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1. 发明专利

JP2004048052A Cleaning device for semiconductor wafer and method therefor, and manufacturing method for substrate for microelectronics 有权
标题翻译：用于半导体滤波器的清洁装置及其方法以及用于微电子的基板的制造方法
公开(公告)号：JP2004048052A
公开(公告)日：2004-02-12
申请号：JP2003326406
申请日：2003-09-18
申请人： Scd Mountain View Inc , エスシーディーマウンテンヴューインコーポレイテッド
发明人： MOHINDRA RAJ , BHUSHAN ABHAY , BHUSHAN RAJIV , PURI SURAJ , ANDERSON JOHN H SR , NOWELL JEFFREY
IPC分类号： B08B7/04 , B08B3/10 , G11B23/50 , H01L21/00 , H01L21/027 , H01L21/304 , H01L21/306
CPC分类号： H01L21/02052 , B08B3/10 , G11B23/505 , H01L21/02049 , H01L21/67028 , H01L21/67051 , H01L21/67057 , H01L21/6708 , H01L21/67086 , Y10S134/902
摘要： PROBLEM TO BE SOLVED: To provide a device and a method that actually eliminate particles from a semiconductor substrate or decrease the quantity of the particles, and also effectively clean the substrate. SOLUTION: The cleaning device 10 includes a vessel capable of immersing a wafer with a front surface, a rear surface, and an edge into liquid containing water; a control valve 56 connected to the vessel and capable of forming an environment containing gas adjacent to the front surface and the rear surface substantially without the particle when the liquid is removed without lifting the wafer from the inside of the vessel; and a second control valve 64 connected to the vessel and capable of introducing a cleaning effect enhancing material into the environment containing gas without the particle in the vessel. Then, as a result of the level of the liquid lowered in the vessel with crossing the front surface and the rear surface, the fluid current for separating the stuck liquid from the wafer is accelerated by doping the liquid stuck to the front surface and the rear surface with the cleaning effect enhancing material to cause the concentration gradient of the cleaning effect enhancing material in the stuck liquid. COPYRIGHT: (C)2004,JPO
摘要翻译：要解决的问题：提供实际上从半导体衬底去除颗粒或减少颗粒量的装置和方法，并且还有效地清洁衬底。解决方案：清洁装置10包括能够将具有前表面，后表面和边缘的晶片浸入含有水的液体的容器; 控制阀56，其连接到容器，并且能够在液体被移除时基本上没有颗粒形成包含邻近前表面和后表面的气体的环境，而不将晶片从容器的内部提升; 以及第二控制阀64，其连接到容器并且能够将清洁效果增强材料引入到容纳气体的环境中而不存在容器中的颗粒。然后，由于在与前表面和后表面相交的容器中液体的液面下降的结果，通过将粘附在前表面和后表面上的液体掺杂来加速用于将粘附的液体与晶片分离的流体流具有清洁效果增强材料的表面，以引起粘附液体中的清洁效果增强材料的浓度梯度。版权所有（C）2004，JPO

2. 发明专利

DE69530118T2 未知
公开(公告)号：DE69530118T2
公开(公告)日：2004-05-27
申请号：DE69530118
申请日：1995-11-13
申请人： SCD MOUNTAIN VIEW INC
发明人： MOHINDRA RAJ , BHUSHAN ABHAY , BHUSHAN RAJIV , PURI SURAJ , ANDERSON H , NOWELL JEFFREY
IPC分类号： B08B7/04 , B08B3/10 , G11B23/50 , H01L21/00 , H01L21/027 , H01L21/304 , H01L21/306 , B08B3/04
摘要： A method for cleaning a semiconductor wafer. The method includes immersing a wafer in a liquid having water. The wafer has a front face, a back face, and an edge. The method also includes providing a substantially particle free environment adjacent to the front face and the back face as the liquid is being removed. A step of introducing a carrier gas having a cleaning enhancement substance during the providing step also is included. The cleaning enhancement substance dopes the liquid which is attached to the front face and the back face to cause a concentration gradient of the cleaning enhancement substance in the attached liquid to accelerate fluid flow of the attached liquid off of the wafer.

3. 发明专利

DE69530118D1 未知
公开(公告)号：DE69530118D1
公开(公告)日：2003-04-30
申请号：DE69530118
申请日：1995-11-13
申请人： SCD MOUNTAIN VIEW INC
发明人： MOHINDRA RAJ , BHUSHAN ABHAY , BHUSHAN RAJIV , PURI SURAJ , ANDERSON H , NOWELL JEFFREY
IPC分类号： B08B7/04 , B08B3/10 , G11B23/50 , H01L21/00 , H01L21/027 , H01L21/304 , H01L21/306 , B08B3/04
摘要： A method for cleaning a semiconductor wafer. The method includes immersing a wafer in a liquid having water. The wafer has a front face, a back face, and an edge. The method also includes providing a substantially particle free environment adjacent to the front face and the back face as the liquid is being removed. A step of introducing a carrier gas having a cleaning enhancement substance during the providing step also is included. The cleaning enhancement substance dopes the liquid which is attached to the front face and the back face to cause a concentration gradient of the cleaning enhancement substance in the attached liquid to accelerate fluid flow of the attached liquid off of the wafer.

