专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US09158206B2 Lithographic apparatus and contamination removal or prevention method 有权
标题翻译：平版印刷设备和污染物去除或预防方法
公开(公告)号：US09158206B2
公开(公告)日：2015-10-13
申请号：US13032222
申请日：2011-02-22
申请人： Anthonius Martinus Cornelis Petrus De Jong , Hans Jansen , Martinus Hendrikus Antonius Leenders , Antonius Johannus Van Der Net , Peter Franciscus Wanten , Jacques Cor Johan Van Der Donck , Robert Douglas Watso , Teunis Cornelis Van Den Dool , Nadja Schuh , Jan Willem Cromwijk
发明人： Anthonius Martinus Cornelis Petrus De Jong , Hans Jansen , Martinus Hendrikus Antonius Leenders , Antonius Johannus Van Der Net , Peter Franciscus Wanten , Jacques Cor Johan Van Der Donck , Robert Douglas Watso , Teunis Cornelis Van Den Dool , Nadja Schuh , Jan Willem Cromwijk
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/70925
摘要： An immersion lithographic apparatus is cleaned by use of a cleaning liquid consisting essentially of ultra-pure water and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide at a concentration of up to 5%, or (c) ozone at a concentration of up to 50 ppm, or (d) oxygen at concentration of up to 10 ppm, or (e) any combination selected from (a)-(d).
摘要翻译：或（c）过氧化氢和臭氧的混合物，或（b）浓度高达5％的过氧化氢，或（c）浓度高达50ppm的臭氧，或（d）浓度高达10ppm的氧，或（e）选自（a） - （d）的任何组合。

2. 发明申请

US20110292359A1 CLEANING DEVICE AND A LITHOGRAPHIC APPARATUS CLEANING METHOD 审中-公开
标题翻译：清洁装置和光刻装置清洁方法
公开(公告)号：US20110292359A1
公开(公告)日：2011-12-01
申请号：US13198479
申请日：2011-08-04
申请人： Anthonius Martinus Cornelis Petrus De Jong , Hans Jansen , Marco Koert Stavenga , Peter Franciscus Wanten , Bauke Jansen , Johannes Wilhelmus Jacobus Leonardus Cuijpers , Raymond Gerardus Marius Beeren , Kornelis Tijmen Hoekerd
发明人： Anthonius Martinus Cornelis Petrus De Jong , Hans Jansen , Marco Koert Stavenga , Peter Franciscus Wanten , Bauke Jansen , Johannes Wilhelmus Jacobus Leonardus Cuijpers , Raymond Gerardus Marius Beeren , Kornelis Tijmen Hoekerd
IPC分类号： G03B27/52 , B08B3/12 , B08B3/04
CPC分类号： B08B3/12 , B08B3/08 , B08B2203/0288 , G03F7/70341 , G03F7/70925
摘要： A cleaning tool to clean a surface of a component of a lithographic apparatus is disclosed. The cleaning tool includes a sonic transducer, a liquid supply device configured to provide liquid to a reservoir between the surface to be cleaned and the sonic transducer, and a liquid outlet configured to remove liquid provided by the liquid supply device, the cleaning tool constructed and arranged such that, in use, liquid flows into the outlet under the influence of gravity.
摘要翻译：公开了一种用于清洁光刻设备的部件的表面的清洁工具。清洁工具包括声音换能器，液体供应装置，其构造成向要清洁的表面和声音换能器之间的储存器提供液体，以及液体出口，该液体出口构造成去除由液体供应装置提供的液体，所构建的清洁工具和被布置为使得在使用中，液体在重力的影响下流入出口。

