会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 1. 发明申请
    • APPARATUS AND METHOD FOR IN SITU AND EX SITU MEASUREMENTS OF OPTICAL SYSTEM FLARE
    • 用于光系统的现场和现场测量的装置和方法
    • WO2006124707A2
    • 2006-11-23
    • PCT/US2006/018606
    • 2006-05-15
    • ZETETIC INSTITUTEHILL, Henry, A.
    • HILL, Henry, A.
    • G01B11/02G01B9/02
    • G03F7/706G01J2009/0223G03F7/70591G03F7/7085G03F7/70941
    • Apparatus and methods for in situ and ex situ measurements of spatial profiles of the modulus of the complex amplitude and intensity of flare generated by an optical system. The in situ and ex situ measurements comprise interferometric and non-interferometric measurements that use an array of diffraction sites simultaneously located in an object plane of the optical system to increase signals related to measured properties of flare in a conjugate image plane. The diffraction sites generate diffracted beams with randomized relative phases. In general, the interferometric profile measurements employ phase-shifting point-diffraction interferometry to generate a topographical interference signal and the non-interferometric measurements are based on flare related signals other than topographic interference signals. The topographical interference signal and flare related signals are generated by a detector either as an electrical interference signal or electrical flare related signals or as corresponding exposure induced changes in a recording medium.
    • 用于原位和非原位测量由光学系统产生的光斑的复振幅和强度的模量的空间分布的装置和方法。 原位和非原位测量包括使用同时位于光学系统的物平面中的衍射位置阵列的干涉测量和非干涉测量,以增加与共轭图像平面中的测光特性相关的信号。 衍射点产生具有随机相对相位的衍射光束。 通常,干涉测量轮廓测量采用相移点衍射干涉测量法来产生地形干涉信号,并且非干涉测量基于与地形干扰信号不同的闪光相关信号。 地形干扰信号和火炬相关信号由检测器产生,作为电干扰信号或电眩光相关信号,或作为记录介质中相应的曝光引起的变化。
    • 2. 发明申请
    • APPARATUS AND METHOD FOR MEASUREMENT OF FIELDS OF BACKSCATTERED AND FORWARD SCATTERED/REFLECTED BEAMS BY AN OBJECT IN INTERFEROMETRY
    • 用于测量干涉仪中的对象的反向扫描和前向散射/反射的区域的装置和方法
    • WO2004090466A2
    • 2004-10-21
    • PCT/US2004/009984
    • 2004-04-01
    • ZETETIC INSTITUTEHILL, Henry, Allen
    • HILL, Henry, Allen
    • G01B
    • G02B21/0056G01B9/02007G01B9/02019G01B9/02029G01B9/0203G01B9/02042G01B9/02069G01B9/02079G01J1/58G01N21/211G02B17/0808G03F7/70625
    • An interferometry system for making interferometric measurements of an object, the system including a source assembly that generates an input beam; a detector assembly that includes a detector element; and an interferometer that includes a source imaging system that images the input beam onto a spot on or in the object and an object imaging system that images the spot onto the detector element as an interference beam, the object imaging system combining light coming from the spot with a reference beam to produce the interference beam, wherein the source imaging system is characterized by a first aperture stop that defines a first aperture and includes a first phase shifter that introduces a first phase shift in light passing through a first region of the first aperture relative to light passing through a second regino of the first aperture, and wherein the object imaging system is characterized by a second aperture stop that defines a second aperture and includes a second phase shifter that introduces a second phase shift in light passing through a first region of the second aperture relative to light passing through a second region of the second aperture.
    • 一种用于对物体进行干涉测量的干涉测量系统,所述系统包括产生输入光束的光源组件; 检测器组件,其包括检测器元件; 以及干涉仪,其包括将输入光束成像到物体上或物体上的点上的源成像系统和将斑点作为干涉光束成像到检测器元件上的物体成像系统,该物体成像系统将来自该点的光 具有参考光束以产生所述干涉光束,其中所述源成像系统的特征在于限定第一孔径的第一孔径光阑,并且包括第一移相器,所述第一移相器在通过所述第一孔径的第一区域的光中引入第一相移 相对于穿过第一孔的第二区域的光,并且其中所述物体成像系统的特征在于限定第二孔的第二孔径光阑,并且包括第二移相器,所述第二移相器在通过第一区域的光中引入第二相移 的第二孔相对于穿过第二孔的第二区域的光。
    • 5. 发明申请
    • APPARATUS AND METHOD FOR JOINT AND TIME DELAYED MEASUREMENTS OF COMPONENTS OF CONJUGATED QUADRATURES OF FIELDS OF REFLECTED/SCATTERED AND TRANSMITTED/SCATTERED BEAMS BY AN OBJECT IN INTERFEROMETRY
    • 装置和方法用于在干涉测量中通过物体测量反射/散射和透射/散射光束的共轭焦面组分的时间和延迟测量
    • WO2006023406A2
    • 2006-03-02
    • PCT/US2005/028852
    • 2005-08-16
    • ZETETIC INSTITUTEHILL, Henry, A.
