会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 6. 发明公开
    • A method of forming a shallow doped region in a semiconductor substrate
    • 制造平面型掺杂区,一个在半导体衬底的方法。
    • EP0165547A2
    • 1985-12-27
    • EP85107228.0
    • 1985-06-13
    • International Business Machines Corporation
    • Rubloff, Gary WayneWittmer, Marc Francis
    • H01L21/28H01L21/225
    • H01L21/2254H01L21/2257H01L21/28518
    • A shallow (not more than about 30nm deep) doped region (24) is formed in a semiconductor substrate (10) by depositing at least two overlayers (12,14) on the top surface of the semiconductor substrate, one (14) of the overlayers containing metal atoms. The overlayers are such that a metal compound is formed from the metal atoms in one (14) of the overlayers and atoms from another one (12) of the overlayers when the multilayered structure is annealed at a temperature less than 700°C. At least one (12) of the overlayers contains atoms to be introduced as a dopant into the substrate.
      When the multilayer structure is annealed at a temperature less than 700°C the metal compound is formed and releases the atoms to be introduced into the substrate. This produces an interface (18) which moves towards the substrate and pushes the released atoms by the snowplow effect towards the substrate. The annealing is continued for a time sufficient to move the interface (18) to the top surface of the substrate to push the released atoms into the body of the substrate.
    • 浅(不超过约30nm深)掺杂区(24)在一个半导体基片(10)通过的所述半导体衬底的顶面,一个(14)上沉积的至少两个以上的层(12,14)而形成 在含有金属原子的层。 过层被检查没有金属化合物选自金属原子的过从过层当该多层结构是在温度低于700℃。在至少退火另一个(12)的层和原子形成一个(14) 一个(12)的上方的层包含原子被引入作为掺杂剂进入衬底。 当多层结构是在温度低于700℃下退火的金属化合物形成,并释放原子被引入到基材。 这产生基片接口(18),朝向所述基板移动,并推动通过朝向所述扫雪机作用释放的原子。 退火持续足够长的时间的界面(18)移动到衬底的顶表面,以释放的原子推入基板的主体中。
    • 9. 发明公开
    • Magnetic field sensing device
    • Vorrichtung zum Nachweis magnetischer Felder。
    • EP0130496A1
    • 1985-01-09
    • EP84107150.9
    • 1984-06-22
    • International Business Machines Corporation
    • Aboaf, Joseph AdamKlokholm, ErikMc Guire, Thomas Roche
    • G01R33/06H01L43/08
    • G11B5/3903H01L43/10
    • A magnetic field sensing device employs a magnetoresistive element which exhibits a negative Δp effect (Δp = p ∥-ρ┴) when a magnetic field is applied to it to magnetise it to saturation at room temperature. The electrical resistivity p┴ of the element in a direction perpendicular to the direction of current through the element is greater than the electrical resistivity p ∥ of the element in a direction parallel to the direction of the electrical current through the element. The magnetoresistive element is formed from a ferromagnetic material containing at least one of Ni; Fe and Co together with lr in an amount sufficient to cause the element to exhibit negative anisotropic magnetoresistance at room temperature.
    • 当磁场被施加到磁场以在室温下饱和时,磁场感测装置采用表现出负的DELTA rho效应(DELTA rho = rho ||-rho ORTHOGONAL)的磁阻元件。 元件在与通过元件的电流方向垂直的方向上的电阻率ROH ORTHOGONAL大于电阻率rho || 的元件在平行于通过元件的电流的方向的方向上。 磁阻元件由含有Ni中的至少一种的铁磁材料形成; Fe和Co与Ir的量足以使元素在室温下呈现负的各向异性磁阻。