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1. 发明申请

WO1998009715A1 METHOD OF TREATING EXHAUST GASES CONTAINING HALOGEN BASED COMPOUND 审中-公开
标题翻译：处理含有卤化物的废气的处理方法
公开(公告)号：WO1998009715A1
公开(公告)日：1998-03-12
申请号：PCT/JP1997003050
申请日：1997-09-01
申请人： DAIKIN INDUSTRIES LTD. , OMI, Tadahiro , HONDA, Yoshitaka
发明人： DAIKIN INDUSTRIES LTD.
IPC分类号： B01D53/68
CPC分类号： B01D53/68 , B01D53/685
摘要： A method of treating exhaust gases containing a halogen based compound characterized by contacting exhaust gases, which contain a halogen based compound such as a halogen gas and/or a halogenated hydrogen gas (halogenated acid gas), with a simple metal. It is possible to effectively remove a halogen based compound such as acid gas and halogen gas from the exhaust gases.
摘要翻译：一种处理含有卤素系化合物的废气的方法，其特征在于，将含有诸如卤素气体和/或卤化氢气（卤化酸气体）的卤素系化合物的废气与简单的金属接触。可以从废气中有效地除去卤素类化合物，例如酸性气体和卤素气体。

2. 发明专利

IL128594D0 Gasket and pipe joint 未知
公开(公告)号：IL128594D0
公开(公告)日：2000-01-31
申请号：IL12859499
申请日：1999-02-18
申请人： OMI TADAHIRO , FUJIKIN KK
IPC分类号： F16L19/03 , C22C38/00 , C22C38/44 , F16J15/08 , F16L19/02 , F16L
摘要： A pipe joint comprises a pair of tubular joint members (10,11), an annular gasket (13) interposed between opposed end faces of the two joint members, and threaded means for joining the two joint members. Each of the joint members is prepared from a stainless steel having a surface with a Vickers hardness of at least 300. The gasket is prepared from a stainless steel comprising, in ratio by weight, 12.90 to 15.00% of Ni, 16.50 to 18.00% of Cr, 2.00 to 3.00% of Mo, up to 0.02% of C, up 0.30% of Si, up to 0.40% of Mn, up to 0.03% of P, up to 0.003% of S, up to 0.25% of Cu and up to 0.01% of Al, the gasket having a surface with a Vickers hardness of 90 to 160.

3. 发明授权

EP0963779B1 METHOD OF TREATING EXHAUST GASES CONTAINING HALOGEN BASED COMPOUND 失效
标题翻译：法废气与含卤化合物处理
公开(公告)号：EP0963779B1
公开(公告)日：2005-11-30
申请号：EP97937860.1
申请日：1997-09-01
申请人： DAIKIN INDUSTRIES, LIMITED , Omi, Tadahiro
发明人： OMI, Tadahiro , HONDA, Yoshitaka, Yodogawa Works of
IPC分类号： B01D53/68 , B01J20/02
CPC分类号： B01D53/68 , B01D53/685

4. 发明公开

EP0963779A1 METHOD OF TREATING EXHAUST GASES CONTAINING HALOGEN BASED COMPOUND 失效
标题翻译： VERFAHREN ZUR BEHANDLUNG VON ABGASEN麻醉剂HALOGEN ENTHALTENDER VERBINDUNG
公开(公告)号：EP0963779A1
公开(公告)日：1999-12-15
申请号：EP97937860.1
申请日：1997-09-01
申请人： DAIKIN INDUSTRIES, LIMITED , Omi, Tadahiro
发明人： OMI, Tadahiro , HONDA, Yoshitaka, Yodogawa Works of
IPC分类号： B01D53/68 , B01J20/02
CPC分类号： B01D53/68 , B01D53/685
摘要： A method of treating exhaust gases containing halogen compound, the improvement in that the exhaust gases containing halogen compounds such as halogen gases and/or hydrogen halide gases (halogenated acid gases) are brought into contact with simple metals.
The halogen compounds such as acid gases and halogen gases can thereby effectively be removed from the exhaust gases.
摘要翻译：一种处理含有卤素化合物的废气的方法，其中含有卤素化合物如卤素气体和/或卤化氢气体（卤化酸性气体）的废气与简单的金属接触。因此，可以有效地从排气中除去卤素化合物如酸性气体和卤素气体。

