专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

WO2023061651A1 METHODS OF DETERMINING ABERRATIONS OF A CHARGED PARTICLE BEAM, AND CHARGED PARTICLE BEAM SYSTEM 审中-公开
公开(公告)号：WO2023061651A1
公开(公告)日：2023-04-20
申请号：PCT/EP2022/073953
申请日：2022-08-29
申请人： ICT INTEGRATED CIRCUIT TESTING GESELLSCHAFT FÜR HALBLEITERPRÜFTECHNIK MBH
发明人： EHBERGER, Dominik , BREUER, John , FIRNKES, Matthias
IPC分类号： H01J37/153 , H01J37/28
摘要： A method of determining aberrations of a charged particle beam (11) focused by a focusing lens (120) toward a sample (10) in a charged particle beam system is described. The method includes: (a) taking one or more images of the sample at one or more defocus settings to provide one or more taken images (h1...N); (b) simulating one or more images of the sample taken at the one or more defocus settings based on a set of beam aberration coefficients (iC) and a focus image of the sample to provide one or more simulated images; (c) comparing the one or more taken images and the one or more simulated images for determining a magnitude (Ri) of a difference therebetween; and (d) varying the set of beam aberration coefficients (*C) to provide an updated set of beam aberration coefficients (i+1C) and repeating (b) and (c) using the updated set of beam aberration coefficients (i+1C) in an iterative process for minimizing said magnitude (Ri). Alternatively, in (b), one or more beam cross sections may be simulated, and, in (c) the simulated beam cross sections may be compared with one or more retrieved beam cross sections retrieved from the one or more taken images for determining a magnitude (Ri) of a difference therebetween. Further, a charged particle beam system for imaging and/or inspecting a sample that is configured for any of such methods is provided.

2. 发明申请

WO2005024890A1 CHARGED PARTICLE BEAM ENERGY WIDTH REDUCTION SYSTEM FOR CHARGED PARTICLE BEAM SYSTEM 审中-公开
标题翻译：充电粒子束能量减少系统的充电粒子束系统
公开(公告)号：WO2005024890A1
公开(公告)日：2005-03-17
申请号：PCT/EP2004/009802
申请日：2004-09-02
申请人： ICT INTEGRATED CIRCUIT TESTING GESELLSCHAFT FÜR HALBLEITERPRÜFTECHNIK MBH , FROSIEN, Jürgen , DEGENHARDT, Ralf , LANIO, Stefan
发明人： FROSIEN, Jürgen , DEGENHARDT, Ralf , LANIO, Stefan
IPC分类号： H01J37/153
CPC分类号： H01J37/05 , H01J37/153 , H01J2237/057 , H01J2237/1534
摘要： The present invention provides a charged particle beam energy width reduction system. The system comprises a first element (110) acting in a focusing and dispersive manner in an x-z-plane; a second element (112) acting in a focusing and dispersive manner in the x-z-plane; a charged particle selection element (116; 116a; 116b) positioned between the first and the second element acting in a focusing and dispersive manner; and a focusing element (114; 314, 712; 714) positioned between the first and the second element acting in a focusing and dispersive manner.
摘要翻译：本发明提供一种带电粒子束能量减少系统。该系统包括以x-z平面聚焦和分散的方式起作用的第一元件（110）在x-z平面中以聚焦和分散方式起作用的第二元件（112）; 位于第一和第二元件之间的带电粒子选择元件（116; 116a; 116b）以聚焦和分散方式起作用; 以及位于第一和第二元件之间的以聚焦和分散方式起作用的聚焦元件（114; 314,712; 714）。

