会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 1. 发明专利
    • ION COLLECTING ELECTRODE FOR TOTAL-PRESSURE COLLECTOR
    • JPH1140099A
    • 1999-02-12
    • JP7468598
    • 1998-03-23
    • LEYBOLD INFICON INC
    • HOLKEBOER DAVID HFREES LOUIS C
    • G01N27/62H01J49/04H01J49/06
    • PROBLEM TO BE SOLVED: To provide a total-pressure collector that blocks the adverse effects of secondary electron currents liable to deteriorate the total performance of a mass spectrometer for detecting various types of ion, by directing secondary electrons away from an ion measuring device as used for a dual ion or other ion source. SOLUTION: A mass-spectrometer gas analysis device 1 includes an ion source 16 for producing ions of sample gas in a specified capacity. The first part of the ions produced is recovered and analyzed by an ion analyzer 18, which then determines a partial pressure on selected types of gas in the sample gas. The second part of the ions is recovered by an ion collector 22 on the other side, which then determines a total pressure on the sample gas. The collecting surface of the collector 22 is oriented in relation to incident ion beams for the recovery of ionic currents, and is designed to deflect the substantial part of plural secondary electrons generated by ion collisions as a result of the usage of the collector 22 way below the ionization capacity. The partial pressure is thus determined by the analyzer 18 receiving no secondary electrons.
    • 3. 发明专利
    • CONTROL CIRCUIT FOR EVAPORATION MONITOR
    • JPH03221806A
    • 1991-09-30
    • JP33346490
    • 1990-11-29
    • LEYBOLD INFICON INC
    • KURARENSU HAADO
    • G01B17/02C23C14/54G01B7/06G01R23/07G01R29/22
    • PURPOSE: To accurately control film thickness by, while connected to a signal generating means and a phase detection means, controlling a drive signal and a response signal and providing a control means which detects at least one resonance frequency. CONSTITUTION: Based on the frequency direction from a micro controller 33, a sine wave of accurate frequency and phase is formed at a digital synthesizer 35, and is supplied to a crystal 12 through a multiplier circuit 23. A reactance from the crystal 12 is, through amplification (25), sent to a phase detector 26. At the same time, a synthesized RF wave is supplied to the detector 26 as a reference signal, through a reference amplification limit magnetism 27. At the detector 26, phase shift is accurately measured. When the synthesized signal is scanned through a crystal resonance frequency, an intermittent signal is generated. At an output driver circuit 29, the phase signal which is sent to an A/D converter 37 as a voltage is adjusted. In the controller 33, a program is provided to control the frequency and phase of the synthesizer 35, and the crystal 12 is kept in oscillation wave mode.
    • 4. 发明专利
    • ACOUSTIC CONSUMPTION MONITOR
    • JPH11172453A
    • 1999-06-29
    • JP21456698
    • 1998-07-29
    • LEYBOLD INFICON INC
    • GOGOL CARL A JRWAJID ABDULRUBLOFF GARY
    • G01N33/00C23C16/44C23C16/52G01N1/00G01N25/00G01N29/02
    • PROBLEM TO BE SOLVED: To determine discharged reacted and unreacted by-products, to quantitatively derive the reaction efficiency of a chemical vapor growth reactor and to continuously determine the growth rate and thickness of thin films by measuring the gaseous compsn. in the outlet of reactor and determining the reaction part ratio of a precursor material from the gaseous compsns. in the inlet and outlet of the reactor. SOLUTION: The carrier gas from a gas cylinder 20 passes through a mass flow rate controller 24, then through the precursor material in a foam box 22, picks up the precursor material and flows from a head gap 23. The dilute stream of the gas carried to the mass flow rate controller 24 by a parallel circuit is mixed with the gaseous stream and is introduced to the reactor 10 where the thin films are grown on a substrate 30. At this time, the gaseous mixture is passed through an acoustic cell 40 near the inlet port 16 of the reactor 10 and the compsn. is calculated. As a result, the compsn. of the gaseous mixture may be controlled. Simultaneously, the compsn. of the gas to be discharged is calculated by an acoustic cell 50 near the outlet port 18 of the reactor 10 and the reaction part ratio is determined from the compsns. of both gases.
    • 9. 发明专利
    • METHOD OF CORRECTING PARTIAL PRESSURE MEASUREMENT IN MASS SPECTROMETER
    • JPH1131473A
    • 1999-02-02
    • JP7468698
    • 1998-03-23
    • LEYBOLD INFICON INC
    • HOLKEBOER DAVID HELLEFSON ROBERT E
    • G01N27/62H01J49/02H01J49/26H01J49/42
    • PROBLEM TO BE SOLVED: To correction flow data over a wide range of gas pressure by measuring a partial pressure ion flow after deciding measurement full pressure, and using a correction factor, which is decided on the basis of the measurement full pressure ion flow, so as to correct the measurement partial pressure. SOLUTION: A full pressure collector 11 computes the full pressure of a gas mixture as a target, and the ion generated in an ion source 2 is filled as a focus beam into a quadrupole filter 6. In this case, rods, which are arranged opposite to the quadrupole filter 6, are electrically connected to each other, and the ion is directed in a direction in parallel with the longitudinal direction of the rods in a space between the electrodes, and separated by the lateral force generated by the electric potential, which is applied to the electrodes, in response to a ratio of mass to charge. The ion flow is transmitted to an ion detecting element 8, and the measured ion flow is related to the partial pressure (a partial pressure of a specified chemical component of the gas mixture), and a correction factor, which is decided on the basis of the full pressure ion flow, is used so as to correct the measurement partial pressure.