4. 发明授权

EP0800424B1 ULTRA-LOW PARTICLE SEMICONDUCTOR CLEANER 失效
标题翻译：半导体学报超低颗粒含量条件：清洗
公开(公告)号：EP0800424B1
公开(公告)日：2003-03-26
申请号：EP95939961.9
申请日：1995-11-13
申请人： SCD Mountain View, Inc.
发明人： MOHINDRA, Raj , BHUSHAN, Abhay , BHUSHAN, Rajiv , PURI, Suraj , ANDERSON, John, H., Sr. , NOWELL, Jeffrey
IPC分类号： B08B3/04 , H01L21/00
CPC分类号： H01L21/02052 , B08B3/10 , G11B23/505 , H01L21/02049 , H01L21/67028 , H01L21/67051 , H01L21/67057 , H01L21/6708 , H01L21/67086 , Y10S134/902
摘要： A method (400) for cleaning a semiconductor wafer. The method includes immersing (420) a wafer in a liquid comprising water. The wafer has a front face, a back face, and an edge. The method also includes providing a substantially particle free environment adjacent to the front face and the back face as the liquid is being removed. A step of introducing a carrier gas comprising a cleaning enhancement substance during the providing step (450) also is included. The cleaning enhancement substance dopes the liquid which is attached to the front face and the back face to cause a concentration gradient of the cleaning enhancement substance in the attached liquid to accelerate fluid flow of the attached liquid off of the wafer.

5. 发明申请

US20020043272A1 Ultra-low particle semiconductor cleaner 失效
公开(公告)号：US20020043272A1
公开(公告)日：2002-04-18
申请号：US10014113
申请日：2001-12-11
申请人： SCD Mountain View, Inc.
发明人： Raj Mohindra , Abhay Bhushan , Rajiv Bhushan , Suraj Puri , John H. Anderson SR. , Jeffrey Nowell
IPC分类号： B08B003/00
CPC分类号： H01L21/02052 , B08B3/10 , G11B23/505 , H01L21/02049 , H01L21/67028 , H01L21/67051 , H01L21/67057 , H01L21/6708 , H01L21/67086 , Y10S134/902
摘要： A method (400) for cleaning a semiconductor wafer. The method includes immersing (420) a wafer in a liquid comprising water. The wafer has a front face, a back face, and an edge. The method also includes providing a substantially particle free environment adjacent to the front face and the back face as the liquid is being removed. A step of introducing a carrier gas comprising a cleaning enhancement substance during the providing step (450) also is included. The cleaning enhancement substance dopes the liquid which is attached to the front face and the back face to cause a concentration gradient of the cleaning enhancement substance in the attached liquid to accelerate fluid flow of the attached liquid off of the wafer.

6. 发明授权

US6047717A Mandrel device and method for hard disks 失效
标题翻译：心轴设备和硬盘方法
公开(公告)号：US6047717A
公开(公告)日：2000-04-11
申请号：US69887
申请日：1998-04-29
申请人： Rajiv Bhushan , Ru Chang , Raj Mohindra , Vincent Chiu , Dong T. Tran
发明人： Rajiv Bhushan , Ru Chang , Raj Mohindra , Vincent Chiu , Dong T. Tran
IPC分类号： B08B11/02 , G11B23/00 , G11B33/04 , H01L21/673 , B08B3/00 , A47G19/08 , B23Q1/00 , B65G59/00 , F16M11/00
CPC分类号： G11B23/00 , B08B11/02 , G11B33/0461 , Y10S134/902 , Y10S414/121
摘要： An improved mandrel device (100) and method. The mandrel device (100) has an elongated member (117) for supporting a plurality of hard disks, for example. The elongated member (117) includes an inner member (107) that is defined between a pair of outer members (105), where each of the members have ridges (103) defined thereon. The combination of these members and ridges are used to support a plurality of disks that do not touch each other during, for example transportation.
摘要翻译：改进的心轴装置（100）和方法。心轴装置（100）具有例如用于支撑多个硬盘的细长构件（117）。细长构件（117）包括限定在一对外部构件（105）之间的内部构件（107），其中每个构件具有限定在其上的脊（103）。这些构件和脊的组合用于支撑在例如运输期间彼此不接触的多个盘。

7. 发明授权

US6045621A Method for cleaning objects using a fluid charge 有权
标题翻译：使用流体充电清洁物体的方法
公开(公告)号：US6045621A
公开(公告)日：2000-04-04
申请号：US179540
申请日：1998-10-26
申请人： Suraj Puri , Raj Mohindra
发明人： Suraj Puri , Raj Mohindra
IPC分类号： B08B3/04 , G11B23/50 , H01L21/00
CPC分类号： H01L21/67028 , B08B3/04 , G11B23/505 , Y10S134/902
摘要： A method for cleaning an object. The method (400) includes immersing (420) an object in a liquid comprising water, which can be ultra-clean. The object has a front face, a back face, and an edge. The method includes providing (450) a cleaning enhancement substance (e.g., trace amount of polar organic compound, surfactant, ammonia bearing compound) into the liquid. In one embodiment, the cleaning enhancement substance can form a liquid film, such as a monolayer overlying an upper surface or level of the liquid. The method also includes providing a substantially particle free environment (e.g., ultra-clean gas, ultra-clean non-reactive gas) adjacent to the front face and the back face of the object as the liquid including the cleaning enhancement substance is being removed.
摘要翻译：清洁物体的方法。方法（400）包括将物体浸入（420）包含水的液体中，其可以是超洁净的。该物体具有前表面，后表面和边缘。该方法包括向液体中提供（450）清洁增强物质（例如痕量的极性有机化合物，表面活性剂，含氨化合物）。在一个实施方案中，清洁增强物质可以形成液膜，例如覆盖在液体的上表面或水平上的单层。该方法还包括当除去包括清洁增强物质的液体时，提供与物体的正面和背面相邻的基本上无颗粒的环境（例如，超洁净气体，超清洁非反应性气体）。

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