3. 发明申请

WO2004097378A1 APPARATUS AND METHOD FOR INSPECTING A SAMPLE OF A SPECIMEN BY MEANS OF AN ELECTRON BEAM 审中-公开
标题翻译：通过电子束检测样品样品的装置和方法
公开(公告)号：WO2004097378A1
公开(公告)日：2004-11-11
申请号：PCT/EP2004/004402
申请日：2004-04-26
申请人： ICT, INTEGRATED CIRCUIT TESTING GESELLSCHAFT FÜR HALBLEITERPRÜFTECHNIK MBH , FEUERBAUM, Hans-Peter
发明人： FEUERBAUM, Hans-Peter
IPC分类号： G01N1/32
CPC分类号： G01N1/32 , H01J37/28 , H01J37/3056 , H01J2237/20 , H01J2237/31745
摘要： The invention refers to an apparatus (10) for inspecting a sample (12) of a specimen (14) by means of an electron beam (34) comprising a vacuum chamber (18); an ion beam device (20) for generating an ion beam (22) used for etching a sample (12) from the specimen (14) within said vacuum chamber (18); an electron beam device (30) having a scanning unit (32) for scanning the electron beam (34) across said specimen (14) within said vacuum chamber (18); said electron beam device (30) having a first detector (36) positioned to detect electrons (38) that are released from the specimen (14) in a backward direction with respect to the direction of the electron beam (34); and said electron beam device (30) having a second detector (40) positioned to detect electrons (42) that are released from the sample (12) of the specimen (14) in a forward direction with respect to the direction of the electron beam (34); and separation means (50; 52) within said vacuum chamber (18) to separate the sample (12) from the specimen (14) for the inspection of the sample (12) by means of the second detector (40). With the apparatus according to the invention, it is possible to perfom a transmission inspection of a sample of a specimen, e.g. a thin slice of a semiconductor wafer, at a high throughput at comparably low costs.
摘要翻译：本发明涉及一种用于通过包括真空室（18）的电子束（34）检查试样（14）的样品（12）的装置（10）。用于产生用于在所述真空室（18）内从样品（14）蚀刻样品（12）的离子束（22）的离子束装置（20）; 具有扫描单元（32）的电子束装置（30），用于在所述真空室（18）内扫过所述试样（14）上的电子束（34）。所述电子束装置（30）具有第一检测器（36），所述第一检测器（36）定位成检测相对于所述电子束（34）的方向在从所述样本（14）向后方释放的电子（38）并且所述电子束装置（30）具有第二检测器（40），所述第二检测器（40）定位成检测相对于电子束的方向从样品（14）的样品（12）向前方释放的电子（42）（34）; 以及在所述真空室（18）内的分离装置（50; 52），以将样品（12）与样品（14）分离，以便通过第二检测器（40）检查样品（12）。利用根据本发明的装置，可以对试样的样品进行透射检查，例如，半导体晶片的薄片，在相当低的成本下处于高产量。

4. 发明申请

WO2004079770A1 CHARGED PARTICLE BEAM DEVICE WITH CLEANING UNIT AND METHOD OF OPERATION THEREOF 审中-公开
标题翻译：带有清洁单元的充电颗粒光束装置及其操作方法
公开(公告)号：WO2004079770A1
公开(公告)日：2004-09-16
申请号：PCT/EP2004/002140
申请日：2004-03-03
申请人： ICT, INTEGRATED CIRCUIT TESTING GESELLSCHAFT FÜR HALBLEITERPRÜFTECHNIK MBH , JASINSKI, Thomas
发明人： JASINSKI, Thomas
IPC分类号： H01J37/06
CPC分类号： H01J3/026 , H01J37/065 , H01J2237/022
摘要： The invention provides a charged particle beam device, an emitter module for emitting charged particle beams and a method of operation thereof. Thereby, a charged particle beam emitter (15) emitting charged particles along an optical axis (1) is realized. On the same carrier body (32), a cleaning emitter (16) for emitting charged particles approximately along the optical axis (1) is realized. Thus, an improved cleaning can be provided.
摘要翻译：本发明提供一种带电粒子束装置，用于发射带电粒子束的发射器模块及其操作方法。由此，实现了沿光轴（1）发射带电粒子的带电粒子束发射器（15）。在相同的载体（32）上，实现了用于沿着光轴（1）近似地发射带电粒子的清洁发射器（16）。因此，可以提供改进的清洁。

5. 发明申请

WO2021233584A1 CHARGED PARTICLE BEAM DEVICE AND METHOD FOR INSPECTING AND/OR IMAGING A SAMPLE 审中-公开
公开(公告)号：WO2021233584A1
公开(公告)日：2021-11-25
申请号：PCT/EP2021/055856
申请日：2021-03-09
申请人： ICT INTEGRATED CIRCUIT TESTING GESELLSCHAFT FÜR HALBLEITERPRÜFTECHNIK MBH
发明人： WINKLER, Dieter , WÖLLERT, Bernd , SCHABINGER, Birgit
IPC分类号： H01J37/04 , H01J37/244
摘要： A charged particle beam device 10 for imaging and/or inspecting a sample 140 is described. The charged particle beam device includes a beam emitter 150 for emitting a primary charged particle beam 105; a retarding field device 100 for retarding the primary beam before impinging on the sample, the retarding field device including an objective lens 110 and a proxy electrode 130; and a first detector 120 for off-axial backscattered particles between the proxy electrode and the objective lens. The charged particle beam device is adapted for guiding the primary beam along an optical axis 101 to the sample for releasing signal particles. The proxy electrode includes one opening 131 allowing a passage of the primary charged particle beam and of the signal particles, wherein the one opening is sized to allow a passage of charged particles backscattered from the sample at angles from 0° to 20° or above relative to the optical axis. Further, a method for imaging and/or inspecting a sample with a charged particle beam device is described.