5. 发明专利

JP2005240494A Support device 审中-公开
标题翻译：支持设备
公开(公告)号：JP2005240494A
公开(公告)日：2005-09-08
申请号：JP2004054419
申请日：2004-02-27
申请人： Omi Tadahiro , Taisei Corp , 大成建設株式会社 , 大見忠弘
发明人： SAITO MAKOTO
IPC分类号： E02D27/01 , E04G25/00
摘要： PROBLEM TO BE SOLVED: To increase the construction accuracy of a joint placement part of a concrete slab.
SOLUTION: This support device 100 supporting the joint placement part of the concrete slab comprises a screw bolt 104 having a spiral groove formed at one end thereof over a specified distance so that the depth of threading can be adjusted, a C-shape steel 101 threaded to the groove and supporting a concrete during placing on a support surface having a support position in the axial direction of the screw bolt 104 adjusted by the groove, and a reception metal fitting 103 fixing the other end of the screw bolt 104.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提高混凝土板的接合放置部分的施工精度。解决方案：支撑混凝土板的接合放置部分的支撑装置100包括螺栓104，该螺栓104的一端形成有一定长度的螺旋槽，从而可以调节螺纹的深度，C形钢101与螺纹连接并在支撑表面上支撑混凝土，该支撑表面具有由所述槽调节的螺钉104的轴向方向的支撑位置，以及固定螺栓104的另一端的接收金属配件103。版权所有（C）2005，JPO＆NCIPI

6. 发明专利

JP2003224079A HEAT TREATING METHOD, HEAT TREATING DEVICE AND MANUFACTURING METHOD FOR SILICON EPITAXIAL WAFER 审中-公开
公开(公告)号：JP2003224079A
公开(公告)日：2003-08-08
申请号：JP2002023684
申请日：2002-01-31
申请人： SHINETSU HANDOTAI KK , OMI TADAHIRO
发明人： KANETANI KOICHI , NISHIZAWA TAKESHI , OMI TADAHIRO , SUGAWA SHIGETOSHI
IPC分类号： H01L21/677 , H01L21/205 , H01L21/324 , H01L21/68
摘要： PROBLEM TO BE SOLVED: To provide a heat treating method capable of reducing the amount of brought-in moisture to a heat treating chamber (reaction chamber), a heat treating device and a manufacturing method for a silicon epitaxial wafer. SOLUTION: The heat treating method is for executing a heat treatment to a silicon single crystal substrate W by using a heat treating device 10 provided with a load lock chamber 20, a heat treating chamber 30, and a transfer chamber 40 for transferring the silicon single crystal substrate W between the load lock chamber 20 and the heat treating chamber 30. After performing work for enabling the atmosphere outside the heat treating device 10 to flow into the transfer chamber 40, a transfer chamber inner wall heating process is executed for heating the inner wall of the transfer chamber 40 to a temperature lower than the temperature of the heat treatment performed in the heat treating chamber 40. Thereafter, the silicon single crystal substrate W inside the load lock chamber 20 is carried through the transfer chamber 40 to the heat treating chamber 30, and the heat treatment is performed in the heat treating chamber 30. COPYRIGHT: (C)2003,JPO

7. 发明专利

JP2003214671A CLEAN ROOM 审中-公开
公开(公告)号：JP2003214671A
公开(公告)日：2003-07-30
申请号：JP2002014906
申请日：2002-01-24
申请人： OMI TADAHIRO , KUMAGAI GUMI CO LTD
发明人： OMI TADAHIRO , YAMADA TAKAHISA , SUMIHAMA HIROSHI , NAKAZAWA KATSUNORI , SUZUKI HIROKAZU , MURAOKA KENJI , MIURA MASAYASU
IPC分类号： E04F13/07 , E04F13/00 , E04F13/08 , E04F15/18 , E04H5/02 , F24F7/06
摘要： PROBLEM TO BE SOLVED: To solve a problem of a conventional clean room, wherein anti-static measures for walls and floors are not sufficiently made, so they are electrically charged, dusts accumulate due to static charge, a static electricity spark causes organic reaction, and then gas generate, causing problems in manufacturing semiconductors. SOLUTION: This clean room has a conductive sheet floor finishing material (conductive vinyl chloride sheet 4) extending to a wall substrate surface (2), and has a conductive sheet wall finishing material (conductive cloth 5) through which electricity is conducted to the sheet floor finishing material extending to the wall substrate surface. COPYRIGHT: (C)2003,JPO

