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    • 1. 发明申请
    • METHOD FOR PRODUCING TETRAFLUOROSILANE
    • 生产四氯氟硅烷的方法
    • WO2005030642A1
    • 2005-04-07
    • PCT/JP2004/014419
    • 2004-09-24
    • SHOWA DENKO K.K.OKA, Masakazu
    • OKA, Masakazu
    • C01B33/107
    • C03B37/01446B01D53/02C01B33/107C01B33/10705C01B33/10784C03B37/01453C03B2201/12C03C25/607
    • The invention relates to a method for producing tetrafluorosilane by decomposing hexafluorosilicic acid with sulfuric acid, which comprises: step 1 of decomposing hexafluorosilicic acid in concentrated sulfuric acid in the first reactor to give SiF 4 and HF and taking out the SiF 4 ; step 2 of transferring part of the concentrated sulfuric acid solution of step 1 containing HF into the second reactor to react the HF with silicon dioxide fed thereinto, thereby producing SiF 4 containing (SiF 3 ) 2 0; and step 3 of bringing the reaction product of step 2 containing (SiF 3 ) 2 O and SiF 4 to the first reactor to react (SiF 3 ) 2 O contained in the reaction product with HF to convert it into SiF 4 and then taking out the SiF4 along with SiF 4 formed in step 1. According to the invention, high-purity SiF 4 can be obtained with (SiF 3 ) 2 Obeing reduced, free from HF generated as a problematic side product in conventional method.
    • 本发明涉及通过用硫酸分解六氟硅酸生产四氟硅烷的方法,其包括:在第一反应器中分解六氟硅酸在浓硫酸中的步骤1,得到SiF 4和HF并取出SiF 4; 将部分含有HF的步骤1的浓硫酸溶液转移到第二反应器中以使HF与供给的二氧化硅反应,从而产生含有(SiF 3)20的SiF 4的步骤2; 和将含有(SiF 3)2 O和SiF 4的步骤2的反应产物引入第一反应器以使反应产物中含有的(SiF 3)2 O与HF反应以将其转化为SiF 4,然后与形成的SiF 4一起取出SiF 4的步骤3 根据本发明,通过(SiF 3)2可以获得高纯度的SiF 4,其在常规方法中不产生作为有问题的副产物的HF。