6. 发明申请

WO2021151629A1 METHOD OF OPERATING A CHARGED PARTICLE GUN, CHARGED PARTICLE GUN, AND CHARGED PARTICLE BEAM DEVICE 审中-公开
公开(公告)号：WO2021151629A1
公开(公告)日：2021-08-05
申请号：PCT/EP2021/050164
申请日：2021-01-07
申请人： ICT INTEGRATED CIRCUIT TESTING GESELLSCHAFT FÜR HALBLEITERPRÜFTECHNIK MBH
发明人： WINKLER, Dieter
IPC分类号： H01J37/073 , H01J37/21 , H01J37/18
摘要： A method of operating a charged particle gun (102) is described. The method includes providing an emitter (122) at a first emitter potential within the charged particle gun and providing a trapping electrode (142) at a first electrode potential within the charged particle gun, wherein the first emitter potential and the first electrode potential is provided to have an electrical field of essentially zero at the emitter and at the trapping electrode; switching the trapping electrode from the first electrode potential to a second electrode potential different from the first electrode potential to generate an electrostatic trapping field at the trapping electrode; and after switching the trapping electrode from the first electrode potential to the second electrode potential, switching on an electrostatic emission field at the emitter.

7. 发明申请

WO2020187696A1 A BEAM SPLITTER FOR A CHARGED PARTICLE DEVICE 审中-公开
公开(公告)号：WO2020187696A1
公开(公告)日：2020-09-24
申请号：PCT/EP2020/056689
申请日：2020-03-12
申请人： ICT INTEGRATED CIRCUIT TESTING GESELLSCHAFT FÜR HALBLEITERPRÜFTECHNIK MBH
发明人： WINKLER, Dieter , COOK, Benjamin John
IPC分类号： H01J37/147
摘要： A beam splitter for generating a plurality of charged particle beamlets from a charged particle source is disclosed. The beam splitter includes a plurality of beamlet deflectors, which each pass a beamlet along an optical axis. Each beamlet deflector includes a low order element and a corresponding high order element. Each low order element has fewer electrodes than each corresponding high order element; and each low order element is one of a plurality of low order elements; and each corresponding high order element is one of a plurality of high order elements.

8. 发明申请

WO2014202532A1 CHARGED PARTICLE BEAM SYSTEM AND METHOD OF OPERATING THEREOF 审中-公开
标题翻译：充电颗粒束系统及其操作方法
公开(公告)号：WO2014202532A1
公开(公告)日：2014-12-24
申请号：PCT/EP2014/062570
申请日：2014-06-16
申请人： ICT INTEGRATED CIRCUIT TESTING GESELLSCHAFT FÜR HALBLEITERPRÜFTECHNIK MBH
发明人： FROSIEN, Jürgen , COOK, Benjamin John
IPC分类号： H01J37/147 , H01J37/153 , H01J37/26
CPC分类号： H01J37/045 , H01J37/1478 , H01J37/153 , H01J37/263 , H01J2237/1534 , H01J2237/281 , H01J2237/2815
摘要： A charged particle beam device is described. The charged particle beam device includes a charged particle beam source (12) for emitting a charged particle beam, and a switchable multi-aperture (26) for generating two or more beam bundles (21a, 21b) from the charged particle beam, wherein the switchable multi-aperture includes: two or more aperture openings, wherein each of the two or more aperture openings is provided for generating a corresponding beam bundle of the two or more beam bundles; a beam blanker arrangement (226) configured for individually blanking the two or more beam bundles; and a stopping aperture (227) for blocking beam bundles, which are blanked off by the beam blanker arrangement. The device further includes a control unit electrically connected to the beam blanker arrangement and configured to control the individual blanking of the two or more beam bundles for switching of the switchable multi-aperture and an objective lens (18) configured for focusing the two or more beam bundles on a specimen (19) or wafer, wherein the two or more beam bundles are tilted with respect to the specimen or wafer depending on the position of each of the two or more beam bundles relative to an optical axis defined by the objective lens, and wherein the objective lens is configured for focusing the charged particle beam source, a virtual source provided by the charged particle beam source or a crossover.
摘要翻译：描述带电粒子束装置。带电粒子束装置包括用于发射带电粒子束的带电粒子束源（12）和用于从带电粒子束产生两个或更多束束（21a，21b）的可切换多孔（26），其中可切换的多孔径包括：两个或更多个孔口，其中两个或更多个孔径开口中的每一个被设置用于产生两个或更多个束束的对应的束束; 光束消除器布置（226），其被配置为单独地消隐所述两个或更多束束; 以及用于阻挡束束的停止孔（227），其被光束消除器布置消隐。该装置还包括电连接到光束消隐装置并被配置为控制用于切换可切换多孔径的两个或更多束束的单独消隐的控制单元和被配置用于聚焦两个或多个束（束）在样本（19）或晶片上，其中根据两个或多个束束中的每一个相对于由物镜限定的光轴的位置，两束或更多束束相对于样本或晶片倾斜，并且其中所述物镜被配置为聚焦所述带电粒子束源，由所述带电粒子束源提供的虚拟源或交叉。