3. 发明申请

US20090025753A1 Lithographic Apparatus And Contamination Removal Or Prevention Method 审中-公开
标题翻译：平版印刷设备和污染物去除或预防方法
公开(公告)号：US20090025753A1
公开(公告)日：2009-01-29
申请号：US11862873
申请日：2007-09-27
申请人： Anthonius Martinus Cornelis Petrus DE JONG , Hans Jansen , Martinus Hendrikus Antonius Leenders , Antonius Johannus Van Der Net , Peter Franciscus Wanten , Jacques Cor Johan Van Der Donck , Robert Douglas Watso , Teunis Cornelis Van Den Dool , Nadja Schuh , Jan Willem Cromwijk
发明人： Anthonius Martinus Cornelis Petrus DE JONG , Hans Jansen , Martinus Hendrikus Antonius Leenders , Antonius Johannus Van Der Net , Peter Franciscus Wanten , Jacques Cor Johan Van Der Donck , Robert Douglas Watso , Teunis Cornelis Van Den Dool , Nadja Schuh , Jan Willem Cromwijk
IPC分类号： B08B3/04 , B08B3/08
CPC分类号： G03F7/70925 , G03F7/2041 , G03F7/70341
摘要： A lithographic apparatus is disclosed having an in situ ozonizer, which is used to produce ozone gas, for example, by UV irradiation of an oxygen-containing gas. The thus produced ozone is dissolved in ultra-pure water by contacting the ozone with the ultra-pure water through a permeable membrane.
摘要翻译：公开了一种具有原位臭氧发生器的光刻设备，其用于产生臭氧气体，例如通过含氧气体的紫外线照射。由此产生的臭氧通过渗透膜将臭氧与超纯水接触而溶解在超纯水中。

4. 发明授权

US09013672B2 Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method 有权
标题翻译：清洁装置，光刻设备和光刻设备清洁方法
公开(公告)号：US09013672B2
公开(公告)日：2015-04-21
申请号：US11819949
申请日：2007-06-29
申请人： Anthonius Martinus Cornelis Petrus De Jong , Hans Jansen , Marco Koert Stavenga , Peter Franciscus Wanten , Bauke Jansen , Johannes Wilhelmus Jacobus Leonardus Cuijpers , Raymond Gerardus Marius Beeren , Kornelis Tijmen Hoekerd
发明人： Anthonius Martinus Cornelis Petrus De Jong , Hans Jansen , Marco Koert Stavenga , Peter Franciscus Wanten , Bauke Jansen , Johannes Wilhelmus Jacobus Leonardus Cuijpers , Raymond Gerardus Marius Beeren , Kornelis Tijmen Hoekerd
IPC分类号： G03F7/20 , B08B3/12
CPC分类号： G03F7/70925 , B08B3/12 , G03F7/70341
摘要： An immersion lithographic projection apparatus having a megasonic transducer configured to clean a surface and a method of using megasonic waves through a liquid to clean a surface of an immersion lithographic projection apparatus are disclosed. A flow, desirably a radial flow, is induced in the liquid.
摘要翻译：公开了一种具有构造成清洁表面的兆声传感器的浸没式光刻投影设备和使用超声波通过液体清洁浸没式光刻投影设备的表面的方法。在液体中诱导流动，期望地是径向流动。

5. 发明授权

US07916269B2 Lithographic apparatus and contamination removal or prevention method 有权
标题翻译：平版印刷设备和污染物去除或预防方法
公开(公告)号：US07916269B2
公开(公告)日：2011-03-29
申请号：US11862817
申请日：2007-09-27
申请人： Anthonius Martinus Cornelis Petrus De Jong , Hans Jansen , Martinus Hendrikus Antonius Leenders , Antonius Johannus Van Der Net , Peter Franciscus Wanten , Jacques Cor Johan Van Der Donck , Robert Douglas Watso , Teunis Cornelis Van Den Dool , Nadja Schuh , Jan Willem Cromwijk
发明人： Anthonius Martinus Cornelis Petrus De Jong , Hans Jansen , Martinus Hendrikus Antonius Leenders , Antonius Johannus Van Der Net , Peter Franciscus Wanten , Jacques Cor Johan Van Der Donck , Robert Douglas Watso , Teunis Cornelis Van Den Dool , Nadja Schuh , Jan Willem Cromwijk
IPC分类号： G03B27/52 , G03B27/42 , G03B27/58 , G03B27/32 , H01L21/00
CPC分类号： G03F7/70341 , G03F7/70925
摘要： An immersion lithographic apparatus is cleaned by use of a cleaning liquid consisting essentially of ultra-pure water and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide at a concentration of up to 5%, or (c) ozone at a concentration of up to 50 ppm, or (d) oxygen at concentration of up to 10 ppm, or (e) any combination selected from (a)-(d).
摘要翻译：或（c）过氧化氢和臭氧的混合物，或（b）浓度高达5％的过氧化氢，或（c）浓度高达50ppm的臭氧，或（d）浓度高达10ppm的氧，或（e）选自（a） - （d）的任何组合。

