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    • 3. 发明申请
    • SELF-CENTERING ELECTROMAGNETIC TRANSDUCERS
    • 自中心电磁传感器
    • WO2014165790A1
    • 2014-10-09
    • PCT/US2014/033020
    • 2014-04-04
    • L-3 COMMUNICATIONS CINCINNATI ELECTRONICS CORPORATION
    • FIEDLER, Andreas
    • H02K1/06
    • H02K33/16H02K35/02
    • Self-centering electromagnetic transducers, such as linear motors and generators, are disclosed. In one embodiment, an electromagnetic transducer includes an outer yoke made of a ferromagnetic material, and a coil assembly including a plurality of loops of electrically conductive wire, wherein the coil assembly is substantially surrounded by the outer yoke. The electromagnetic transducer further includes a magnet, and an inner yoke made of ferromagnetic material. The magnet is disposed within the outer yoke such that the coil assembly surrounds the magnet. The inner yoke is disposed within the magnet, and the magnet is free to translate. The electromagnetic transducer further includes at least one high-reluctance zone positioned within the outer yoke and/or the inner yoke. In some embodiments, the electromagnetic transducer includes one or more actuators that vary a width of one or more high-reluctance zones to change a spring rate of the electromagnetic transducer.
    • 公开了诸如线性电机和发电机的自定心电磁换能器。 在一个实施例中,电磁换能器包括由铁磁材料制成的外磁轭以及包括多个导电线环的线圈组件,其中线圈组件基本上被外磁轭包围。 电磁换能器还包括磁铁和由铁磁材料制成的内磁轭。 磁体设置在外磁轭内,使得线圈组件围绕磁体。 内轭设置在磁体内,磁体自由平移。 电磁换能器还包括位于外磁轭和/或内磁轭内的至少一个高磁阻区。 在一些实施例中,电磁换能器包括一个或多个致动器,其改变一个或多个高磁阻区域的宽度以改变电磁换能器的弹簧刚度。
    • 5. 发明公开
    • TUNNELING BARRIER INFRARED DETECTOR DEVICES
    • INFRAROTDETEKTOREN,DIE AUF EINER TUNNELBARRIERE BASIEREN
    • EP2933845A2
    • 2015-10-21
    • EP15163706.3
    • 2015-04-15
    • L-3 Communications Cincinnati Electronics Corporation
    • Wei, Yajun
    • H01L31/101H01L31/0352
    • H01L31/035263H01L31/022408H01L31/03046H01L31/035209H01L31/035236H01L31/035272H01L31/101H01L31/1013H01L31/109H01L31/1844Y02E10/544
    • Infrared detector devices incorporating a tunneling structure are disclosed. The infrared detector device includes a first contact layer (110), an absorber layer (120) adjacent to the first contact layer, and a tunneling structure (133) including a barrier layer (130) adjacent to the absorber layer (120) and a second contact layer (140) adjacent to the barrier layer. The barrier layer has a tailored valence band offset such that a valence band offset of the barrier layer at the interface between the absorber layer and the barrier layer is substantially aligned with the valence band offset of the absorber layer, and the valence band offset of the barrier layer at the interface between the barrier layer and the second contact layer is above a conduction band offset of the second contact layer (140). Such infrared detector devices have a low dark current, low required bias voltage and a high operating temperature.
