类号： H01L21/322
CPC分类号： H01L21/68707 , H01L21/67742 , H01L21/68757 , Y10S294/902 , Y10S414/141
摘要： The invention relates inter alia to a method and apparatus for handling an article in semiconductor fabrication. For example, the method includes handling the article by completely separating the article from a gripper by a frozen liquid.
摘要翻译：本发明特别涉及用于在半导体制造中处理制品的方法和装置。例如，该方法包括通过将冻结液体与夹具完全分开来处理物品。

4. 发明授权

US06443171B1 Exhaust apparatus 有权
标题翻译：排气装置
公开(公告)号：US06443171B1
公开(公告)日：2002-09-03
申请号：US09504274
申请日：2000-02-15
申请人： Germar Schneider , Pierre-Louis Saez
发明人： Germar Schneider , Pierre-Louis Saez
IPC分类号： B08B300
CPC分类号： H01L21/67051 , B08B15/005 , Y10S134/902
摘要： An exhaust apparatus for a treatment unit of electrical components, preferably wafers, particularly for a spray tool to clean electrical components, is described. To ensure that particles of a size greater than or equal to 0.16 &mgr;m in diameter can be reliably removed from the treatment unit, which particles would otherwise cause contamination of the electrical components, the exhaust apparatus is provided with a main exhaust pipe and a side pipe. The main exhaust pipe has an outside pipe and an inside pipe, whereby the inside pipe is equipped with a number of nozzles. The side pipe connects the treatment unit with the main exhaust pipe and which has an outside pipe and an inside pipe, whereby the inside pipe is equipped with a number of nozzles. The inside pipes are connected with a source of a cleaning fluid such that the cleaning fluid at least intermittently flows through the inside pipes for the purpose of rinsing. The side pipe and the main exhaust pipe are connected with each other at a certain angle. Furthermore, the side pipe is made of several partial areas that are aligned at a certain angle with respect to each other. Furthermore, an additional exhaust pipe, which connects the main exhaust pipe with a clean room, is provided.
摘要翻译：描述了用于电气部件的处理单元的排气装置，优选晶片，特别是用于清洁电气部件的喷雾工具。为了确保直径大于或等于0.16μm的尺寸的颗粒可以从处理单元被可靠地移除，否则这些颗粒将导致电气部件的污染，排气装置设置有主排气管和侧管。主排气管具有外管和内管，内管配有多个喷嘴。侧管将处理单元与主排气管连接，并且具有外管和内管，由此内管配备有多个喷嘴。内部管道与清洁流体源连接，使得清洁流体至少间歇地流过内部管道用于冲洗的目的。侧管和主排气管以一定角度彼此连接。此外，侧管由相对于彼此以一定角度排列的几个部分区域制成。此外，还提供了连接主排气管和洁净室的附加排气管。

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