9. 发明申请

WO2005071708A2 FOCUSSING LENS FOR CHARGED PARTICLE BEAMS 审中-公开
标题翻译：牵引带电粒子束的透镜
公开(公告)号：WO2005071708A2
公开(公告)日：2005-08-04
申请号：PCT/EP2005/000598
申请日：2005-01-21
申请人： ICT INTEGRATED CIRCUIT TESTING GESELLSCHAFT FÜR HALBLEITERPRÜFTECHNIK MBH , FEUERBAUM, Hans-Peter
发明人： FEUERBAUM, Hans-Peter
IPC分类号： H01J37/00
CPC分类号： H01J37/28 , H01J37/12
摘要： The present invention relates to a focussing lens (100) for focussing a charged particle beam (7) onto a specimen (3) at a predetermined landing angle (42; 42'; 42) comprising at least one first electrode (26, 105, 105a) having a first aperture (106) to generate a focussing electric field (110) for focussing the charged particle beam (7) onto the specimen (3); and a correcting electrode having a curved surface (115) to compensate for landing angle dependent distortions of the focussing electric field (110) caused by the specimen (3). With the curved surface (115) of the correcting electrode it is possible to improve the focussing of a charged particle beam at landing angles that differ from the perpendicular landing angle.
摘要翻译：本发明涉及用于以预定的着陆角（42; 42'; 42）将带电粒子束（7）聚焦到样本（3）上的聚焦透镜（100），其至少包括一个具有第一孔径（106）的第一电极（26,105,105a），用于产生用于将带电粒子束（7）聚焦到样本（3）上的聚焦电场（110）; 以及校正电极，其具有曲面（115）以补偿由样本（3）引起的聚焦电场（110）的与着屏角度相关的失真。利用校正电极的弯曲表面（115），可以改善带电粒子束在与垂直着陆角不同的着陆角处的聚焦。

10. 发明申请

WO2004088709A1 APPARATUS AND METHOD FOR CONTROLLING THE BEAM CURRENT OF A CHARGED PARTICLE BEAM 审中-公开
标题翻译：用于控制充电颗粒束的光束电流的装置和方法
公开(公告)号：WO2004088709A1
公开(公告)日：2004-10-14
申请号：PCT/EP2004/003329
申请日：2004-03-29
申请人： ICT, INTEGRATED CIRCUIT TESTING GESELLSCHAFT FÜR HALBLEITERPRÜFTECHNIK MBH , SELLMAIR, Josef
发明人： SELLMAIR, Josef
IPC分类号： H01J37/317
CPC分类号： H01J37/243 , B82Y10/00 , B82Y40/00 , H01J37/3023 , H01J37/3174 , H01J2237/06341 , H01J2237/31774 , H01J2237/31796
摘要： An apparatus for producing a beam of charged particles is provided, which comprises an emitter (1, 2) and a switching device (3) adapted to switch between first, second and third beam current levels, wherein the beam current at said first current level is suitable for writing a pixel of an image on the surface of a sample, the beam current at said second current level is suitable for not writing a pixel on the surface of said sample, and the beam current at said third current level is lower than the beam current at the second current level. Furthermore, a method of controlling the beam current of a charged particle beam is provided, comprising the steps of switching the beam current of said charged particle beam between first and second current levels, wherein the beam current at said first current level is suitable for writing a pixel of an image on the surface of a sample and the beam current at said second current level is suitable for not writing a pixel on the surface of said sample, and switching the beam current to a third voltage level, wherein the beam current at said third current level is lower than the beam current at the second current level.
摘要翻译：提供一种用于产生带电粒子束的装置，其包括适于在第一，第二和第三束电流水平之间切换的发射极（1,2）和开关装置（3），其中所述第一电流电平适合于在样品的表面上写入图像的像素，所述第二电流水平的束电流适于不在所述样品的表面上写入像素，并且所述第三电流水平的束电流低于束电流处于第二电流电平。此外，提供了一种控制带电粒子束的束电流的方法，包括以下步骤：将所述带电粒子束的束电流切换在第一和第二电流水平之间，其中所述第一电流水平的束电流适于写入在样品表面上的图像的像素和在所述第二电流电平处的束电流适合于不在所述样品的表面上写入像素，并且将束电流切换到第三电压电平，其中，所述第三电流水平低于在第二电流水平的束电流。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式