6. 发明授权

US07900641B2 Cleaning device and a lithographic apparatus cleaning method 有权
公开(公告)号：US07900641B2
公开(公告)日：2011-03-08
申请号：US11819959
申请日：2007-06-29
申请人： Anthonius Martinus Cornelis Petrus De Jong , Hans Jansen , Marco Koert Stavenga , Peter Franciscus Wanten , Bauke Jansen , Johannes Wilhelmus Jacobus Leonardus Cuijpers , Raymond Gerardus Marius Beeren , Kornelis Tijmen Hoekerd
发明人： Anthonius Martinus Cornelis Petrus De Jong , Hans Jansen , Marco Koert Stavenga , Peter Franciscus Wanten , Bauke Jansen , Johannes Wilhelmus Jacobus Leonardus Cuijpers , Raymond Gerardus Marius Beeren , Kornelis Tijmen Hoekerd
IPC分类号： B08B3/04
CPC分类号： G03F7/70925 , B08B3/12 , G03F7/70341
摘要： A cleaning tool to clean a surface of a component of a lithographic apparatus is disclosed. The cleaning tool includes a sonic transducer, a liquid supply device configured to provide liquid to a reservoir between the surface to be cleaned and the sonic transducer, and a liquid outlet configured to remove liquid provided by the liquid supply device, the cleaning tool constructed and arranged such that, in use, liquid flows into the outlet under the influence of gravity.

7. 发明申请

US20090190105A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：US20090190105A1
公开(公告)日：2009-07-30
申请号：US12358000
申请日：2009-01-22
申请人： Anthonius Martinus Cornelis Petrus DE JONG
发明人： Anthonius Martinus Cornelis Petrus DE JONG
IPC分类号： G03B27/52
CPC分类号： G03F7/70916 , G03F7/70341 , G03F7/70925
摘要： Contaminants may build up on surfaces of an immersion lithographic apparatus that come into contact with an immersion liquid from during exposure of a substrate. A solution containing a cleaning agent may be used to clean such surfaces. The cleaning properties of such a cleaning solution may be improved by activating it with ultraviolet radiation. This means that a solution of a lower concentration may be used, thereby reducing the risk of damaging the surfaces to which the cleaning solution is provided. An embodiment of the present invention allows ultraviolet radiation to be provided to surfaces being cleaned without having to take the apparatus off-line. In an embodiment, a guide member is used to transfer ultraviolet radiation from a remote radiation source to an outlet located at a position where it is desired for a cleaning operation.
摘要翻译：污染物可能积聚在浸没式光刻设备的表面上，浸没式光刻设备在曝光基板期间与浸没液接触。可以使用含有清洁剂的溶液来清洁这些表面。这种清洗液的清洗性能可以通过用紫外线辐射激活来提高。这意味着可以使用较低浓度的溶液，从而降低损坏提供清洁溶液的表面的风险。本发明的实施例允许将紫外线辐射提供给被清洁的表面，而不必将设备离线。在一个实施例中，引导构件用于将来自远程辐射源的紫外线辐射传送到位于需要进行清洁操作的位置处的出口。