8. 发明专利

JP2003213952A STRUT BASE WRAPPER FOR CLEAN ROOM 审中-公开
公开(公告)号：JP2003213952A
公开(公告)日：2003-07-30
申请号：JP2002014925
申请日：2002-01-24
申请人： OMI TADAHIRO , KUMAGAI GUMI CO LTD
发明人： OMI TADAHIRO , YAMADA TAKAHISA , SUMIHAMA HIROSHI , NAKAZAWA KATSUNORI , SUZUKI HIROKAZU , MURAOKA KENJI , MIURA MASAYASU
IPC分类号： E04B1/24 , E04H5/02
摘要： PROBLEM TO BE SOLVED: To solve a problem of a conventional clean room base wrapper, the problem being caused by non-conduction thereof to a steel strut and difficult grounding of current charged on a surface of the steel strut, resulting in stagnation of electric charge on the surface of the steel strut and adverse effect on semiconductor production, etc. SOLUTION: There is provided a new strut base wrapper 1 for the clean room, which consists of a base wrapping frame 2, and base wrapping concrete 5. The base wrapping frame 2 is formed of an electric conductor, and encloses the periphery of a base of the strut 42 in a manner being spaced away from the strut so as to form a space in which concrete is placed. The base wrapping concrete 5 is placed in the space between the base wrapping frame 2 and the strut 42. An inner side of the base wrapping frame 2 is electrically connected to the strut 42 via a conductive rod 4. Further, a surface of the strut, a floor surface, and an upper surface of the base wrapping concrete are subjected to conductive treatment, and the strut surface and the floor surface which have been subjected to the conductive treatment are brought into conduction with each other via the upper surface of the base wrapping concrete which has been subjected to the conductive treatment, and the conductive base wrapping frame. COPYRIGHT: (C)2003,JPO

9. 发明专利

JP2003213917A PERFORATED FLOOR OF CLEAN ROOM 审中-公开
公开(公告)号：JP2003213917A
公开(公告)日：2003-07-30
申请号：JP2002014936
申请日：2002-01-24
申请人： OMI TADAHIRO , KUMAGAI GUMI CO LTD
发明人： OMI TADAHIRO , SUZUKI HIROKAZU , MURAOKA KENJI , MIURA MASAYASU
IPC分类号： E04H5/02 , E04F15/024 , E04F15/18
摘要： PROBLEM TO BE SOLVED: To solve such a problem that in a perforated floor of conventional clean rooms, since the end of each perforated floor plate forming the perforated floor is not electrically connected, the floor can not shade electromagnetic waves of a high frequency band. SOLUTION: In the perforated floor of a clean room in which a plurality of perforated floor plates 1 constituted of a conductive body having a plurality of formed holes are laid so as to arrange side by side. The external peripheral end of adjacent perforated floor plates 1 are electrically connected by a shield gasket 4, and the corner 6 of each perforated floor plate 1 is fixedly screwed in a metallic base piece 5 through a shield packing 7. In this way, each perforated floor plate 1 is electrically connected to a steel joist 60. COPYRIGHT: (C)2003,JPO

10. 发明专利

JP2003213812A INTERIOR SYSTEM FOR CLEAN ROOM 审中-公开
公开(公告)号：JP2003213812A
公开(公告)日：2003-07-30
申请号：JP2002016255
申请日：2002-01-24
申请人： OMI TADAHIRO , HITACHI PLANT ENG & CONSTR CO , TAKASAGO THERMAL ENGINEERING , BENITSUKUSU KK
发明人： OMI TADAHIRO , SHIRAI YASUYUKI , HANAOKA HIDEO , KOBAYASHI KIKUJI , HONMA TAKESHI , SHIBATA KUNIHIRO , SAITO KAZUO , KUDO MASAMITSU , TOMIKAWA SHINOBU , SAIRENJI AKIRA
IPC分类号： E04B1/92
摘要： PROBLEM TO BE SOLVED: To provide an interior system for a clean room ensuring electromagnetic wave shielding by positively carrying out electrical connection at a joint part between panels in constructing the clean room with interior panels. SOLUTION: Rubber vibration insulators are interposed at the joint parts of a floor panel, a wall panel and a ceiling panel constituting the interior material of the clean room, and the panels are jointed by electromagnetic shielding plates across the rubber vibration insulators while connecting them to construct the clean room as rigid structure, and the clean room of rigid structure is constructed interposing the rubber vibration insulators at the internal wall surface of a building wall finishing material. The electromagnetic wave shielding plate is stuck to the building finishing material, and a spring member made of a conductive material is interposed with a space between the interior panel and the electromagnetic wave shielding plate to construct the clean room. The electromagnetic wave shielding plate is formed of a Galvalume Steel Sheet (R), and the spacing for fixing the electromagnetic wave shielding plate to the other electromagnetic wave shielding plate is set to the multiple of the wavelength or less on the basis of frequency centering on the electromagnetic wave to be shielded. COPYRIGHT: (C)2003,JPO

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