会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 2. 发明授权
    • Servo synchronization validation techniques based on both servo synch marks and wedge identifiers in a rotating media storage device
    • 基于旋转介质存储设备中的伺服同步标记和楔形标识符的伺服同步验证技术
    • US07023639B1
    • 2006-04-04
    • US10815508
    • 2004-03-31
    • Hanan Kupferman
    • Hanan Kupferman
    • G11B5/09
    • G11B5/59688
    • Disclosed is a rotatable media storage device (RMSD) connectable to a host. The RMSD include a movable head to perform track following, a disk, and a synch mark detection circuit. The disk includes a circumferential track that has a plurality of embedded servo wedges utilized in track following. The synch mark detection circuit has a first detection mode and a second detection mode. In the first detection mode, the synch mark detection circuit detects a servo synchronization signal based on the head reading a SSM of a servo header of an embedded servo wedge. In the second detection mode, the synch mark detection circuit detects a servo synchronization signal based on the head reading a SSM and a wedge identifier of a servo header of an embedded servo wedge. The wedge ID is utilized in conjunction with the SSM to validate the servo synchronization signal.
    • 公开了可连接到主机的可旋转介质存储设备(RMSD)。 RMSD包括用于执行跟踪的移动头,盘和同步标记检测电路。 盘包括具有多个嵌入式伺服楔的周向轨道,该楔形跟踪跟踪中使用。 同步标记检测电路具有第一检测模式和第二检测模式。 在第一检测模式中,同步标记检测电路基于头读取嵌入伺服楔的伺服头的SSM来检测伺服同步信号。 在第二检测模式中,同步标记检测电路基于头读取SSM和嵌入伺服楔的伺服头的楔形标识符来检测伺服同步信号。 楔形ID与SSM一起使用以验证伺服同步信号。
    • 3. 发明授权
    • Valve manifold for HVAC zone control
    • 用于HVAC区域控制的阀门歧管
    • US07162884B2
    • 2007-01-16
    • US10750709
    • 2004-01-02
    • Harold Gene Alles
    • Harold Gene Alles
    • F25D17/00F16K11/22E03B1/00F24D1/00
    • F24F13/10F24F3/0442F24F2013/087Y10T29/49716Y10T137/87249Y10T137/87684Y10T137/87692
    • A pressure and vacuum valve manifold system such as may be used, for example, to actuate pneumatic bladders controlling airflow in a forced air HVAC system to provide zone climate control. The valves are individually operable to connect a respective individual bladder to pressure or to vacuum. Two manifolds can be mated and commonly fed pressure and vacuum. The two manifolds can be of identical construction. One manifold chamber from each can be connected into a single large pressure manifold, and another manifold chamber from each can be connected into a single large vacuum manifold. Such connections can be made with fittings which also serve as pressure and vacuum relief valves, respectively. The valve plungers are arranged in a grid, enabling a simple X-Y two-motor servo system to actuate all the valves, one at a time. The valves may be arranged such that the valves of one manifold are one half increment offset from the valves of the other manifold, enabling a single actuator having two actuator fingers to operate only a single manifold's valve at a time.
    • 压力和真空阀歧管系统例如可用于致动气动气囊以控制强制空气HVAC系统中的气流以提供区域气候控制。 阀可单独操作以将相应的单独的气囊连接到压力或真空。 两个歧管可以配合并通常进行压力和真空。 两个歧管的结构可以相同。 每一个的一个歧管腔可以连接到一个单一的大型压力歧管中,并且每个歧管腔可以连接到单个大型真空歧管中。 这种连接可以分别由也可用作压力和真空安全阀的配件制成。 阀柱塞排列成格栅,使得简单的X-Y双电机伺服系统能够一次一个地驱动所有的阀。 阀可以被布置成使得一个歧管的阀门与另一个歧管的阀门偏移一半增量,使得具有两个致动器指状件的单个致动器能够一次仅操作单个歧管阀门。
    • 9. 发明授权
    • Position determination in a lithography system using a substrate having a partially reflective position mark
    • 使用具有部分反射位置标记的基板的光刻系统中的位置确定
    • US09395635B2
    • 2016-07-19
    • US13453986
    • 2012-04-23
    • Guido De BoerNiels Vergeer
    • Guido De BoerNiels Vergeer
    • G03F9/00
    • G03F9/7088G03F9/7076
    • The invention relates to a substrate for use in a lithography system, said substrate being provided with an at least partially reflective position mark comprising an array of structures, the array extending along a longitudinal direction of the mark, characterized in that said structures are arranged for varying a reflection coefficient of the mark along the longitudinal direction, wherein said reflection coefficient is determined for a predetermined wavelength. In an embodiment a specular reflection coefficient varies along the substrate, wherein high order diffractions are substantially absorbed by the substrate. A position of a beam on a substrate can thus be determined based on the intensity of its reflection in the substrate. The invention further relates to a positioning device and lithography system for cooperation with the substrate, and a method of manufacture of the substrate.
    • 本发明涉及一种在光刻系统中使用的基片,所述基片设置有至少部分反射的位置标记,该标记包括沿该标记的纵向方向延伸的结构阵列,其特征在于,所述结构被设置为 沿着纵向方向改变标记的反射系数,其中所述反射系数被确定为预定波长。 在一个实施例中,镜面反射系数沿衬底变化,其中高阶衍射基本上被衬底吸收。 因此,可以基于其在基板中的反射强度来确定光束在基板上的位置。 本发明还涉及一种用于与该基板配合的定位装置和光刻系统,以及该基板的制造方法。