8. 发明申请

US20090174871A1 Lithographic apparatus and method of cleaning a surface of an immersion lithographic apparatus 有权
标题翻译：平版印刷设备和清洗浸没式光刻设备表面的方法
公开(公告)号：US20090174871A1
公开(公告)日：2009-07-09
申请号：US12314611
申请日：2008-12-12
申请人： Anthonius Martinus Cornelis Petrus De Jong , Hans Jansen , Josephus Cornelius Johannes Antonius Vugts , Jacques Cor Johan Van Der Donck , Teunis Cornelis Van Den Dool , Gerrit Oosterhuis
发明人： Anthonius Martinus Cornelis Petrus De Jong , Hans Jansen , Josephus Cornelius Johannes Antonius Vugts , Jacques Cor Johan Van Der Donck , Teunis Cornelis Van Den Dool , Gerrit Oosterhuis
IPC分类号： G03B27/52 , B08B3/00
CPC分类号： B08B3/02 , B08B5/02 , G03F7/70341 , G03F7/70925
摘要： A method of cleaning a lithography apparatus using an aerosol spray is described. The spray from the aerosol is contained in a space.
摘要翻译：描述了使用气溶胶喷雾器清洁光刻设备的方法。来自气溶胶的喷雾被包含在空间中。

9. 发明申请

US20080284990A1 Cleaning device, a lithographic apparatus and a lithographic cleaning method 有权
标题翻译：清洁装置，光刻设备和光刻清洁方法
公开(公告)号：US20080284990A1
公开(公告)日：2008-11-20
申请号：US12081169
申请日：2008-04-11
申请人： Anthonius Martinus Cornelis Petrus De Jong , Hans Jansen , Marco Koert Stavenga , Peter Franciscus Wanten , Bauke Jansen , Johannes Wilhelmus Jacobus Leonardus Cuijpers , Raymond Gerardus Marius Beeren , Kornelis Tijmen Hoekerd
发明人： Anthonius Martinus Cornelis Petrus De Jong , Hans Jansen , Marco Koert Stavenga , Peter Franciscus Wanten , Bauke Jansen , Johannes Wilhelmus Jacobus Leonardus Cuijpers , Raymond Gerardus Marius Beeren , Kornelis Tijmen Hoekerd
IPC分类号： G03B27/52
CPC分类号： G03F7/70925 , G03F7/70341
摘要： An immersion lithographic projection apparatus having a megasonic transducer configured to clean a surface and a method of using megasonic waves through a liquid to clean a surface of an immersion lithographic projection apparatus are disclosed. A flow, desirably a radial flow, is induced in the liquid.
摘要翻译：公开了一种具有构造成清洁表面的兆声传感器的浸没式光刻投影设备和使用超声波通过液体清洁浸没式光刻投影设备的表面的方法。在液体中诱导流动，期望地是径向流动。

10. 发明申请

US20080271750A1 Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method 有权
标题翻译：清洁装置，光刻设备和光刻设备清洁方法
公开(公告)号：US20080271750A1
公开(公告)日：2008-11-06
申请号：US11819954
申请日：2007-06-29
申请人： Bauke Jansen , Raymond Gerardus Marius Beeren , Anthonius Martinus Cornelis Petrus De Jong , Kornelis Tijmen Hoekerd
发明人： Bauke Jansen , Raymond Gerardus Marius Beeren , Anthonius Martinus Cornelis Petrus De Jong , Kornelis Tijmen Hoekerd
IPC分类号： B08B3/10 , A61N5/00
CPC分类号： G03F7/70925 , B08B3/12 , G03F7/70341
摘要： A cleaning tool to clean a surface of a liquid confinement system of an immersion lithographic apparatus is disclosed, the liquid confinement system having an aperture to allow passage of a beam of radiation therethrough of an immersion lithographic apparatus. The cleaning tool includes a sonic transducer, a reservoir configured to hold liquid between the sonic transducer and the surface to be cleaned, and a barrier positioned in the reservoir under the aperture to form, in use, a shield to sonic waves.
摘要翻译：公开了一种用于清洁浸没式光刻设备的液体限制系统的表面的清洁工具，液体限制系统具有允许通过其中的浸没式光刻设备的光束通过的孔。清洁工具包括声音换能器，被配置为在声音换能器和待清洁表面之间保持液体的储存器，以及位于孔下方的储存器中的屏障，以在使用中形成对声波的屏蔽。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式