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1. 发明申请

US20140363903A1 SUBSTRATE TREATING APPARATUS AND METHOD OF TREATING SUBSTRATE 审中-公开
标题翻译：基板处理装置和处理基板的方法
公开(公告)号：US20140363903A1
公开(公告)日：2014-12-11
申请号：US13914098
申请日：2013-06-10
申请人： Tokyo Ohta Kogyo Co., Ltd.
发明人： Hidenori Miyamoto , Yubun Kikuchi , Tsutomu Sahoda , Yoshiaki Masu
IPC分类号： H01L21/66 , H01L21/02 , H01L21/324 , H01L21/67
CPC分类号： H01L21/324 , H01L21/02664 , H01L21/6715 , H01L21/67253 , H01L21/6776 , Y02E10/541
摘要： A substrate treating apparatus including: a chamber capable of accommodating a substrate; a treating part which conducts a predetermined treatment associated with forming a coating film containing a metal to the substrate accommodated in the chamber; and a detection part which detects a concentration of a predetermined gas containing a chalcogen element within a gas inside the chamber.
摘要翻译：一种基板处理装置，包括：能够容纳基板的室; 处理部，其与容纳在所述室中的所述基板进行与形成含有金属的涂膜相关联的预定处理; 以及检测部，其检测在所述室内的气体内含有硫属元素的规定气体的浓度。

2. 发明授权

US5985525A Developer solution for photoresist composition 失效
标题翻译：光致抗蚀剂组合物的显影剂溶液
公开(公告)号：US5985525A
公开(公告)日：1999-11-16
申请号：US127640
申请日：1993-09-28
申请人： Mitsuru Sato , Hatsuyuki Tanaka , Toshimasa Nakayama
发明人： Mitsuru Sato , Hatsuyuki Tanaka , Toshimasa Nakayama
IPC分类号： G03F7/32 , H01L21/027 , H01L21/30 , G03C5/00
CPC分类号： G03F7/322
摘要： Proposed is an aqueous developer solution for an alkali-developable photoresist composition which contains, besides a water-soluble organic basic compound such as tetramethyl ammonium hydroxide and an anionic or non-ionic surface active agent as conventional ingredients in the prior art developwer solutions, an inorganic ammonium salt such as ammonium sulfate, ammonium phosphates and ammonium borates in a limited amount. By virtue of this unique additive, the developer solution is advantageous in respect of the absence of any scums on the patterned resist layer obtained by the development treatment therewith as well as quite good orthogonality in the cross sectional profile of line-patterned resist layer in addition to the greatly improved latitude in the light exposure dose and range of focusing depth in the light-exposure process of the resist layer with ultraviolet light.
摘要翻译：提出了一种用于碱显影光致抗蚀剂组合物的水性显影剂溶液，其除了水溶性有机碱性化合物如四甲基氢氧化铵和阴离子或非离子表面活性剂外，还含有现有技术的开发溶液中的常规成分，无机铵盐如硫酸铵，磷酸铵和硼酸铵。由于这种独特的添加剂，显影剂溶液在通过其显影处理获得的图案化抗蚀剂层上不存在任何浮渣以及线图案化抗蚀剂层的横截面轮廓中的相当好的正交性方面是有利的在抗紫外线的光曝光过程中的曝光剂量和聚焦深度的范围大大提高。

3. 发明申请

US20130337387A1 RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN 审中-公开
标题翻译：耐蚀组合物和形成耐力图案的方法
公开(公告)号：US20130337387A1
公开(公告)日：2013-12-19
申请号：US13868462
申请日：2013-04-23
申请人： Tokyo Ohta Kogyo Co., Ltd.
发明人： Masahito Yahagi , Jun Iwashita
IPC分类号： G03F7/004
CPC分类号： G03F7/004 , G03F7/0045 , G03F7/0382 , G03F7/0392 , G03F7/0397 , G03F7/2041 , G03F7/2059 , G03F7/40
摘要： A resist composition including a base component (A) which generates acid upon exposure and exhibits changed solubility in a developing solution by the action of acid, (A) including (A1) including (a0) and (a2), and the resist composition having a Tf temperature of lower than 170° C. (└La01 represents —COO—, —CON(R′)— or a divalent aromatic group, R′ represents a hydrogen atom or a methyl group, Va01 represents a linear alkylene group of at least 3 carbon atoms, A− represents an anion-containing group, Mm+ represents an organic cation, Ya21 represents a single bond or divalent linking group, La21 represents —O—, —COO—, —CON(R′)— or —OCO—, R′ represents a hydrogen atom or a methyl group, and Ra21 represents a lactone-containing group, a carbonate containing group or an —SO2— containing group.
摘要翻译：一种抗蚀剂组合物，其包含在曝光后产生酸的基础组分（A），并且通过酸作用而在显影液中溶解度变化，（A）包括（A1）（a0）和（a2）），并且所述抗蚀剂组合物具有（◎La01表示-COO-，-CON（R'） - 或二价芳族基团，R'表示氢原子或甲基，Va 01表示直链亚烷基，至少3个碳原子，A-表示含阴离子基团，Mm +表示有机阳离子，Ya21表示单键或二价连接基团，La 21表示-O - ， - COO - ， - CON（R'） - 或-OCO - ，R'表示氢原子或甲基，Ra 21表示含内酯基，含碳酸酯基或-SO 2 - 基团。

4. 发明授权

US08148457B2 Adhesive composition and film adhesive 有权
标题翻译：粘合剂组合物和胶粘剂
公开(公告)号：US08148457B2
公开(公告)日：2012-04-03
申请号：US12514633
申请日：2007-09-26
申请人： Takahiro Asai , Koichi Misumi , Atsushi Miyanari , Yoshihiro Inao , Akihiko Nakamura
发明人： Takahiro Asai , Koichi Misumi , Atsushi Miyanari , Yoshihiro Inao , Akihiko Nakamura
IPC分类号： C08L31/00
CPC分类号： C09J153/00 , C08F212/08 , C08F220/06 , C08F220/18 , C08F290/046 , C08F2220/301 , C09J7/381 , C09J133/10 , C09J133/12 , C09J135/06 , C09J2205/114 , C09J2433/00 , C09J2453/00 , Y10T428/2852 , Y10T428/2891
摘要： Disclosed is an adhesive composition whose component is a polymer obtained by copolymerizing a monomer composition containing styrene, a (meth)acrylic acid ester having a cyclic structure, and an alkyl(meth)acrylate having a chain structure. The monomer composition further contains a carboxylic acid having an ethylene double bond, a bifunctional monomer, and a styrene macromonomer. The polymer has a styrene block segment. This can improve heat resistance, adhesive strength in a high temperature environment, alkaline resistance, and easiness in stripping of an adhesive composition that has been subjected to a high temperature process. As a result, there can be obtained an adhesive composition which has high heat resistance, adhesive strength in a high temperature environment, and alkali resistance, and which can be easily stripped off after the adhesive composition is processed at a high temperature.
摘要翻译：公开了一种粘合剂组合物，其组分是通过共聚包含苯乙烯的单体组合物，具有环状结构的（甲基）丙烯酸酯）和具有链结构的（甲基）丙烯酸烷基酯获得的聚合物。单体组合物还含有具有乙烯双键的羧酸，双官能单体和苯乙烯大分子单体。聚合物具有苯乙烯嵌段。这可以提高耐热性，在高温环境下的粘合强度，耐碱性，以及剥离已经进行高温处理的粘合剂组合物的容易性。结果，可以获得耐热性高，在高温环境下的粘合强度和耐碱性的粘合剂组合物，并且在粘合剂组合物在高温下加工后可以容易地剥离。

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