    • HILL, Henry, A.
    • G01B9/02
    • G01B9/02022G01B9/02014G01B9/02068G01B9/02079G01B2290/70
    • A method of interferometrically obtaining measurements for properties associated with a spot on or in an object, the method involving: receiving a sequence of M optical pulses separated in time; from each pulse in the sequence of M optical pulses, generating an n-tuplet of measurement pulses, and an n-tuplet of reference pulses, wherein each measurement pulse has a corresponding reference pulse aligned with it in time; from each pulse of each n-tuplet of reference pulses for the sequence of M optical pulses, generating a reference beam; from each pulse of each n-tuplet of measurement pulses for the sequence of M optical pulses, (a) generating a measurement beam; (b) directing the measurement beam onto the spot to thereby produce a return measurement beam from the spot; and (c) combining the return measurement beam with the corresponding reference beam that was derived from the reference pulse corresponding to that measurement pulse to generate an interference beam, wherein the sequence of M n-tuplets of measurement pulses forms n interleaved sequences of M measurement pulses, and wherein the method further involves, for each of the n interleaved sequences of M measurement pulses, introducing a combination of phase shifts between the measurement beams and corresponding reference beams.
    • 一种干涉测量获得与物体上或物体中的斑点相关联的性质的测量值的方法,所述方法包括:接收在时间上分离的M个光脉冲的序列; 从M个光脉冲序列中的每个脉冲中产生n元组测量脉冲和一个n元组参考脉冲,其中每个测量脉冲具有与其对准的对应参考脉冲; 从用于M个光脉冲序列的参考脉冲的每个n元组的每个脉冲中,生成参考光束; 从用于M个光脉冲序列的测量脉冲的每个n元组的每个脉冲中,(a)产生测量光束; (b)将测量光束引导到该点上,从而从该点产生返回测量光束; (c)将返回测量光束与从对应于该测量脉冲的参考脉冲导出的对应参考光束组合以生成干涉光束,其中测量脉冲的M个n连接组的序列形成n个交织的M测量序列 脉冲,并且其中该方法还包括对于M个测量脉冲的n个交错序列中的每一个,引入测量光束和对应参考光束之间的相移组合。
    • 6. 发明申请
    • METHOD AND APPARATUS FOR DARK FIELD INTERFEROMETRIC CONFOCAL MICROSCOPY
    • 用于暗场干涉微结构显微镜的方法和装置
    • WO2004074881A2
    • 2004-09-02
    • PCT/US2004/004946
    • 2004-02-19
    • ZETETIC INSTITUTEHILL, Henry, Allen
    • HILL, Henry, Allen
    • G02B
    • G01B9/04G02B21/0024G02B21/0056G02B27/108G02B27/143G02B27/144G02B27/145
    • A differential interferometric confocal microscope for measuring an object, the microscope including: a source-side pinhole array; a detector-side pinhole array; and an interferometer that images the array of pinholes of the source-side pinhole array onto a first array of spots located in front of an object plane located near where the object is positioned and onto a second array of spots behind the object plane, wherein the first and second arrays of spots are displaced relative to each other in a direction that is normal to the object plane, the interferometer also (1) imaging the first arrays of spots onto a first image plane tha tis behind the detector-side phinhole array, (2) imaging the first array of spots onto a plane defined by the detector-side pihole array, (3) imaging the second array of spots onto a second image plane that is in front of the detector-side pinhole array, and (4) imaging the second array of spots onto the plane defined by the detector-side pinhole array, wherein each spot of the imaged first array of spots in the first image plane is aligned with a corresponding different spot of the imaged second array of spots in the second image plane and a corresponding different pinhole of the detector-side pinhole array, and wherein each spot of the image first array of spots in the plane defined by the detector-side array coincides with a corresponding different spot of the imaged second array of spots in the plane defined by the detector-side array and coincides with a corresponding different pinhole of the detector-side pinhole array.
