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    • 1. 发明专利
    • Electron microscope imaging system and method
    • 电子显微镜成像系统及方法
    • JP2014060145A
    • 2014-04-03
    • JP2013161759
    • 2013-08-02
    • B-Nano Ltdビー−ナノ リミテッド
    • DOV SHACHALRAFI DE PICCIOTTO
    • H01J37/20H01J37/28
    • PROBLEM TO BE SOLVED: To provide a system in which electron microscope image is facilitated in a helium environment.SOLUTION: In an electron microscope 100, a volume part 116 capable of high helium concentration is provided in the vicinity of an optical axis 106 in the outside of a vacuum chamber 104, to which a helium supply assembly 110 selectably supplies helium during imaging. A sample 122 is supported by a stage 124 on the outside of the vacuum chamber 104 and can be carried into and carried out from the volume part 116 capable of high helium concentration by a translational moving assembly 124 during imaging.
    • 要解决的问题:提供一种在氦环境中电子显微镜图像有助于的系统。解决方案:在电子显微镜100中,在光轴106附近提供能够高氦浓度的体积部分116 在真空室104的外部,氦气供应组件110在成像期间可选择地供应氦。 样品122由真空室104的外部的台124支撑,并且可以在成像期间由平移运动组件124承载并且能够由能够由平移运动组件124进行高氦浓度的容积部分116进行运送。
    • 4. 发明申请
    • A SYSTEM AND METHOD FOR PERFORMING ANALYSIS OF MATERIALS IN A NON-VACUUM ENVIRONMENT USING AN ELECTRON MICROSCOPE
    • 使用电子显微镜对非真空环境中的材料进行分析的系统和方法
    • WO2013183057A1
    • 2013-12-12
    • PCT/IL2013/050489
    • 2013-06-05
    • B-NANO LTD.
    • SHACHAL, DovDE PICCIOTTO, Rafi
    • G01N21/47
    • G01N23/2252G01N2223/309
    • A method for performing analysis of materials when present in a non- vacuum environment using an electron microscope, the method including generating first and second characteristic spectrum for a material by directing an electron beam from the electron microscope onto the material in respective first and second non-vacuum environments, in which respective first and second amounts of scattering of the electron beam takes place, collecting respective first and second X-rays emitted from the material and performing spectral analysis on the first and second X-rays, comparing the first and second characteristic spectra and noting peaks whose intensity increases with increased scattering, generating a scattering-compensated characteristic spectrum for the material from at least one of the first and second characteristic spectra by eliminating at least one peak whose intensity increases with increased scattering.
    • 一种当使用电子显微镜存在于非真空环境中时进行材料分析的方法,该方法包括通过将电子束从电子显微镜引导到相应的第一和第二非离子表面上的材料上来产生材料的第一和第二特征谱 真空环境,其中发生电子束的相应的第一和第二量的散射,收集从材料发射的相应的第一和第二X射线,并对第一和第二X射线进行光谱分析,比较第一和第二X射线 特征光谱和注意峰,其强度随着散射的增加而增加,通过消除其强度随着增加的散射而增加的至少一个峰,从而从第一和第二特征光谱中的至少一个产生材料的散射补偿特性光谱。