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1. 发明授权

EP0747945B1 Wafer orientation inspection system 失效
标题翻译：断面方位检测系统
公开(公告)号：EP0747945B1
公开(公告)日：2004-12-29
申请号：EP96304024.1
申请日：1996-06-04
申请人： Varian Semiconductor Equipment Associates Inc.
发明人： Landau, Richard F. , Schultheis, Edward D.
IPC分类号： H01L21/66
CPC分类号： H01L21/681 , H01L22/12

2. 发明授权

EP0900439B1 ACCORDION PLEATED MEDIA STORAGE UNIT HAVING SEPARABLE POCKETS 失效
标题翻译：具有可分离手风琴式折叠STORAGE包装袋
公开(公告)号：EP0900439B1
公开(公告)日：2003-11-12
申请号：EP97931452.3
申请日：1997-05-23
申请人： CD3 Storage Systems Incorporated
发明人： HUNT, Ronald, E. , WHITEHEAD, Verlon, E.
IPC分类号： G11B33/04 , B65D85/57
CPC分类号： G11B33/0466 , G11B23/0236
摘要： An accordion pleated media storage unit is provided which is constructed of a continuous elongate web of flexible material, such as a non-woven polyester spun material. A continuous zigzag fold of the elongate web creates multiple overlying planes, each of which has at least one edge which is integral with an adjacent plane. A bond is then formed along each edge of a pair of adjacent planes, extending from a common edge to a point just short of the mid-line of each plane, such that multiple adjacent pockets are formed which, when the unit is extended, are separated by a specified distance and wherein the pocket dimensions are not altered, greatly enhancing insertion and retrieval of a storage media element.

3. 发明授权

EP0747927B1 Apparatus for obtaining dose uniformity in plasma doping (PLAD) ion implantation processing 失效
标题翻译：装置以实现离子注入方法的均匀剂量的等离子体掺杂（PLAD）
公开(公告)号：EP0747927B1
公开(公告)日：2003-01-22
申请号：EP96304023.3
申请日：1996-06-04
申请人： Varian Semiconductor Equipment Associates Inc.
发明人： Chapek, David Leroy , Malik, Shamim Muhammad , Felch, Susan B. , Sheng, Tienyu Terry , Kissick, Michael William
IPC分类号： H01J37/32 , H01J37/317 , H01J37/08 , H01J37/04 , C23C14/48 , C23C16/50
CPC分类号： H01J37/32412 , C23C14/48 , H01J37/32697

4. 发明授权

EP0659297B1 TOXIC REMEDIATION SYSTEM AND METHOD 失效
标题翻译：系统和方法进行处理有毒废料
公开(公告)号：EP0659297B1
公开(公告)日：2002-10-16
申请号：EP93919953.5
申请日：1993-08-11
申请人： Tipaz Incorporated , THE REGENTS OF THE UNIVERSITY OF CALIFORNIA
发明人： MATTHEWS, Stephen, M. , SCHONBERG, Russell, G. , FADNESS, David, R.
IPC分类号： H01J37/30 , H01J33/00 , B01D53/00 , F23J15/02 , B01J19/08
CPC分类号： A62D3/15 , A62D2101/20 , A62D2101/22 , A62D2203/10 , B01D53/007 , B01D53/323 , B01D53/75 , B01D2257/708 , B01D2259/812 , B01J19/085 , B01J2219/00103 , B01J2219/00153 , B01J2219/00159 , B09C1/06 , B09C1/08 , C02F1/008 , C02F1/305 , H01J33/02

5. 发明授权

EP0871978B1 METHOD FOR INJECTION OF EXTERNALLY PRODUCED IONS INTO A ION TRAP 失效
标题翻译：的程序对ONE导入外部生产的ION离子阱
公开(公告)号：EP0871978B1
公开(公告)日：2001-10-31
申请号：EP97932169.2
申请日：1997-07-08
申请人： Varian, Inc.
发明人： MORDEHAI, Alex , BUTTRILL, Sidney, E., Jr.
IPC分类号： H01J49/42
CPC分类号： H01J49/4295 , H01J49/424