    • 用于测量物体的差分干涉式共聚焦显微镜,所述显微镜包括:源极针孔阵列; 检测器侧针孔阵列; 以及干涉仪,其将源侧针孔阵列的针孔阵列成像到位于物体平面附近的物体平面前方的位于第一阵列的位置上,并且位于物平面后面的第二阵列上,其中, 第一和第二阵列阵列在垂直于物平面的方向上相对于彼此移位,干涉仪还(1)将第一阵列阵列成像到检测器侧孔阵列后面的第一图像平面上, (2)将第一阵列的斑点成像到由检测器侧针孔阵列限定的平面上,(3)将第二阵列阵列成像到位于检测器侧针孔阵列前面的第二图像平面上,和(4 )将第二阵列的斑点成像到由检测器侧针孔阵列限定的平面上,其中第一图像平面中成像的第一阵列阵列的每个点与成像的第二阵列的相对应的不同点对齐 他的第二图像平面和检测器侧针孔阵列的相应不同的针孔,并且其中由检测器侧阵列限定的平面中的图像的第一阵列点的每个点与被成像的第二阵列的相应的不同点重合 由检测器侧阵列限定的平面中的点并且与检测器侧针孔阵列的相应不同的针孔重合。
    • 7. 发明申请
    • TRANSVERSE DIFFERENTIAL INTERFEROMETRIC CONFOCAL MICROSCOPY
    • 横向差分干涉微结构显微镜
    • WO2004072695A2
    • 2004-08-26
    • PCT/US2004/004275
    • 2004-02-13
    • ZETETIC INSTITUTEHILL, Henry, Allen
    • HILL, Henry, Allen
    • G02B
    • G02B21/0056G01B9/04G02B21/0024G02B21/04
    • An array of conjugated quadratures of fields is measured interferometrically by a confocal interferometer and detector system wherein each conjugated quadratures comprises a difference of conjugated quadratures of fields of beams scattered/reflected or transmitted by a pair of spots in or on a substrate. The array of conjugated quadratures is measured jointly, i.e ., simultaneously, and the components of each conjugated quadratures may be measured jointly. Each pair of spots generally has a relative displacement on the order of the three or more times the size of the spots in a direction nominally tangent to the surface of the substrate. The relative phases of the beams subsequently scattered/reflected or transmitted by the pair of spots on/in a substrate may be adjusted as a set by control of a single system parameter so that the conjugated quadratures of the array of conjugated quadratures are nominally zero, i.e ., information may be obtained about the substrate with the interferometer and detector system operating in a dark field mode. Operation in a dark field mode leads to both reduced systematic and statistical errors in the information and increased throughput. The information may include the transverse derivative of a profile of one or more surfaces of a substrate; onedimensional, two-dimensional, and three-dimensional transverse differential images of a substrate; critical dimensions of features or artifacts on or in a substrate, and the size and location of sub-wavelength defects in or on a substrate.
    • 场共轭正交阵列通过共焦干涉仪和检测器系统进行干涉测量,其中每个共轭正交包括由衬底中或衬底上的一对斑点散射/反射或透射的光束的场的共轭正交的差。 共轭正交阵列共同测量,即同时测量,并且可以共同测量每个共轭正交的分量。 每对点通常在与基板表面正切的方向上的点的尺寸的三次或更多次的量级上具有相对位移。 随后通过单个系统参数的控制将随后由衬底上的一对点散射/反射或透射的光束的相对相位调整为一组,使得共轭正交阵列的共轭正交值标称为零, 即,可以利用干涉仪和检测器系统在暗场模式下操作来获得关于衬底的信息。 在暗场模式下的操作可以减少信息中的系统和统计误差,提高吞吐量。 信息可以包括衬底的一个或多个表面的轮廓的横向导数; 衬底的二维,二维和三维横向差分图像; 衬底上或衬底上的特征或伪影的关键尺寸,以及衬底中或衬底上的亚波长缺陷的尺寸和位置。
    • 10. 发明申请
    • METHOD FOR CONSTRUCTING A CATADIOPTRIC LENS SYSTEM
    • 用于构造阴离子透镜系统的方法
    • WO2004090582A2
    • 2004-10-21
    • PCT/US2004/009968
    • 2004-04-01
    • ZETETIC INSTITUTEHILL, Henry, Allen
    • HILL, Henry, Allen
    • G02B
    • G02B21/0056G02B21/0024
    • A method of fabricating a catadioptric lens system, the method involving: fabricating a single catadioptric lens element having a bottom surface and an upper surface, the upper surface having a convex portion and a concave portion, both the convex and concave portions sharing a common axis of symmetry; cutting apart the catadioptric lens element to form 2n pie-shaped segments, wherein n is an integer; and reassembling the 2n pie-shaped segments to form the catadioptric lens system with n of the 2n pie-shaped segments being located above a common plane and the rest of the 2n pie-shaped elements being below the common plane.
    • 一种制造反射折射透镜系统的方法,所述方法包括:制造具有底表面和上表面的单个反射折射透镜元件,所述上表面具有凸部和凹部,所述凸部和凹部均具有公共轴线 的对称性 切割反射折射透镜元件以形成2n个饼形片段,其中n为整数; 并且重新组装2n个饼状部分以形成反射折射透镜系统,其中2n个饼状部分中的n个位于公共平面之上,其余的2n个饼状部分位于公共平面之下。