    • 公开了结合隧道结构的红外检测器装置。 红外检测器装置包括第一接触层(110),与第一接触层相邻的吸收层(120)和包括邻近吸收层(120)的阻挡层(130)的隧道结构(133) 与所述阻挡层相邻的第二接触层(140)。 阻挡层具有定制的价带偏移,使得阻挡层在吸收层和阻挡层之间的界面处的价带偏移基本上与吸收层的价带偏移对准,并且 在阻挡层和第二接触层之间的界面处的阻挡层高于第二接触层(140)的导带偏移。 这种红外检测器件具有低暗电流,低所需偏置电压和高工作温度。
    • 7. 发明公开
    • Diode barrier infrared detector devices and superlattice barrier structures
    • Diodenbarrieren-Infrarotdetechtorvorrichtung undÜbergitter-Barrierenstrukturen
    • EP2802018A3
    • 2015-04-29
    • EP14167441.6
    • 2014-05-07
    • L-3 Communications Cincinnati Electronics Corporation
    • Wei, Yajun
    • H01L31/101H01L31/0352H01L31/0304
    • H01L31/035236H01L31/02005H01L31/03046H01L31/101Y02E10/544
    • Diode barrier infrared detector devices and superlattice barrier structures are disclosed. In one embodiment, a diode barrier infrared detector device (100) includes a first contact layer (110), an absorber layer (120) adjacent to the first contact layer, and a barrier layer (130) adjacent to the absorber layer, and a second contact layer (140) adjacent to the barrier layer. The barrier layer includes a diode structure formed by a p-n junction (137) formed within the barrier layer. The barrier layer may be such that there is substantially no barrier to minority carrier holes. In another embodiment, a diode barrier infrared detector device includes a first contact layer, an absorber layer adjacent to the first contact layer, a barrier layer adjacent to the absorber layer, and a diode structure adjacent to the barrier layer. The diode structure includes a second contact layer. The diode structure formed within or adjacent to the barrier layer provides for a built-in electric field for close to zero bias optical turn on and limits the depletion region within the barrier layer within small bias range.
    • 公开了二极管屏障红外探测器和超晶格屏障结构。 在一个实施例中,二极管屏障红外检测器装置(100)包括第一接触层(110),与第一接触层相邻的吸收层(120)和与吸收层相邻的阻挡层(130) 与所述阻挡层相邻的第二接触层(140)。 阻挡层包括由形成在阻挡层内的p-n结(137)形成的二极管结构。 阻挡层可以使得对少数载流子孔基本上没有阻挡。 在另一个实施例中,二极管屏障红外检测器件包括第一接触层,与第一接触层相邻的吸收层,与吸收层相邻的阻挡层,以及与阻挡层相邻的二极管结构。 二极管结构包括第二接触层。 形成在阻挡层内或邻近势垒层的二极管结构为接近零偏压的光导通提供了内置的电场,并且在小的偏置范围内限制了阻挡层内的耗尽区。
    • 8. 发明公开
    • Superlattice structures for unipolar infrared detector devices
    • Übergitter-Strukturenfürunipolare Infrarot-Detektoren
    • EP2819180A2
    • 2014-12-31
    • EP14173917.7
    • 2014-06-25
    • L-3 Communications Cincinnati Electronics Corporation
    • Wei, Yajun
    • H01L31/101H01L31/0352
    • H01L31/035236H01L31/03046H01L31/101Y02E10/544
    • Embodiments of strain-balanced superlattice infrared detector devices and their fabrication are disclosed. In one embodiment, an infrared detector device (100) includes a first contact layer (110), an absorber superlattice region (120), a wider gap unipolar barrier region (130), and a second contact layer (140). The absorber superlattice region has a period (121) defined by a first InAs layer (122), strain-balancing structure (124), a second InAs layer (126), and an InAsSb layer (128). The strain-balancing structure (124) comprises an arbitrary alloy layer sequence containing at least one constituent element of aluminum or phosphor, e.g. InGaAs, AlInAs, InAsP. In another embodiment, the absorber superlattice region has a period defined by a first InAs layer, first strain-balancing structure, a second InAs layer, a first GaSb layer, a second strain-balancing structure, and a second GaSb layer. The first strain-balancing structure includes at least one constituent element of aluminum or phosphor, e.g. InGaAs, AlInAs, InAsP. The second strain-balancing structure includes GaInSb and GaSb.
    • 公开了应变平衡超晶格红外检测器件及其制造的实施例。 在一个实施例中,红外检测器装置(100)包括第一接触层(110),吸收体超晶格区域(120),较宽的间隙单极性阻挡区域(130)和第二接触层(140)。 吸收体超晶格区具有由第一InAs层(122),应变平衡结构(124),第二InAs层(126)和InAsSb层(128)限定的周期(121)。 应变平衡结构(124)包括含有至少一种铝或磷光体构成元素的任意合金层序列。 InGaAs,AlInAs,InAsP。 在另一个实施例中,吸收体超晶格区域具有由第一InAs层,第一应变平衡结构,第二InAs层,第一GaSb层,第二应变平衡结构和第二GaSb层限定的周期。 第一应变平衡结构包括铝或磷光体的至少一种构成元素, InGaAs,AlInAs,InAsP。 第二应变平衡结构包括GaInSb和GaSb。