6. 发明公开

EP0858095A3 Methods and apparatus for linear scan magnetron sputtering 失效
标题翻译： Verfahren undGerätezur线性gerasterderMangetronzerstäubung
公开(公告)号：EP0858095A3
公开(公告)日：2001-01-17
申请号：EP98300888.9
申请日：1998-02-06
申请人： INTEVAC, INC.
发明人： Hughes, John L. , Kolenkow, Robert J. , Pond, Norman H. , Davis, Gary A. , Petersen, Carl T. , Weiss, Robert E.
IPC分类号： H01J37/34
CPC分类号： H01J37/3455 , C23C14/35 , H01J37/3408
摘要： A magnetron sputtering source for depositing a material onto a substrate includes a target from which the material is sputtered, a magnet assembly disposed in proximity to the target for confining a plasma at the surface of the target and a drive assembly for scanning the magnet assembly relative to the target. The sputtering source may further include an anode for maintaining substantially constant plasma characteristics as the magnet assembly is scanned relative to the target. The anode may be implemented as variable voltage stationary electrodes positioned at or near the opposite ends of the scan path followed by the magnet assembly, spaced-apart anode wires positioned between the target and the substrate or a movable anode that is scanned with the magnet assembly. The magnet elements of the magnet assembly may have different spacings from-the surface of the target to enhance depositional thickness uniformity. The target may be fabricated in sections, each having a target element bonded to a backing element for reduced sensitivity to thermal variations. The target may be rotated from a first fixed position to a second fixed position relative to the magnet assembly at least once during its operating life for increased target utilization.
摘要翻译：用于将材料沉积到衬底上的磁控溅射源包括溅射材料的靶，设置在靶附近的磁体组件，用于限制靶的表面处的等离子体和用于扫描磁体组件相对的驱动组件到目标当磁体组件相对于靶被扫描时，溅射源还可以包括用于维持基本恒定的等离子体特性的阳极。阳极可以被实现为位于扫描路径的相对端处或附近的可变电压固定电极，随后是磁体组件，位于靶和衬底之间的间隔开的阳极线或用磁体组件扫描的可移动阳极。磁体组件的磁体元件可以具有与靶的表面不同的间隔，以增强沉积厚度均匀性。靶可以以各自的方式制造，每个具有结合到背衬元件的目标元件，以降低对热变化的敏感性。目标可以在其使用寿命期间相对于磁体组件从第一固定位置旋转至第二固定位置，以增加目标利用率。

7. 发明授权

EP0734055B1 Method of manufacturing an electrostatic chuck 失效
标题翻译：一种制备静电吸盘板的方法
公开(公告)号：EP0734055B1
公开(公告)日：2000-07-26
申请号：EP96107414.3
申请日：1992-11-09
申请人： Varian Semiconductor Equipment Associates Inc.
发明人： Sherman, Arthur
IPC分类号： H01L21/00
CPC分类号： H01L21/6831 , H01L21/6833 , Y10S269/903 , Y10T279/23

8. 发明授权

EP0602983B1 Hybrid photomultiplier tube with high sensitivity 失效
标题翻译：以高灵敏度混合光电倍增管
公开(公告)号：EP0602983B1
公开(公告)日：2000-06-07
申请号：EP93310188.3
申请日：1993-12-16
申请人： INTEVAC, INC.
发明人： La Rue, Ross Actor , Costello, Kenneth , Aebi, Verle W.
IPC分类号： H01J43/28 , G01N23/227 , G01T1/28
CPC分类号： H01J43/246 , G01N23/2273 , G01T1/28 , H01J43/28

9. 发明公开

EP0807955A3 Liquid ion chamber electrode apparatus 失效
标题翻译：对于Flüssigkeitsionisationskammer电极装置
公开(公告)号：EP0807955A3
公开(公告)日：2000-04-19
申请号：EP97303235.2
申请日：1997-05-13
申请人： VARIAN ASSOCIATES, INC.
发明人： Day, Derek J. , Majidi-Ahy, Reza , Fencl, Willi , Riem, Heinrich , Provencale, Salvatore , Staehelin, Rolf
IPC分类号： H01J47/02
CPC分类号： H01J47/028 , G01T1/185
摘要： The present invention provides electrode assemblies for LIC imagers that maximize ion collection and the electric field for the minimum bias voltage. To achieve this optimization the ion collection is confined to small regions. Due to this limited ion collection region, high neutralization efficiencies and fast sweep-out times can be obtained. Furthermore, with an electrode separation of approximately 0.1 millimeters, pulse voltages of less than 100 volts can be used. Low voltages result in improved reliability, longer system life, and lower safety risks.

10. 发明授权

EP0663092B1 ROBUST DELAY FAULT BUILT-IN SELF-TESTING METHOD AND APPARATUS 失效
标题翻译：方法和设备的延迟故障的鲁棒性和自动测试
公开(公告)号：EP0663092B1
公开(公告)日：2000-03-22
申请号：EP94922668.2
申请日：1994-07-21
申请人： RUTGERS UNIVERSITY
发明人： BUSHNELL, Michael, L. , SHAIK, Imtiaz, Cook Campus
IPC分类号： G06F11/263 , G06F17/50 , G01R31/28 , G06F11/24
CPC分类号： G06F11/267 , G01R31/3016 , G06F2201/83 , G06F2201/88
摘要： This invention relates to a method and apparatus for robust delay fault testing of integrated circuits (IC) with built-in self-testing. For the method, hazardous nodes of the IC are determined. Thereafter, the topology of the IC can be modified to include a cut-point at hazardous nodes of the circuit. Input of the IC to the cut-point is diverted to an observation point. An out-put multi-input signature register (MISR) at the observation point generates a first signature. An output MISR provides a second signature for outputs to the IC. During testing, a hazard-free input pattern is applied to the IC and the generated first and second signatures are compared to known correct signatures.

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